G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1992
11/26/1992	DE4216888A1 Patterned resist, esp. useful for integrated circuit prodn. - by forming and exposing single resist layer, followed by repeated silylation and etching steps to prevent side corrosion
11/26/1992	DE4117126A1 Increasing abrasion-resistance of printing plate and photoresist - by coating printing or non-printing area or relief e.g. with toner, ink or pigment and opt. binder
11/25/1992	EP0515352A1 Ion source
11/25/1992	EP0515212A1 A method for forming a resist pattern
11/25/1992	EP0515133A2 Fluorone and pyronin Y derivatives
11/25/1992	EP0515079A1 Resist materials and processes of their use
11/25/1992	EP0514990A1 A lithographic base and a method for making a lithographic printing plate therewith
11/25/1992	EP0514630A1 Radiation crosslinkable coating and its use
11/25/1992	CA2069228A1 Method for forming a resist pattern
11/24/1992	US5166948 Optically pumped up converting light source
11/24/1992	US5166884 Intelligent system for processing and storing articles
11/24/1992	US5166856 Electrostatic chuck with diamond coating
11/24/1992	US5166724 Image printer/copier with a common heater for development and transfer pressure of latent images on microcapsule mediums
11/24/1992	US5166530 Illuminator for microlithographic integrated circuit manufacture
11/24/1992	US5166523 Device for burning in light-sensitive layers in the production of printing forms
11/24/1992	US5166405 Benzoates containing a substituent having olefinic unsaturation
11/24/1992	US5166126 Color filter array element with protective overcoat layer and method of forming same
11/24/1992	US5166040 Method of forming a polymer image
11/24/1992	US5166039 Peeling solution for photo- or electron beam-sensitive resin and process for peeling off said resin
11/24/1992	US5166038 Multilayer light sensitive elements with silicon coupling agent and crosslinking
11/24/1992	US5166036 Electrodeposition coating composition and image-forming method using the same
11/24/1992	US5166033 Semiconductors or images
11/24/1992	US5165957 Process for producing multilayer wiring structure
11/24/1992	US5165345 Lithographic printing plates containing image-support pigments and methods of printing therewith
11/24/1992	US5165343 Printing plate and printing process
11/24/1992	CA1310734C Hydrogen ion microlithography
11/24/1992	CA1310639C .alpha.-AMINOACETOPHENONES AS PHOTOINITIATORS
11/24/1992	CA1310534C Positive-working radiation-sensitive mixture
11/19/1992	EP0514186A1 Photopolymerizable, negative working, peel developable, single sheet color proofing system
11/19/1992	EP0513965A1 Exposure apparatus for forming pattern on printed-wiring board
11/19/1992	EP0513781A1 Liquid blends of photoinitiators, process for their preparation and their use
11/19/1992	EP0513536A2 Cyclic acylphosphinic acid derivatives and process for their preparation
11/19/1992	EP0513534A2 Cyclic acylphosphinic acid derivatives and process for their preparation
11/19/1992	EP0513493A1 Photosensitive resin composition
11/19/1992	EP0513359A1 Yag laser working machine for precision working of thin film
11/19/1992	DE4116436A1 Printing-plate illumination equipment outside working area - has extensible mask between adjustable holders and slewing in relation to table
11/19/1992	DE4116045A1 Development of light-sensitive resin on metal with clear colour change - indicating state and course of process in precision printing
11/18/1992	CA2068401A1 Photopolymerizable, negative working, peel developable, single sheet color proofing system
11/17/1992	US5165094 Partially constrained minimum energy state controller
11/17/1992	US5165062 Automatic printing system
11/17/1992	US5164974 X-ray exposure apparatus
11/17/1992	US5164792 Movement measuring interferometer and driving system
11/17/1992	US5164762 Image forming apparatus for forming an image on a pressure-deformable material
11/17/1992	US5164286 Photoresist developer containing fluorinated amphoteric surfactant
11/17/1992	US5164285 Method for forming plate characters in a half-tone gravure platemaking process
11/17/1992	US5164284 Lamination of multilayer photoresist containing sheet to printed circuit with irregular surface
11/17/1992	US5164279 Quinonediazide
11/17/1992	US5164278 Speed enhancers for acid sensitized resists
11/17/1992	US5164277 Oxyalkylated derivative of ditrimethylolpropane
11/17/1992	US5163235 Apparatus for washing out photopolymer printing plates by means of solvents, drying the printing plates and recovering the solvents
11/17/1992	CA2067462A1 Cyclic acylphosphinic acid derivatives and process for their preparation
11/17/1992	CA2067316A1 Cyclic acylphosphinic acid derivatives and process for their preparation
11/17/1992	CA1310205C Quantitative lense analysis technique
11/15/1992	WO1992021068A1 Flexographic printing plate
11/15/1992	CA2108471A1 Flexographic printing plate
11/15/1992	CA2068546A1 Radiation sensitive materials
11/12/1992	WO1992020014A1 Stereolithography using vinyl ether-epoxide polymers
11/12/1992	WO1992020011A1 Overcoats for diazo-containing layers with chemical and abrasion resistance
11/12/1992	DE4114877A1 Structured optical components mfr. by pulsed UV laser copying - using quartz mask selectively removing UV opaque material, e.g. PMMA or optical properties in visible range economically and reliably
11/11/1992	EP0512845A2 Light-sensitive planographic printing plate and light-sensitive composition
11/11/1992	EP0512692A1 Photosensitive materials and process for making them
11/11/1992	EP0512634A1 Pearlescent toners having reduced stain characteristics
11/11/1992	EP0512339A1 High temperature stable positive resists and process for the production of high temperature stable relief structure
11/11/1992	EP0512117A1 Method of and device for removing resist
11/11/1992	EP0288491B1 Selective metallization process, additive method for manufacturing printed circuit boards, and composition for use therein
11/10/1992	US5162559 Silylation reagents for preparing binders which are soluble in aqueous alkali and contain silanyl groups in the side chain
11/10/1992	US5162510 Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide
11/10/1992	US5162431 Photosensitive Binders
11/10/1992	US5162194 Method of providing a printed circuit board with a cover coat
11/10/1992	US5162193 Radiation sensitive devices
11/10/1992	US5162190 1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds
11/10/1992	US5162078 Method of producing microstructered metallic bodies
11/10/1992	CA1310155C Process for the amionic polymerisation of acrylic monomers, and eventually of vinylic comonomers
11/07/1992	CA2067908A1 Pearlescent toners having reduced stain characteristics
11/05/1992	DE4214363A1 Resist giving high sensitivity and resolution - contains acid precursor and etherified poly:hydroxy:styrene with esterified ether gp. decomposed by acid
11/05/1992	DE4114269A1 Mfg. microstructures locked on mask for X=ray lithography - using plasma etching to separate microstructures from titanium@ supporting membrane
11/04/1992	EP0511847A2 Length-measuring device and exposure apparatus
11/04/1992	EP0511659A1 Method for processing photosensitive copying materials
11/04/1992	EP0511585A2 Method of prducing a relief printing plate
11/04/1992	EP0511403A1 Photosensitive resin composition and photosensitive element structure
11/04/1992	EP0511328A1 Silicone coating formulations and planographic printing plates made therewith
11/04/1992	EP0473643A4 Photocurable pigmented secondary optical fiber coatings
11/04/1992	CN1018958B Photoconductive mask mfg. method
11/03/1992	US5161177 Substrate holding apparatus for holding a substrate in an exposure apparatus
11/03/1992	US5161176 Exposure apparatus
11/03/1992	US5161114 Method of manufacturing a reticule
11/03/1992	US5161062 Optical projection system including a refractive lens assembly having a gap between constituent lenses
11/03/1992	US5161059 High-efficiency, multilevel, diffractive optical elements
11/03/1992	US5160962 Projection exposure apparatus
11/03/1992	US5160961 Substrate holding device
11/03/1992	US5160960 Method of transporting a photosensitive sheet
11/03/1992	US5160959 Device and method for the alignment of masks
11/03/1992	US5160957 Alignment and exposure apparatus
11/03/1992	US5160849 Diffraction-type displacement detector for alignment of mask and wafer
11/03/1992	US5159879 Plate surface correcting solution for dry lithographic printing plate
11/03/1992	CA1309797C Method for making polysilanes
10/1992
10/31/1992	CA2067608A1 Solvent mixture for use in the development of negative-working recording layers
10/29/1992	WO1992018904A1 Process and device for the photolithographic production of long grid scales
10/29/1992	WO1992015920A3 Peel-apart photosensitive element
10/29/1992	WO1992015633A3 Improved management of waste solution containing photoresist materials

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