| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/11/1993 | DE4229816A1 Radiation sensitive compsn. for photoresist in accurate UV and X=ray process - contg. modified maleic anhydride] polymer and acid forming agent with high resolution and sensitivity for highly integrated circuit prodn. |
| 03/11/1993 | DE4129439A1 Heat-resistant structurised epoxide] resin or polymer film prodn. - by exposing substrate with resin adduct of olefinically unsatd. mono:isocyanate through negative original and baking |
| 03/11/1993 | CA2094593A1 Printing plate and methods of making and using same |
| 03/10/1993 | EP0531259A1 Photoimageable polyimide |
| 03/10/1993 | EP0531102A1 Aligner and exposure method for manufacturing semiconductor device |
| 03/10/1993 | EP0531066A1 Sor exposure system and method of manufacturing semiconductor device using same |
| 03/10/1993 | EP0531019A1 Photosensitive polyimide precursor compositions and process for preparing same |
| 03/10/1993 | EP0530962A1 Anti-blocking, water soluble top coat for color proofing films |
| 03/10/1993 | EP0530957A1 A lithographic printing plate precursor of direct image type |
| 03/10/1993 | EP0530849A2 Fine pattern forming material and pattern forming method |
| 03/10/1993 | EP0530815A1 Presensitized plate for use in making lithographic printing plate |
| 03/10/1993 | EP0530798A1 Mixture of dyes for black dye donor for thermal color proofing |
| 03/10/1993 | EP0530674A1 Plate blank, process for producing printing plate from plate blank, and printing method and apparatus using plate |
| 03/10/1993 | EP0530613A1 Image forming element with a photopolymerizable monomer |
| 03/10/1993 | EP0530469A1 Process for the preparation of organic compounds carrying tert.-butoxycarbonyl groups |
| 03/09/1993 | US5192869 Device for controlling beams of particles, X-ray and gamma quanta |
| 03/09/1993 | US5192643 Pattern-forming method and radiation resist for use when working this pattern-forming method |
| 03/09/1993 | US5192642 Oxygen-containing titanocenes, and the use thereof |
| 03/09/1993 | US5192640 Nitrosation, sulfonation, reduction, oxidation, diazotization, and salt formation |
| 03/09/1993 | US5192639 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and chromium molybdenum or tungsten compound |
| 03/06/1993 | CA2077525A1 Photoimageable polyimide |
| 03/04/1993 | WO1993004521A1 Linear actuator control system for platform stabilization |
| 03/04/1993 | WO1993004406A1 Double-layer resist and method of and device for making said resist |
| 03/04/1993 | WO1993004401A1 Silver image bleaching solution and process |
| 03/04/1993 | WO1993003927A1 A hard copy imaging system |
| 03/04/1993 | DE4226691A1 Imaging with light-sensitive resin and pigment using specified developer - contg. glycol or polyether glycol mono: or di:sulphate to minimise fogging |
| 03/04/1993 | DE4128964A1 Defined adhesive area prodn. esp. for micro-mechanics or integrated sensor - using photoresist adhesive soln. of lacquer, photosensitive cpd. and hardener, etc. |
| 03/04/1993 | DE4128796A1 Electron beam negative resist developed by aq. alkali - contg. 4-halophenol novolak and poly:cyclic partly hydrogenated triazine deriv. as crosslinker |
| 03/03/1993 | EP0530148A1 Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane |
| 03/03/1993 | EP0530095A1 Improved sensitization of photopolymerizable compositions |
| 03/03/1993 | EP0529971A1 High resolution printing technique by using a mask pattern adapted to the technique |
| 03/03/1993 | EP0529970A1 Novolak resin compositions with high Tg and high sensitivity for photoresist applications |
| 03/03/1993 | EP0529969A1 Novolak resin compositions with high Tg and high sensitivity for photoresist applications |
| 03/03/1993 | EP0529944A1 Method and apparatus for aligning phototools for photoprocessing of printed circuit board panels |
| 03/03/1993 | EP0529896A1 Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator |
| 03/03/1993 | EP0529827A1 Process and apparatus for controllably separating framed working area from remainder of the membrane |
| 03/03/1993 | EP0529826A1 Optical pellicle holder |
| 03/03/1993 | EP0529789A1 Negative single sheet color proofing system based on aqueous developable photo-oligomers |
| 03/03/1993 | EP0529697A1 Stripping film material |
| 03/03/1993 | EP0529643A1 Aqueous-developable dry film photoresist |
| 03/03/1993 | EP0529537A1 Intermediate receiver cushion layer |
| 03/03/1993 | EP0529459A1 Dry film process for altering the wavelength of response of holograms |
| 03/03/1993 | EP0529438A1 Apparatus for separating and peeling a foil from a laminated carrier material |
| 03/03/1993 | EP0529362A1 Method of making thermally transferred color filter arrays with incorporated black matrix using electronic light flash |
| 03/03/1993 | EP0529361A1 Radiation-curing resin composition |
| 03/03/1993 | EP0528969A1 Unit magnification optical system with improved reflective reticle |
| 03/03/1993 | EP0528791A1 Step and repeat camera/projector machine |
| 03/02/1993 | US5191535 Mask control system |
| 03/02/1993 | US5191374 Exposure control apparatus |
| 03/02/1993 | US5191218 Vacuum-attraction holding device |
| 03/02/1993 | US5191200 Imaging apparatus having a focus-error and/or tilt detection device |
| 03/02/1993 | US5191124 Photoinitiators for Cationic Polymerization |
| 03/02/1993 | US5191069 Polyfunctional compounds containing α-diazo-β-keto ester units and sulfonate units |
| 03/02/1993 | US5190845 Coloring transparent substrates |
| 03/02/1993 | US5190836 Reflection type photomask with phase shifter |
| 03/02/1993 | US5190637 Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
| 03/02/1993 | US5190614 Electromagnetic radiation to measure processing, detection windows |
| 03/01/1993 | CA2076727A1 Alkaline-etch resistant dry film photoresist |
| 02/28/1993 | CA2076601A1 Dry film process for altering the wavelength of response of holograms |
| 02/27/1993 | CA2070354A1 Sensitization of photopolymerizable compositions |
| 02/24/1993 | EP0528785A1 Ion optical imaging system |
| 02/24/1993 | EP0528655A2 Dry-etching method and apparatus |
| 02/24/1993 | EP0528401A1 Positive resist composition |
| 02/24/1993 | EP0528395A1 Presensitized plate for use in making lithographic printing plate |
| 02/24/1993 | EP0528373A1 Apparatus for peeling off a film, laminated to a carrier-material |
| 02/24/1993 | EP0528285A1 Method and apparatus for patterning an imaging member |
| 02/24/1993 | EP0528203A1 Radiation-sensitive composition containing a polymeric binder having units of alpha,beta-unsaturated carboxamides |
| 02/23/1993 | US5189306 Grey-splice algorithm for electron beam lithography post-processor |
| 02/23/1993 | US5188924 Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
| 02/23/1993 | US5188921 Selected block copolymer novolak binder resins in radiation-sensitive resist compositions |
| 02/23/1993 | US5188920 Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound |
| 02/22/1993 | CA2076357A1 Positive resist composition |
| 02/18/1993 | WO1993003423A1 Photosensitive resin composition, production thereof, and flexographic plate material |
| 02/18/1993 | DE4125534A1 Three=dimensional layering - in which transparent sealed cover is used over bath to allow radiation through but exclude ambient atmos. |
| 02/17/1993 | EP0527607A1 Electron beam exposure process for writing a pattern on an object by an electron beam with a compensation of the proximity effect |
| 02/17/1993 | EP0527572A1 Formation of benzocyclobutene resin films |
| 02/17/1993 | EP0527521A1 A silver halide photographic material |
| 02/17/1993 | EP0527369A1 Radiation-sensitive recording material comprising a layer support and a positive-working radiation-sensitive layer having a grained surface |
| 02/17/1993 | EP0527166A1 Illumination device. |
| 02/16/1993 | US5187726 High resolution X-ray lithography using phase shift masks |
| 02/16/1993 | US5187519 Exposure apparatus having mount means to suppress vibrations |
| 02/16/1993 | US5187413 Low pressure discharge lamp apparatus |
| 02/16/1993 | US5187241 Reaction of hydrolyzed polyimide surface (polyamic acids) with an acyl chloride to produce polyisoimides |
| 02/16/1993 | US5187048 Photoresists formed by polymerization of di-unsaturated monomers |
| 02/16/1993 | US5187045 Halomethyl-1,3,5-triazines containing a sensitizer moiety |
| 02/16/1993 | US5187044 Aziridine compound containing primer layer, radiation curable polyurethane elastomer |
| 02/16/1993 | US5187041 Using a photosensitive silver halide, organic silver salt, reducing agent and photopolymerizable monomer |
| 02/16/1993 | US5187040 Photocurable mixture and material containing diazonium salt polycondensation product or organic azido compound photosensitizer and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| 02/16/1993 | US5186801 Forming a transparent, electroconductive layer on a substrate, electrodepositing a negative photosensitive resin layer, exposing to light through a mask developing and repeating for each color |
| 02/16/1993 | US5186788 Coating a semiconductor substrate with a high molecular weight organic resist then a developer insoluble positive resist, irradiation such that positive resist becomes soluble, exposing positive resist to electron or focused ion beam |
| 02/16/1993 | US5186787 Depositing releasable hard coating on carrier, depositing vacuum coating on the hardcoat, etching image, removing vacuum deposited coating |
| 02/11/1993 | DE4203557A1 Resist pattern coating on substrate by deep UV lithography - comprises coating substrate with anti-reflection coating contg. new organo:silane cpd., applying resist, and selectively exposing |
| 02/11/1993 | DE4126514A1 Cleaning appts. for printed circuit board - feeds board by roller pairs through spray generated by nozzles, with fluid collected in container |
| 02/10/1993 | EP0527058A1 Apparatus for controlling a developing solution |
| 02/10/1993 | EP0527043A1 Catadioptric reduction projection optical system |
| 02/10/1993 | EP0527018A1 Method and apparatus for measuring positional deviation |
| 02/10/1993 | EP0527008A1 Curable silicone composition |
| 02/10/1993 | EP0526902A1 Process for producing multicolor display |
| 02/10/1993 | EP0526867A1 Process for making a cylindrical embossing tool |
| 02/10/1993 | EP0526650A1 Photosensitive polymer composition and pattern formation |