Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/05/1992 | US5111237 Image forming apparatus |
05/05/1992 | US5110711 Electron resists; epoxidized polysilsesquioxanes |
05/05/1992 | US5110709 Light-sensitive positive working composition containing a pisolfone compound |
05/05/1992 | US5110708 Positives |
05/05/1992 | US5110706 I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive |
05/05/1992 | US5110697 Multifunctional photolithographic compositions |
05/05/1992 | US5110391 Method and apparatus for automatically bonding film to a substrate and cutting the film to desired size |
05/05/1992 | US5110384 Process for making electrically conductive patterns |
05/05/1992 | CA1300307C Photopolymerisation by means of organometallic salts |
05/05/1992 | CA1300294C Radiation-polymerizable composition |
05/01/1992 | CA2054320A1 Ink composition and process for producing a lithographic printing plate using the same |
05/01/1992 | CA2052848A1 Dual laminate process for thermal color proofing |
05/01/1992 | CA2052828A1 Intermediate receiver release layer |
04/30/1992 | WO1992007303A1 Method of engraving with image mask and photosensitive laminate film for said image mask |
04/30/1992 | WO1992007298A1 Imageable recording films |
04/30/1992 | WO1992007297A1 Laser imageable composition |
04/30/1992 | WO1992007032A1 Processless imaging to maximize blue light absorption of an image |
04/30/1992 | WO1992006951A1 Diacetylene ethers |
04/29/1992 | EP0482835A1 Printable transparency |
04/29/1992 | EP0482653A1 Plate surface correcting solution for dry lithographic printing plate |
04/29/1992 | EP0482612A1 Method of coating sensitizing solution on metal plate for use in manufacture of color cathode ray tube and coating apparatus |
04/29/1992 | EP0482553A2 Measuring device for x,y, gamma alignment tables |
04/29/1992 | EP0482479A2 Method and apparatus for processing photosensitive material |
04/29/1992 | EP0482051A1 Laser machining. |
04/29/1992 | CN1016467B Photosensitive compositions containing microgels |
04/28/1992 | US5109479 Method of designing three dimensional electrical circuits |
04/28/1992 | US5109430 Mask alignment and measurement of critical dimensions in integrated circuits |
04/28/1992 | US5109149 Laser, direct-write integrated circuit production system |
04/28/1992 | US5108875 Photoresist pattern fabrication employing chemically amplified metalized material |
04/28/1992 | US5108874 For enhancing the contrast of images in manufacture of integrated circuits |
04/28/1992 | US5108871 Lithographic printing plate material improved in water retention characteristics |
04/28/1992 | US5108870 Positive-working photoresist composition containing purified broadband dye and process of using |
04/28/1992 | US5108868 Negative working, peel developable, single sheet color proofing method |
04/28/1992 | US5108858 High light sensitivity, reduced thermosensitivity and "dark" hardening; snesitizer that is chromium ion migration enhancer7 |
04/26/1992 | CA2053761A1 Borate coinitiators for photopolymerizable compositions |
04/25/1992 | CA2053984A1 Photopolymerizable composition and photosensitive lithographic printing plate |
04/23/1992 | DE4132288A1 Paper and ink for repeated printing and erasing - uses arrangement which can be changed from visible to invisible state such as a layer of photochromic material |
04/23/1992 | DE4033215A1 Novel photoinitiator cpds. - comprise acyl-(2'-hydroxybiphenyl-2-yl)- phosphinic acid salts |
04/22/1992 | EP0481827A2 Color filters |
04/22/1992 | EP0481709A1 Negative type photosensitive electrodepositing resin composition |
04/22/1992 | EP0481562A1 A negative type lithographic printing plate |
04/22/1992 | EP0481548A1 Patterned receiver for color filter array |
04/22/1992 | EP0481539A1 Process for forming a filter |
04/22/1992 | EP0481506A2 Method of treating substrate and apparatus for the same |
04/22/1992 | EP0258284B1 Installation for coating and drying both sides of printed circuit boards or similar structures |
04/22/1992 | EP0190227B1 Product and process for producing an image on a substrate |
04/22/1992 | CN1016381B Photosensitive compositions containing microcapsules concentrated in surface layer |
04/21/1992 | US5107524 Synchrotron radiation utilizing apparatus and method for utilizing synchrotron radiation |
04/21/1992 | US5107298 Image transferring method |
04/21/1992 | US5107295 Image forming apparatus |
04/21/1992 | US5107294 Image recording apparatus having detection unit for detecting malfunction of take-up roller |
04/21/1992 | US5107275 Exposure control system |
04/21/1992 | US5106932 Polymers usable as positive photoresists |
04/21/1992 | US5106786 Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide |
04/21/1992 | US5106724 Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive-type and developer composition for light-sensitive material |
04/21/1992 | US5106723 Photoresist composites; patterning, photobleaching, stripping developing |
04/21/1992 | US5106722 Photoiniators having cyclopentadieneyl or indenyl groups and fluorinated aryl or heterocyclic ring; photoresists of unsaturated compounds |
04/21/1992 | US5106720 Hydroxylated polyamide and(or) polyimide binder, photopolymerizable compound and photoinitiator |
04/21/1992 | US5106718 Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound |
04/21/1992 | US5106455 Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography |
04/21/1992 | US5106450 Dry film resist transport and lamination system for semiconductor wafers |
04/21/1992 | US5106288 Laser based plastic model making workstation |
04/20/1992 | WO1992006983A1 Acyl-(2'-hydroxydiphenyl-2-yl)-phosphinic acid salts, their production and use |
04/20/1992 | CA2094238A1 Acyl-(2'-hydroxydiphenyl-2-yl) -phosphinic acid salts, their production and use |
04/20/1992 | CA2053701A1 Image reproduction process using a peel-apart photosensitive element |
04/19/1992 | CA2053094A1 Erasible and reprintable paper and ink, and printing and erasing system using such paper and ink |
04/16/1992 | WO1992006489A1 Method of removing organic coating |
04/16/1992 | WO1992006412A1 Photopolymerizable composition and photopolymerizable element |
04/16/1992 | WO1992006410A1 Improved ablation-transfer imaging/recording |
04/16/1992 | WO1992006354A1 Full surface interferometric testing instrument |
04/16/1992 | WO1992006074A1 Photosensitive azo compound and image forming device utilizing the same |
04/16/1992 | DE4133770A1 Positive photoresist giving good pattern profile with deep UV - comprises hydroxy gp.-contg. resin, photochemical acid-former and acid-decomposable dissolution inhibitor |
04/16/1992 | DE4133742A1 Pattern formation with deep ultraviolet core - using photoresist comprising hydroxyl gp.-contg. resin, photochemical acid-former and hydroxyl-contg. ester] |
04/15/1992 | EP0480617A2 X-Ray Ringfield lithography |
04/15/1992 | EP0480616A2 Projection exposure apparatus with a device for compensating aberration of a projection lens |
04/15/1992 | EP0480486A2 Thin film coating method |
04/15/1992 | EP0480388A2 Light-sensitive litho printing plate requiring no dampening water |
04/15/1992 | EP0480335A2 Light curable elastomer composition and recording material obtained therefrom for the production of relief printing plates |
04/15/1992 | EP0480311A1 Radiation-sensitive mixture containing an acid-cleavable group and process for obtaining relief patterns and images |
04/15/1992 | EP0480287A1 Process for the production of relief patterns and relief images |
04/15/1992 | EP0480183A2 Method and apparatus for writing or etching narrow linewidth patterns on insulating materials |
04/15/1992 | EP0480154A2 Thermally stable photoimaging composition |
04/15/1992 | EP0480073A1 Method and device for making photosensitive resin form plate |
04/15/1992 | EP0479968A1 X-ray imaging system. |
04/15/1992 | CN1060362A Colour printing method |
04/14/1992 | US5105215 Liquid crystal programmable photoresist exposure system |
04/14/1992 | US5105214 Image forming apparatus using mask original form |
04/14/1992 | US5105075 Projection exposure apparatus |
04/14/1992 | US5104961 Perfluoroalkyl group-containing polymers and reproduction layers produced therefrom |
04/14/1992 | US5104944 Process for nucleophilic derivatization of materials having an imide group conjugated to an aromatic moiety |
04/14/1992 | US5104773 Preparing highly thermoresistant relief structures |
04/14/1992 | US5104772 Coating with solution containing radiation sensitive resist and ultra violet absorber, then controlled exposure to prevent backscattering and deterioration |
04/14/1992 | US5104770 Positive-working photoresist compositions |
04/14/1992 | US5104768 Positive photoresist composition containing radiation sensitive quinonediazide compound and completely esterified polyamic acid polymer |
04/14/1992 | US5104592 Method of and apparatus for production of three-dimensional objects by stereolithography with reduced curl |
04/14/1992 | US5104479 Selective irradiation of layer containing copolymer of silane-substituted acrylic ester and acrylic ester or nitrile having electron attracating group |
04/14/1992 | US5103557 Making and testing an integrated circuit using high density probe points |
04/14/1992 | CA1298761C Device fabrication method using spin-on glass resins and devices formed thereby |
04/14/1992 | CA1298728C Optical memory element and manufacturing method thereof |
04/12/1992 | CA2053161A1 Light-sensitive litho printing plate requiring no dampening water |