| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/13/1992 | CA1308595C Photosensitive composition |
| 10/13/1992 | CA1308594C Thermally stable photoresists with high sensitivity |
| 10/11/1992 | CA2065640A1 Polyamide resins and their use in relief printing |
| 10/10/1992 | CA2065478A1 Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith |
| 10/10/1992 | CA2065477A1 Radiation-sensitive composition containing esters of (1,2-naphthoquinone 2-diazide)-sulfonic acid and a radiation-sensitive recording material prepared therewith |
| 10/10/1992 | CA2065475A1 Radiation-sensitive ester and process for its preparation |
| 10/08/1992 | DE4110808A1 Indolizintrimethinfarbstoffe Indolizinetrimethine dyes |
| 10/07/1992 | EP0507589A2 System for processing lithographic information |
| 10/07/1992 | EP0507487A2 Optical projection exposure method and system using the same |
| 10/07/1992 | EP0507181A1 Process for the fabrication of colour-proofs and light sensitive material therefor |
| 10/07/1992 | EP0507043A2 Selective and precise etching and plating of conductive substrates |
| 10/07/1992 | EP0507008A1 Lithographic printing plate based on a resin comprising aryldiazosulfonates |
| 10/07/1992 | EP0506959A1 Method of engraving with image mask and photosensitive laminate film for said image mask |
| 10/07/1992 | EP0430992A4 Photocurable compositions and method of investment casting |
| 10/07/1992 | CN1065143A Negative photosensitive printed board and its making method |
| 10/06/1992 | US5153916 Method and apparatus for detecting focal plane |
| 10/06/1992 | US5153898 X-ray reduction projection exposure system of reflection type |
| 10/06/1992 | US5153773 Illumination device including amplitude-division and beam movements |
| 10/06/1992 | US5153678 Method of determining regularity of a pattern array to enable positioning of patterns thereof relative to a reference position |
| 10/06/1992 | US5153634 Copying apparatus |
| 10/06/1992 | US5153494 Ultrafast electro-dynamic x, y and theta positioning stage |
| 10/06/1992 | US5153419 Device for detecting position of a light source with source position adjusting means |
| 10/06/1992 | US5153323 Halomethyl-1,3,5-triazines containing a photoinitiator moiety |
| 10/06/1992 | US5153236 Photopolymerizable composition |
| 10/06/1992 | US5153103 Coating a copolymer of silicon-containing acrylate and alpha-trifluoromethyl acrylate, baking, radiation exposing |
| 10/06/1992 | US5153102 Blend of acrylic copolymer, photopolymerizable monomer, melamine compound and free radical photoinitiator |
| 10/06/1992 | US5153101 Photoresist |
| 10/06/1992 | US5153100 Borate coinitiators for photopolymerizable compositions |
| 10/06/1992 | US5153097 Light-sensitive material for lithographic printing plate and process for making printing plate |
| 10/06/1992 | US5153096 Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide |
| 10/06/1992 | US5153095 Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain |
| 10/06/1992 | US5152834 Reacting crosslinked polysiloxane with organosilicon adhesion promoter yields damage resistant storage stable coating for semiconductors |
| 10/06/1992 | US5152225 Method of making a printing film and printing process using same |
| 10/06/1992 | CA1308385C Apparatus and method for separating adherent films |
| 10/06/1992 | CA1308293C Thin film artwork compounds |
| 10/01/1992 | WO1992016877A1 Resist formation |
| 10/01/1992 | DE4209873A1 Positive and negative photocopy prodn. - by exposure to change adhesion between light heat transformation coat and copying coat and image transfer |
| 10/01/1992 | DE4140712A1 Optical disc and prodn. esp. small scale prodn. of audio-visual disc - by laser exposure of photoresist contg. resin, light-sensitive cpd. and ballast cpd. |
| 09/30/1992 | EP0506616A1 Photosensitive acrylate mixture |
| 09/30/1992 | EP0506593A1 Uniformly coated photoresist compositions |
| 09/30/1992 | EP0506432A1 Polysilane and polysilane composition |
| 09/30/1992 | EP0506337A1 Coating apparatus |
| 09/30/1992 | EP0506114A1 Scanning exposure apparatus |
| 09/30/1992 | EP0505987A1 Polyhydric phenol compound and positive resist composition comprising the same |
| 09/30/1992 | EP0505903A1 A photosensitive composition for offset lithography plates |
| 09/30/1992 | EP0505894A1 Coating processes and apparatus |
| 09/30/1992 | EP0505865A2 Method of exposing printing plates |
| 09/30/1992 | EP0505757A1 Process for making microstructures having a high aspect ratio |
| 09/29/1992 | WO1992017820A1 Photodefinable interlevel dielectrics |
| 09/29/1992 | US5151928 Method and apparatus for generating x rays |
| 09/29/1992 | US5151750 Alignment apparatus |
| 09/29/1992 | US5151749 Method of and apparatus for measuring coordinate position and positioning an object |
| 09/29/1992 | US5151584 Method and apparatus for endpoint detection in a semiconductor wafer etching system |
| 09/29/1992 | US5151520 Cationic dye-triarylmonoalkylorate anion complexes |
| 09/29/1992 | US5151341 Radiation-sensitive mixture and production of relief structures |
| 09/29/1992 | US5151340 Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures |
| 09/29/1992 | US5151339 Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin |
| 09/29/1992 | US5151219 Solvents for photoresists |
| 09/29/1992 | US5151153 Multilayer element with patterns on a conveyor and etching |
| 09/29/1992 | CA2105657A1 Photodefinable interlevel dielectrics |
| 09/28/1992 | WO1992017821A1 Lithographic printing plates |
| 09/28/1992 | CA2098376A1 Lithographic printing plates |
| 09/26/1992 | CA2062861A1 Polyhydric phenol compound and positive resist composition comprising the same |
| 09/24/1992 | DE4109239A1 Microcapsules for photographic colour transfer process - contg. di to hexa:(meth)acrylate] of dicyclopentodiene deriv. for high photo-cure speed |
| 09/23/1992 | EP0505291A2 Heat-fixing apparatus for color video printer |
| 09/23/1992 | EP0505227A2 Method for making resist patterns for large area circuit base |
| 09/23/1992 | EP0505161A1 Photosensitive polymer composition |
| 09/23/1992 | EP0505155A1 Heat-developable masking layer |
| 09/23/1992 | EP0505144A1 X-ray lithography mask, light exposure apparatus and process therefor |
| 09/23/1992 | EP0505101A1 Sub-micron imaging |
| 09/23/1992 | EP0505094A1 Speed stabilised positive-acting photoresist compositions |
| 09/23/1992 | EP0504824A1 Photosensitive printing element |
| 09/23/1992 | EP0504759A1 Photoresist pattern-forming process suitable for integrated circuit production |
| 09/23/1992 | EP0504724A1 Positive resist composition |
| 09/23/1992 | EP0504569A2 Method of coating or sealing of electronic components or component groups |
| 09/23/1992 | EP0504431A1 Method of removing organic coating |
| 09/23/1992 | EP0504419A1 Photosensitive azo compound and image forming device utilizing the same |
| 09/23/1992 | EP0504365A1 Processing method for fabricating electrical contacts to mesa structures in semiconductor devices |
| 09/22/1992 | US5150391 Exposure apparatus |
| 09/22/1992 | US5150370 Narrow-band laser apparatus |
| 09/22/1992 | US5150253 Reflective mirror having cooling unit attached thereto |
| 09/22/1992 | US5150154 Apparatus for forming images discharge lamp and current, tone and temperature control means |
| 09/22/1992 | US5150153 Lithographic device with a suspended object table |
| 09/22/1992 | US5150152 Exposure apparatus including device for determining movement of an object |
| 09/22/1992 | US5150151 Reflecting device and pattern transfer apparatus using the same |
| 09/22/1992 | US5149975 Pattern fabrication method using a charged particle beam and apparatus for realizing same |
| 09/22/1992 | US5149776 Cross-linking hardenable resin composition, metal laminates thereof and metal surface processing method therewith |
| 09/22/1992 | US5149617 Imageable diacetylene ethers |
| 09/22/1992 | US5149616 5,7-Dodecadiyn-1,12-Bis/Isopropyl Carbamate/ Homopolymer |
| 09/22/1992 | US5149615 Applying multicoat of chromium adhesion, gold plating seed, polyimide dielectric, passivation layer and electroplated copper conductors; patterning, dissolving, exposing and etching to form desired integrated circuit |
| 09/22/1992 | US5149614 Developer compositions for ps plates and method for developing the same wherein the developer composition contains a surfactant having an aryl group, an oxyalkylene group and a sulfate ester or sulfonic acid group |
| 09/22/1992 | US5149613 Process for producing images on a photosensitive material |
| 09/22/1992 | US5149397 Fabrication methods for micromechanical elements |
| 09/22/1992 | CA1307695C Photosensitive compounds and thermally stable and aqueous developablenegative images |
| 09/21/1992 | WO1992016822A2 Fluid cooled contact mask |
| 09/21/1992 | CA2106477A1 Fluid cooled contact mask |
| 09/21/1992 | CA2063296A1 Photosensitive printing element |
| 09/21/1992 | CA2062479A1 Photoresist pattern-forming process suitable for integrated circuit production |
| 09/17/1992 | WO1992015924A1 Methods for photolithography and development analysis |
| 09/17/1992 | WO1992015923A1 Use of diffracted light from latent images in photoresist for exposure control |