Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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09/14/1995 | WO1995024472A1 Microfabricated capsules for isolation of cell transplants |
09/14/1995 | WO1995024261A1 Microfabricated particle filter |
09/14/1995 | WO1995024257A1 Process and device for removing coating layers from printed circuit boards |
09/14/1995 | DE19508749A1 Phase shift mask fabrication |
09/14/1995 | DE19508497A1 Aperture for use in optical appts. e.g. for semiconductor mfr. |
09/14/1995 | DE19507881A1 Supporting objects formed by stereo lithography or rapid prototype process |
09/14/1995 | CA2185028A1 Stable, ionomeric photoresist emulsion and process of preparation and use thereof |
09/13/1995 | EP0671662A1 Method for developing a resist pattern |
09/13/1995 | EP0671661A2 Photosensitive lithographic printing plate |
09/13/1995 | EP0671660A2 Lead-frame forming material |
09/13/1995 | EP0671659A1 Photosensitive composition |
09/13/1995 | EP0671658A2 Exposure apparatus and reflection type mask to be used in the same |
09/13/1995 | EP0671640A2 Method for fabricating a grating for an opto-electronic device |
09/13/1995 | EP0671025A1 Metal ion reduction in bottom anti-reflective coatings for photoresists. |
09/13/1995 | EP0671024A1 Method and apparatus for fabricating microlenses |
09/13/1995 | EP0670784A1 Improved laser pattern generation apparatus |
09/13/1995 | CN1108248A Glycoprotein IIB/IIIA antagonists |
09/12/1995 | US5450241 Wavefront corrector for scanning microlens arrays |
09/12/1995 | US5449915 Electron beam exposure system capable of detecting failure of exposure |
09/12/1995 | US5449705 Silicon-containing polyamic acid derivative and photosensitive resin composition using it |
09/12/1995 | US5449591 Shaping prepreg in a mold, plating with copper, forming patterns, repeating with next prepreg layer |
09/12/1995 | US5449588 Photosensitive polyimide precursor composition with photoacid generator |
09/12/1995 | US5449585 Method for making lithographic printing plates according to the silver salt diffusion transfer process |
09/12/1995 | US5449584 Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound |
09/12/1995 | US5449578 Method of manufacturing a mask for forming a pattern in a semiconductor device |
09/12/1995 | US5449405 Material-saving resist spinner and process |
09/12/1995 | CA1336947C Photopolymerizable, positive working, peel developable, single sheet color proofing system |
09/08/1995 | WO1995023999A1 Aqueous composition for removing polymer resist layers from substrate surfaces and its use |
09/08/1995 | WO1995023998A1 Liquid photosensitive resin composition for forming relief structures |
09/08/1995 | WO1995023710A1 Light control material and method for making same |
09/07/1995 | EP0678200A4 On-demand production of lat imaging films. |
09/07/1995 | DE4406759A1 Cleaning and recycling of development and fixing liq. |
09/07/1995 | DE3844739C2 Light sensitive compsn. contg. alkali soluble resin and diazo cpd. |
09/06/1995 | EP0670587A1 Plasma asher with microwave trap |
09/06/1995 | EP0670522A1 Energy-sensitive materials and methods for their use |
09/06/1995 | EP0670521A1 Photosensitive resin composition and process for producing the same |
09/06/1995 | EP0670323A1 Dimeric bisacylphosphines, bisacylphosphine oxides and bisacylphosphine sulfides |
09/06/1995 | EP0670055A1 Method of deposition. |
09/06/1995 | EP0670052A1 Lens array photolithography |
09/06/1995 | EP0455651B1 Novel printing method and printed product |
09/06/1995 | EP0441905B1 Method and apparatus for processing materials |
09/05/1995 | US5448612 X-ray exposure apparatus |
09/05/1995 | US5448416 Wide-field exposure optical system |
09/05/1995 | US5448408 Projection lens system |
09/05/1995 | US5448350 Surface state inspection apparatus and exposure apparatus including the same |
09/05/1995 | US5448336 Apparatus and method for projection exposure |
09/05/1995 | US5448333 Exposure method |
09/05/1995 | US5448332 Exposure method and apparatus |
09/05/1995 | US5448325 Photographic development apparatus |
09/05/1995 | US5448075 Electron-beam exposure system having an improved rate of exposure throughput |
09/05/1995 | US5447825 Method for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydes |
09/05/1995 | US5447810 Masks for improved lithographic patterning for off-axis illumination lithography |
09/05/1995 | US5447757 Applying a polymer to a metal screen and applying a developer to polymer layer |
09/05/1995 | CA1336934C Energy-curable cyanate compositions |
09/03/1995 | CA2143571A1 Dimeric bisacylphosphines, oxides and sulfides |
08/31/1995 | WO1995023174A1 Epoxy resin, process for producing the same, and photocurable resin composition and powder coating resin composition both containing said resin |
08/31/1995 | DE4410274A1 Multilayer resist prodn. process |
08/31/1995 | DE19502113A1 Resist module formation for integrated circuit prodn. |
08/30/1995 | EP0669793A2 A method for manufacturing printed circuit board |
08/30/1995 | EP0669636A1 Manufacturing system error detection |
08/30/1995 | EP0668995A1 Method of fabricating at least a membrane mounted on a frame |
08/30/1995 | EP0605567A4 Water-soluble formulation for masking and the like, and method utilizing the same. |
08/30/1995 | EP0470071B1 Process for producing flexographic printing plates |
08/30/1995 | EP0386107B1 Method and apparatus for processing and transporting sheet materials |
08/30/1995 | CN1107585A Waterborne photoresists having non-ionic fluorocarbon surfactants |
08/30/1995 | CN1107584A Waterborne photoresists having binders with sulfonic acid functionality |
08/29/1995 | US5446649 Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing |
08/29/1995 | US5446587 Projection method and projection system and mask therefor |
08/29/1995 | US5446542 Mark position determining apparatus for use in exposure system |
08/29/1995 | US5446521 Phase-shifted opaquing ring |
08/29/1995 | US5446519 Stage device |
08/29/1995 | US5446074 Photosensitive polyimide precursors |
08/29/1995 | US5445934 Selective photoremovable groups on surface |
08/29/1995 | US5445919 Photopolymerizable composition |
08/29/1995 | US5445918 Using a photoiniator of a titanocene compound and N-phenyl glycine to polymerize and unsaturated compound; photosensitity; UV and visible radiation |
08/29/1995 | US5445917 Superacid precursor to catalyze thermal decomposition of secondary acid generator, such as squaric acid and oxalic acid derivatives; effecting color change in imaging process |
08/29/1995 | US5445916 Photopolymers based on polyvinyl alcohol derivatives of 8-hydroxyquinoline compositions |
08/29/1995 | US5445915 Laser exposure; having matting agent in base layer and receiving layer containing physical development nuclei |
08/29/1995 | US5445914 Method for making a lithographic offset plate by the silver salt diffusion transfer process |
08/29/1995 | US5445912 Lithographic base and a method for making a lithographic printing plate therewith |
08/29/1995 | US5444921 Edge bead removal gap gauge |
08/24/1995 | WO1995022787A1 Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates |
08/24/1995 | WO1995022448A2 Preparation of embossing shims |
08/24/1995 | DE19503675A1 Optisches Übertragungssystem und Verfahren zur Lichtausstrahlung The optical transmission system and method for light emission |
08/23/1995 | EP0668606A2 Carrier device |
08/23/1995 | EP0668541A1 Exposure apparatus and device manufacturing method |
08/23/1995 | EP0668540A1 Positive working recording material with improved development properties |
08/23/1995 | EP0668144A2 Use of glow discharge treatment to promote adhesion of aqueous coats to substrate |
08/23/1995 | EP0667877A1 Unitary reaction resin systems |
08/23/1995 | CN1107278A Photosensitive resin composition for corrugated board printing plate |
08/22/1995 | US5444753 X-ray lithography mask, light exposure apparatus and process therefore |
08/22/1995 | US5444576 Cooled reflective mirror apparatus |
08/22/1995 | US5444572 Wavefront corrector for scanning microlens arrays |
08/22/1995 | US5444538 System and method for optimizing the grid and intrafield registration of wafer patterns |
08/22/1995 | US5444136 Optionally oriented, monomeric and polymeric nonlinearly optically active materials and derivatives thereof |
08/22/1995 | US5443942 Jetting; immersion; photolithography |
08/22/1995 | US5443941 Plasma polymer antireflective coating |
08/22/1995 | US5443939 Transparent base film of plastic; photopolymerizable layer containing polymeric binder and a compound polymerizable by free radical catalyst, a polymerization initiator, layer of dye or colored pigment; a thermoplastic adhesion layer |
08/22/1995 | US5443938 Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer |
08/22/1995 | US5443937 Aqueous developable precolored diazo imaging element |