| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/04/1993 | CA1317285C Three dimensional diazonium condensates |
| 05/04/1993 | CA1317149C Printing plate precursors |
| 05/04/1993 | CA1317147C Radiation sensitive devices |
| 05/02/1993 | CA2081965A1 Increasing adhesion of dry-film photopolymerizable compositions to carriers |
| 05/02/1993 | CA2081931A1 Carboxyl-containing plasticizers in dry film photopolymerizable compositions |
| 05/02/1993 | CA2081714A1 Photosensitive resin and resin composition for lithographic printing |
| 05/02/1993 | CA2078830A1 Positive type radiation-sensitive resist composition |
| 04/30/1993 | CA2081220A1 Single-phase developers for lithographic printing elements |
| 04/29/1993 | WO1993008508A1 Method for producing images using a photopolymerizable composition |
| 04/29/1993 | WO1993008506A1 Stereographic equipment and method |
| 04/29/1993 | DE4236265A1 Controlling developer bath top-up during offset plate processing - using predetermined data related to plate area, exposure characteristics and required contrast for top-up pump metering |
| 04/29/1993 | DE4231426A1 Polyhedron tip near field optical sensor and opto-electronic transducer - has polyhedron tip with uncoated sharp edges and tip between side faces coated with films, e.g. of aluminium@, silver@ or gold@ |
| 04/29/1993 | DE4135344A1 Method for prodn. of printing plates - involves film exposed on plate raw piece, and then film and plate precisely laid on transparent carrier for transfer to copier to be exposed from below |
| 04/28/1993 | EP0539334A2 Masking method for the production of printing plates and masking foil for implementing such a method |
| 04/28/1993 | EP0539227A1 Reducing plugging in printing plates made from polymerizable compositions |
| 04/28/1993 | EP0538997A1 Aminoketone sensitizers for aqueous soluble photopolymer compositions |
| 04/28/1993 | EP0538940A1 Segmented mask and exposure system for x-ray lithography |
| 04/28/1993 | EP0538716A1 Photosensitive polyimide precursor formulation |
| 04/28/1993 | EP0538683A1 Polyamic acid and polyimide from fluorinated reactant |
| 04/28/1993 | EP0538652A2 Pattern plate making system and printed matter printed thereby |
| 04/27/1993 | US5206515 Deep ultraviolet photolithography and microfabrication |
| 04/27/1993 | US5206349 Lithographic printing plates |
| 04/27/1993 | US5206348 Thermostability, high speed, heat resistance |
| 04/27/1993 | US5206317 Resist material and process for use |
| 04/27/1993 | US5206117 Photosensitive polyamic alkyl ester composition and process for its use |
| 04/27/1993 | US5206116 Light-sensitive composition for use as a soldermask and process |
| 04/27/1993 | US5206113 Graft polymer with unsaturated lateral chains, photosensitive mixture containing said graft polymer and recording material produced therefrom |
| 04/27/1993 | US5206110 Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye |
| 04/27/1993 | US5206102 Photoelectrochemical imaging system |
| 04/27/1993 | US5205867 Spin coating apparatus having a horizontally linearly movable wafer holder |
| 04/27/1993 | CA1317060C Organometal-containing polymers and use thereof |
| 04/27/1993 | CA1316930C Cationically polymerizable mixtures containing selected curing agents |
| 04/27/1993 | CA1316742C Photoimaging process using water removable coatings |
| 04/27/1993 | CA1316725C Process of forming reflection holograms in photopolymerizable layers |
| 04/22/1993 | DE4134265A1 Stereografie-vorrichtung und -verfahren Stereography device and method |
| 04/22/1993 | DE4132068A1 Optimised lithography for integrated optics - uses rotationally symmetrical write=beam with variable diameter and outwardly increasing intensity |
| 04/21/1993 | EP0537912A1 Positive-acting photothermographic materials |
| 04/21/1993 | EP0537879A1 Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition |
| 04/21/1993 | EP0537720A1 A method for ashing a photoresist resin film on a semiconductor wafer and an asher |
| 04/21/1993 | EP0537630A1 Photopolymerizable composition |
| 04/21/1993 | EP0537524A1 Radiation sensitive compositions and methods |
| 04/20/1993 | US5204886 Method of improving an x-ray lithography beamline uniformity |
| 04/20/1993 | US5204823 Method and apparatus for high-speed layer thickness curing in 3-D model making |
| 04/20/1993 | US5204712 Support device with a tiltable object table, and optical lithographic device provided with such a support device |
| 04/20/1993 | US5204711 Projection exposure device |
| 04/20/1993 | US5204506 Plasma pinch surface treating apparatus and method of using same |
| 04/20/1993 | US5204467 Visible photosensitizers for photopolymerizable compositions |
| 04/20/1993 | US5204227 Monoterpene, N-methylpyrrolidone, aromatic alcohol and nonionic surfactant |
| 04/20/1993 | US5204226 Photosensitizers for polysilanes |
| 04/20/1993 | US5204225 Process for producing negative images |
| 04/20/1993 | US5204224 Method of exposing a peripheral part of a wafer |
| 04/20/1993 | US5204223 Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor |
| 04/20/1993 | US5204222 Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates |
| 04/20/1993 | US5204221 Photosensitive resin composition |
| 04/20/1993 | US5204218 Photosensitive resin composition |
| 04/20/1993 | US5204217 Compound that when radiated with actinic radiation produces a carboxylic acid |
| 04/20/1993 | US5204216 Radiation-sensitive mixture |
| 04/20/1993 | US5204210 Applying diamond powder layer to photoresist; exposure, development; carbonizing photoresist, removal with hydrogen and carbon-containing gases |
| 04/20/1993 | US5204206 Process for producing display element, pattern sheet therefor, and process for producing pattern sheet |
| 04/20/1993 | US5204126 Of polymerized amphiphilic molecules capable of self-assembly |
| 04/20/1993 | US5204026 Having an extended shelf life |
| 04/20/1993 | CA1316622C Positive type photosensitive resinous composition |
| 04/20/1993 | CA1316441C Solutions of permonosulphuric acid |
| 04/15/1993 | WO1993007640A1 Method and compositions for diffusion patterning |
| 04/15/1993 | WO1993007625A1 X-ray lithography mirror and method of making same |
| 04/15/1993 | WO1993007539A1 Processing waste washout liquid containing photopolymer from printing plate manufacture |
| 04/15/1993 | WO1993007538A1 Photocurable polyimide coated glass fiber |
| 04/15/1993 | WO1993007518A1 Process for manufacturing multicolor display |
| 04/15/1993 | WO1993007224A1 Thin films |
| 04/15/1993 | DE4134161A1 Oven for heat treatment of printing plates - is heated by radiant heaters and has conveyors to transport plates |
| 04/15/1993 | CA2079824A1 Positive-acting photothermographic materials |
| 04/14/1993 | EP0537086A1 Curtain coating method and apparatus |
| 04/14/1993 | EP0537015A1 Optical arrangement for exposure apparatus |
| 04/14/1993 | EP0536842A1 X-ray alignment system |
| 04/14/1993 | EP0536827A1 Combined scanning force microscope and optical metrology tool |
| 04/14/1993 | EP0536775A1 Processing method for light-sensitive lithographic printing plates and processing device thereof |
| 04/14/1993 | EP0536743A1 Resin composition and plastic clad optical fiber comprising the same |
| 04/14/1993 | EP0536690A1 Light-sensitive composition |
| 04/14/1993 | EP0536272A1 Image-forming process |
| 04/14/1993 | EP0252151B1 Photosensitive material for screen process |
| 04/14/1993 | CN1071031A Method and compositions for diffusion patterning |
| 04/14/1993 | CN1071015A Machine tool graduation ring photoetching technological method |
| 04/13/1993 | US5202748 In situ process control system for steppers |
| 04/13/1993 | US5202722 Image-forming system |
| 04/13/1993 | US5202716 Resist process system |
| 04/13/1993 | US5202359 Aceto- and benzophenones, especially those substituted by highly fluorinated alkyl groups; fluoropolymer coatings |
| 04/13/1993 | US5202304 Recording medium |
| 04/13/1993 | US5202275 Forming insulation films, doping gate electrodes of random memory cells |
| 04/13/1993 | US5202227 Control of cell arrangement |
| 04/13/1993 | US5202222 Selective and precise etching and plating of conductive substrates |
| 04/13/1993 | US5202221 Light-sensitive composition |
| 04/13/1993 | US5202218 Scanning exposing type lithographic printing plate with 1.5 wt. % of water or less |
| 04/13/1993 | US5202217 Aromatic group-containing alkali-soluble resin and an ammonium salt generating an acid upon irradiation; high transparency to UV light |
| 04/13/1993 | US5202216 Containing water insoluble polymer and aromatic sulfonic acid salt of an onium compound |
| 04/13/1993 | US5201951 Device for coating a photosensitive film on a plate roll |
| 04/08/1993 | DE4233797A1 Negative-working light-sensitive compsn. - contg. block copolymer of unsatd. acid or sulphonyl-amide] with unsatd. cpd. or polyurethane contg. azo gp. |
| 04/08/1993 | DE4233049A1 Presensitised dry lithographic printing plate for scanner - comprises photopolymerisable light sensitive coat contg. tri:aryl methane print=out dyestuff, organic amine and fluorenone cpd. covered by silicone rubber |
| 04/08/1993 | DE4132590A1 Automatic exposure control method for photolithographic processing in semiconductor IC mfr. - using micro-photometer to measure reflectivity of critical structure during exposure |
| 04/07/1993 | EP0536086A1 Photosensitive mixtures |
| 04/07/1993 | EP0535984A1 Production of three-dimensional objects |