Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/1995
08/22/1995US5443932 Exposure method
08/22/1995US5443736 Chelating multivalent metal ions from organic solution, adsorption on activated carbon; photoresists pollutants
08/22/1995US5443690 Pattern formation material and pattern formation method
08/22/1995US5443677 Apparatus for manufacturing a screen printing stencil
08/22/1995US5443672 Using photopolymerizable material
08/19/1995CA2142752A1 Polymeric composition and method for surface detackification
08/17/1995WO1995022085A1 Masks for lithographic patterning using off-axis illumination
08/16/1995EP0667608A1 A method of manufacturing a matrix for producing optical disks without the medium of a master
08/16/1995EP0667561A1 Reactive microgel and photosensitive resin composition containing the reactive microgel for flexographic printing plate
08/16/1995EP0667560A1 Imaging method based on photopolymerisation and delamination
08/16/1995EP0667450A1 Nozzle plate, particularly for injection valves and method of manufacturing a nozzle plate
08/16/1995EP0667338A1 Sulfonium salt and resist composition
08/16/1995EP0667024A1 Cd mastering process
08/16/1995EP0380591B1 Fiber/resin composites, and method of making the same
08/16/1995CN1106936A Waterborne photoresists having polysiloxanes
08/16/1995CN1106935A Waterborne photoresists having binders neutralized with amino acrylates
08/15/1995US5442714 Design rule checking method and a method of fabricating a phase shift mask
08/15/1995US5442418 Exposure method
08/15/1995US5442416 Resist processing method
08/15/1995US5442184 System and method for semiconductor processing using polarized radiant energy
08/15/1995US5442163 Exposure apparatus
08/15/1995US5442090 Radiation-curable urethane acrylate compounds containing amine and urea groups
08/15/1995US5442087 Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
08/15/1995US5442061 Recording, photoresists, printing plates
08/15/1995US5442024 Photosensitive polyimide precursor composition
08/15/1995US5441917 Method of laying out bond pads on a semiconductor die
08/15/1995US5441850 Imaging medium and process for producing an image
08/15/1995US5441849 Reduces electrical charge accumulation caused by an exposure to charged particle beam
08/15/1995US5441846 System for preparation of light-sensitive material
08/15/1995US5441845 Curable; films for protecting electronic parts
08/15/1995US5441843 Having ethylenically unsaturated polymerizable compound dispersed in light sensitive layer outside microcapsules containing silver halide, reducing agent, polymerizable compound, color image forming substance
08/15/1995US5441835 Transmitting light for exposure through a converging portion; convex portion made of transparent or translucent material; for transfer of fine patterns into different positions on wafer
08/15/1995US5441797 Antireflective polyimide dielectric for photolithography
08/15/1995US5441616 Integrated circuit fabrication method
08/15/1995US5440987 Laser imaged seamless lithographic printing members and method of making
08/15/1995CA1336658C Photosensitive composition, photosensitive material, and image forming method
08/15/1995CA1336657C Photopolymerizable imaging materials
08/10/1995WO1995021404A1 A simple and easy method for making plate and its apparatus
08/10/1995DE4404022A1 Semiconductor wafer double=sided lacquering station transport appts.
08/10/1995DE19503388A1 Photo varnish film development method for semiconductor mfr.
08/10/1995DE19502827A1 Projection illumination unit for exposure of wafer
08/10/1995DE19500162A1 Plasma incineration of resist on wafer
08/09/1995EP0666587A1 Method for electrodeposition of photosensitive resist
08/09/1995EP0666505A1 Aziridine primer for flexographic printing plates
08/09/1995EP0666504A1 Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture
08/09/1995EP0666503A1 Photo mask and method for manufacturing the same
08/09/1995EP0666184A1 Printing plate material and process for producing the same
08/09/1995EP0665961A1 Imaging medium and process.
08/09/1995EP0665960A1 Imaging medium and process
08/09/1995EP0468002A4 Autodeposition emulsion for selectively protecting metallic surfaces
08/09/1995CN1106545A Simple plate making method and equipment thereof
08/08/1995US5440426 Optical spatial filtering for attenuating the zero diffractive orders of mutually incoherent light beams
08/08/1995US5440423 Optical illumination instrument
08/08/1995US5440397 Apparatus and method for exposure
08/08/1995US5440394 Length-measuring device and exposure apparatus
08/08/1995US5440138 Exposure method
08/08/1995US5439990 Photolytic polymer and photoresist composition
08/08/1995US5439781 Delineating pattern using synchrotron emitted x-ray radiation using condenser which collects over specified arc
08/08/1995US5439780 Energy sensitive materials and methods for their use
08/08/1995US5439779 Aqueous soldermask
08/08/1995US5439774 Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit
08/08/1995US5439765 Photomask for semiconductor integrated circuit device
08/08/1995US5439764 Mask having multiple patterns
08/08/1995US5439582 Photosensitive resin on an electroconductive substrate
08/08/1995US5439519 Solution applying apparatus
08/08/1995US5438751 Using developer with a chlorine-free organic solvent
08/08/1995CA2023028C Method for making edge faded holograms
08/03/1995WO1995020827A1 Packaged strain actuator
08/03/1995WO1995020776A1 Method of producing a liquid crystal polymer photomask
08/02/1995EP0665590A2 Microstructure, process for manufacturing thereof and devices incorporating the same
08/02/1995EP0665471A2 Release layer for thermally developed flexographic printing plates
08/02/1995EP0665470A2 Method for forming a fine pattern
08/02/1995EP0665469A2 Multilayer flexographic printing plate
08/02/1995EP0665468A1 Staining inhibitor for photopolymerizable compositions containing a tetrazole
08/02/1995EP0665467A1 Photoresist compositions with improved sensitivity and metal adhesion
08/02/1995EP0665466A1 A method for making a lithographic printing plate
08/02/1995EP0665220A1 Novel sulfonium salt and chemically amplified positive resist composition
08/02/1995EP0664925A1 Interconnection structure for integrated circuits and method for making same
08/02/1995EP0599993B1 A hard copy imaging system
08/02/1995EP0479968B1 X-ray imaging system
08/02/1995EP0402430B1 Aqueous solutions of oleophilic compounds
08/02/1995CN1106142A Solid photographic device and manufacture of same
08/02/1995CN1029426C Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer
08/01/1995US5438419 Precision wafer driving device by utilizing solid type actuator
08/01/1995US5438413 Process for measuring overlay misregistration during semiconductor wafer fabrication
08/01/1995US5438207 Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same
08/01/1995US5438204 Twin-mask, and method and system for using same to pattern microelectronic substrates
08/01/1995US5437964 Stereolithography using vinyl ether-epoxide polymers
08/01/1995US5437961 Forming carbon layer on light reflective layer, photosensitive layer over carbon layer, selectively patterning it by light while carbon layer is patterned by etching, using patterned resin layer as mask, finally pattering reflective layer
08/01/1995US5437960 Process for laminating photosensitive layer
08/01/1995US5437959 Protective coating for imaging elements
08/01/1995US5437957 An water soluble acrylamide polymer in or next to the physical development nuclei layer; silver complex diffusion transfer process; wear resistance; storage stability
08/01/1995US5437952 Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin
08/01/1995US5437948 Process for adjusting a photolithographic exposure machine and associated device
08/01/1995US5437946 Multiple reticle stitching for scanning exposure system
08/01/1995US5437932 High speed aqueous solvent developable photopolymer compositions
08/01/1995US5437893 Method for suppression of electrification
08/01/1995US5437733 A treatment liquid held between the surface and liquid holder having apertures; noncontamination; cleaning and etching semiconductor; removing photoresists
08/01/1995CA1336477C Alkyl salicylate resin for carbonless copy paper and imaging use
07/1995
07/27/1995WO1995020263A1 Hybrid electrostatic chuck
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