| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/17/1992 | DE4039941A1 Aq. developer for positive or negative resist - contg. tetra:alkyl:ammonium hydroxide, alkanolamine and diol ether or ester |
| 06/16/1992 | US5123036 X-ray exposure apparatus |
| 06/16/1992 | US5122830 Image recording apparatus having front/rear sheet face sensor |
| 06/16/1992 | US5122443 Heat development process |
| 06/16/1992 | US5122442 Water soluble binder; photosensitive compound |
| 06/16/1992 | US5122440 Ultraviolet curing of photosensitive polyimides |
| 06/16/1992 | US5122438 Method for developing a waterless light-sensitive lithographic plate |
| 06/16/1992 | US5122432 Photosensitive microcapsule imaging system having improved gray scale |
| 06/16/1992 | US5122428 Exposing to light through negative grid pattern photoardmable element with coating of water soluble polymer, dichromate salt, black pigment |
| 06/16/1992 | US5122387 Developing solution and pattern forming method using the same |
| 06/16/1992 | CA1303549C Electron beam sensitized resist containing polymerized w-alkenyl trimethylsilane |
| 06/11/1992 | WO1992009935A1 Method of and device for removing resist |
| 06/11/1992 | DE4039045A1 Base material for multilayer resist systems - comprising novolak resin, solvent and reactive plasticiser useful in the photolithographic prodn. of small structures |
| 06/11/1992 | DE4038895A1 Photoresist system - comprises polymers chemically bonded to selected light-sensitive aryl:acrylic acids |
| 06/11/1992 | DE4038711A1 Negatively working radiation-sensitive mixts. - comprise phenolic binder insol. in water but soluble in aq. alkali, cpd. forming strong acid on irradiation, and benzyl alcohol or deriv. |
| 06/11/1992 | DE4038545A1 Device for producing printing plates - comprises copying table with illuminated copy station to which plates for processing are successively passed |
| 06/11/1992 | DE4038544A1 Device for producing printing plates - comprises copying table with lighting system located over copy station to which uncopied plates are successively fed |
| 06/10/1992 | EP0489560A1 Positive type photosensitive anionic electrodeposition coating resin composition |
| 06/10/1992 | EP0489553A1 Photosensitive polymeric printing medium and water developable printing plates |
| 06/10/1992 | EP0489540A2 Phase-shifting lithographic masks with improved resolution |
| 06/10/1992 | EP0489426A2 Projection exposure method |
| 06/10/1992 | EP0489203A1 Active energy ray-curable type resin composition |
| 06/10/1992 | EP0489143A1 Plasma etching indium tin oxide using a deposited oxide mask |
| 06/10/1992 | EP0268595B1 Pattern transfer process for fabricating integrated-circuit devices |
| 06/10/1992 | CN2107034U Printed circuit plate film light drawing instrument |
| 06/09/1992 | US5121256 Lithography system employing a solid immersion lens |
| 06/09/1992 | US5121160 Exposure method and apparatus |
| 06/09/1992 | US5121156 Apparatus for detecting the proper functioning of a thermal fixing unit in an image forming apparatus |
| 06/09/1992 | US5120971 Method for reflection-type two-dimensional pattern-reducing-copying using single convergence mirror and equipment thereof |
| 06/09/1992 | US5120799 Polymeric compounds having pendant sulphonato groups and method of producing the polymeric compounds |
| 06/09/1992 | US5120772 Radiation-polymerizable composition and element containing a photopolymerizable mixture |
| 06/09/1992 | US5120634 Heating in oxidation resistance environment; development |
| 06/09/1992 | US5120633 Polymers with acid-labile ester/ether pendant groups and acid-generating photoinitiators; positives; printed circuits; resolution |
| 06/09/1992 | US5120629 Positive-working photosensitive electrostatic master |
| 06/09/1992 | US5120623 Method of producing a substrate plate for a liquid crystal cell with black matrix areas |
| 06/09/1992 | US5120622 Lift-off process for patterning dichroic filters |
| 06/09/1992 | US5120569 Method of forming a polymer on a substrate |
| 06/09/1992 | US5120475 Method for preparing microcapsules having improved pre-walls, and microcapsules and photosensitive materials produced thereby |
| 06/09/1992 | US5120396 Drawing a figure on a sheet of paper, transferring the figure to a film, then to a silk screen, brushing a protective coating onto a plate covered by the silk screen, removing the silk screen and etching |
| 06/09/1992 | US5120034 Two-step positioning device using lorentz forces and a static gas bearing |
| 06/09/1992 | CA1302769C Photopolymerizable composition and photopolymerizable recording material containing same |
| 06/09/1992 | CA1302768C Photosensitive composition and recording material prepared therewith |
| 06/07/1992 | WO1992010092A1 Very large scale immobilized polymer synthesis |
| 06/07/1992 | CA2097708A1 Very large scale immobilized polymer synthesis |
| 06/04/1992 | DE4139479A1 Relief printing material with photocured barrier coat - between primed base and photosensitive resin layer to increase resistance to ink and washing oil |
| 06/04/1992 | DE4138999A1 Semiconductor component mfg. - depositing carbon layer on light reflecting layer and forming photosensitive resin layer on carbon layer |
| 06/04/1992 | CA2056762A1 Photosensitive polymeric printing medium and water developable printing plates |
| 06/04/1992 | CA2031379A1 Photosensitive resin composition for flexographic printing |
| 06/03/1992 | EP0488748A1 Resist compositions |
| 06/03/1992 | EP0488713A1 Positive photoresist composition |
| 06/03/1992 | EP0488712A1 Positive photoresist composition |
| 06/03/1992 | EP0488705A1 Laminate film having a thermocurable resin layer |
| 06/03/1992 | EP0488686A1 A process of making naphthoquinone diazide esters using lactone solvents |
| 06/03/1992 | EP0488681A1 N, N-dialkylaminoalkyl-N', N'-dialkylaminodimethylsilane |
| 06/03/1992 | EP0488530A2 Ink composition and process for producing a lithographic printing plate using the same |
| 06/03/1992 | EP0488525A1 Alkoxyalkyl ester solubility inhibitors for phenolic resins |
| 06/03/1992 | EP0488372A1 Fine pattern forming process |
| 06/03/1992 | EP0488339A1 Flame-resistant photo-curable resin composition |
| 06/03/1992 | EP0487993A2 Stable liquid compositions useful as polymerization photopromoters, their preparation and use |
| 06/03/1992 | EP0487797A1 Image forming method |
| 06/03/1992 | EP0487794A1 Process for preparing resist patterns |
| 06/03/1992 | EP0487790A1 Whiteness controlling process and stripping film material |
| 06/03/1992 | EP0313580B1 Radiation curable temporary solder mask |
| 06/03/1992 | CN1061679A Shadow mask, original using shadow mask printing and method of origindl manufacture |
| 06/03/1992 | CN1016859B Method of producing glossy image and device for effecting said method |
| 06/02/1992 | USH1062 Apparatus for producing a printing stencil plate for screen printing |
| 06/02/1992 | US5119390 Energy amount controlling device |
| 06/02/1992 | US5119127 Photoresist exposure method and apparatus therefor |
| 06/02/1992 | US5118957 Method and apparatus for precisely detecting surface position of a patterned wafer |
| 06/02/1992 | US5118590 Light-sensitive microcapsule containing polymerizable compound and pigment particles |
| 06/02/1992 | US5118585 Positive and negative working radiation sensitive mixtures and production of relief patterns |
| 06/02/1992 | US5118583 Storage stability |
| 06/02/1992 | US5118582 Using radiation-sensitive, acid catalyst-generating polysulfonate to solubilize exposed photoresist in alkali solution; stability, resolution |
| 06/02/1992 | US5118559 Dibenzofulvene compound |
| 06/02/1992 | CA1302626C Polyfunctional ethylenically unsaturated cellulose polymer-based photocurable compositions |
| 05/31/1992 | CA2056640A1 Flame-resistant photo-curable resin composition |
| 05/31/1992 | CA2056594A1 Laminate film having a thermocurable resin layer |
| 05/29/1992 | WO1992009012A1 Topological image transfer method |
| 05/29/1992 | WO1992009011A1 Photosensitive resin composition and photosensitive element structure |
| 05/27/1992 | WO1992009934A1 Photosensitive materials |
| 05/27/1992 | EP0487453A1 Silylated acylphosphinoxide |
| 05/27/1992 | EP0487343A1 Process for preparing a lithographic plate |
| 05/27/1992 | EP0487261A1 Process for forming resist pattern and resist composition therefor |
| 05/27/1992 | EP0487260A1 Printing method |
| 05/27/1992 | EP0487086A1 Photosensitive recording medium and method of preparing volume type phase hologram member using same |
| 05/27/1992 | EP0486793A1 Improved image reproduction process using a peel-apart photosensitive element |
| 05/27/1992 | DE4037926A1 Electron beam working arrangement e.g. for X=ray mask prodn. - uses gas which is concentrated at impact point of beam to avoid influencing beam |
| 05/27/1992 | CA2094906A1 Photosensitive matrials |
| 05/26/1992 | US5117257 Contact printer |
| 05/26/1992 | US5117255 Projection exposure apparatus |
| 05/26/1992 | US5117254 Projection exposure apparatus |
| 05/26/1992 | US5116977 Halomethyl-1,3,5-triazines containing an amine-containing moiety |
| 05/26/1992 | US5116876 Multilayer |
| 05/26/1992 | US5116720 Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
| 05/26/1992 | US5116718 Contact printing process |
| 05/26/1992 | US5116715 Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid |
| 05/26/1992 | US5116426 Method of cleaning a substrate using a dichloropentafluoropropane |
| 05/26/1992 | US5116250 Method and apparatus for applying a coating material to a substrate |
| 05/26/1992 | US5116110 Partially coherent optical system with scattering type object |
| 05/26/1992 | US5115760 Developer material coating apparatus having developer material removing unit |