Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1987
09/01/1987US4690838 React photoresis polymer with the alkyl metal compound
09/01/1987US4690833 Photoprocessing negative resist withscreen-printable coating thereon; metallization, etching, contoured surface
09/01/1987US4690528 Projection exposure apparatus
09/01/1987CA1226392A1 Radiation-polymerizable mixture, copying material produced therefrom, and process for producing a solder mask from the mixture
09/01/1987CA1226376A1 Electron beam enhanced surface modification for making highly resolved structures
09/01/1987CA1226348A1 Inspection system utilizing dark-field illumination
09/01/1987CA1226287A1 Photocurable mixtures
08/1987
08/27/1987DE3618768C1 Process for producing punching steel sheets, in particular paper-punching steel sheets
08/26/1987EP0233755A2 Ultraviolet laser treating of molded surfaces
08/26/1987EP0233747A2 Vapor deposited photoresists of anionically polymerizable monomers
08/26/1987EP0233623A2 Photopolymerizable films containing plasticizer silica combinations
08/26/1987EP0233567A2 Curable compositions containing N-sulfonylaminosulfonium salts as cationically active catalysts
08/26/1987EP0233333A2 Method of treating photoresists
08/26/1987CN87100720A Photosensitive compositions containing microgels
08/25/1987US4689516 Position adjustment device with a piezoelectric element as a lock mechanism
08/25/1987US4689291 Integrated optical device, memory
08/25/1987US4689290 Photosensitive elastomeric polymer composition for flexographic printing plate
08/25/1987US4689289 Bissilyl pinacolate-containing silicone-acrylate or -substituted styrene copolymer, aryl onium salt, photoresists
08/25/1987US4689288 Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process
08/25/1987US4689272 Process for a two-stage hydrophilizing post-treatment of aluminum oxide layers with aqueous solutions and use thereof in the manufacture of supports for offset printing plates
08/25/1987US4689114 Method for manufacturing a shadow mask
08/25/1987US4689113 Process for forming planar chip-level wiring
08/25/1987US4688932 Exposure apparatus
08/25/1987US4688918 Negative type photoresist developing apparatus
08/25/1987US4688904 Reflecting optical system
08/25/1987CA1226075A1 Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge
08/25/1987CA1225951A1 Lithographic printing plates
08/20/1987DE3604581A1 4-Acylbenzylsulphonium salts, their preparation, and photocurable mixtures and recording materials containing these compounds
08/19/1987EP0233072A2 Improvements in or relating to radiation sensitive material
08/19/1987EP0233056A2 Light absorbing coating
08/19/1987EP0233023A2 Poly(acetylene) films having localised zones of a low conductivity material
08/19/1987EP0232973A2 Microplastic structures, process for forming such structures, and photomask suitable for use in such process
08/19/1987EP0232972A2 Negative photoresist compositions and processes for preparing thermally stable, negative images using them
08/19/1987EP0232894A2 Multi layer photopolymeric structure for the manufacturing of MESFET devices with submicrometric gate and variable length recessed channel
08/19/1987EP0232865A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound
08/19/1987EP0232721A2 Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound
08/19/1987EP0232545A2 Photocurable composition and cured article
08/19/1987EP0232512A2 Encapsulated pigment in silver halide wash-off film
08/19/1987CN87100180A Microplastic structures and methods of manufacture
08/18/1987US4688056 Liquid jet recording head having a layer of a resin composition curable with an active energy ray
08/18/1987US4688054 Liquid jet recording head
08/18/1987US4687895 Conveyorized microwave heating system
08/18/1987US4687730 Pattern irradiation with altinic radiation, metallization at oblique angle, flood irradiation and development
08/18/1987US4687728 Radiation sensitive compositions
08/18/1987US4687727 Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition
08/18/1987US4687726 Photosensitive recording material for use in the production of negative-working planographic printing plates with diazonium polycondensate and inorganic pigment
08/18/1987US4687725 Method for forming relief images and photosensitive material useful therein
08/18/1987US4687541 Dual deposition single level lift-off process
08/18/1987US4687322 Projection optical apparatus
08/18/1987CA1225789A1 Electron-beam and x-ray sensitive polymers and resists
08/13/1987WO1987004810A1 Method for developing poly(methacrylic anhydride) resists
08/13/1987DE3701333A1 Photopolymerisable material
08/12/1987EP0232167A2 Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane
08/12/1987EP0232106A2 Plate processing apparatus
08/12/1987EP0231977A1 Optical imaging arrangement comprising an opto-electric focussing-error detection system
08/12/1987EP0231938A2 Film conveying apparatus
08/12/1987EP0231922A2 Electron beam and X-ray resists
08/12/1987EP0231902A2 Process for coating printing cylinders by way of application of a photopolymerisable registration layer
08/12/1987EP0231859A2 Film trimming of laminated photosensitive layer
08/12/1987EP0231855A2 Bis-1,2-naphthoquinone-2-diazide-sulfon amide, and its use in a photosensitive composition and in a photosensitive registration material
08/12/1987EP0231522A2 Antireflective photoresist composition
08/12/1987EP0231497A1 Silicone resist materials containing polysiloxanes
08/12/1987EP0231207A1 Contrast enhancement layer
08/11/1987US4686440 Fine positioning device
08/11/1987US4686280 Positive type resist material with trimethylsilylnitrile
08/11/1987US4686173 Etching method employing positive photoresist film
08/11/1987US4686172 Photosensitive elastomeric composition for flexographic printing plates having improved softness
08/11/1987US4686171 Printed circuit boards
08/11/1987US4686168 Fluoroalkyl acrylate resist material and process for forming fine resist pattern
08/11/1987US4686002 Stabilized choline base solutions
08/11/1987US4685991 From corner to corner; conveyor with gripping jaws
08/11/1987US4685975 Method for edge cleaning
08/11/1987US4685807 Optical microlithography apparatus with a local alignment system
08/11/1987US4685777 Reflection and refraction optical system
08/11/1987CA1225467A1 Method of manufacturing optical memory element
08/06/1987DE3702839A1 Presensitised dry plate
08/05/1987EP0231164A2 Device for ion-projection apparatuses
08/05/1987EP0231112A2 Imageable material and process
08/05/1987EP0231067A2 Photography pin board system
08/05/1987EP0231028A2 High contrast low metal ion photoresist developing method and composition
08/05/1987EP0231002A2 Crosslinkable solid rubbery polymers
08/05/1987EP0230995A2 Light-sensitive composition
08/05/1987EP0230992A2 Transfer element and process for printing radiation defined images using said element
08/05/1987EP0230941A2 Photopolymerisable composition and photopolymerisable registration material containing it
08/05/1987EP0230936A2 Photosensitive compositions containing microgels
08/05/1987EP0230931A2 Laser beam homogenizer
08/05/1987EP0230889A2 Process for the cementing of photopolymerizable flexographic printing elements or printing plates
08/05/1987EP0230728A2 Photolithography
08/05/1987EP0230656A1 Halogen-containing polyacrylate derivatives
08/05/1987EP0230615A2 Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings
08/05/1987EP0230540A2 X-Y-theta stage apparatus
08/04/1987US4684688 UV stabilizer for polyacetylenic recording media
08/04/1987US4684671 Cationically polymerizable
08/04/1987US4684601 Unsaturated, high molecular weight
08/04/1987US4684600 Compressible photopolymer printing plate
08/04/1987US4684599 Photoresist compositions containing quinone sensitizer
08/04/1987US4684597 Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor
08/04/1987US4684537 Bonding chromophore complex to titanium oxide
08/04/1987US4684437 Selective metal etching in metal/polymer structures
08/04/1987US4684315 Frictionless supporting apparatus
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