| Patents for H01J 27 - Ion beam tubes (3,716) |
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| 04/04/2001 | EP1088334A2 An apparatus for reduction of selected ion intensities in confined ion beams |
| 03/29/2001 | WO2001022470A1 Ion beam vacuum sputtering apparatus and method |
| 03/29/2001 | WO2001022465A1 Plasma source of linear ion beam |
| 03/27/2001 | US6207951 Method of generating a pulsed metastable atom beam and pulsed ultraviolet radiation and an apparatus therefor |
| 03/20/2001 | USRE37100 Pulsed ion beam source |
| 03/20/2001 | US6204508 Toroidal filament for plasma generation |
| 03/14/2001 | EP1082750A1 Pulsed ion source for ion trap mass spectrometer |
| 03/14/2001 | EP0757598A4 Pulsed ion beam assisted deposition |
| 03/07/2001 | EP1080612A1 Method for modulating a magnetic field configuration |
| 03/06/2001 | US6196155 Plasma processing apparatus and method of cleaning the apparatus |
| 02/27/2001 | US6194836 Magnetic system, particularly for ECR sources, for producing closed surfaces of equimodule B of form dimensions |
| 02/15/2001 | WO2001011659A1 System and method for providing implant dose uniformity across the surface of a substrate |
| 02/08/2001 | WO2001009918A1 Enhanced electron emissive surfaces for a thin film deposition system using ion sources |
| 02/07/2001 | CN1061781C Radio freguency ion source |
| 02/06/2001 | US6184625 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 02/06/2001 | US6184624 Ion source |
| 02/06/2001 | US6184532 Ion source |
| 02/01/2001 | DE19933762A1 Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen Pulsed magnetic opening of electron cyclotron resonance Jonen sources for generating short, strong current pulses of highly charged ions or electrons |
| 01/31/2001 | EP1073087A2 Ion source |
| 01/31/2001 | CN1282095A Ion source |
| 01/25/2001 | WO2001006534A1 Beam source |
| 01/25/2001 | WO2001006533A2 Pulsed magnetic opening of electron resonance ion sources for the generation of short, high-current pulses of highly charged ions or electrons |
| 01/23/2001 | US6177679 Ion implanter with impurity interceptor which removes undesired impurities from the ion beam |
| 01/18/2001 | WO2001004611A2 Method and apparatus for enhancing yield of secondary ions |
| 01/18/2001 | DE19925493C1 Linear ausgedehnte Anordnung zur großflächigen Mikrowellenbehandlung und zur großflächigen Plasmaerzeugung Linear extended array for large-scale microwave treatment and for large-scale plasma generation |
| 01/09/2001 | US6172324 Plasma focus radiation source |
| 01/04/2001 | WO2001001438A1 Ion beam generation apparatus |
| 01/03/2001 | EP1065696A2 Ion implantation apparatus and ion source and ion source subassembly for use in ion implantation apparatus |
| 01/02/2001 | US6169288 Laser ablation type ion source |
| 12/27/2000 | EP1062679A1 Plasma etching installation |
| 12/20/2000 | EP1061550A2 System and method for cleaning contaminated surfaces in an ion implanter |
| 12/14/2000 | WO2000075955A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 12/14/2000 | CA2375677A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 11/28/2000 | US6153067 Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source |
| 11/23/2000 | WO2000070646A1 Secondary electron spectroscopy method and system |
| 11/23/2000 | WO2000038210A3 Map ion diode puff valve and gas dam and method of using the same |
| 11/21/2000 | US6150755 Charged particle source with liquid electrode |
| 11/21/2000 | US6150628 Toroidal low-field reactive gas source |
| 11/16/2000 | WO2000068451A2 Magnetron negative ion sputter source |
| 11/15/2000 | EP1052672A1 Time-of-flight mass spectrometer ion source for gas sample analysis |
| 11/14/2000 | US6147354 Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap |
| 11/08/2000 | EP1050064A2 Implantation of radioactive ?32 p atoms |
| 11/02/2000 | EP0809857B1 Generator of ribbon-shaped ion beam |
| 10/31/2000 | US6140656 Ion implantation apparatus, ion implantation method and semiconductor device |
| 10/26/2000 | WO2000063459A1 Method and apparatus for deposition of diamond like carbon |
| 10/26/2000 | DE19900437A1 Surface coating and/or implantation of solid objects or human or animal tissue is carried out using one or more laser beams coaxial with ion beam from electron cyclotron resonance ion source |
| 10/24/2000 | US6137110 Focused ion beam source method and apparatus |
| 10/24/2000 | US6136387 A plasma processing system, for attracting only positive ions from a plasma and repelling electrons and negative ions to the plasma, thereby forming a positive ion flow directed toward a target object |
| 10/24/2000 | US6135128 Method for in-process cleaning of an ion source |
| 10/18/2000 | EP1044460A1 Electron sources utilizing patterned negative electron affinity photocathodes |
| 10/12/2000 | WO2000060642A1 Pulsed ion source for ion trap mass spectrometer |
| 10/10/2000 | US6130507 Cold-cathode ion source with propagation of ions in the electron drift plane |
| 10/10/2000 | US6129808 Low contamination high density plasma etch chambers and methods for making the same |
| 10/04/2000 | EP1041863A1 Plasma cell |
| 10/03/2000 | US6127775 Ionic display with grid focusing |
| 09/28/2000 | DE3845007C2 Ion beam generator for semiconductor processing |
| 09/21/2000 | WO2000054899A1 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 09/08/2000 | WO2000052730A1 Liquid metal ion source and method for measuring flow impedance of liquid metal ion source |
| 09/06/2000 | EP0880793B1 Large area uniform ion beam formation |
| 08/22/2000 | US6107634 Decaborane vaporizer |
| 08/16/2000 | EP1027482A1 Apparatus and method for the in-situ generation of dopants |
| 07/27/2000 | DE19953782A1 Ion source for elemental analysis of solid samples comprises a chamber having an inlet channel, a suction-extraction channel, a cathode, a cylindrical hollow anode and an aperture allowing ions to enter a mass spectrometer |
| 07/25/2000 | US6094012 Low energy spread ion source with a coaxial magnetic filter |
| 07/19/2000 | EP1020887A2 Discharge device |
| 07/13/2000 | WO2000041210A1 Plasma etching installation |
| 07/13/2000 | WO2000017906A3 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 07/13/2000 | DE19953821A1 Ion source for elemental analysis of solid samples comprises a chamber having an inlet channel, a suction-extraction channel, a cathode, a cylindrical hollow anode and an aperture allowing ions to enter a mass spectrometer |
| 07/12/2000 | EP1018140A1 Electron sources having shielded cathodes |
| 07/12/2000 | EP0928495B1 Ion source for generating ions of a gas or vapour |
| 07/12/2000 | EP0880794B1 Ion beam shield for implantation systems |
| 07/11/2000 | US6087615 Ion source for an ion beam arrangement |
| 07/05/2000 | EP1015161A1 Plasma gun and methods for the use thereof |
| 07/04/2000 | USRE36760 Method and apparatus for altering material using ion beams |
| 07/04/2000 | US6084241 Method of manufacturing semiconductor devices and apparatus therefor |
| 07/04/2000 | US6084198 Plasma gun and methods for the use thereof |
| 06/29/2000 | WO2000038210A2 Map ion diode puff valve and gas dam and method of using the same |
| 06/29/2000 | DE19960314A1 Ionenstrahl-Bearbeitungsvorrichtung und Verfahren zum Betreiben einer Ionenquelle für diese An ion beam processing apparatus and method for operating an ion source for this |
| 06/29/2000 | DE19849894C1 Gepulste Plasmaquelle für einen gasgefüllten Teilchenbeschleuniger Pulsed plasma source for a gas-filled particle accelerator |
| 06/21/2000 | CN1053763C Adjoint alpha neutron tube for logging |
| 06/14/2000 | EP1007759A1 Modulated power for ionized metal plasma deposition |
| 06/06/2000 | US6072273 Discharge device having cathode with micro hollow array |
| 05/16/2000 | US6064070 Radioactivity ion sources for miniaturized ion mobility spectrometers |
| 05/11/2000 | WO2000027170A1 Gas-filled particle accelerator with a pulsed plasma source |
| 05/09/2000 | US6061074 Ion generator for ionographic print heads |
| 05/09/2000 | US6060836 Plasma generating apparatus and ion source using the same |
| 05/09/2000 | US6060718 Ion source having wide output current operating range |
| 04/26/2000 | EP0995345A1 Vorrichtung zur anregung |
| 04/26/2000 | EP0995215A1 Power control apparatus for an ion source having an indirectly heated cathode |
| 04/26/2000 | EP0995214A1 Method and apparatus for neutralising space charge in an ion beam |
| 04/12/2000 | EP0992059A1 Toroidal low-field reactive gas source |
| 04/12/2000 | EP0992057A1 Charged-particle source, control system, and process |
| 04/06/2000 | WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 03/30/2000 | WO2000017906A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 03/21/2000 | US6040547 Gas discharge device |
| 03/14/2000 | US6037717 Cold-cathode ion source with a controlled position of ion beam |
| 03/14/2000 | US6037587 Chemical ionization source for mass spectrometry |
| 03/08/2000 | EP0984481A2 Ion source device |
| 03/01/2000 | EP0873573A4 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 02/24/2000 | DE19900179C1 Installation for etching substrates by high-density plasmas comprises a phase delay line causing the supply voltages at both ends of the inductively coupled plasma coil to be in counter-phase with one another |
| 02/23/2000 | EP0721655B1 An ultra-sensitive molecular identifier |