Patents for H01J 27 - Ion beam tubes (3,716) |
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07/17/1997 | WO1997025737A1 A method for reduction of selected ion intensities in confined ion beams |
07/16/1997 | EP0729640A4 Methods and apparatus for altering material using ion beams |
07/09/1997 | EP0782763A1 An ion beam apparatus |
07/02/1997 | EP0781921A1 Closed ion drift source |
06/17/1997 | US5640020 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
06/17/1997 | US5640009 Fast atom beam source |
06/17/1997 | US5639308 Plasma apparatus |
05/27/1997 | US5633506 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
05/21/1997 | EP0774769A1 Fast atom beam source |
05/13/1997 | US5628831 Method for cleaning contaminants from a body in space using a space charge neutral plasma |
05/07/1997 | EP0615655B1 Corona discharge ionisation source |
04/30/1997 | DE19539579A1 Electrode system mfg. method using numerical control for ion beam acceleration and focussing |
04/29/1997 | US5625195 High-energy implantation process using an ion implanter of the low-or medium-current type and corresponding devices |
04/23/1997 | EP0769892A1 Magnetic field adjusting center rods for cyclotron, magnet for cyclotron, and cyclotron |
04/23/1997 | EP0769891A1 Cylotron and method of adjusting the same |
04/23/1997 | EP0769202A1 Liquid metal ion source |
04/23/1997 | EP0769201A1 Device for generating an ion beam of adjustable energy, particularly for the continuous vacuum processing of large surfaces |
04/23/1997 | EP0611482B1 Ion-optical system for gas discharge ion source |
04/16/1997 | CN1147690A Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
04/15/1997 | US5620522 Microwave plasma generator |
04/09/1997 | EP0729641A4 Pulsed ion beam source |
04/03/1997 | WO1997003453A3 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
04/02/1997 | EP0721655A4 An ultra-sensitive molecular identifier |
03/12/1997 | EP0762469A1 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
02/18/1997 | US5604350 Fitting for an ion source assembly |
02/13/1997 | WO1997005645A1 Gas-discharge device with electrodes for use in vacuum technology |
02/12/1997 | EP0757598A1 Pulsed ion beam assisted deposition |
02/11/1997 | US5601654 Flow-through ion beam source |
02/06/1997 | WO1997004474A1 An ion beam apparatus |
02/06/1997 | DE19528314A1 In der Vakuumtechnik einsetzbares Gerät mit Elektroden für eine Gasentladung In vacuum technology use device with electrodes for gas discharge |
02/04/1997 | US5600136 Single potential ion source |
01/30/1997 | WO1997003453A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
01/28/1997 | US5597495 Method and apparatus for etching surfaces with atomic fluorine |
01/14/1997 | US5594243 For measuring the mass of organic molecules |
01/08/1997 | EP0751972A1 Polymer surface treatment with pulsed particle beams |
01/07/1997 | US5592055 Radio-frequency plasma source |
01/02/1997 | DE19513345A1 Electron cyclotron resonance ion source with cylindrical cavity and hollow conductor |
12/12/1996 | DE19531141A1 Ion source for use in industrial manufacture of high purity optical films, e.g. multiple interference films |
12/03/1996 | US5581156 HF sustained, DC discharge driven negative ion source with automatic control system |
11/20/1996 | EP0743669A1 Ion source |
11/19/1996 | US5576600 Broad high current ion source |
10/30/1996 | EP0740327A2 Ion beam processing apparatus |
10/29/1996 | US5569976 Ion emmiter based on cold cathode discharge |
10/24/1996 | DE19513566A1 Industrial scale appts. implants tin ions into steel to reduce friction of alloy |
10/08/1996 | US5563410 Ion gun and mass spectrometer employing the same |
09/25/1996 | EP0733800A1 Ion thruster |
09/24/1996 | US5559391 Three-grid ion-optical system |
09/18/1996 | EP0732719A1 Discharge device having cathode with micro hollow array |
09/10/1996 | US5554852 Ion implantation having increased source lifetime |
09/04/1996 | EP0729641A1 Pulsed ion beam source |
09/04/1996 | EP0729640A1 Methods and apparatus for altering material using ion beams |
08/29/1996 | WO1996026530A1 Generator of ribbon-shaped ion beam |
08/22/1996 | WO1996025755A1 Electronic cyclotron resonance device for generating an ion beam |
08/21/1996 | EP0727095A1 Micromachined mass spectrometer |
08/08/1996 | DE19600861C1 Generation of shaped parts on substrates using metal spray jet |
08/06/1996 | US5543625 Filament assembly for mass spectrometer ion sources |
08/06/1996 | US5543624 Gasphase ion source for time-of-flight mass-spectrometers with high mass resolution and large mass range |
08/01/1996 | WO1996023021A1 Polymer surface treatment with pulsed particle beams |
08/01/1996 | WO1996022841A1 Pulsed ion beam assisted deposition |
08/01/1996 | CA2186102A1 Pulsed ion beam assisted deposition |
08/01/1996 | CA2186101A1 Polymer surface treatment with pulsed particle beams |
07/30/1996 | US5541408 Micromachined mass spectrometer |
07/17/1996 | EP0722180A2 Ion implantation apparatus, ion implantation method and semiconductor device |
07/17/1996 | EP0721655A1 An ultra-sensitive molecular identifier |
07/02/1996 | US5532495 Methods and apparatus for altering material using ion beams |
06/27/1996 | WO1996019822A1 Radio frequency ion source |
06/18/1996 | US5528034 Method of ultra high sensitivity hydrogen detection with slow multiply-charged ions |
06/11/1996 | US5525805 Pulsed ion beam source |
06/04/1996 | US5523652 Microwave energized ion source for ion implantation |
05/28/1996 | US5521389 Solid state cesium ion gun |
05/23/1996 | DE19515279C1 HV constant current power supply e.g. for ion source in accelerator equipment |
05/22/1996 | EP0713239A1 Ion generating source for use in an ion implanter |
05/21/1996 | US5519183 Plasma spray gun head |
05/14/1996 | US5517084 Selective ion source |
05/14/1996 | US5517077 Ion implantation having increased source lifetime |
05/07/1996 | US5514936 RF plasma source and method for plasma cleaning of surface in space |
05/01/1996 | EP0710056A1 Radio-frequency plasma source |
04/10/1996 | EP0706199A1 Novel high brightness point ion sources using liquid ionic compounds |
04/09/1996 | US5506475 Microwave electron cyclotron electron resonance (ECR) ion source with a large, uniformly distributed, axially symmetric, ECR plasma volume |
04/09/1996 | US5506185 Ceramic oxyanion emitter |
04/02/1996 | US5503725 Method and device for treatment of products in gas-discharge plasma |
03/27/1996 | EP0703597A1 Microwave energized ion source for ion implantation |
03/27/1996 | EP0702843A1 Method for high energy implantation using a low or medium current implanter, and devices therefor |
03/27/1996 | CN1119338A Structure for alignment of an ion source aperture with a predetermind ion beam path |
03/27/1996 | CA2159028A1 Microwave energized ion source for ion implantation |
03/12/1996 | US5498290 Confinement of secondary electrons in plasma ion processing |
03/05/1996 | US5497006 Ion generating source for use in an ion implanter |
03/05/1996 | US5497005 Method and apparatus for producing a stream of ionic aluminum |
02/20/1996 | US5493115 Methods for analyzing a sample for a compound of interest using mass analysis of ions produced by slow monochromatic electrons |
01/30/1996 | US5488228 Saddle field source |
01/25/1996 | WO1996002065A1 Liquid metal ion source |
01/18/1996 | WO1996001490A1 Device for generating an ion beam of adjustable energy, particularly for the continuous vacuum processing of large surfaces |
01/03/1996 | EP0690475A1 Structure for alignment of an ion source aperture with a predetermined ion beam path |
12/27/1995 | EP0621979B1 Radio-frequency ion source |
12/21/1995 | DE4419970A1 Highly charged ion beam generator |
12/20/1995 | EP0687381A1 Ion gun and mass spectrometer employing the same |
12/05/1995 | US5473165 Method and apparatus for altering material |
11/29/1995 | EP0583473A4 Method and device for treatment of articles in gas-discharge plasma |
11/21/1995 | US5468363 Magnetic-cusp, cathodic-arc source |
11/14/1995 | US5466941 Negative ion sputtering beam source |