Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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07/27/1995 | DE4418779C1 Irradiation device for X-ray lithography |
07/27/1995 | DE4401590A1 Forming lacquer structure with overhanging edges |
07/27/1995 | DE4328839A1 Radiation-curable mixt. used as photoresist in microelectronic devices |
07/27/1995 | DE19500486A1 Light-sensitive dry lithographic printing plate with good test properties |
07/26/1995 | EP0664501A1 Temperature control apparatus and method with recirculated coolant |
07/26/1995 | EP0664491A1 Waterborne photoresists having polysiloxanes |
07/26/1995 | EP0664490A1 Waterborne photoresists having associate thickeners |
07/26/1995 | EP0664489A1 Waterborne photoresists having binders with sulfonic acid functionality |
07/26/1995 | EP0664488A1 Waterborne photoresists having binders neutralized with amino acrylates |
07/26/1995 | EP0664487A1 Silver halide light-sensitive material comprising light-sensitive polymerizable layer and an overcoating layer containing polyvinyl alcohol with acidic groups or a salt thereof |
07/26/1995 | EP0664486A1 Waterborne photoresists having non-ionic fluorocarbon surfactants |
07/26/1995 | EP0664485A2 Protective coating for imaging elements |
07/26/1995 | EP0664211A2 Seamless offset lithographic printing members for use with laser-discharge imaging apparatus |
07/26/1995 | EP0664033A1 Rasterizer for a pattern generation apparatus |
07/26/1995 | EP0664016A1 Method for preparing and using a screen printing stencil having raised edges |
07/26/1995 | CA2133146A1 Waterborne photoresists having binders with sulfonic acid functionality |
07/25/1995 | US5436761 Projection exposure apparatus and polarizer |
07/25/1995 | US5436725 Cofocal optical system for thickness measurements of patterned wafers |
07/25/1995 | US5436692 Projection exposure apparatus and semiconductor device manufacturing method |
07/25/1995 | US5436463 Sedimentary deposition of photoresist on semiconductor wafers |
07/25/1995 | US5436279 Coating materials containing a reaction product of an epoxy novolak resin and an olefinically unsaturated carboxylic acid crosslinkable by radiation |
07/25/1995 | US5436119 Alkylene oxide phosphate |
07/25/1995 | US5436114 Anti-dissolution surface treatment |
07/25/1995 | US5436112 Method for producing a negative image with color proofing element containing a urethane monomer |
07/25/1995 | US5436110 Multilayer element with aluminum oxide layer for images |
07/25/1995 | US5436107 Positive resist composition |
07/25/1995 | US5436106 Process for the production of a color test image using quinone diazide photosensitive recording material |
07/25/1995 | US5436105 For development in automatic additive developing machine, diazo compound, acrylic polymer with hydroxy groups |
07/25/1995 | US5436098 Multilayer element with quinone diazide, resin and aromatic hydroxy compound for relief images |
07/25/1995 | US5436097 Mask for evaluation of aligner and method of evaluating aligner using the same |
07/25/1995 | US5436095 Manufacturing method or an exposing method for a semiconductor device for a semiconductor integrated circuit device and a mask used therefor |
07/25/1995 | US5435850 Gas injection system |
07/25/1995 | US5435247 Printing plate with raised etched image |
07/20/1995 | WO1995019640A1 Charged particle projector system |
07/20/1995 | DE4410505A1 Prodn. of resist pattern for semiconductor components |
07/20/1995 | DE4340106A1 Diffraction grid prodn. |
07/19/1995 | EP0663690A2 An ashing method for removing an organic film on a substance of a semiconductor device under fabrication |
07/19/1995 | EP0663619A1 Process for the preparation of an image using only dry steps |
07/19/1995 | EP0663618A1 Illumination unit having a facility for preventing contamination of optical components, and photolithographic apparatus including such an illumination unit |
07/19/1995 | EP0663617A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
07/19/1995 | EP0663616A2 Radiation sensitive material and method for forming pattern |
07/19/1995 | EP0663411A1 Photo-imaging resist ink and cured product thereof |
07/19/1995 | EP0663139A1 Electrodeless lamp with bulb rotation |
07/19/1995 | EP0662990A1 Novolak resin mixtures. |
07/19/1995 | EP0411089B1 Improved photosensitive emulsion for holographic plates and method |
07/19/1995 | EP0406427B1 Production method of color filter |
07/19/1995 | CN1105504A Seal manufacturing apparatus |
07/19/1995 | CN1105457A Photon colloid-removing machine |
07/18/1995 | US5434875 Low cost, high average power, high brightness solid state laser |
07/18/1995 | US5434750 Partially-molded, PCB chip carrier package for certain non-square die shapes |
07/18/1995 | US5434648 Proximity exposure method and machine therefor |
07/18/1995 | US5434647 Projector for exposing photosensitive substrate |
07/18/1995 | US5434646 Method and apparatus for automatized exposing of light sensitive material by means of laser means of laser light |
07/18/1995 | US5434644 Filter device |
07/18/1995 | US5434424 Spinning reticle scanning projection lithography exposure system and method |
07/18/1995 | US5434031 Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive |
07/18/1995 | US5434026 Exposure condition measurement method |
07/13/1995 | WO1995018991A1 Microstructured body gradual construction process and thus produced microstructured bodies |
07/13/1995 | DE4404885A1 Selective etching process in semiconductors mfr. |
07/12/1995 | EP0662705A2 Cleaning agent for semiconductor device and method for manufacturing semiconductor device |
07/12/1995 | EP0662637A1 Photosensitive polyimide precursors |
07/12/1995 | EP0662636A2 Method of forming images |
07/12/1995 | EP0662243A1 Antireflex layer and process for lithographically structuring such a layer |
07/12/1995 | EP0662223A1 Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide |
07/12/1995 | EP0662222A1 Positive-working photoresist composition. |
07/11/1995 | US5432831 Vacuum optical system |
07/11/1995 | US5432588 Semiconductor device and method of making the semiconductor device |
07/11/1995 | US5432587 Exposing device capable of making clear pattern image on photo resist layer having different level surfaces |
07/11/1995 | US5432314 Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate |
07/11/1995 | US5432049 Photochromic composition |
07/11/1995 | US5432046 Process for preparing improved lithographic printing plates by brushgraining with alumina/quartz slurry |
07/11/1995 | US5432044 Method of forming a pattern using a phase shifting mask |
07/11/1995 | US5432042 Method for obtaining a printing plate according to the silver salt diffusion transfer process |
07/11/1995 | US5432039 Radiation sensitive quinone diazide and resin composition for microlens |
07/11/1995 | US5431790 Method of crosslinking amino acid containing polymers using photoactivatable chemical crosslinkers |
07/11/1995 | CA1336248C Compressible temporary support for transfer layer |
07/11/1995 | CA1336238C Process for the production of flexographic printing reliefs |
07/06/1995 | WO1995018480A1 Holographic technique for extreme microcircuitry size reduction |
07/06/1995 | WO1995018400A1 Method and apparatus for processing photosensitive material |
07/06/1995 | WO1995018399A1 Colored photosensitive resin composition |
07/05/1995 | EP0661596A1 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
07/05/1995 | EP0661595A1 Method for producing color filter |
07/05/1995 | EP0661285A1 Sensitizer for radiation sensitive polyimides |
07/05/1995 | EP0660949A1 Treatment of photographic effluent |
07/05/1995 | EP0648348A4 Variable annular illuminator for photolithographic projection imager. |
07/05/1995 | CN2202935Y Automatic plate-making equipment for screen plate printing |
07/05/1995 | CN1104671A Adhesive radiation cross linked and then hot hardened |
07/04/1995 | USH1463 Method for detecting positions of photomask and substrate |
07/04/1995 | US5430522 Image forming apparatus with enhanced transport of its photosensitive recording member |
07/04/1995 | US5430303 Exposure apparatus |
07/04/1995 | US5430130 Photosensitive polyfunctional aromatic diazo compounds useful in photosensitive compositions |
07/04/1995 | US5429912 Method of dispensing fluid onto a wafer |
07/04/1995 | US5429910 Method of forming a critical resist pattern |
07/04/1995 | US5429908 Multilayer images formed by photoforming |
07/04/1995 | US5429907 Method for making an imaging element and for obtaining an image therefrom |
07/04/1995 | US5429905 Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound |
07/04/1995 | US5429904 Positive resist composition |
07/04/1995 | US5429903 Water developable, negative working overlay or transfer type diazo color proofing film |
07/04/1995 | US5429896 Photomask and pattern forming method employing the same |
07/04/1995 | US5429673 Binary vapor adhesion promoters and methods of using the same |