Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 27 - Ion beam tubes
Patents for H01J 27 - Ion beam tubes (3,716)
12/1998
12/22/1998CA2081005C Plasma accelerator with closed electron drift
12/16/1998EP0884760A2 Electron-beam excited plasma generator
12/15/1998US5849093 Process for surface treatment with ions
12/03/1998WO1998054750A1 Electron sources having shielded cathodes
12/02/1998EP0880798A1 System and method for cooling workpieces processed by an ion implantation system
12/02/1998EP0880797A1 Ion implantation system for implanting workpieces
12/02/1998EP0880794A1 Ion beam shield for implantation systems
12/02/1998EP0880793A1 Large area uniform ion beam formation
12/02/1998EP0880792A1 Loadlock assembly for an ion implantation system
11/1998
11/26/1998DE19820545A1 Electrode free plasma and ion source for continual operation
11/24/1998US5841237 Production of large resonant plasma volumes in microwave electron cyclotron resonance ion sources
11/24/1998US5841235 Source for the generation of large area pulsed ion and electron beams
11/24/1998US5840167 Sputtering deposition apparatus and method utilizing charged particles
11/11/1998EP0876677A1 Ion source for an ion beam arrangement
11/05/1998WO1998048973A1 Plasma gun and methods for the use thereof
10/1998
10/28/1998EP0873573A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
10/27/1998US5828070 System and method for cooling workpieces processed by an ion implantation system
10/22/1998WO1998047049A1 Apertured nonplanar electrodes and forming methods
10/21/1998EP0871977A1 A method for reduction of selected ion intensities in confined ion beams
10/20/1998US5824602 Helicon wave excitation to produce energetic electrons for manufacturing semiconductors
10/14/1998EP0583473B1 Method and device for treatment of articles in gas-discharge plasma
10/13/1998US5821677 Ion source block filament with laybrinth conductive path
10/07/1998CN1195261A End cap for indirectly heated cathode of ion source
09/1998
09/22/1998US5811823 For treating a workpiece by directing an ion beam at a workpiece
09/15/1998US5808416 For producing an ion beam from a feed gas
09/09/1998CN1192575A Cathode mounting for ion source with indirectly heated cathode
08/1998
08/11/1998US5793050 Ion implantation system for implanting workpieces
07/1998
07/22/1998EP0577667B1 Arc source macroparticle filter
07/15/1998CN1187682A Adjoint alpha neutron tube for logging
07/14/1998US5780862 Method and apparatus for generating ions
07/01/1998EP0851453A1 Endcap for indirectly heated cathode of ion source
06/1998
06/25/1998WO1998027572A1 Magnetic system, particularly for ecr sources, for producing closed surfaces of equimodule b of any form and dimensions
06/16/1998US5767512 In an inductively coupled plasma mass spectrometer
06/10/1998EP0847073A1 Ion source block cathode with labyrinth conductive path
06/10/1998CN1184324A Ion source block filament with labyrinth conductive path
06/09/1998US5763986 Cyclotron and method of adjusting the same having an ion puller electrode with a movable aperture
06/09/1998US5763895 Source inner shield for eaton NV-10 high current implanter
06/09/1998US5763890 Cathode mounting for ion source with indirectly heated cathode
06/02/1998US5760405 Plasma chamber for controlling ion dosage in ion implantation
05/1998
05/28/1998WO1998022970A1 Electronic cyclotron resonance source for the production of ions with multiple charge in a hostile medium
05/28/1998WO1998022969A1 Gas discharge device
05/20/1998EP0842527A1 Gas-discharge device with electrodes for use in vacuum technology
05/19/1998US5754008 Device for creating a beam of adjustable-energy ions particularly for sequential vacuum treatment of surfaces with large dimensions
05/14/1998WO1998020513A1 Charged particle source
05/14/1998CA2271688A1 Charged particle source
05/12/1998US5751003 Loadlock assembly for an ion implantation system
05/12/1998US5750987 Ion beam processing apparatus
05/07/1998DE19641439A1 Electron cyclotron resonance ion source
05/06/1998EP0840346A1 Cathode mounting for ion source with indirectly heated cathode
04/1998
04/30/1998WO1998018150A1 Ion gun
04/28/1998US5745537 Neutron tube with magnetic confinement of the electrons by permanent magnets and its method of manufacture
04/23/1998DE19746425A1 Insulator etching method for semiconductor manufacture
04/14/1998US5739646 Magnetic field adjusting center rods for cyclotron a magnet for cyclotron, and cyclotron
04/14/1998US5739528 Fast atom beam source
04/09/1998WO1998014977A1 An arc chamber for an ion implantation system
04/09/1998CA2267082A1 An arc chamber for an ion implantation system
04/02/1998WO1998013851A1 Ion source for generating ions of a gas or vapour
03/1998
03/26/1998WO1998003988A3 Cathode arc source and graphite target
03/04/1998EP0827179A1 Single potential ion source
03/04/1998CN1175320A Radio frequency ion source
02/1998
02/11/1998CN1173107A Method and apparatus for ion formation in ion implanter
01/1998
01/29/1998WO1998003988A2 Cathode arc source and graphite target
12/1997
12/30/1997US5703372 For use in an ion implanter
12/17/1997EP0813223A1 Magnetic field generation means and ECR ion source using the same
12/09/1997US5696429 Method for charge neutralization of surface in space with space-charge neutral plasma
12/04/1997WO1997045855A1 Highly tetrahedral amorphous carbon films and methods for their production
12/04/1997WO1997045834A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
12/04/1997WO1997045567A1 Flow-through ion beam source
12/03/1997EP0810628A2 Source for generating large surface pulsed ion and electron beams
12/03/1997EP0810624A1 Method and apparatus for ion formation in an ion implanter
12/03/1997EP0809857A1 Generator of ribbon-shaped ion beam
12/03/1997EP0809855A1 Electronic cyclotron resonance device for generating an ion beam
11/1997
11/30/1997CA2207773A1 Method and apparatus for ion formation in an ion implanter
11/25/1997US5689950 Spacecraft
11/13/1997WO1997032335A3 Control mechanisms for dosimetry control in ion implantation systems
11/11/1997US5686796 Ion implantation helicon plasma source with magnetic dipoles
11/11/1997US5686789 Discharge device having cathode with micro hollow array
11/04/1997US5684360 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
11/04/1997US5684300 Ion mobility spectrometer
10/1997
10/08/1997EP0799491A1 Radio frequency ion source
10/07/1997US5675606 Solenoid and monocusp ion source
10/07/1997US5675152 Source filament assembly for an ion implant machine
10/02/1997WO1997036463A1 Source of fast neutral molecules
10/02/1997DE19700856A1 Ion source for ion beam system, e.g. for doping semiconductors
09/1997
09/23/1997US5670785 Charge converter provided in an ion implantation apparatus
09/04/1997WO1997032335A2 Control mechanisms for dosimetry control in ion implantation systems
08/1997
08/26/1997US5661308 Method and apparatus for ion formation in an ion implanter
08/21/1997WO1997030471A1 System and method for cooling workpieces processed by an ion implantation system
08/21/1997WO1997030470A1 Ion implantation system for implanting workpieces
08/21/1997WO1997030467A1 Ion beam shield for implantation systems
08/21/1997WO1997030466A1 Large area uniform ion beam formation
08/21/1997WO1997030465A1 Loadlock assembly for an ion implantation system
08/21/1997WO1997030464A1 Plasma chamber for controlling ion dosage in ion implantation
08/21/1997DE19603043A1 Ion generator for plasma production in ionographic print head
08/14/1997DE19605171A1 High temperature oven for metal vaporisation
08/12/1997US5656820 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device
08/12/1997US5656819 Pulsed ion beam source
07/1997
07/31/1997WO1997027613A1 Ion source for an ion beam arrangement
07/24/1997DE19618734A1 Ion source for implantation of semiconductors or for surface treatment
07/22/1997US5650203 Silicon ion emitter electrodes
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