| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/11/1992 | US5137758 Apparatus and method for coating flexible sheets while inhibiting curl |
| 08/11/1992 | US5137751 Process for making thick multilayers of polyimide |
| 08/11/1992 | US5137662 Method and apparatus for production of three-dimensional objects by stereolithography |
| 08/11/1992 | US5137349 Projection-type optical apparatus |
| 08/11/1992 | US5136970 Coating apparatus with vertically movable solution receiver |
| 08/11/1992 | CA1306140C Method of forming an image with photographic likeness on chocolate |
| 08/11/1992 | CA1306138C High contrast low metal ion photoresist developing method and composition |
| 08/11/1992 | CA1306137C Silver-based electrostatic printing master |
| 08/11/1992 | CA1306136C Color filter arrays |
| 08/06/1992 | WO1992013008A1 Photopolymerizable composition |
| 08/06/1992 | WO1992011322A3 Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications |
| 08/06/1992 | DE4103236A1 Illumination unit for copier, cine projector or projection lithography - uses extended light source in rotationally symmetrical reflector with prim. focal point and sec. focal turns in which shutter and refractive element are placed |
| 08/06/1992 | CA2060521A1 Stabilization of thiolene compositions |
| 08/05/1992 | EP0497644A1 Lithographic process for semiconductor substrate, specifically for the treatment of a protrusion |
| 08/05/1992 | EP0497552A1 Photopolymerisable compositions |
| 08/05/1992 | EP0497351A1 Presensitized plate for use in making lithographic printing plate |
| 08/05/1992 | EP0497342A2 Negative photoresist composition |
| 08/05/1992 | EP0497311A2 Exposing apparatus and method of forming image |
| 08/05/1992 | EP0497227A2 Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography |
| 08/05/1992 | EP0496891A1 Method and device for optical exposure |
| 08/04/1992 | US5136413 Imaging and illumination system with aspherization and aberration correction by phase steps |
| 08/04/1992 | US5136400 Color copying apparatus and method for copying color image based on surface-finishing condition of the copied medium |
| 08/04/1992 | US5136322 Light-sensitive material processing apparatus |
| 08/04/1992 | US5136167 Electron beam lens and deflection system for plural-level telecentric deflection |
| 08/04/1992 | US5136149 Method of focusing optical head on object body and automatic focusing device for optical inspection system including tilt detection |
| 08/04/1992 | US5135838 Resist materials |
| 08/04/1992 | US5135837 A layer having a liquid polyisoprene plasticizer in a mixture containing a binder, a photoinitiator and an unsaturated monomer |
| 08/04/1992 | US5135836 Crosslinked homo- or copolyolefins coversheet, photohardenable layer, elastomers; peel-apart element |
| 08/04/1992 | US5135827 Continuous processing by screw extruding a melt of a thermoplastic elastomer, an unsaturated compound and a photoinitiator; degassing; calendaring so no rotating bead is formed |
| 08/04/1992 | US5135609 Precise patterning of thin films; identifying, removing microscopically sized tiles; chromium masks for integrated circuits |
| 08/04/1992 | US5134962 Spin coating apparatus |
| 08/02/1992 | WO1992014172A1 Method for manufacturing multiple color display device |
| 08/01/1992 | CA2060228A1 Negative photoresist composition |
| 07/31/1992 | WO1992014190A1 Pre-bake printing plate composition |
| 07/31/1992 | CA2100082A1 Pre-bake printing plate cmposition |
| 07/30/1992 | DE4201765A1 Positive light-sensitive compsn. - contg. e.g. p-styrene-1,2-naphthoquinone-2-di:azido-5-di:sulphonic acid and p-chloro phenyl-1,2-naphthoquinone-2-di:azido-5-di:sulphone |
| 07/30/1992 | DE4201661A1 Semiconductor integrated circuit mfr. - uses a deposited carbon@ film as intermediate layer to improve the accuracy of reproducing sub-micron dimensions |
| 07/29/1992 | EP0496640A1 I-ray sensitive positive resist composition |
| 07/29/1992 | EP0496554A1 Electrodeposition method |
| 07/29/1992 | EP0496442A1 Method of manufacturing a colour filter |
| 07/29/1992 | EP0496397A1 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and polymerization inhibitor releasing compound |
| 07/29/1992 | EP0496203A2 Storage stable solution of a carboxylic groups containing copolymer and procedure for manufacture of photosensitive coatings and offset printing plates |
| 07/29/1992 | EP0496127A1 A negative type lithographic printing plate based on silver salt diffusion transfer |
| 07/28/1992 | USRE34010 Position detection apparatus |
| 07/28/1992 | US5134640 Synchrotron radiation apparatus |
| 07/28/1992 | US5134436 Exposure control method for adjusting the temperature of a workpiece holding chuck attracting surface based on memorized data |
| 07/28/1992 | US5134298 Beam control method and apparatus |
| 07/28/1992 | US5134058 Photoresist |
| 07/28/1992 | US5134057 Method of providing a substrate with a layer comprising a polyvinyl based hydrogel and a biochemically active material |
| 07/28/1992 | US5134056 Multilayer element of positive photoresist covering a solder resist, exposure and removal |
| 07/28/1992 | US5134054 Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate |
| 07/28/1992 | US5134053 Graft polymer with unsaturated lateral chains, photosensitive mixture containing said graft polymer and recording material produced therefrom |
| 07/28/1992 | US5134052 Process for forming images using a low temperature exposure step |
| 07/28/1992 | US5134047 Saponified Polyvinyl Acetate, Addition Condensed Photosensitive and Hydrophobic Groups |
| 07/28/1992 | US5133599 High accuracy linear displacement interferometer with probe |
| 07/28/1992 | CA1305823C Photocurable blends of cyclic ethers and cycloaliphatic epoxides |
| 07/28/1992 | CA1305627C Pellicle |
| 07/23/1992 | WO1992012466A1 Method of forming minute resist pattern |
| 07/23/1992 | WO1992012205A1 Positive resist composition |
| 07/23/1992 | CA2059707A1 Electrodeposition method |
| 07/23/1992 | CA2044165A1 Positive resist composition |
| 07/22/1992 | EP0495752A1 Bisacylphosphine sulfide |
| 07/22/1992 | EP0495751A1 Bisacylphosphines |
| 07/22/1992 | EP0495158A1 Contact cooling of a projection mask |
| 07/22/1992 | CN1062992A Color picture tube exposing method and apparatus thereof |
| 07/22/1992 | CN1062982A Line or plane matrix plate making exposure head |
| 07/21/1992 | US5132723 Method and apparatus for exposure control in light valves |
| 07/21/1992 | US5132722 Imaging recording apparatus capable of forming a frame-like marginal portion in outer periphery of an image portion |
| 07/21/1992 | US5132537 Image transfer apparatus and method |
| 07/21/1992 | US5132441 Amino acid derivatives |
| 07/21/1992 | US5132376 Process for selective removal of dimeric species from phenolic polymers |
| 07/21/1992 | US5132195 Method of fabricating imaging apparatus |
| 07/21/1992 | CA1305532C Method for providing a design pattern on a metal stencil and metal stencil having a patternable covering layer |
| 07/15/1992 | EP0494792A1 Tetrahydropyranyloxystyrene homopolymer and method of manufacturing the same |
| 07/15/1992 | EP0494791A1 P-vinylphenoxydimethylphenyl-carbyldimethylsilane homopolymer and method of manufacturing the same |
| 07/15/1992 | EP0494744A1 Coating composition for forming insulating layers and masks |
| 07/15/1992 | EP0494685A2 Pattern shift measuring method |
| 07/15/1992 | EP0494383A1 Photoresist |
| 07/15/1992 | CA2059145A1 Bisacylphosphines |
| 07/14/1992 | USRE33992 Pulsed X-ray lithography |
| 07/14/1992 | US5131022 Exposure method and apparatus |
| 07/14/1992 | US5130764 Multi layer photopolymeric structure for the manufacturing of mesfet devices with submicrometric gate and variable length recessed channel |
| 07/14/1992 | US5130747 Carrier apparatus |
| 07/14/1992 | US5130744 Image recording apparatus capable of maintaining a constant tension in a photosensitive recording medium |
| 07/14/1992 | US5130743 Image forming apparatus having means for indicating timing of heat-fixing filter |
| 07/14/1992 | US5130410 Alternating and block copolymer resins |
| 07/14/1992 | US5130409 M- or p-cresol novolaks with formaldehyde and hydroxy aromatic aldehydes as positive photoresists |
| 07/14/1992 | US5130392 Radiation-sensitive polymers |
| 07/14/1992 | US5130265 Process for obtaining a multifunctional, ion-selective-membrane sensor using a siloxanic prepolymer |
| 07/14/1992 | US5130263 Method for photolithographically forming a selfaligned mask using back-side exposure and a non-specular reflecting layer |
| 07/14/1992 | US5130228 Photosensitive material, a dye which will change color on radiation, a multilayer device |
| 07/14/1992 | US5130227 Radiation sensitive plates |
| 07/14/1992 | US5130225 Positive resist composition comprising a cyclic dimer of isopropenyl phenol, also known as a 1,1,3 trimethyl-3-hydroxyphenyl indane |
| 07/14/1992 | US5130224 Positive-working photoresist composition |
| 07/14/1992 | US5130223 Postive working image-forming material with surface roughened plastic film substrate, transparent resin layer, colored resin layer and photosensitive resin layer |
| 07/14/1992 | US5130213 Device manufacture involving lithographic processing |
| 07/14/1992 | US5130064 Method of making a three dimensional object by stereolithography |
| 07/09/1992 | WO1992011580A1 Photodefinable interlevel dielectrics |
| 07/09/1992 | WO1992011579A1 Planographic printing plate precursor |
| 07/09/1992 | WO1992011578A1 Photodefinable interlevel dielectrics |