Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/1995
07/27/1995DE4418779C1 Irradiation device for X-ray lithography
07/27/1995DE4401590A1 Forming lacquer structure with overhanging edges
07/27/1995DE4328839A1 Radiation-curable mixt. used as photoresist in microelectronic devices
07/27/1995DE19500486A1 Light-sensitive dry lithographic printing plate with good test properties
07/26/1995EP0664501A1 Temperature control apparatus and method with recirculated coolant
07/26/1995EP0664491A1 Waterborne photoresists having polysiloxanes
07/26/1995EP0664490A1 Waterborne photoresists having associate thickeners
07/26/1995EP0664489A1 Waterborne photoresists having binders with sulfonic acid functionality
07/26/1995EP0664488A1 Waterborne photoresists having binders neutralized with amino acrylates
07/26/1995EP0664487A1 Silver halide light-sensitive material comprising light-sensitive polymerizable layer and an overcoating layer containing polyvinyl alcohol with acidic groups or a salt thereof
07/26/1995EP0664486A1 Waterborne photoresists having non-ionic fluorocarbon surfactants
07/26/1995EP0664485A2 Protective coating for imaging elements
07/26/1995EP0664211A2 Seamless offset lithographic printing members for use with laser-discharge imaging apparatus
07/26/1995EP0664033A1 Rasterizer for a pattern generation apparatus
07/26/1995EP0664016A1 Method for preparing and using a screen printing stencil having raised edges
07/26/1995CA2133146A1 Waterborne photoresists having binders with sulfonic acid functionality
07/25/1995US5436761 Projection exposure apparatus and polarizer
07/25/1995US5436725 Cofocal optical system for thickness measurements of patterned wafers
07/25/1995US5436692 Projection exposure apparatus and semiconductor device manufacturing method
07/25/1995US5436463 Sedimentary deposition of photoresist on semiconductor wafers
07/25/1995US5436279 Coating materials containing a reaction product of an epoxy novolak resin and an olefinically unsaturated carboxylic acid crosslinkable by radiation
07/25/1995US5436119 Alkylene oxide phosphate
07/25/1995US5436114 Anti-dissolution surface treatment
07/25/1995US5436112 Method for producing a negative image with color proofing element containing a urethane monomer
07/25/1995US5436110 Multilayer element with aluminum oxide layer for images
07/25/1995US5436107 Positive resist composition
07/25/1995US5436106 Process for the production of a color test image using quinone diazide photosensitive recording material
07/25/1995US5436105 For development in automatic additive developing machine, diazo compound, acrylic polymer with hydroxy groups
07/25/1995US5436098 Multilayer element with quinone diazide, resin and aromatic hydroxy compound for relief images
07/25/1995US5436097 Mask for evaluation of aligner and method of evaluating aligner using the same
07/25/1995US5436095 Manufacturing method or an exposing method for a semiconductor device for a semiconductor integrated circuit device and a mask used therefor
07/25/1995US5435850 Gas injection system
07/25/1995US5435247 Printing plate with raised etched image
07/20/1995WO1995019640A1 Charged particle projector system
07/20/1995DE4410505A1 Prodn. of resist pattern for semiconductor components
07/20/1995DE4340106A1 Diffraction grid prodn.
07/19/1995EP0663690A2 An ashing method for removing an organic film on a substance of a semiconductor device under fabrication
07/19/1995EP0663619A1 Process for the preparation of an image using only dry steps
07/19/1995EP0663618A1 Illumination unit having a facility for preventing contamination of optical components, and photolithographic apparatus including such an illumination unit
07/19/1995EP0663617A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process
07/19/1995EP0663616A2 Radiation sensitive material and method for forming pattern
07/19/1995EP0663411A1 Photo-imaging resist ink and cured product thereof
07/19/1995EP0663139A1 Electrodeless lamp with bulb rotation
07/19/1995EP0662990A1 Novolak resin mixtures.
07/19/1995EP0411089B1 Improved photosensitive emulsion for holographic plates and method
07/19/1995EP0406427B1 Production method of color filter
07/19/1995CN1105504A Seal manufacturing apparatus
07/19/1995CN1105457A Photon colloid-removing machine
07/18/1995US5434875 Low cost, high average power, high brightness solid state laser
07/18/1995US5434750 Partially-molded, PCB chip carrier package for certain non-square die shapes
07/18/1995US5434648 Proximity exposure method and machine therefor
07/18/1995US5434647 Projector for exposing photosensitive substrate
07/18/1995US5434646 Method and apparatus for automatized exposing of light sensitive material by means of laser means of laser light
07/18/1995US5434644 Filter device
07/18/1995US5434424 Spinning reticle scanning projection lithography exposure system and method
07/18/1995US5434031 Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive
07/18/1995US5434026 Exposure condition measurement method
07/13/1995WO1995018991A1 Microstructured body gradual construction process and thus produced microstructured bodies
07/13/1995DE4404885A1 Selective etching process in semiconductors mfr.
07/12/1995EP0662705A2 Cleaning agent for semiconductor device and method for manufacturing semiconductor device
07/12/1995EP0662637A1 Photosensitive polyimide precursors
07/12/1995EP0662636A2 Method of forming images
07/12/1995EP0662243A1 Antireflex layer and process for lithographically structuring such a layer
07/12/1995EP0662223A1 Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide
07/12/1995EP0662222A1 Positive-working photoresist composition.
07/11/1995US5432831 Vacuum optical system
07/11/1995US5432588 Semiconductor device and method of making the semiconductor device
07/11/1995US5432587 Exposing device capable of making clear pattern image on photo resist layer having different level surfaces
07/11/1995US5432314 Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate
07/11/1995US5432049 Photochromic composition
07/11/1995US5432046 Process for preparing improved lithographic printing plates by brushgraining with alumina/quartz slurry
07/11/1995US5432044 Method of forming a pattern using a phase shifting mask
07/11/1995US5432042 Method for obtaining a printing plate according to the silver salt diffusion transfer process
07/11/1995US5432039 Radiation sensitive quinone diazide and resin composition for microlens
07/11/1995US5431790 Method of crosslinking amino acid containing polymers using photoactivatable chemical crosslinkers
07/11/1995CA1336248C Compressible temporary support for transfer layer
07/11/1995CA1336238C Process for the production of flexographic printing reliefs
07/06/1995WO1995018480A1 Holographic technique for extreme microcircuitry size reduction
07/06/1995WO1995018400A1 Method and apparatus for processing photosensitive material
07/06/1995WO1995018399A1 Colored photosensitive resin composition
07/05/1995EP0661596A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process
07/05/1995EP0661595A1 Method for producing color filter
07/05/1995EP0661285A1 Sensitizer for radiation sensitive polyimides
07/05/1995EP0660949A1 Treatment of photographic effluent
07/05/1995EP0648348A4 Variable annular illuminator for photolithographic projection imager.
07/05/1995CN2202935Y Automatic plate-making equipment for screen plate printing
07/05/1995CN1104671A Adhesive radiation cross linked and then hot hardened
07/04/1995USH1463 Method for detecting positions of photomask and substrate
07/04/1995US5430522 Image forming apparatus with enhanced transport of its photosensitive recording member
07/04/1995US5430303 Exposure apparatus
07/04/1995US5430130 Photosensitive polyfunctional aromatic diazo compounds useful in photosensitive compositions
07/04/1995US5429912 Method of dispensing fluid onto a wafer
07/04/1995US5429910 Method of forming a critical resist pattern
07/04/1995US5429908 Multilayer images formed by photoforming
07/04/1995US5429907 Method for making an imaging element and for obtaining an image therefrom
07/04/1995US5429905 Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound
07/04/1995US5429904 Positive resist composition
07/04/1995US5429903 Water developable, negative working overlay or transfer type diazo color proofing film
07/04/1995US5429896 Photomask and pattern forming method employing the same
07/04/1995US5429673 Binary vapor adhesion promoters and methods of using the same