| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/12/1992 | CA2051517A1 Patterned receiver for color filter array |
| 04/11/1992 | CA2045249A1 Filter, process for forming same, and solid state imager incorporating this filter |
| 04/09/1992 | DE4031254A1 New quinoline aza methine dyestuff cpds. for use in transfer - by diffusion or sublimation, for dyeing synthetic material or making colour filter or toner |
| 04/08/1992 | EP0479068A1 Chinolinmethin dyes and process for their thermal transfer |
| 04/08/1992 | EP0465562A4 A near infrared laser absorbing coating and method for using same in color imaging and proofing |
| 04/07/1992 | US5103342 Apochromatic lens system |
| 04/07/1992 | US5103316 Method for the simultaneous optical storage of a first image, optical retrieval and latent formation of a second image, and development of a latent third image |
| 04/07/1992 | US5103257 Process for producing or inspecting micropatterns on large-area substrates |
| 04/07/1992 | US5103256 Image forming apparatus using mask original form |
| 04/07/1992 | US5103255 Image recording apparatus for inhibiting the deterioration of photosensitive recording medium |
| 04/07/1992 | US5103101 Multiphase printing for E-beam lithography |
| 04/07/1992 | US5102959 Auto-photocrosslinkable copolyimides and polyimide compositions |
| 04/07/1992 | US5102777 Resist stripping |
| 04/07/1992 | US5102776 Method and apparatus for microlithography using x-pinch x-ray source |
| 04/07/1992 | US5102775 Sensitizer, water insoluble photoinitiator and nitrogen containing compound |
| 04/07/1992 | US5102774 Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions |
| 04/07/1992 | US5102773 Photosensitive recording material comprising carboxyl-containing polymeric binder having ethylenically unsaturated side groups and β-amino alcohols |
| 04/07/1992 | US5102772 Heat resistance, shelf life |
| 04/07/1992 | US5102771 Containing photoinitiator and polymer containing alkoxyalkyl ester groups |
| 04/07/1992 | US5102702 Binder mixtures crosslinkable by radiation |
| 04/07/1992 | US5102688 Fine pattern forming process |
| 04/07/1992 | US5102519 Process for preparing a printed-circuit board |
| 04/07/1992 | US5102491 Wet lamination process and apparatus |
| 04/07/1992 | CA1298522C Aziridine-treated articles |
| 04/07/1992 | CA1298511C Solvent developable photoresist film |
| 04/07/1992 | CA1298510C Light-sensitive material and a process for producing negative copies utilizing the material |
| 04/06/1992 | WO1992006413A1 Printing plate protectant |
| 04/06/1992 | CA2093234A1 Printing plate protectant |
| 04/02/1992 | WO1992005209A1 Copolymerization process and optical copolymer produced therefrom |
| 04/02/1992 | WO1992005033A1 Device for making cylinder for gravure printing and method of smoothing said cylinder |
| 04/02/1992 | EP0502128A4 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists. |
| 04/02/1992 | DE4029609A1 Etch-resistant pattern formation on substrate - by formation of photoresist layer on carrier substrate, formation of pattern in photoresist layer, lamination onto receiving substrate, etc. |
| 04/01/1992 | EP0478480A1 Monomers, polymers and possibly orientated materials derived thereof for non-linear optics and process for their preparation |
| 04/01/1992 | EP0478321A1 Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern |
| 04/01/1992 | EP0477890A2 Processing method and apparatus |
| 04/01/1992 | EP0477691A2 Positive-type photoresist composition |
| 04/01/1992 | EP0477686A1 Photosensitive recording material |
| 04/01/1992 | EP0477442A1 A method for forming plate characters in a half-tone gravure platemaking process |
| 04/01/1992 | EP0477441A1 A method for forming plate characters in a half-tone gravure platemaking process |
| 03/31/1992 | US5101454 Light emitting diode with multifaceted reflector to increase coupling efficiency and alignment tolerance |
| 03/31/1992 | US5101420 Lithography and masking |
| 03/31/1992 | US5101297 Method for producing a diffraction grating in optical elements |
| 03/31/1992 | US5101053 Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation |
| 03/31/1992 | US5101032 Sensitizers for photopolymerization and electrography |
| 03/31/1992 | US5100928 Compositions containing organic-soluble xanthene dye photoinitiators |
| 03/31/1992 | US5100768 Photosensitive composition |
| 03/31/1992 | US5100767 Epoxy resins |
| 03/31/1992 | US5100764 Patterned ceramic films on silicon wafers |
| 03/31/1992 | US5100763 Water developable photosensitive resin composition, and resin or printing plate therefrom |
| 03/31/1992 | US5100762 Radiation-sensitive polymer and radiation-sensitive composition containing the same |
| 03/31/1992 | US5100760 High contast images, photography, azo compound is photoinitiator |
| 03/31/1992 | US5100758 Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent |
| 03/31/1992 | US5100757 Method for forming a colored image on a degradable sheet material |
| 03/31/1992 | US5100756 Image forming medium coated with microcapsules having photocurable composition |
| 03/31/1992 | US5100755 Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators |
| 03/31/1992 | US5100599 Method for producing thin film particulates of controlled shape |
| 03/31/1992 | US5100508 Exposure of one section at a time, no repeat exposure for same area, semiconductor wiring patterns |
| 03/31/1992 | US5100503 Silica-based anti-reflective planarizing layer |
| 03/31/1992 | US5099782 Apparatus for forming a coating of a viscous liquid on an object |
| 03/31/1992 | US5099557 Removal of surface contaminants by irradiation from a high-energy source |
| 03/31/1992 | CA1298414C Linewidth loss measurement |
| 03/31/1992 | CA1298145C Photosensitive flexographic printing plate |
| 03/26/1992 | DE4131698A1 Photosensitive compsn. used esp. as photoresist - contg. chloromethyl-styrene¨-maleimide copolymer and photosensitiser developed with aq. alkali |
| 03/26/1992 | DE4129924A1 Photosensitive material contg. antioxidant - used to stabilise system based on microcapsules, giving clear print |
| 03/25/1992 | EP0476887A2 Composite black and white substrate for color proofing films |
| 03/25/1992 | EP0476865A1 Resist material and process for forming pattern using the same |
| 03/25/1992 | EP0476840A1 Process for fabricating a device |
| 03/25/1992 | EP0476519A1 Photopolymerisable composition and recording material produced therefrom |
| 03/25/1992 | EP0476187A1 A highly photosensitive imaging element based on a photosensitive resin |
| 03/25/1992 | EP0476086A1 Orange filter dye and filter element for color filter arrays |
| 03/25/1992 | EP0476014A1 Very large scale immobilized polymer synthesis. |
| 03/24/1992 | US5099358 Apparatus for recording image including an afocal optical system |
| 03/24/1992 | US5099272 Image recording apparatus with a developer coating device |
| 03/24/1992 | US5099133 Charged particle beam exposure method and apparatus |
| 03/24/1992 | US5099116 Optical device for measuring displacement |
| 03/24/1992 | US5099007 Light-sensitive quinone diazide compound containing an alkylimidazole group and method of forming a photoresist using said compound |
| 03/24/1992 | US5098816 Method for forming a pattern of a photoresist |
| 03/24/1992 | US5098815 Process for the production of dielectric layers in planar circuits on ceramics substrates |
| 03/24/1992 | US5098814 Laminate for the formation of beam leads for IC chip bonding |
| 03/24/1992 | US5098806 Photosensitive elements based on polymeric matrices of diacetylenes and spiropyrans and the use thereof as coatings to prevent document reproduction |
| 03/24/1992 | US5098803 Photopolymerizable compositions and elements for refractive index imaging |
| 03/24/1992 | US5098594 Nonflammable solvents of ethylene carbonate and propylene carbonate with an aprotic polar compound |
| 03/24/1992 | US5098527 Method of making electrically conductive patterns |
| 03/24/1992 | CA1297950C Optical communication system, particularly in the subcriber area |
| 03/23/1992 | CA2051971A1 Photosensitive recording material |
| 03/19/1992 | WO1992005474A1 Top coat for acid catalyzed resists |
| 03/19/1992 | WO1992004291A1 Method of endpoint detection and structure therefor |
| 03/19/1992 | WO1992001973A3 Embossing tool |
| 03/19/1992 | DE4107926A1 Positive photosensitive lacquer-resistant to plasma etching - comprises selected 1,2-naphtho:quinone-2-di:azide, phenol¨ resin, silicon-contg. substd. benzoic acid and solvent |
| 03/19/1992 | DE4029225A1 Offset printing plate for printing with wiping water - has covering layer with hydrophobic, hydrophobic and oleophilic components |
| 03/19/1992 | CA2090039A1 Top coat and acid catalyzed resists |
| 03/18/1992 | EP0475903A1 Acid labile solution inhibitors and positively and negatively working radiation sensitive composition based on them |
| 03/18/1992 | EP0475617A1 Substrate transfer method |
| 03/18/1992 | EP0475384A1 Spray development process |
| 03/18/1992 | EP0475287A2 Process for defined etching of substrates |
| 03/18/1992 | EP0475153A1 Borate coinitiators for photopolymerizable compositions |
| 03/18/1992 | EP0475086A1 Photo-sensitive polymer composition |
| 03/18/1992 | EP0475020A2 Field compensated lens |
| 03/18/1992 | EP0474922A1 Photographic DTR mono-sheet material |
| 03/18/1992 | EP0474716A1 Resin composition sensitive to uv radiation and to electrons |