Patents for H01J 27 - Ion beam tubes (3,716) |
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10/04/2007 | US20070228286 Polarized pulsed front-end beam source for electron microscope |
10/02/2007 | US7276847 Cathode assembly for indirectly heated cathode ion source |
10/02/2007 | US7276691 Ion beam device and ion beam processing method |
09/27/2007 | WO2007109672A2 Coupled electrostatic ion and electron traps for electron capture dissociation-tandem mass spectrometry |
09/27/2007 | US20070221862 Coupled Electrostatic Ion and Electron Traps for Electron Capture Dissociation - Tandem Mass Spectrometry |
09/27/2007 | US20070221843 Ion sources, systems and methods |
09/20/2007 | WO2007106176A2 Air assist for ac ionizers |
09/19/2007 | CN200949112Y Anode for ion source of optical auxiliary film plating machine |
09/18/2007 | US7271400 Methods, apparatus, and systems involving ion beam generation |
09/13/2007 | WO2007067316A3 Ion sources, systems and methods |
09/13/2007 | US20070210260 Method And Apparatus For Extending Equipment Uptime In Ion Implantation |
09/12/2007 | EP1831914A2 Target design for high-power laser accelerated ions |
09/12/2007 | EP1185857B1 Method and apparatus for enhancing yield of secondary ions |
09/07/2007 | WO2007067313A3 Ion sources, systems and methods |
09/06/2007 | US20070205375 Ion sources, systems and methods |
09/05/2007 | EP1830383A2 Particle-optical apparatus equipped with a gas ion source |
09/05/2007 | EP1829436A2 Anionic and neutral particulate beams |
09/04/2007 | US7265362 Mass spectrometer |
08/29/2007 | EP1826809A1 Particle-optical apparatus equipped with a gas ion source |
08/29/2007 | EP1825491A2 Ion source with substantially planar design |
08/23/2007 | WO2006083886A3 Ion source for use in an ion implanter |
08/23/2007 | US20070194252 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
08/21/2007 | US7259379 On-axis electron impact ion source |
08/21/2007 | US7259378 Closed drift ion source |
08/21/2007 | US7259368 Apparatus for delivering ions from a grounded electrospray assembly to a vacuum chamber |
08/16/2007 | WO2007067317A3 Ion sources, systems and methods |
08/15/2007 | CN1332414C Ion beam irradiation device |
08/14/2007 | US7256396 Sensitive glow discharge ion source for aerosol and gas analysis |
08/09/2007 | WO2007038134A3 Method of aligning a particle-beam-generated pattern to a pattern on pre-patterned substrate |
08/09/2007 | WO2005094389A3 Method and system for desorption electrospray ionization |
08/09/2007 | US20070181830 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
08/02/2007 | WO2007087285A2 Addressable microplasma devices and arrays with buried electrodes in ceramic |
08/02/2007 | WO2007087213A2 Methods of implanting ions and ion sources used for same |
08/02/2007 | WO2007087212A1 Methods of implanting ions and ion sources used for same |
08/02/2007 | US20070176115 Ion implantation system and control method |
08/02/2007 | US20070176114 Ion implantation system and control method |
08/02/2007 | US20070176113 Electrospray-assisted laser desorption ionization device, mass spectrometer, and method for mass spectrometry |
08/01/2007 | EP1539332A4 Multimode ionization source |
07/26/2007 | US20070170372 Dual mode ion source for ion implantation |
07/26/2007 | US20070170371 Microplasma-based sample ionizing device and methods of use thereof |
07/26/2007 | DE19838599B4 Chemische Ionisationsquelle für die Massenspektrometrie Chemical ionization source for mass spectrometry |
07/25/2007 | CN1328755C Low contaminatino, high density plasma etch chamber and method for making the same |
07/24/2007 | US7247863 System and method for rapidly controlling the output of an ion source for ion implantation |
07/19/2007 | US20070164231 Apparatus and method for ion calibrant introduction |
07/18/2007 | EP1807859A2 Ionizer and method for gas-cluster ion-beam formation |
07/17/2007 | US7244952 Combinations of deflection chopping systems for minimizing energy spreads |
07/12/2007 | WO2005081940A3 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
07/12/2007 | US20070158582 Ion sources, systems and methods |
07/12/2007 | US20070158581 Ion sources, systems and methods |
07/12/2007 | US20070158580 Ion sources, systems and methods |
07/12/2007 | US20070158579 Optical apparatus, lithographic apparatus and device manufacturing method |
07/12/2007 | US20070158578 Air Assist for AC Ionizers |
07/12/2007 | US20070158577 Method and apparatus for generating laser produced plasma |
07/12/2007 | US20070158555 Ion sources, systems and methods |
07/11/2007 | EP1804841A2 Process and device for sterilising ambient air |
07/11/2007 | CN1998059A Non-axisymmetric charged-particle beam system |
07/11/2007 | CN1996546A The real-time control system and control method for the ion source in gas |
07/10/2007 | US7241361 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
07/05/2007 | US20070152165 Apparatus and method for generating ions of an ion implanter |
07/04/2007 | CN2919518Y Power supply for Hall ion source |
07/03/2007 | US7238952 Metal ion emission device and process for producing the same, ion beam irradiation device, processing apparatus and analyzing apparatus provided with emission device |
06/28/2007 | WO2006047609A8 Ionizer and method for gas-cluster ion-beam formation |
06/21/2007 | WO2007044361A3 Ldi/maldi source for enhanced spatial resolution |
06/21/2007 | WO2000068451A3 Magnetron negative ion sputter source |
06/21/2007 | US20070138406 Multimode ion source with improved ionization |
06/21/2007 | US20070138405 Corona etching |
06/20/2007 | CN1983504A Ion source and mould polisher therewith |
06/20/2007 | CN1322559C Plasma processor |
06/19/2007 | US7232992 Charged droplet sprayers |
06/14/2007 | WO2007067318A2 Ion sources, systems and methods |
06/14/2007 | WO2007067317A2 Ion sources, systems and methods |
06/14/2007 | WO2007067316A2 Ion sources, systems and methods |
06/14/2007 | WO2007067313A2 Ion sources, systems and methods |
06/14/2007 | WO2007067310A2 Ion sources, systems and methods |
06/14/2007 | US20070132358 Ion source and polishing system using the same |
06/14/2007 | US20070131871 Acoustic desorption mass spectrometry |
06/12/2007 | US7230256 Ion doping system, ion doping method and semiconductor device |
06/06/2007 | EP1332509A4 Focused ion beam system |
05/31/2007 | US20070120066 Spray glow discharge ionization method and system |
05/30/2007 | EP1287549A4 An apparatus and a method for forming a pattern using a crystal structure of material |
05/30/2007 | EP1261752B1 Method for repairing lithography masks using a charged particle beam system |
05/30/2007 | EP1212777B1 Ion beam vacuum sputtering apparatus and method |
05/30/2007 | CN1973346A An ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
05/29/2007 | US7224567 Structural arrangements for ion generator to promote ionization efficiency |
05/29/2007 | US7223990 Ion beam irradiation device |
05/29/2007 | US7223984 Helium ion generation method and apparatus |
05/24/2007 | US20070114439 Mass spectrometer |
05/24/2007 | US20070114438 Automatic cleaning of ion sources |
05/22/2007 | US7220976 Ion source and ion implanter having the same |
05/22/2007 | US7220972 Method and apparatus for the characterization and analysis of the shape of molecules and molecular clusters, and for the separation of desired isomers, based on Rydberg states |
05/17/2007 | US20070108394 Ion implantation ion source, system and method |
05/17/2007 | US20070108391 Method of analyzing dioxins |
05/16/2007 | CN1316539C External magnetic insulation ion diode for prdoucing large area strong flow pulse ionic beam |
05/09/2007 | CN1961403A Carbon nanotube electron ionization sources |
05/03/2007 | WO2007050475A2 Ion drive and odor emitter |
05/03/2007 | US20070098980 Highly Tetrahedral Amorphous Carbon Coatings and Systems and Methods for Their Production |
05/03/2007 | US20070098979 Diamond-like carbon coating supported one a glass substrate; coating has a first tetrahedral amorphous carbon layer having at least 35% sp3 bonds including subplanted carbon bonds and an average density of at least 2.5 gm/cm3; magnetic recording media |
05/02/2007 | CN1314075C Shielding system for plasma chamber |
05/01/2007 | US7211805 Liquid metal ion gun |
04/26/2007 | WO2007045739A1 Reading/writing tip, head and device, and use thereof, and method for making same |