| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/10/1993 | EP0526567A1 A rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media. |
| 02/10/1993 | EP0442952B1 Positive-working photoresists employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent |
| 02/10/1993 | EP0305545B1 Substituted acridine derivatives and their use |
| 02/09/1993 | US5185625 Exposure apparatus for forming pattern on printed-wiring board |
| 02/09/1993 | US5185419 Poly(arylenevinylenesiloxanes) compounds |
| 02/09/1993 | US5185296 Forming thin film of radiation senstive material, irradiating, contacting with liquefied gas or supercritical fluid |
| 02/09/1993 | US5185235 Aliphatic alcohol, organic solvent, quaternany ammonium compound |
| 02/09/1993 | US5185234 Photosensitive flexographic printing plate composition |
| 02/09/1993 | US5185225 Manuscript film; non-adhesive film; fluid photosensitive nylon resin; adhesive film on supporting substrate; exposure to light |
| 02/09/1993 | US5185210 Photodefinable interlevel dielectrics |
| 02/09/1993 | US5185209 Electronic interconnect structure; pattern from prepolymer which is an ether of the oligomeric condensation product of a dihydric phenol and formaldehyde |
| 02/09/1993 | US5185059 Process for producing electrode plate structure for liquid crystal color display device |
| 02/09/1993 | US5185055 Method of forming a pattern on a surface |
| 02/09/1993 | CA2075026A1 Method and apparatus for patterning an imaging member |
| 02/09/1993 | CA1313470C Organic solvent free developer compositions for lithographic plates having neutral ph |
| 02/06/1993 | CA2075325A1 Process for producing an embossing die in roll form |
| 02/04/1993 | WO1993002395A1 Photocurable compositions |
| 02/04/1993 | WO1993002391A1 Treatment of photographic effluent |
| 02/04/1993 | DE4225422A1 Photosensitive compsn. contg. resin, soln. inhibitor and sulphonyl cpd. - used as photo-acid for photoresist with high sensitivity, resolution and stability |
| 02/04/1993 | DE4224938A1 Polymerisable compsns. for dry presensitised printing plates etc. - contain special poly-(meth)acrylate ester(s) of polyalkoxylated poly:hydroxy cpds., e.g. sorbitol, and polymerisation initiator etc. |
| 02/03/1993 | EP0526284A1 Photopolymerizable, red-sensitive compositions, useful for recording holograms |
| 02/03/1993 | EP0526242A1 Image projection method and semiconductor device manufacturing method using the same |
| 02/03/1993 | EP0526039A1 Method for exposing a pattern plate having an alignment pattern |
| 02/03/1993 | EP0525872A1 Positioning device having two manipulators operating in parallel, and optical lithographic device provided with such a positioning device |
| 02/03/1993 | EP0525721A1 High resolution lithography method |
| 02/03/1993 | EP0525692A1 Apparatus for separating and peeling a foil of a laminated carrier material |
| 02/03/1993 | EP0525627A1 Oligomeric compounds containing acid-cleavable protective groups and positive groups and positive-working, radiation-sensitive composition prepared using these cmpounds |
| 02/03/1993 | EP0525626A1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds |
| 02/03/1993 | EP0525625A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith |
| 02/03/1993 | EP0525624A1 Method for producing a multicoloured image and photosensitive material for implementing this method |
| 02/03/1993 | EP0525578A1 Photopolymer composition for the production of three-dimensional objects |
| 02/03/1993 | EP0525528A1 Arrangement for the coherence reduction and the formation of a laser beam |
| 02/03/1993 | EP0525465A1 Method for producing color filter |
| 02/03/1993 | EP0525293A1 Mask holder in exposure device |
| 02/03/1993 | EP0525285A1 Sample holding device in exposure device and double-surface concurrent exposure device |
| 02/03/1993 | EP0525206A1 Photosensitive elastomer composition |
| 02/03/1993 | EP0525185A1 Positive resist composition |
| 02/03/1993 | EP0525070A1 Photovoltaic cells. |
| 02/03/1993 | CA2075115A1 Photopolymer composition for the production of three-dimensional objects |
| 02/03/1993 | CA2074403A1 Light-sensitive material for producing a multi-color image |
| 02/02/1993 | US5184307 Method and apparatus for production of high resolution three-dimensional objects by stereolithography |
| 02/02/1993 | US5184196 Projection exposure apparatus |
| 02/02/1993 | US5184176 Projection exposure apparatus with an aberration compensation device of a projection lens |
| 02/02/1993 | US5184055 Device for positioning control |
| 02/02/1993 | US5184021 Method and apparatus for measuring the dimensions of patterned features on a lithographic photomask |
| 02/02/1993 | US5183725 Electrode pattern forming method |
| 02/02/1993 | US5183724 Method of producing a strip of lead frames for integrated circuit dies in a continuous system |
| 02/02/1993 | US5183722 Heat and solvent resistance |
| 02/02/1993 | US5183688 Applying a removable mask with desired pattern of openings to one surface of acrylic material, applying water-based resist film, drying, removing the mask, leaving resist, depositing thin film of reflective material, removing resist |
| 02/02/1993 | US5183534 One-step development and etching of photoresist/polyamic acid layer using an aqueous solution of solvent, alkylamine and small amount of an ionic base |
| 02/02/1993 | US5183508 Apparatus for patch coating printed circuit boards |
| 02/02/1993 | CA1313377C Polymethine dyes and uv absorbers and imaging materials for their use |
| 01/31/1993 | WO1993003199A1 Method of surface treating rolling roll |
| 01/31/1993 | WO1993003068A1 Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| 01/31/1993 | CA2113201A1 Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| 01/31/1993 | CA2092545A1 Method for processing surface of work roll |
| 01/30/1993 | CA2074791A1 Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith |
| 01/28/1993 | DE4224205A1 Imaging using material with strippable coat and resin coat contg. anionic pigment - or separate pigment and resin coats, using developer contg. N-vinyl pyrrolidone polymer |
| 01/27/1993 | WO1993003424A1 Apparatus and method for focusing hard x-rays |
| 01/27/1993 | EP0524759A1 Device fabrication process |
| 01/27/1993 | EP0524250A1 Resist material for use in thick film resists |
| 01/27/1993 | CA2089557A1 Apparatus and method for focusing hard x-rays |
| 01/26/1993 | US5182763 Reflection device |
| 01/26/1993 | US5182718 Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light |
| 01/26/1993 | US5182615 Exposure apparatus |
| 01/26/1993 | US5182610 Position detecting method and device therefor as well as aligning device |
| 01/26/1993 | US5182316 Forming a UV-detectable fluorophore in a mixture of hydride containing silicone, unsaturated silicone, cationically sensitive compound and a latent dibenzofulvene |
| 01/26/1993 | US5182188 Method of developing a self-developing resist |
| 01/26/1993 | US5182187 Photoresists having good resistance to alkaline etching |
| 01/26/1993 | US5182185 Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions |
| 01/26/1993 | US5182184 Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom |
| 01/26/1993 | US5182183 Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone |
| 01/26/1993 | US5182180 Dry film process for altering the wavelength of response of holograms |
| 01/26/1993 | US5182056 Stereolithography method and apparatus employing various penetration depths |
| 01/26/1993 | US5182055 Exposure of a multilayer element with a pattern of packed tiles, scanning and vectors |
| 01/26/1993 | CA1313287C Photolytically crosslinkable thermally stable composition |
| 01/26/1993 | CA1313081C Additive developer |
| 01/26/1993 | CA1313075C Optical fiber connector assemblies and methods of making the assemblies |
| 01/24/1993 | CA2047642A1 Positive type, photosensitive resinous composition |
| 01/21/1993 | WO1993001527A1 Developing solution and developing method |
| 01/21/1993 | WO1993001526A1 Red-sensitive photopolymerizable compositions for recording holograms |
| 01/21/1993 | DE4222423A1 Photosensitive poly:silane compsn. contg. photo-acid precursor - to increase sensitivity and resolution and give rectangular structure cross=section |
| 01/21/1993 | DE4213802A1 Liquid crystal orientation film - has repeating irregular surface shape with longer tilt pitch in one direction than the other |
| 01/21/1993 | DE4124025A1 Substrate microstructure positioning method for lithography process - forming structure edge by successive illumination of spaced matrix points |
| 01/20/1993 | EP0523957A1 Radiation-sensitive composition |
| 01/20/1993 | EP0523861A2 Optical device and method of manufacturing the same |
| 01/20/1993 | EP0523828A2 Optically pumped up coverting light source |
| 01/20/1993 | EP0523715A1 Photo-crosslinkable resin composition, hologram recording medium, and hologram recording method |
| 01/20/1993 | EP0523673A2 Photosensitive material printing apparatus |
| 01/20/1993 | EP0523565A1 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and color imager forming substance |
| 01/20/1993 | EP0523325A1 Process for the preparation of images on tonable light-sensitive layers |
| 01/20/1993 | EP0523303A1 Ringfield lithography |
| 01/20/1993 | EP0523245A1 Method for manufacturing multiple color display device |
| 01/20/1993 | EP0523042A1 Ultrafast electro-dynamic x, y and theta positioning stage. |
| 01/19/1993 | US5180655 Chemical compositions for improving photolithographic performance |
| 01/19/1993 | US5180654 Processing radiation sensitive members with aqueous ethyl hexyl sulphate treatment prior to burn-in step |
| 01/19/1993 | US5180652 Light- and heat-sensitive composition, and recording material |
| 01/19/1993 | CA1312843C Fabrication of electronic devices utilizing lithographic techniques |
| 01/17/1993 | WO1993002396A1 Process for processing subtractive offset plate |
| 01/17/1993 | CA2091681A1 Process for processing subtractive offset plate |