Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/1993
01/17/1993CA2073155A1 Dual curing composition and use thereof
01/14/1993DE4122156A1 Forming decorative figures on stainless steel products
01/13/1993EP0523033A1 Ion optical imaging system
01/13/1993EP0522990A1 Top antireflective coating films
01/13/1993EP0522865A2 Container for a plate-like article
01/13/1993EP0522787A1 Fabrication methods for micromechanical elements
01/13/1993EP0522616A1 Method for producing images using a photopolymerizable composition
01/13/1993EP0522568A1 Photopolymerizable composition and photosensitive lithographic printing plate
01/13/1993EP0522457A1 Photosensitive composition
01/13/1993EP0522175A1 Photopolymerizable composition
01/13/1993EP0521935A1 Coating material with negative effect, which can be developed in water, precipitated by electrophoresis and hardened by light, and its use to manufacture conductive tracks
01/13/1993EP0521911A1 Method and device for moving molecules by the application of a plurality of electrical fields
01/13/1993CA2072702A1 Aqueous photosensitive resin composition and print obtained by using the same
01/12/1993US5179408 Microencapsulated media supply and utilization apparatus and method
01/12/1993US5179405 Replenisher supply device for photosensitive planographic printing plate processing apparatus
01/12/1993US5179185 High purity hydroxy-terminated phenyl ladder polysiloxane and method for producing the same
01/12/1993US5178989 Pattern forming and transferring processes
01/12/1993US5178988 Photoimageable permanent resist
01/12/1993US5178987 Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin
01/12/1993US5178986 Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol
01/12/1993US5178985 Image forming method combining heat and pressure to produce a color image
01/12/1993US5178979 Image transferring medium
01/12/1993US5178978 Fabricating integrated optics
01/12/1993US5178974 Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams
01/12/1993US5178963 Hydrophilic copolymers and their use in reprography
01/12/1993CA2073494A1 Photopolymerizable composition and photosensitive lithographic printing plate
01/12/1993CA1312496C Positive-working color proofing film and process
01/12/1993CA1312495C Method and apparatus for processing and transporting sheet materials
01/10/1993CA2073324A1 Method for producing color filter
01/07/1993WO1993000614A1 Small field scanner
01/07/1993WO1993000613A1 Image formation apparatus
01/07/1993WO1993000307A1 Synthetic quartz glass optical member for excimer laser and production thereof
01/07/1993EP0528969A4 Unit magnification optical system with improved reflective reticle.
01/07/1993EP0521713A1 Manufacture of a micromechanical element with two degrees of freedom
01/07/1993EP0521649A2 Method of making patterns
01/07/1993EP0521360A2 Process and composition for cladding optic fibres
01/07/1993EP0521296A1 Protected photosensitive recording films
01/07/1993EP0521083A1 Mirrors
01/07/1993DE4122733A1 Image reversal resist used to produce reverse resist - contains naphthoquinone di:azide cpd., oligomer of oxa:cycloalkane as crosslinker and novolak or polyvinyl-phenol] resin binder
01/07/1993DE4121303A1 Cleaning agent for sieves for filtering solder pastes etc. - comprises low boiling point alcohol(s), limonene and surface active additives
01/05/1993US5177527 Image forming apparatus
01/05/1993US5177514 Apparatus for coating a photo-resist film and/or developing it after being exposed
01/05/1993US5177476 Methods of fabricating dual anode, flat panel electrophoretic displays
01/05/1993US5177218 Photochromic benzothioxanthone oxides, process for their preparation and the use thereof
01/05/1993US5177181 Diamines and photosensitive polyimides made therefrom
01/05/1993US5177172 Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions
01/05/1993US5177171 Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
01/05/1993US5177056 Plastics composition containing superconductors
01/05/1993US5176986 Liquid cleaner composition for removing polymeric materials from a surface
01/05/1993US5176985 Reaction product, preparation thereof and radiation-sensitive material obtained therewith
01/05/1993US5176984 Photohardenable compositions containing a borate salt
01/05/1993US5176982 Keto-silane compound
01/05/1993US5176973 Low optical dot gain pre-press proofs wherein the first down adhesive layer thickness is at least twice that of any additional thin adhesive layer
01/05/1993US5176970 Virtually distortion-free imaging system for large field, high resolution lithography
01/05/1993US5176782 Apparatus for photochemically ashing a photoresist
01/05/1993US5176081 Method and an apparatus for individual transport of offset printing plates
01/05/1993CA2073147A1 Photosensitive composition
12/1992
12/30/1992EP0520793A1 Method of treating waste solution of non-silver halide light-sensitive material
12/30/1992EP0520760A1 Method for producing orifice plate
12/30/1992EP0520654A1 Deep UV light sensitive positive photoresist compositions
12/30/1992EP0520642A1 Resist material and pattern formation process
12/30/1992EP0520631A2 Micromechanical magnetic devices and method of producing the same
12/30/1992EP0520626A1 Radiation-sensitive resin composition
12/30/1992EP0520606A1 Photosensitive coating composition
12/30/1992EP0520574A1 Thioxanthone derivatives
12/30/1992EP0520437A1 Method of printing an image on a substrate particularly useful for producing printed circuit boards
12/30/1992EP0520364A1 Photopolymerizable composition
12/30/1992EP0520332A1 Printing press with a printing form to be deleted
12/30/1992EP0520319A1 Apparatus for making contact prints
12/30/1992EP0520265A2 Positive working radiation-sensitive composition with disulfone acid generators
12/30/1992EP0483277A4 Improving holographic lithography
12/30/1992EP0252150B1 Photosensitive resin composition for screen process
12/30/1992CA2072530A1 Method of making patterns
12/29/1992US5175757 Apparatus and method to enhance X-ray production in laser produced plasmas
12/29/1992US5175755 Use of a kumakhov lens for x-ray lithography
12/29/1992US5175079 Optical memory device
12/29/1992US5175078 Positive type photoresist developer
12/29/1992US5175076 Water-developable photosensitive composition for producing relief plates
12/29/1992US5175075 Positron beam lithography
12/29/1992US5175072 Flexographic printing plate process
12/29/1992US5174943 Repeated computer controlled irradiation polymerization of surface layers yields plastic parts
12/29/1992US5174856 Stripping by exposure to oxygen and ammonia gas
12/29/1992US5174843 Matrix support article shaping system and method
12/29/1992CA2064159A1 Photosensitive coating composition
12/25/1992CA2068021A1 Process and composition for cladding optic fibers
12/24/1992DE4217811A1 Laser beam cutting device for cutting PCB holes - has reflector arrangement ensuring uniform beam distribution over mask surface
12/23/1992WO1992022855A1 Photolithographically patterned fluorescent coating
12/23/1992WO1992016822A3 Fluid cooled contact mask
12/23/1992EP0519591A1 Aqueous developable imaging systems
12/23/1992EP0519439A2 Binders for diazo resins
12/23/1992EP0519299A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith
12/23/1992EP0519298A1 Radiation-sensitive sulfonic acid esters and their use
12/23/1992EP0519297A2 Radiation-sensitive composition comprising as binders novel polymers with units derived from amides of alpha,beta-unsaturated carboxylic acids
12/23/1992EP0519128A1 A positive type, photosensitive resinous composition
12/23/1992EP0519123A1 A method for making a lithographic aluminium offset printing plate by the silver salt diffusion transfer process
12/23/1992CN1019572B Benzophenone derivatives
12/22/1992US5173457 Paste compositions
12/22/1992US5173452 Process for the vapor deposition of polysilanes photoresists
12/22/1992US5173393 Etch-resistant deep ultraviolet resist process having an aromatic treating step after development
12/22/1992US5173390 Water soluble contrast enhancement composition and method of use