| Patents for G21K 5 - Irradiation devices (9,144) |
|---|
| 12/29/2005 | US20050285054 Charged particle beam drawing apparatus |
| 12/29/2005 | US20050285052 Scanning mechanism of an ion implanter |
| 12/29/2005 | US20050285048 Discharge radiation source, in particular uv radiation |
| 12/28/2005 | EP1609165A2 Ion beam incident angle detector for ion implant systems |
| 12/28/2005 | EP1328387B1 Radiation hardening installation |
| 12/27/2005 | US6980623 Method and apparatus for z-axis tracking and collimation |
| 12/27/2005 | US6979832 Medical charged particle irradiation apparatus |
| 12/22/2005 | WO2005122654A1 Method of forming composite ceramic targets |
| 12/22/2005 | WO2005120286A1 Irradiation device for fingernails or toenails |
| 12/22/2005 | US20050282072 Providing a mask substrate;forming a lower multilayer reflective stack; forming a first embedded layer over the lower multilayer reflective stack; forming a second embedded layer; forming a top multilayer reflective stack; etching an opening through the top multilayer reflective stack |
| 12/22/2005 | US20050281374 Path planning and collision avoidance for movement of instruments in a radiation therapy environment |
| 12/22/2005 | US20050279952 Focused ion beam apparatus |
| 12/22/2005 | CA2567747A1 Method of forming composite ceramic targets |
| 12/20/2005 | US6978437 Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same |
| 12/20/2005 | US6977713 Lithographic apparatus and device manufacturing method |
| 12/20/2005 | US6977386 Angular aperture shaped beam system and method |
| 12/20/2005 | US6977375 Multi-beam multi-column electron beam inspection system |
| 12/15/2005 | WO2005119730A2 X-ray source with nonparallel geometry |
| 12/15/2005 | WO2005119701A2 System for forming x-rays and method for using same |
| 12/15/2005 | US20050278686 Fragmentation point and simulation site adjustment for resolution enhancement techniques |
| 12/15/2005 | US20050277031 Method and apparatus for clean photomask handling |
| 12/15/2005 | US20050277030 capping structure may include alternating layers of a capping material, e.g., ruthenium, and a material with a lower EUV absorption coefficient, e.g., silicon |
| 12/15/2005 | US20050276382 X-ray source with nonparallel geometry |
| 12/15/2005 | US20050274904 Monatomic boron ion source and method |
| 12/15/2005 | US20050274903 Monatomic dopant ion source and method |
| 12/15/2005 | DE102004017131B4 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices |
| 12/14/2005 | EP1604247A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 12/14/2005 | EP1603460A2 X-ray diffraction-based scanning system |
| 12/14/2005 | CN1708729A Electron beam exposure method and electron beam exposure system |
| 12/13/2005 | US6973758 Shielded structure for radiation treatment equipment and method of assembly |
| 12/08/2005 | WO2005115743A2 Light scattering euvl mask |
| 12/08/2005 | WO2005036561A3 X-ray pallet processing |
| 12/08/2005 | US20050273754 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method |
| 12/08/2005 | US20050273753 Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes |
| 12/08/2005 | US20050271949 Reticle manipulations |
| 12/08/2005 | US20050270648 Projection optical system, exposure apparatus, device manufacturing method, and device manufactured by using the same |
| 12/08/2005 | DE10261099B4 Ionenstrahlanlage Ion beam system |
| 12/07/2005 | EP1602007A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 12/07/2005 | CN1230674C Whole set testing equipment employing X-rays |
| 12/06/2005 | US6973164 Laser-produced plasma EUV light source with pre-pulse enhancement |
| 12/06/2005 | US6973161 X-ray foreign material detecting apparatus simultaneously detecting a plurality of X-rays having different amounts of energy |
| 12/06/2005 | US6972421 Extreme ultraviolet light source |
| 12/01/2005 | US20050266317 Light scattering euvl mask |
| 12/01/2005 | US20050264775 Lithographic apparatus, device manufacturing method and radiation system |
| 12/01/2005 | US20050263721 Uniformity control using multiple tilt axes, rotating wafer and variable scan velocity |
| 12/01/2005 | US20050263720 Method and apparatus for recycling gases used in a lithography tool |
| 11/30/2005 | EP1599723A2 Scanning-based detection of ionizing radiation |
| 11/30/2005 | CN1702549A Pattern data manufacturing method, pattern checking method and application thereof |
| 11/30/2005 | CN1229851C Medium-barrier-layer discharge lamp device |
| 11/29/2005 | US6970533 Scanning-based detection of ionizing radiation |
| 11/29/2005 | CA2268136C Simultaneous double sided irradiation |
| 11/24/2005 | WO2005112043A1 Multi-column charged particle optics assembly |
| 11/24/2005 | WO2005112041A2 Remote communication method and device using nuclear isomers |
| 11/24/2005 | WO2005052978A3 Method and apparatus for modifying object with electrons generated from cold cathode electron emitter |
| 11/24/2005 | WO2005050694A3 Liquid metal ion source and its production; processing and analyzing devices provided with said source |
| 11/24/2005 | US20050259785 Dynamic mask projection stereo micro lithography |
| 11/24/2005 | US20050259235 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 11/24/2005 | US20050258768 Method and arrangement for the plasma-based generation of intensive short-wavelength radiation |
| 11/24/2005 | US20050258379 Uniformity control using multiple fixed wafer orientations and variable scan velocity |
| 11/23/2005 | CN1228565C Electric lamp assembly |
| 11/22/2005 | US6968038 Apparatus and method for generating high-order harmonic X-ray, and point-diffraction interferometer using high-order harmonic X-ray |
| 11/22/2005 | US6968036 Radiation therapy device |
| 11/22/2005 | US6967491 Spatial and temporal selective laser assisted fault localization |
| 11/22/2005 | US6967343 Condensed tungsten composite material and method for manufacturing and sealing a radiation shielding enclosure |
| 11/22/2005 | US6967341 Method and device for the generation of far ultraviolet or soft x-ray radiation |
| 11/17/2005 | US20050253092 Radiation source, lithographic apparatus, and device manufacturing method |
| 11/17/2005 | US20050253091 Lithographic apparatus, device manufacturing method and radiation system |
| 11/17/2005 | US20050253082 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/17/2005 | US20050252452 Polynuclear metal molecular beam apparatus |
| 11/16/2005 | EP1595265A1 A sample enclosure for a scanning electron microscope and methods of use thereof |
| 11/16/2005 | EP1565275A4 Chemical functionalization of material surfaces using optical energy and chemicals |
| 11/16/2005 | EP1153398B1 Ion beam scanner system and operating method |
| 11/15/2005 | US6965153 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/15/2005 | US6965117 Extreme UV light source and semiconductor exposure device |
| 11/15/2005 | US6964485 Collector for an illumination system with a wavelength of less than or equal to 193 nm |
| 11/10/2005 | US20050250019 Mask device for photolithography and application thereof |
| 11/10/2005 | US20050247890 Particle therapy system |
| 11/09/2005 | EP1166280B1 Gantry with an ion-optical system |
| 11/09/2005 | CN1226624C Apparatus and method for transmitting appreciable information |
| 11/08/2005 | US6963072 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 11/08/2005 | US6963068 Method for the manufacture and transmissive irradiation of a sample, and particle-optical system |
| 11/03/2005 | WO2005104184A1 Ultraviolet ray irradiation device |
| 11/03/2005 | WO2005102453A1 A system for the delivery of proton therapy |
| 11/03/2005 | US20050244723 Lithography mask for the fabrication of semiconductor components |
| 11/03/2005 | US20050243963 Imaging system to compensate for x-ray scatter |
| 11/03/2005 | US20050242303 Advanced pattern definition for particle-beam exposure |
| 11/03/2005 | US20050242302 Advanced pattern definition for particle-beam processing |
| 11/03/2005 | US20050242301 Targeted radiation treatment using a spectrally selective radiation emitter |
| 11/03/2005 | US20050242295 Apertured plate support mechanism and charged-particle beam instrument equipped therewith |
| 11/03/2005 | US20050242276 Radiosotope production apparatus and radiopharmaceutical production apparatus |
| 11/03/2005 | DE102005015601A1 Teilchenstrahlbeschleuniger, Teilchenbestrahlungs-Behandlungssystem, welches den Teilchenstrahlbeschleuniger verwendet, sowie Verfahren zum Betreiben des Teilchenbestrahlungs-Behandlungssystems Teilchenstrahlbeschleuniger, Teilchenbestrahlungs-treatment system utilizing the Teilchenstrahlbeschleuniger, and method of operating the treatment system Teilchenbestrahlungs |
| 11/02/2005 | EP1591833A2 Exposure method and apparatus |
| 11/02/2005 | EP1119869A4 X-ray target assembly |
| 11/01/2005 | US6960775 first illumination system for beam of ultraviolet radiation, support structure for patterning device, projection system and second illumination system for a compensating beam; critical dimension profile correction; integrated circuit maufacture |
| 11/01/2005 | CA2354080C Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 10/27/2005 | US20050237618 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit |
| 10/27/2005 | US20050236587 Ion beam device and ion beam processing method, and holder member |
| 10/27/2005 | US20050236585 Exposure apparatus and exposure method using EUV light |
| 10/27/2005 | US20050236584 Exposure method and apparatus |
| 10/27/2005 | US20050236570 Charged particle beam adjusting method and charged particle beam apparatus |