Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1995
09/14/1995WO1995024472A1 Microfabricated capsules for isolation of cell transplants
09/14/1995WO1995024261A1 Microfabricated particle filter
09/14/1995WO1995024257A1 Process and device for removing coating layers from printed circuit boards
09/14/1995DE19508749A1 Phase shift mask fabrication
09/14/1995DE19508497A1 Aperture for use in optical appts. e.g. for semiconductor mfr.
09/14/1995DE19507881A1 Supporting objects formed by stereo lithography or rapid prototype process
09/14/1995CA2185028A1 Stable, ionomeric photoresist emulsion and process of preparation and use thereof
09/13/1995EP0671662A1 Method for developing a resist pattern
09/13/1995EP0671661A2 Photosensitive lithographic printing plate
09/13/1995EP0671660A2 Lead-frame forming material
09/13/1995EP0671659A1 Photosensitive composition
09/13/1995EP0671658A2 Exposure apparatus and reflection type mask to be used in the same
09/13/1995EP0671640A2 Method for fabricating a grating for an opto-electronic device
09/13/1995EP0671025A1 Metal ion reduction in bottom anti-reflective coatings for photoresists.
09/13/1995EP0671024A1 Method and apparatus for fabricating microlenses
09/13/1995EP0670784A1 Improved laser pattern generation apparatus
09/13/1995CN1108248A Glycoprotein IIB/IIIA antagonists
09/12/1995US5450241 Wavefront corrector for scanning microlens arrays
09/12/1995US5449915 Electron beam exposure system capable of detecting failure of exposure
09/12/1995US5449705 Silicon-containing polyamic acid derivative and photosensitive resin composition using it
09/12/1995US5449591 Shaping prepreg in a mold, plating with copper, forming patterns, repeating with next prepreg layer
09/12/1995US5449588 Photosensitive polyimide precursor composition with photoacid generator
09/12/1995US5449585 Method for making lithographic printing plates according to the silver salt diffusion transfer process
09/12/1995US5449584 Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound
09/12/1995US5449578 Method of manufacturing a mask for forming a pattern in a semiconductor device
09/12/1995US5449405 Material-saving resist spinner and process
09/12/1995CA1336947C Photopolymerizable, positive working, peel developable, single sheet color proofing system
09/08/1995WO1995023999A1 Aqueous composition for removing polymer resist layers from substrate surfaces and its use
09/08/1995WO1995023998A1 Liquid photosensitive resin composition for forming relief structures
09/08/1995WO1995023710A1 Light control material and method for making same
09/07/1995EP0678200A4 On-demand production of lat imaging films.
09/07/1995DE4406759A1 Cleaning and recycling of development and fixing liq.
09/07/1995DE3844739C2 Light sensitive compsn. contg. alkali soluble resin and diazo cpd.
09/06/1995EP0670587A1 Plasma asher with microwave trap
09/06/1995EP0670522A1 Energy-sensitive materials and methods for their use
09/06/1995EP0670521A1 Photosensitive resin composition and process for producing the same
09/06/1995EP0670323A1 Dimeric bisacylphosphines, bisacylphosphine oxides and bisacylphosphine sulfides
09/06/1995EP0670055A1 Method of deposition.
09/06/1995EP0670052A1 Lens array photolithography
09/06/1995EP0455651B1 Novel printing method and printed product
09/06/1995EP0441905B1 Method and apparatus for processing materials
09/05/1995US5448612 X-ray exposure apparatus
09/05/1995US5448416 Wide-field exposure optical system
09/05/1995US5448408 Projection lens system
09/05/1995US5448350 Surface state inspection apparatus and exposure apparatus including the same
09/05/1995US5448336 Apparatus and method for projection exposure
09/05/1995US5448333 Exposure method
09/05/1995US5448332 Exposure method and apparatus
09/05/1995US5448325 Photographic development apparatus
09/05/1995US5448075 Electron-beam exposure system having an improved rate of exposure throughput
09/05/1995US5447825 Method for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydes
09/05/1995US5447810 Masks for improved lithographic patterning for off-axis illumination lithography
09/05/1995US5447757 Applying a polymer to a metal screen and applying a developer to polymer layer
09/05/1995CA1336934C Energy-curable cyanate compositions
09/03/1995CA2143571A1 Dimeric bisacylphosphines, oxides and sulfides
08/1995
08/31/1995WO1995023174A1 Epoxy resin, process for producing the same, and photocurable resin composition and powder coating resin composition both containing said resin
08/31/1995DE4410274A1 Multilayer resist prodn. process
08/31/1995DE19502113A1 Resist module formation for integrated circuit prodn.
08/30/1995EP0669793A2 A method for manufacturing printed circuit board
08/30/1995EP0669636A1 Manufacturing system error detection
08/30/1995EP0668995A1 Method of fabricating at least a membrane mounted on a frame
08/30/1995EP0605567A4 Water-soluble formulation for masking and the like, and method utilizing the same.
08/30/1995EP0470071B1 Process for producing flexographic printing plates
08/30/1995EP0386107B1 Method and apparatus for processing and transporting sheet materials
08/30/1995CN1107585A Waterborne photoresists having non-ionic fluorocarbon surfactants
08/30/1995CN1107584A Waterborne photoresists having binders with sulfonic acid functionality
08/29/1995US5446649 Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing
08/29/1995US5446587 Projection method and projection system and mask therefor
08/29/1995US5446542 Mark position determining apparatus for use in exposure system
08/29/1995US5446521 Phase-shifted opaquing ring
08/29/1995US5446519 Stage device
08/29/1995US5446074 Photosensitive polyimide precursors
08/29/1995US5445934 Selective photoremovable groups on surface
08/29/1995US5445919 Photopolymerizable composition
08/29/1995US5445918 Using a photoiniator of a titanocene compound and N-phenyl glycine to polymerize and unsaturated compound; photosensitity; UV and visible radiation
08/29/1995US5445917 Superacid precursor to catalyze thermal decomposition of secondary acid generator, such as squaric acid and oxalic acid derivatives; effecting color change in imaging process
08/29/1995US5445916 Photopolymers based on polyvinyl alcohol derivatives of 8-hydroxyquinoline compositions
08/29/1995US5445915 Laser exposure; having matting agent in base layer and receiving layer containing physical development nuclei
08/29/1995US5445914 Method for making a lithographic offset plate by the silver salt diffusion transfer process
08/29/1995US5445912 Lithographic base and a method for making a lithographic printing plate therewith
08/29/1995US5444921 Edge bead removal gap gauge
08/24/1995WO1995022787A1 Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates
08/24/1995WO1995022448A2 Preparation of embossing shims
08/24/1995DE19503675A1 Optisches Übertragungssystem und Verfahren zur Lichtausstrahlung The optical transmission system and method for light emission
08/23/1995EP0668606A2 Carrier device
08/23/1995EP0668541A1 Exposure apparatus and device manufacturing method
08/23/1995EP0668540A1 Positive working recording material with improved development properties
08/23/1995EP0668144A2 Use of glow discharge treatment to promote adhesion of aqueous coats to substrate
08/23/1995EP0667877A1 Unitary reaction resin systems
08/23/1995CN1107278A Photosensitive resin composition for corrugated board printing plate
08/22/1995US5444753 X-ray lithography mask, light exposure apparatus and process therefore
08/22/1995US5444576 Cooled reflective mirror apparatus
08/22/1995US5444572 Wavefront corrector for scanning microlens arrays
08/22/1995US5444538 System and method for optimizing the grid and intrafield registration of wafer patterns
08/22/1995US5444136 Optionally oriented, monomeric and polymeric nonlinearly optically active materials and derivatives thereof
08/22/1995US5443942 Jetting; immersion; photolithography
08/22/1995US5443941 Plasma polymer antireflective coating
08/22/1995US5443939 Transparent base film of plastic; photopolymerizable layer containing polymeric binder and a compound polymerizable by free radical catalyst, a polymerization initiator, layer of dye or colored pigment; a thermoplastic adhesion layer
08/22/1995US5443938 Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer
08/22/1995US5443937 Aqueous developable precolored diazo imaging element