G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1992
10/29/1992	DE4213399A1 Colour sample preparing system for prodn. of colour sample by copying colour image - exposures material by UV light through original image and heats material for development
10/28/1992	EP0510983A1 Positive resist composition
10/28/1992	EP0510872A1 Photodelineable coatings from hydrogen silsesquioxane resin
10/28/1992	EP0510839A1 Sulphoxonium salts
10/28/1992	EP0510753A1 Luminescent article with protective coating and manufacture
10/28/1992	EP0510726A1 Photoresist compositions comprising styryl compounds
10/28/1992	EP0510692A1 Method for producing color filter
10/28/1992	EP0510684A1 Method for producing color filter
10/28/1992	EP0510672A1 Positive type photoresist composition
10/28/1992	EP0510671A1 Positive resist composition
10/28/1992	EP0510670A1 Positive resist composition
10/28/1992	EP0510646A1 Presensitized plates for use in making lithographic printing plates not requiring dampening with water
10/28/1992	EP0510641A1 Alignment apparatus for use in exposure system for optically transferring pattern onto object
10/28/1992	EP0510449A2 Acid-cleavable compounds, positive-working radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom
10/28/1992	EP0510448A1 Sulfonic acid esters of 2,4,6-tris-(2-hydroxy-ethoxy)-1,3,5-triazine, radiation-sensitive positive functioning mixture containing them and recording material
10/28/1992	EP0510447A2 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
10/28/1992	EP0510446A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
10/28/1992	EP0510445A1 Acid-cleavable radiation-sensitive compounds, radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom
10/28/1992	EP0510444A1 Acid-cleavable radiation-sensitive compounds, radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom
10/28/1992	EP0510443A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
10/28/1992	EP0510442A1 Substituted 1-sulfonyloxy-2-pyridones, process for their preparation and their use
10/28/1992	EP0510441A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
10/28/1992	EP0510440A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
10/28/1992	EP0507773A4 Processing systems with intelligent article tracking
10/27/1992	US5159496 Lens system with four meniscus lenses made of anomalous dispersion glass
10/27/1992	US5159483 Projecting and exposing device
10/27/1992	US5159172 Optical projection system
10/27/1992	US5159088 Sulfonium salts and use thereof
10/27/1992	US5158989 Electroless plating-resisting ink composition
10/27/1992	US5158988 Containing photoinitiator; curable by visible light
10/27/1992	US5158862 Homopolymerizing 5,7-dodecadiyn-1,12-bis(isopropyl carbamate)
10/27/1992	US5158861 Generating h+ions to catalyze crosslinking of resin film
10/27/1992	US5158860 Coating substrate with photoresist, imaging, development
10/27/1992	US5158858 Solid imaging system using differential tension elastomeric film
10/27/1992	US5158857 Image forming material
10/27/1992	US5158855 α-diazoacetoacetates and photosensitive resin compositions containing the same
10/27/1992	US5158854 Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane
10/27/1992	CA2067042A1 Positive resist composition
10/27/1992	CA2067041A1 Positive resist composition
10/27/1992	CA2066916A1 Method for producing color filter
10/27/1992	CA1309481C Method of fabricating imaging apparatus
10/27/1992	CA1309291C Processing of exposed lithographic printing plates
10/26/1992	CA2066907A1 Method for producing color filter
10/25/1992	CA2062860A1 Photosensitive resin composition
10/23/1992	CA2064971A1 Photodelineable coatings from hydrogen silsesquioxane resin
10/22/1992	DE4212827A1 Microcapsule ink compsn. with vehicle contg. UV-curable cpd. - having specified hardness after cure and is used in pressure sensitive copying material
10/22/1992	DE4200038A1 Vacuum oven for curing etch-resistant coatings in semiconductor wafer mfr. - uses combination of heat and vacuum pump extraction to remove solvent from etch-resistant layer
10/22/1992	DE4113027A1 Verfahren und vorrichtung zur fotolithographischen herstellung von langen gittermassstaeben Method and device for photolithographic manufacturing of long gittermassstaeben
10/21/1992	EP0509962A1 A process and an apparatus for producing a thin photoimageable coating on a metallic-layered substrate
10/21/1992	EP0509797A2 Projection exposure apparatus
10/21/1992	EP0509740A1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material
10/21/1992	EP0509514A1 Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor
10/21/1992	EP0509512A1 Photosensitive composition for volume hologram recording
10/21/1992	EP0509431A1 Process for preparing radiation sensitive compound and positive resist composition
10/21/1992	EP0490966A4 Radiation-sensitive compositions containing fully substituted novolak polymers
10/21/1992	CN1065468A Solvent dispersible interpenetrating polymer networks
10/21/1992	CN1018771B High contrast high temp. grate manufacturing process and applied technology
10/21/1992	CA2066148A1 Positive-working radiation-sensitve mixture, and radiation-sensitive recording material produced with this mixture
10/21/1992	CA2066147A1 Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture
10/21/1992	CA2066086A1 Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
10/20/1992	WO1992021065A1 Process for preparing electromagnetic radiation imaged material
10/20/1992	US5157700 Exposure apparatus for controlling intensity of exposure radiation
10/20/1992	US5157296 Bearing for use in high resolution precision control device
10/20/1992	US5157091 Ultraviolet-absorbing polymer material and photoetching process
10/20/1992	US5157018 Perfluoroalkyl group-containing polymers and reproduction layers produced therefrom
10/20/1992	US5157003 One step resist coating and prebaking process
10/20/1992	US5156982 Pattern shift measuring method
10/20/1992	US5156943 Reducing the number of elements while introducing at the critical aperture a blazed transmission grating having rings of low bending power defined by multiple plateaus
10/20/1992	US5156942 Focusing electron beam which carries masking pattern onto printed circuit while controlling energy levels
10/20/1992	US5156940 Used in photographic silver halide emulsions and materials
10/20/1992	US5156938 Ablation-transfer imaging/recording
10/20/1992	US5156253 Suction table, especially for an exposure station
10/20/1992	US5156089 Method and apparatus for making a painting screen using an ink jet printer for printing a graphic on the screen emulsion
10/20/1992	CA2108674A1 Process for preparing electromagnetic radiation imaged material
10/20/1992	CA1309056C Forming heat-resistant layer by irradiation of polyether based photopolymer
10/20/1992	CA1308902C Separating device for trimming the width of a poured curtain of coating material
10/18/1992	CA2066389A1 Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor
10/18/1992	CA2066077A1 Photosensitive composition for volume hologram recording
10/18/1992	CA2065468A1 Process for preparing radiation sensitive compound and positive resist composition
10/15/1992	WO1992017548A1 Indolicin trimethine dye
10/15/1992	WO1992017516A1 Process for curing polyquinoline polymers and compositions thereof
10/14/1992	EP0508269A1 Radiation-sensitive ester and process for its production
10/14/1992	EP0508268A1 Radiation-sensitive composition comprising naphthoquinone-di-azide-sulfonic acid esters and recording material produced therewith
10/14/1992	EP0508267A1 Radiation-sensitive composition with 1,2-naphthoquinone-2-dazide-sulfonic acid esters and recording material produced therewith
10/14/1992	EP0508174A1 Radiation sensitive mixture, containing groups which are labile in acid environment and method for fabrication of relief patterns and relief images
10/14/1992	EP0508054A2 Polyamide resins for relief printing
10/14/1992	EP0507773A1 Processing systems with intelligent article tracking
10/14/1992	CA2065776A1 Sulphoxonium salts
10/13/1992	US5155749 Variable magnification mask for X-ray lithography
10/13/1992	US5155523 Workpiece supporting mechanism
10/13/1992	US5155012 Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers and a process for producing printing forms
10/13/1992	US5155011 Mixture of water, organic solvent, alkali agent, anionic surfactant, alkanoic acid or salt, emulsifier, complexing agent, tris/hydroxyalkyl/aminomethane buffer; stability
10/13/1992	US5155010 Photopolymerizable layer on support is exposed to light to modify surface thickness in a selective area to accept a color layer from a color carrier; compression, removal of color carrier so color remains on image carrier
10/13/1992	US5155005 Method of producing polychromatic colored image
10/13/1992	US5154994 Exposing holographic material of polymeric matrix with radiation active substance to interference pattern to form latent image, developing by dipping into swelling solution of solvent mixture, pulling, vaporizing solvents
10/13/1992	US5154808 Functional organic thin film and process for producing the same
10/13/1992	US5154661 Thermal electric cooling system and method
10/13/1992	CA1308852C Photopolymerizable composition
10/13/1992	CA1308609C Planarization through silylation
10/13/1992	CA1308596C Microplastic structures and method of manufacture

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