Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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07/09/1992 | WO1992011577A1 Process and device for producing a three-dimensional object |
07/09/1992 | WO1992011504A1 Bearing for high resolution precision control device |
07/09/1992 | WO1992011322A2 Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications |
07/09/1992 | WO1992011295A1 Uv/eb curable butyl copolymers for coating applications |
07/09/1992 | WO1992011129A1 Method and apparatus for both transporting and laminating resist film onto semiconductor wafers |
07/09/1992 | DE4100473A1 Copying lacquers simplified prodn. for textile printing plate - by in-situ esterification of novolak and di:azide sulphonic acid chloride in lacquer solvent, for electronics economic mfr. |
07/08/1992 | EP0494048A1 Photochromic benzothioxanthoneoxides, process for their preparation and their use |
07/08/1992 | EP0493923A1 Diazo sensitizers of fluorinated esters |
07/08/1992 | EP0493827A2 Sensor for semiconductor device manufacturing process control |
07/08/1992 | EP0493644A1 Electrodialysis cell for removal of excess electrolytes formed during electrodeposition of photoresist coatings |
07/08/1992 | EP0479968A4 X-ray imaging system |
07/08/1992 | EP0349632B1 Gap sensing/adjustment apparatus and method for a lithography machine |
07/08/1992 | EP0239605B1 Structures for controlled chemical release |
07/08/1992 | CN1017387B Tool for connecting cable wires |
07/07/1992 | US5128975 X-ray exposure system |
07/07/1992 | US5128709 Image recording method |
07/07/1992 | US5128235 Method of forming a three-dimensional object comprising additives imparting reduction of shrinkage to photohardenable compositions |
07/07/1992 | US5128234 Production of photopolymeric flexographic relief printing plates |
07/07/1992 | US5128232 Vinylphenol resins |
07/07/1992 | US5128231 Polyhydroxystyrene, semiconductor manufacture |
07/07/1992 | US5128230 Positive working photoresist |
07/07/1992 | US5128223 Thin film of polyester, polyamide, polysulfonate, polysulfonamide, molecular rearrangements |
07/07/1992 | US5128207 Method for producing uniform polymethylmethacrylate layers |
07/07/1992 | US5127989 Semiconductors |
07/07/1992 | US5127987 Patterning, dry etching, conveying in vacuum; semiconductor wafers; corrosion resistance |
07/07/1992 | CA1304613C High performance relay system with magnification |
07/04/1992 | CA2058393A1 Photochromic benzothioxanthone oxides, process for their preparation and the use thereof |
07/02/1992 | DE4143106A1 Release coating compsn. for photosensitive resin based printing plate - contg. hydroxyalkyl-cellulose and plasticiser, used esp. for flexographic plate, does not form creases and is not affected by humidity |
07/02/1992 | DE4143081A1 Photosensitive compsn. used as resist esp. in microelectronics - contg. cpd. composed by acid pref. lactone or sultone and acid precursor pref. onium cpd. |
07/02/1992 | DE4112695A1 Verfahren und vorrichtung zum herstellen eines dreidimensionalen objekts A method and apparatus for producing a three-dimensional object |
07/01/1992 | EP0493367A2 Silicone resist materials containing polysilanes and methods of making the same |
07/01/1992 | EP0493356A2 Styrene/maleates terpolymers |
07/01/1992 | EP0493317A1 Radiosensitive composition on basis of water as solvent or dispersion medium, respectively |
07/01/1992 | EP0492959A1 Method for developing presensitized plate for use in making lithographic printing plate |
07/01/1992 | EP0492953A1 Stereolithography method |
07/01/1992 | EP0492952A1 Method of and apparatus for producing a strip of lead frames for integrated circuit dies in a continuous system |
07/01/1992 | EP0492672A2 Method of controlling exposure of process camera |
07/01/1992 | EP0492590A1 Photopolymerizable composition and dry PS plate |
07/01/1992 | EP0492351A1 Printing screen and method and apparatus for its manufacture |
07/01/1992 | EP0492256A1 Photolithographic patterning |
07/01/1992 | EP0492255A1 Copolymers |
07/01/1992 | EP0492253A1 Photolithographic process |
07/01/1992 | EP0492060A1 Process for the fabrication a flat microperforated reinforced article |
06/30/1992 | US5127029 X-ray exposure apparatus |
06/30/1992 | US5126932 Method and apparatus for executing a program in a heterogeneous multiple computer system |
06/30/1992 | US5126784 Image forming apparatus |
06/30/1992 | US5126783 Image recording apparatus having secondary exposure unit |
06/30/1992 | US5126781 Image recording apparatus |
06/30/1992 | US5126419 Light-sensitive polymer, method for preparing the same andmethod for forming patterns |
06/30/1992 | US5126289 Coating aluminum with antireflection layer of dye and polysulfone and polyaldehyde precursors |
06/30/1992 | US5126231 Minimizing undercutting |
06/30/1992 | US5126230 Alkanolamine or morpholine to prevent irregular deposits on edges of unexposed portions |
06/30/1992 | US5126229 No background contamination |
06/30/1992 | US5126228 PS plate for use in making lithographic printing plate requiring no dampening water |
06/30/1992 | US5126226 Process for the preparation of images on tonable, light-sensitive layers |
06/30/1992 | US5126022 Method and device for moving molecules by the application of a plurality of electrical fields |
06/30/1992 | US5126006 Plural level chip masking |
06/30/1992 | US5125999 Thin film bonding method employing a structure for removing wetting agents |
06/30/1992 | US5125357 Developer material coating apparatus having coating amount control unit |
06/30/1992 | CA1304532C Radiation sensitive acrylate composition |
06/30/1992 | CA1304354C Radiation sensitive compounds |
06/30/1992 | CA1304253C Process and device for treating a photographic recording material |
06/25/1992 | WO1992010588A1 Sequencing by hybridization of a target nucleic acid to a matrix of defined oligonucleotides |
06/25/1992 | WO1992010587A1 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
06/25/1992 | WO1992010523A1 Photosensitive polymers and printing plates |
06/25/1992 | DE4139501A1 Photothermographic material with microcapsules contg. low boiling solvent - for developer or bleach vaporising during mfr., avoiding odour on heating |
06/25/1992 | DE4040996A1 Polymers contg. N-tert.-butyl maleimide units and opt. comonomer(s) - having high transparency, used as base polymers in sensitive resist systems |
06/24/1992 | EP0491457A1 Image forming method and apparatus |
06/24/1992 | EP0491375A2 Pattern forming system |
06/24/1992 | EP0491368A2 Method and apparatus for making print imaging media |
06/24/1992 | EP0490966A1 Radiation-sensitive compositions containing fully substituted novolak polymers |
06/24/1992 | CN1017192B Dispersed laser speckle contact screen and optical system for its manufacture |
06/23/1992 | US5125014 X-ray exposure apparatus |
06/23/1992 | US5124927 Latent-image control of lithography tools |
06/23/1992 | US5124746 Mechanism for winding air-tight sheet up and off |
06/23/1992 | US5124745 Apparatus for the production of printing plates |
06/23/1992 | US5124736 Process and apparatus for developing photopolymer plates |
06/23/1992 | US5124559 Aftertreatment apparatus for printing plates |
06/23/1992 | US5124238 Photolithography patterning; nondeforming vertical wall profile |
06/23/1992 | US5124237 Aftertreatment of an exposed and developed mixture of a carboxy-containing addition polymer binder, unsaturatd compound and photoinitiator with a basic solvent solution |
06/23/1992 | US5124236 Unsaturated compound, initiator of cationic dye with organic boron anion, thiol compound; for printing plates, resists |
06/23/1992 | US5124235 Photopolymerization initiator and photosensitive composition employing the same |
06/23/1992 | US5124234 Liquid light-sensitive resin composition |
06/23/1992 | US5124233 Photoresist compositions |
06/23/1992 | US5124228 Based on hydroxy-substituted alkylbenzophenones |
06/23/1992 | US5124216 Method for monitoring photoresist latent images |
06/23/1992 | US5123998 Selective radiation of a substrate resin film, organometallization of non-irradiated region, etching |
06/23/1992 | US5123743 Lithography mask inspection |
06/23/1992 | US5123734 Apparatus and method for calibrating and normalizing a stereolithographic apparatus |
06/23/1992 | CA1304173C Microlithographic apparatus |
06/23/1992 | CA1304169C Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like |
06/22/1992 | CA2058224A1 Stereolithography method |
06/19/1992 | CA2056680A1 Method and apparatus for making print imaging media |
06/17/1992 | EP0490515A1 Method for preparing lithographic printing plate |
06/17/1992 | EP0490368A1 PS plate requiring no dampening water |
06/17/1992 | EP0490320A2 A method for producing a diffraction grating |
06/17/1992 | EP0490229A2 Method for producing selective sputtered structures |
06/17/1992 | EP0490118A1 Photoimagable solder mask and photosensitive composition |
06/17/1992 | EP0489983A1 A lithographic printing plate |
06/17/1992 | DE4040117A1 Dry-developable negative resist systems - have irradiation-sensitive resist layer based on binding agent and X=ray or electron ray sensitive component, with additional polymer layer |