| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/25/1993 | US5213945 Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like |
| 05/25/1993 | US5213943 Diffusion transfer reversal, precursor |
| 05/25/1993 | US5213941 Solid transfer negative- or positive-working color proofing method |
| 05/25/1993 | US5213940 Image recording method using photosensitive microcapsules |
| 05/25/1993 | US5213917 Plasma processing with metal mask integration |
| 05/25/1993 | US5213916 Photolithography, integrated circuits, layers with different optical transmissivities |
| 05/25/1993 | US5213915 Interposing between surfaces diethylene glycol, bis/allyl carbonate/, 2,2-bis/3,5-dibromo-4-(2-methacrylolyoxyethoxy) phenyl) propane & photopolymierzation catalyst, heating to solidify & exposing to cohert light in an interference pattern |
| 05/25/1993 | US5213849 Method of producing a flat, reinforced article with micro-openings |
| 05/25/1993 | US5213041 Method and system for fusing printing image deposits on surfaces of a printing substrate, and removal thereof for re-use of the surface |
| 05/25/1993 | CA1318233C Thin film coating method |
| 05/20/1993 | CA2081426A1 Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions |
| 05/19/1993 | EP0542659A1 Fast diazoquinone positive resists |
| 05/19/1993 | EP0542572A1 Negative type radiation-sensitive resin composition |
| 05/19/1993 | EP0542523A1 Positive resist material |
| 05/19/1993 | EP0542485A1 Radiation curable compositions |
| 05/19/1993 | EP0542439A1 Polymerisable compositions |
| 05/19/1993 | EP0542254A1 Method and developer for the development of flexographic printing plates |
| 05/19/1993 | EP0542228A1 Stripping agent |
| 05/19/1993 | EP0542061A1 Photoelectrochemical imaging system |
| 05/19/1993 | EP0542008A1 Antihalation compositions |
| 05/19/1993 | EP0541969A1 Method and compositions for diffusion patterning |
| 05/19/1993 | EP0541905A1 Light-sensitive mixture containing o-naphthoquinone diazide sulfonic acid esters and recording material prepared therefrom |
| 05/19/1993 | DE4238404A1 Semiconductor memory mfr. with increased cell storage capacity - forming dynamic random-access memory with metallisation lines on borophosphosilicate glass or oxide film coated structure |
| 05/19/1993 | DE4235896A1 Repairing colour filter with blank spot in image or black matrix element - with coloured photosensitive transfer material by exposure through the filter |
| 05/19/1993 | CN2133863Y Optical registering projector and image registering machine provided with this projector |
| 05/19/1993 | CN1072274A Photoprinting paper for gravure intaglio printing |
| 05/18/1993 | US5212593 Broad band optical reduction system using matched multiple refractive element materials |
| 05/18/1993 | US5212588 Reflective optical imaging system for extreme ultraviolet wavelengths |
| 05/18/1993 | US5212307 Light-sensitive bis-trichloromethyl-s-triazines, and process for their preparation |
| 05/18/1993 | US5212271 Process for obtaining textured coatings from photo-curable urea-containing compositions |
| 05/18/1993 | US5212049 Radiation-sensitive mixture and recording material based on oligomeric maleates and fumarates |
| 05/18/1993 | US5212048 Silicone coating formulations and planographic printing plates made therewith |
| 05/18/1993 | US5212047 Resist material and process for use |
| 05/18/1993 | US5212046 Near UV photoresist |
| 05/18/1993 | US5212044 Phenolic resins on substrates for positive photoresists |
| 05/18/1993 | US5212043 Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent |
| 05/18/1993 | US5212042 P-iminoquinonediazido-N-sulfonyl compound in phenolic resin binder, for micropattern resists |
| 05/18/1993 | US5212041 Light sensitive image producing element for overlays and transfer type proofing sheets |
| 05/18/1993 | US5212040 Carbonless paper for electrostatic imaging processes |
| 05/18/1993 | US5212028 Fabrication of fine patterns by selective surface reaction and inspection method therefor |
| 05/18/1993 | US5211986 Semiconductors |
| 05/18/1993 | US5211753 Spin coating apparatus with an independently spinning enclosure |
| 05/18/1993 | CA1317908C Apparatus and method for curing photosensitive coatings |
| 05/18/1993 | CA1317811C Photohardenable mixture |
| 05/18/1993 | CA1317810C Multi-color transfer image forming method |
| 05/18/1993 | CA1317728C Continuous production of a photosensitive recording element |
| 05/13/1993 | WO1993009546A1 X-ray lithography using holographic images |
| 05/13/1993 | WO1993009473A1 Selected structurally defined novolak binder resins |
| 05/13/1993 | WO1993009472A1 Light exposure device |
| 05/13/1993 | WO1993009471A1 Polyamide materials |
| 05/13/1993 | WO1993009470A1 Positive photoresists containing solubility enhancers |
| 05/13/1993 | WO1993009469A1 Exposure device |
| 05/13/1993 | WO1993009467A1 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
| 05/13/1993 | DE4133086A1 Photopolymerisable material based on salt-forming polymer monomer mixt. - contains neutral (meth)acrylate] monomer to increase mechanical strength |
| 05/12/1993 | EP0541112A1 Positive type light-senstitive composition |
| 05/12/1993 | EP0541111A1 Method of forming solder mask |
| 05/12/1993 | EP0540965A1 Positive light sensitive composition and process for the formation of relief pattern |
| 05/11/1993 | US5210779 Apparatus and method for focusing hard x-rays |
| 05/11/1993 | US5210581 Image recording apparatus having image surface laminating capability |
| 05/11/1993 | US5210425 Ablation of atoms, atomic force microscope |
| 05/11/1993 | US5210110 Silylated acylphosphine oxides |
| 05/11/1993 | US5210005 Method and apparatus for developing photosensitive lithographic plate |
| 05/11/1993 | US5210004 Elastomer layer containing reaction product of rosin, unsaturated acid, polyol and epoxy resin |
| 05/11/1993 | US5210003 Acid labile dissolution inhibitors and positive- and negative-acting photosensitive composition based thereon |
| 05/11/1993 | US5210001 Containing a toner and a core-shell polymer with specified glass transition temperature |
| 05/11/1993 | US5210000 Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units |
| 05/11/1993 | US5209818 Manufacture of a micromechanical element with two degrees of freedom |
| 05/11/1993 | US5209814 Applying a layer in a solvent, heat treatment and washing |
| 05/11/1993 | US5209180 Spin coating apparatus with an upper spin plate cleaning nozzle |
| 05/11/1993 | CA1317501C Liquid photoinitiator mixtures |
| 05/07/1993 | CA2082328A1 Method of forming solder mask |
| 05/05/1993 | EP0540448A1 Base developable discharge toplayer for E-beam resists |
| 05/05/1993 | EP0540447A1 A material-saving resist spinner and process |
| 05/05/1993 | EP0540371A1 Initiator for photopolymerization |
| 05/05/1993 | EP0540302A1 X-ray exposure apparatus and semiconductor-device manufacturing method |
| 05/05/1993 | EP0540178A2 X-ray exposure apparatus |
| 05/05/1993 | EP0540050A1 Increasing adhesion of dry-film photopolymerizable compositions to carriers |
| 05/05/1993 | EP0540032A1 Photoresist composition and etching method |
| 05/05/1993 | EP0540016A1 Photosensitive resin and resin composition for lithographic printing |
| 05/05/1993 | EP0539881A1 Single-phase developers for lithographic printing elements |
| 05/05/1993 | EP0539778A1 Positive type radiation-sensitive resist composition |
| 05/05/1993 | EP0539714A1 Amphoteric compositions |
| 05/05/1993 | EP0539686A1 Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates |
| 05/05/1993 | EP0539606A1 Photopolymerizable composition for color filter and color filter obtained therefrom |
| 05/05/1993 | EP0539384A1 Process for producing a marker indicating the orientation of the crystal lattice of a wafer |
| 05/05/1993 | CN1020454C Thioxanthone derivatives |
| 05/04/1993 | US5208818 Laser system for recording data patterns on a planar substrate |
| 05/04/1993 | US5208629 Optical projection exposure method and system using the same |
| 05/04/1993 | US5208628 Image forming apparatus |
| 05/04/1993 | US5208609 Roller type developing apparatus for a cycolor type color video printer |
| 05/04/1993 | US5208497 Linear driving apparatus |
| 05/04/1993 | US5208281 Stabilization of thiolene compositions |
| 05/04/1993 | US5208138 High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content |
| 05/04/1993 | US5208135 Infrared Sensitive, Photocurable |
| 05/04/1993 | US5208134 Multilayer element with plastic substrate and radiation transparent layer with colors and photosensitive compounds |
| 05/04/1993 | US5208133 Photosensitive resin composition |
| 05/04/1993 | US5208124 Photolithography patterns |
| 05/04/1993 | US5208066 Process of forming a patterned polyimide film and articles including such a film |
| 05/04/1993 | US5207505 Illumination light source device |
| 05/04/1993 | US5206983 Method of manufacturing micromechanical devices |