| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/26/1992 | CA1301953C Applicator for applying dry film solder mask on a board |
| 05/26/1992 | CA1301524C Photosensitive compositions containing microcapsules concentrated in surface layer |
| 05/26/1992 | CA1301522C Laminate for the formation of beam leads for ic chip bonding |
| 05/22/1992 | WO1992009659A1 Silicone coating formulations and planographic printing plates made therewith |
| 05/21/1992 | DE4138731A1 X=ray exposure appts. with microchip support for IC mfr. - has target object holder mounted for shifting w.r.t. microchip support into 2 positions for mounting and exposing |
| 05/21/1992 | DE4036630A1 Aq. alkali stripping soln. - for photoresists contains specified amt. ranges of aq. alkali hydroxide and nonionic surfactant |
| 05/20/1992 | EP0486471A1 Image recording apparatus |
| 05/20/1992 | EP0486316A2 Projection exposure method and apparatus |
| 05/20/1992 | EP0486246A1 Heat-developable photosensitive material |
| 05/20/1992 | EP0485938A2 Apparatus for processing a photosensitive element |
| 05/20/1992 | EP0485809A1 Image forming device and method for transporting a photosensitive member in such device |
| 05/20/1992 | EP0485626A1 Color filter coating material for liquid crystal display, color filter material, formation of coating, and formation of color filter |
| 05/20/1992 | EP0485455A1 Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid |
| 05/19/1992 | USRE33931 Laser pattern generating system |
| 05/19/1992 | US5115456 Mask for exposing wafer with radiation and its exposing method |
| 05/19/1992 | US5115095 Polysilsequioxane photoresists |
| 05/19/1992 | US5114834 Photoresist removal |
| 05/19/1992 | US5114832 Photopolymerizable mixture and recording material prepared therefrom, having a photoinitiating set of compounds which give increased absorption below 450 nm |
| 05/19/1992 | US5114831 Photopolymerizable laminating material |
| 05/19/1992 | US5114830 Solder mask resins having improved stability containing a multifunctional epoxide and a partial ester or styrene-maleic anhydride copolymer |
| 05/19/1992 | US5114827 Photoresists resistant to oxygen plasmas |
| 05/19/1992 | US5114826 Heat stable polyamic acid, ester or imide for light sensitive elements |
| 05/19/1992 | US5114816 Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material |
| 05/19/1992 | US5114754 Passivation of metal in metal/polyimide structures |
| 05/19/1992 | US5114741 Ethers of reaction product of a dicyclopentadiene and a phenol and of a dialdehyde and a phenol |
| 05/19/1992 | US5114234 Stage positioning control method and apparatus |
| 05/19/1992 | US5114223 Exposure method and apparatus |
| 05/19/1992 | CA1300957C Negative working color proofing system comprising polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin |
| 05/19/1992 | CA1300927C Purge air system for a combustion instrument |
| 05/16/1992 | CA2055187A1 Apparatus for processing a photosensitive element |
| 05/14/1992 | WO1992008240A1 High power lamp |
| 05/14/1992 | WO1992008235A1 Device for controlling beams of particles, x-ray and gamma quanta and uses thereof |
| 05/14/1992 | WO1992008166A1 Contrast enhancement of non-amplified alkali developable photoresists |
| 05/14/1992 | WO1992007759A1 Method and apparatus for transferring articles between two controlled environments |
| 05/14/1992 | DE4134526A1 Positive photoresist compsns. - contain alkali-soluble resin and, as light-sensitive additive, ester or amide of 1,2-naphthoquinone-(2)-di:azide-6-sulphonic acid |
| 05/14/1992 | DE4035379A1 Photosensitive substrate layer structuring system using laser scanning - incorporates micro-scanning for deflection of laser beam by fraction of scanning line width |
| 05/13/1992 | EP0485334A2 Photopolymerizable compositions |
| 05/13/1992 | EP0485161A1 Stripping compositions and method of stripping resists from substrates |
| 05/13/1992 | EP0485092A2 Method for fabricating colour filter |
| 05/13/1992 | EP0485062A2 Method of forming a pattern and projection exposure apparatus |
| 05/13/1992 | EP0484980A2 Method of coating and apparatus thereby |
| 05/13/1992 | EP0484917A1 Presensitized plate for use in making lithographic printing plate requiring no damping water |
| 05/13/1992 | EP0484752A1 Photopolymerizable composition and photosensitive lithographic printing plate |
| 05/13/1992 | EP0484557A1 Device for producing picture |
| 05/13/1992 | EP0484515A1 Method and apparatus for producing thermal slide transparencies |
| 05/13/1992 | EP0484388A1 Composite polyester films and their use as a protective coating for photopolymeric plates and photopolymeric plates comprising them |
| 05/13/1992 | EP0371069B1 Process for manufacturing microsensors with integrated signal processing |
| 05/13/1992 | EP0252152B1 Photosensitive emulsion for coating plastic film |
| 05/12/1992 | US5113402 Solid state laser device for lithography light source and semiconductor lithography method |
| 05/12/1992 | US5113212 Method for the formation of images and an apparatus for performing the same |
| 05/12/1992 | US5113211 Image forming apparatus using photopolymerization reaction |
| 05/12/1992 | US5113003 Silicon-containing phenoxy ethers, polymers thereof, and use of such polymers |
| 05/12/1992 | US5112977 Photoinitiators, metallization of polymeric surfaces |
| 05/12/1992 | US5112881 Photocrosslinked second order nonlinear optical polymers |
| 05/12/1992 | US5112743 Light-sensitive composition and presensitized plate for use in making lithographic printing plates |
| 05/12/1992 | US5112726 Embedded catalyst receptors for metallization of dielectrics |
| 05/12/1992 | US5112725 Layer resistant to ozone cracking |
| 05/12/1992 | US5112724 Lithographic method |
| 05/12/1992 | US5112723 Photosensitive recording element |
| 05/12/1992 | US5112722 Photopolymerization of monomer mixture which produces polymers of different refractive index, light is scattered at different angles at different locations on plate |
| 05/12/1992 | US5112721 Photopolymerizable compositions containing sensitizer mixtures |
| 05/12/1992 | US5112719 Improved resolution, semiconductor manufacture |
| 05/12/1992 | US5112647 Apparatus for the preparation of a functional deposited film by means of photochemical vapor deposition process |
| 05/12/1992 | US5112540 Method of making microcapsules having an improved pre-wall |
| 05/12/1992 | US5112491 Management of waste solution containing photoresist materials |
| 05/12/1992 | US5112440 Printed circuits |
| 05/12/1992 | US5112434 Method for patterning electroless metal on a substrate followed by reactive ion etching |
| 05/12/1992 | US5112428 Wet lamination process and apparatus |
| 05/12/1992 | US5111743 Screen process printing plate for printing with high precision |
| 05/12/1992 | CA1300800C Radiation curable liquid (meth)acrylated polymeric hydrocarbon maleateprepolymer and formulations containing same |
| 05/12/1992 | CA1300787C Epoxy fluorocarbon coating compositions and the process to make thesame |
| 05/12/1992 | CA1300786C Radiation-polymerizable mixture, recording material prepared therefrom and process for use thereof |
| 05/12/1992 | CA1300717C Exposure control system for full field photolithography using pulsed sources |
| 05/07/1992 | EP0561765A4 Novel method of making, testing and test device for integrated circuits. |
| 05/07/1992 | DE4135996A1 Photopolymerisable compsn. - contains initiator contg. onium cpd. and acridine deriv. |
| 05/07/1992 | DE4135762A1 Irradiator with mask and object holders - has aligning travelling tables, each with narrow front section for preventing collision |
| 05/07/1992 | DE4034823A1 Prepn. of polymer contg. conjugated polyene - by polymerising per:fluoroalkyl acetylene(s) using tungsten-contg. catalyst for gas- or solvent-permeable membrane, photoresist etc. |
| 05/06/1992 | EP0484183A1 Photo-solidification modelling device |
| 05/06/1992 | EP0484182A1 High precision photosolidification modelling device |
| 05/06/1992 | EP0484179A2 Wafer holding device in an exposure apparatus |
| 05/06/1992 | EP0484131A2 Projection exposure apparatus |
| 05/06/1992 | EP0484127A2 Light-sensitive element and process for preparation thereof |
| 05/06/1992 | EP0484087A2 Method and apparatus for processing presensitized lithographic printing plate |
| 05/06/1992 | EP0484021A1 Resist composition |
| 05/06/1992 | EP0483805A1 Image forming device |
| 05/06/1992 | EP0483802A1 Intermediate receiver release layer |
| 05/06/1992 | EP0483799A1 Dual laminate process for thermal color proofing |
| 05/06/1992 | EP0483752A2 Optical member made of high-purity and transparent synthetic silica glass and method for production thereof and blank thereof |
| 05/06/1992 | EP0483722A1 Process for polymerization of partly fluorinated hydrocarbons containing a triple bond |
| 05/06/1992 | EP0483693A2 Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix |
| 05/06/1992 | EP0483648A2 Borate coinitiators for photopolymerizable compositions |
| 05/06/1992 | EP0483484A2 Selective metallization process |
| 05/06/1992 | EP0483416A1 Method of making aqueous loaded latex compositions |
| 05/06/1992 | EP0483415A1 Method of making lithographic aluminium offset printing plates |
| 05/06/1992 | EP0483412A1 Method of forming thermal transfer dye images |
| 05/06/1992 | EP0483378A1 Photo-set resin letterpress |
| 05/06/1992 | EP0483349A1 Method for control of photoresist develop processes |
| 05/06/1992 | EP0483277A1 Improving holographic lithography |
| 05/05/1992 | US5111279 Apparatus for isolation of flux materials in "flip-chip" manufacturing |
| 05/05/1992 | US5111240 Method for forming a photoresist pattern and apparatus applicable therewith |