| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/07/1993 | EP0535828A1 Photostereolithographic process |
| 04/07/1993 | EP0535720A2 Method and apparatus for production of three-dimensional objects by stereolithography |
| 04/07/1993 | EP0535678A1 Preparation of lithographic printing plate and diffusion transfer processing solution used therefor |
| 04/07/1993 | EP0535653A1 Light-sensitive composition |
| 04/07/1993 | EP0535458A1 Photochemically reactive initiators for the radical polymerization |
| 04/07/1993 | EP0535444A1 Isoimide modifications of a polyimide and reaction thereof with nucleophiles |
| 04/07/1993 | EP0452301B1 Process for producing a flat texture-patterned print on shiny surfaces |
| 04/06/1993 | US5200544 Acid generator, acid sensitive polymer; photosensitivity |
| 04/06/1993 | US5200529 Substituted 2H,5H-2,5-dioxopyrrole compound is used for addition polymerization; latent image, lithography |
| 04/06/1993 | US5200487 Process for the synthesis of polysilsesquioxanes and application of the compounds obtained |
| 04/06/1993 | US5200299 Reduced tendency to migrate; discoloration inhibition |
| 04/06/1993 | US5200294 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 04/06/1993 | US5200293 Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound |
| 04/06/1993 | US5200292 Light-sensitive composition consisting essentially of, in admixture a nonionic aromatic diazo compound and a cationic dye/borate anion complex |
| 04/06/1993 | US5200291 Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin |
| 04/06/1993 | US5200031 Method for removal of photoresist over metal which also removes or inactivates corrosion-forming materials remaining from one or more previous metal etch steps |
| 04/06/1993 | CA1315592C Method of forming images |
| 04/06/1993 | CA1315591C Visible ray-recording hologram material |
| 04/04/1993 | CA2079652A1 Photosensitive compositions |
| 04/01/1993 | WO1993006597A1 Optical recording with near-infrared dyes to effect bleaching |
| 04/01/1993 | WO1993006530A1 Coating compositions |
| 04/01/1993 | WO1993006529A1 Photosensitive resin composition |
| 04/01/1993 | WO1993006528A1 Positive-working coating compositions |
| 04/01/1993 | WO1993005889A1 Water-soluble formulation for masking and the like, and method utilizing the same |
| 04/01/1993 | DE4232673A1 Dry lithographic printing plate prodn. from presensitised plate - by exposure, development and dyeing in aq. dye-bath contg. little organic solvent |
| 04/01/1993 | DE4231324A1 Light-sensitive compsn for mfg. durable lithographic printing plate or photomask - contg photocurable polymer of macromer obtd. by e.g. polymerising mercapto:propionic acid, 4,4'-azo:bis-(4-cyano-valeric acid), 2-methoxyethyl acetate, etc. |
| 03/31/1993 | EP0534759A1 Position detector |
| 03/31/1993 | EP0534758A1 Method and device for measuring positional deviation |
| 03/31/1993 | EP0534757A1 Method and device for measuring displacement |
| 03/31/1993 | EP0534720A1 Register marks |
| 03/31/1993 | EP0534598A1 Exposure apparatus for forming image |
| 03/31/1993 | EP0534463A2 Pattern exposing method using phase shift and mask used therefor |
| 03/31/1993 | EP0534404A1 Electron beam lithography apparatus |
| 03/31/1993 | EP0534324A1 Radiation sensitive compositions comprising polymer having acid labile groups |
| 03/31/1993 | EP0534273A1 Method for producing a bottom-resist |
| 03/31/1993 | EP0534204A1 Base developable negative photoresist and use thereof |
| 03/31/1993 | CN1070495A Extension instrument for optical drawing graph and literal |
| 03/31/1993 | CA2079124A1 Photostereolithographic process |
| 03/30/1993 | US5199055 X-ray lithographic mask blank with reinforcement |
| 03/30/1993 | US5198857 Film exposure apparatus and method of exposure using the same |
| 03/30/1993 | US5198837 Laser beam harmonics generator and light exposing device |
| 03/30/1993 | US5198634 Plasma contamination removal process |
| 03/30/1993 | US5198520 Photoresists |
| 03/30/1993 | US5198402 Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition |
| 03/30/1993 | US5198326 Process for forming fine pattern |
| 03/30/1993 | US5198325 Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator |
| 03/30/1993 | US5198324 Method for making lithographic printing plate |
| 03/30/1993 | US5198323 Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component |
| 03/30/1993 | US5198322 Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture |
| 03/30/1993 | US5198316 Self crosslinking polyimides for protective coatings or relief images with development in alkaline solutions |
| 03/30/1993 | US5198153 Dope Precursor, Electron and Photoresists |
| 03/30/1993 | US5198119 Semipermeable Membranes |
| 03/30/1993 | US5198087 Method of making magneto-optical recording medium |
| 03/28/1993 | CA2078732A1 Displacement measuring device and displacement measuring method |
| 03/28/1993 | CA2078726A1 Position detector |
| 03/25/1993 | DE4231875A1 Light sensitive resin - comprises alkali-soluble resin, light sensitive material and solvent, useful for the prodn. of patterns on semi-conductor substrates |
| 03/24/1993 | EP0533459A1 Photocurable composition and its use |
| 03/24/1993 | EP0532968A1 Projection type x-ray lithography apparatus |
| 03/23/1993 | US5197118 Control system for a fine pattern printing apparatus |
| 03/23/1993 | US5197089 Pin chuck for lithography system |
| 03/23/1993 | US5196883 Image forming apparatus |
| 03/23/1993 | US5196745 Magnetic positioning device |
| 03/23/1993 | US5196517 Selected trihydroxybenzophenone compounds and their use as photoactive compounds |
| 03/23/1993 | US5196296 Epoxy acrylate resins and photosensitive resin compositions therefrom |
| 03/23/1993 | US5196295 Spin castable mixtures useful for making deep-UV contrast enhancement layers |
| 03/23/1993 | US5196290 Method for making a lithographic aluminium offset printing plate by the silver salt diffusion transfer process |
| 03/23/1993 | US5196289 Selected block phenolic oligomers and their use in radiation-sensitive resist compositions |
| 03/23/1993 | US5196288 Silver halide emulsion, polymerizable compound, microcapsules, contrast |
| 03/23/1993 | US5196287 Process for producing encapsulated photosensitive composition by altering the concentration of the internal phase during encapsulation |
| 03/23/1993 | US5196285 Method for control of photoresist develop processes |
| 03/23/1993 | US5195655 Integrated fluid dispense apparatus to reduce contamination |
| 03/23/1993 | US5195430 Dual roller apparatus for pressure fixing sheet material |
| 03/23/1993 | CA1314892C Polymethine dyes and uv absorbers containing a. triarylborylisocyano group and imaging materials for their use |
| 03/23/1993 | CA1314752C Photosensitive resin plate for flexography |
| 03/23/1993 | CA1314751C Photosensitive recording materials containing elastomeric graft copolymer binders, and relief plates obtained from these |
| 03/17/1993 | EP0532236A1 System for stabilizing the shapes of optical elements, exposure apparatus using this system and method of manufacturing semiconductor devices |
| 03/17/1993 | EP0532211A1 X-ray mask and semiconductor device manufacturing method using the same |
| 03/17/1993 | EP0532183A2 Photosensitive polyamic alkyl ester composition and process for its use |
| 03/17/1993 | EP0532076A1 Silver salt diffusion transfer type lithographic printing plate |
| 03/17/1993 | EP0532042A1 Silver halide photographic material |
| 03/17/1993 | EP0532029A1 Purple membrane composition with increased efficiency of holographic diffraction |
| 03/17/1993 | EP0531292A1 Photoresist stripper. |
| 03/17/1993 | EP0526567A4 A rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media |
| 03/17/1993 | CA2076511A1 Photocurable composition, flexible photosensitive articles made therefrom and methods of improving solvent resistance and flexibility of those articles |
| 03/16/1993 | US5195113 X-ray exposure apparatus and method of positioning the same |
| 03/16/1993 | US5194928 Polysilsesquisiloxanes polymers between polyimides |
| 03/16/1993 | US5194893 Exposure method and projection exposure apparatus |
| 03/16/1993 | US5194890 Imaging apparatus equipped with an image glossing |
| 03/16/1993 | US5194889 Flashing device |
| 03/16/1993 | US5194743 Device for positioning circular semiconductor wafers |
| 03/16/1993 | US5194402 Semiconductors and electronic circuits |
| 03/16/1993 | US5194366 Pearlescent toners having reduced stain characteristics |
| 03/16/1993 | US5194365 Method for forming images |
| 03/16/1993 | US5194364 Polymers from silane substituted acetylenes |
| 03/16/1993 | US5194350 Method and apparatus for creation of resist patterns by chemical development |
| 03/16/1993 | US5194316 Polyimide layer laminate sheet |
| 03/16/1993 | US5193248 Latching assembly for hingeable plate members |
| 03/16/1993 | CA1314652C Photoreactive polymers and production of a two-layer resist |
| 03/16/1993 | CA1314425C Photopolymerizable films containing plasticizer silica combinations |
| 03/11/1993 | WO1993005446A1 Printing plate |