| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/30/1987 | EP0239488A2 Tri-level resist process for fine resolution photolithography |
| 09/30/1987 | EP0239423A2 Positive type radiation-sensitive resin composition |
| 09/30/1987 | EP0239385A2 Radiation-sensitive positive resist and composition containing the same |
| 09/30/1987 | EP0239376A2 Contrast enhanced photolithography |
| 09/30/1987 | EP0239197A2 Process for producing a metallic pattern |
| 09/30/1987 | EP0239188A2 Preformatted optical recording medium and method of producing the same |
| 09/30/1987 | EP0239082A2 Light-sensitive composition |
| 09/30/1987 | EP0238965A2 Electron-sensitive resist material for microscopic structures in electronics |
| 09/30/1987 | EP0238929A2 Process for providing circuit lines on a substrate |
| 09/30/1987 | EP0238690A1 Process for forming sidewalls |
| 09/30/1987 | CN87100804A Method for forming images on plain paper and an imaging sheet useful therein |
| 09/30/1987 | CN86206408U Electronic coincidence type chinese character optical parallel automatic photo-compositor |
| 09/29/1987 | US4696990 Novel photocrosslinkable liquid crystalline polymers |
| 09/29/1987 | US4696891 Reversal, reduced heat treatment times and temperatures, nontoxic process |
| 09/29/1987 | US4696890 Processes for preparing protective coatings and relief structures |
| 09/29/1987 | US4696889 Method of photoforming optical patterns for VLSI devices |
| 09/29/1987 | US4696888 Light-sensitive compounds possessing trichloromethyl groups, a process for their production and light-sensitive mixtures containing these compounds |
| 09/29/1987 | US4696886 Positive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compound |
| 09/29/1987 | US4696885 Method of forming a large surface area integrated circuit |
| 09/29/1987 | US4696876 Photopolymerizable composition |
| 09/29/1987 | US4696820 Photosensitive elements containing polymer of imidylcompounds |
| 09/29/1987 | CA1227355A1 Inspection system for pellicalized reticles |
| 09/24/1987 | WO1987005540A1 Shrinkage-resistant ultraviolet-curing coatings |
| 09/23/1987 | EP0238416A2 X-ray lithography system |
| 09/23/1987 | EP0238084A2 Apparatus for depositing mono-molecular layer |
| 09/23/1987 | EP0237985A2 Improved solvent developable photoresist composition and process of use |
| 09/23/1987 | EP0237875A2 Process for the separation of higher molecular compounds from phenol polymers |
| 09/23/1987 | EP0237838A2 Film peeling apparatus having fluid injection device |
| 09/23/1987 | EP0237631A2 Method of treating photoresists |
| 09/23/1987 | EP0237574A1 Cylindrical photosensitive resin structure and method of preparing cylindrical printing plate |
| 09/23/1987 | CN87100185A Photosensitive compounds and thermally stable and aqueous developable negative images |
| 09/22/1987 | US4695527 Radiation-polymerizable composition and process for the application of markings to a printed circuit board |
| 09/22/1987 | US4695523 Method of screening a flat mask cathode ray tube |
| 09/22/1987 | US4694776 Step and repeat apparatus |
| 09/22/1987 | US4694748 Device for moving offset plates |
| 09/22/1987 | US4694548 Method for producing a spinning nozzle plate |
| 09/16/1987 | EP0237312A2 Active energy beam-curable resin composition |
| 09/16/1987 | EP0237309A2 Active energy ray-curable resin composition |
| 09/16/1987 | EP0237060A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/16/1987 | EP0237059A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/16/1987 | EP0237058A2 Light sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/16/1987 | EP0237057A2 Image-forming method employing light-sensitive material and image-receiving material |
| 09/16/1987 | EP0237054A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/16/1987 | EP0237049A2 Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/16/1987 | EP0237048A2 Light-sensitive material comprising light-sensitive layer provided on support |
| 09/16/1987 | EP0237041A2 Projection optical system for use in precise copy |
| 09/16/1987 | EP0237025A2 Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same |
| 09/16/1987 | EP0237024A2 Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same |
| 09/16/1987 | EP0236950A2 Adhesion promotion in photoresist lamination and processing |
| 09/16/1987 | EP0236914A2 Fabrication of electronic devices utilizing lithographic techniques |
| 09/16/1987 | EP0236730A2 Film peeling apparatus with a sliding press element |
| 09/16/1987 | EP0236559A2 Method and apparatus of treating photoresists |
| 09/16/1987 | EP0236483A1 Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method |
| 09/16/1987 | CN87101841A Protective colloid solution for offset printing plates and its method of preparation |
| 09/15/1987 | US4694477 Flexure stage alignment apparatus |
| 09/15/1987 | US4694178 Multiple channel electron beam optical column lithography system and method of operation |
| 09/15/1987 | US4694061 Polyamide(imide)s containing benzophenone (di-ortri)carboxylic acid |
| 09/15/1987 | US4693960 Photolithographic etching process using organosilicon polymer composition |
| 09/15/1987 | US4693959 Including an amino resin of melamine or hydantoin, formaldehyde and a toluenesulfonamide in the photosensitive layer |
| 09/15/1987 | US4693958 Lithographic plates and production process therefor |
| 09/15/1987 | US4693957 Transition and inner transition metal chelate polymers for high energy resist lithography |
| 09/15/1987 | US4693955 Negative type lithographic printing plate |
| 09/15/1987 | US4693953 Method for production of moisture sensitive element |
| 09/15/1987 | US4693915 Clathrate complexes |
| 09/15/1987 | US4693569 Method and apparatus for optical system adjustments |
| 09/15/1987 | US4693211 For processing a wafer substrate |
| 09/11/1987 | WO1987005409A1 Methods for applying simultaneously on a plurality of integrated circuit boards a film having a uniform thickness and consisting of arsenic or germanium selenide glass sensitized by a silver salt |
| 09/11/1987 | WO1987005390A1 Purge air system for a combustion instrument |
| 09/11/1987 | WO1987005314A1 Photoresist stripper composition and process of use |
| 09/11/1987 | WO1987003706A3 Improvements in or relating to radiation sensitive devices |
| 09/10/1987 | DE3607532A1 Device for keeping constant the temperature of a body |
| 09/10/1987 | DE3605916A1 Method for increasing contrast in X-ray lithography, and arrangement for carrying out the method |
| 09/09/1987 | EP0236261A2 Polymers containing organometallic derivatives |
| 09/09/1987 | EP0235751A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/08/1987 | USRE32498 Method of manufacturing fluorescent screens of cathode ray tubes |
| 09/08/1987 | US4692934 X-ray lithography system |
| 09/08/1987 | US4692398 Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
| 09/08/1987 | US4692397 Process for developing an aqueous alkaline development diazo photographic element |
| 09/08/1987 | US4692396 Photopolymerizable resin composition for producing aqueous-development type dry film resists |
| 09/08/1987 | US4692395 Carbon black pigment transferred by heating and pressing a meltable acrylic binder |
| 09/08/1987 | US4692205 Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings |
| 09/08/1987 | US4692015 Short focal lens array with multi-magnification properties |
| 09/02/1987 | EP0235038A2 Visible-ray recording hologram material |
| 09/02/1987 | EP0234986A1 Time and heat stable resinous compositions, self-stabilized resinous esters, production process and use as photo-thermoplastic material |
| 09/02/1987 | EP0234580A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 09/02/1987 | EP0234570A2 Photopolymerizable composition, photosensitive element with that composition, and process for the production of a lithographic printing plate using this element |
| 09/02/1987 | EP0234553A2 Process of laminating fotofoils on circuit boards |
| 09/02/1987 | EP0234470A1 Active energy ray-curing resin composition |
| 09/02/1987 | EP0234430A2 Diluent for UV and EB curable resins |
| 09/02/1987 | EP0234387A2 Method of removing photoresist on a semiconductor wafer |
| 09/02/1987 | EP0234347A1 Electrically conductive composition and use thereof |
| 09/02/1987 | EP0234327A2 High resolution photoresist of imide containing polymers |
| 09/02/1987 | EP0234166A1 Masking process and mask therefor |
| 09/02/1987 | EP0222878A4 Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings. |
| 09/02/1987 | EP0131575B1 Aqueous alkaline solution and method for developing positively working reproduction layers |
| 09/01/1987 | US4690962 Blend of acetylenic oligomer with plasticizer and toughness agents |
| 09/01/1987 | US4690887 Method for forming micro-patterns by development |
| 09/01/1987 | US4690886 Method for making negative working O-quinone diazide containing dry planographic printing plate utilizing multiply light exposure, development and basic treatment |
| 09/01/1987 | US4690882 Positive acting resist material comprised of novoloc resin derived from phenylphenol |
| 09/01/1987 | US4690880 Coating, photoresists, images, exposure, development, etching |