Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1995
10/11/1995EP0676668A1 Positive resist composition
10/11/1995EP0676558A1 Stiff actuator active vibration isolation system
10/11/1995EP0676275A1 Stereolithographic exposure head
10/11/1995EP0676062A1 Photodefinable polymers containing perfluorocyclobutane groups
10/11/1995EP0664925A4 Interconnection structure for integrated circuits and method for making same.
10/11/1995EP0615634B1 Production of lithographic printing plates in a dry manner
10/11/1995EP0541647B1 Substrate whirling plate
10/11/1995CN1110005A Method for fabricating semiconductor device
10/11/1995CN1109981A Polymeric compositions and method for surface detackification
10/10/1995US5457153 Partially saponified polyvinylalcohol, fluorine-containing surfactant, liquid water-containing medium
10/10/1995US5457008 Photographic element containing a novel cyan dye forming coupler and process for its use
10/10/1995US5457005 Providing on substrate layer containing polymeric epoxide, bis/hydroxydimethylsilyl/benzene, onium salt crosslinking initiator, exposing to actinic radiation source, vaporizing unexposed regions, removing residue with reactive ions
10/10/1995US5457003 Polysiloxane, polysilsesquioxane
10/10/1995US5456999 Red sensitizing dye of the cationic type; increases sensitivity in the infrared region
10/10/1995US5456996 Containing photosensitive 1,2-quinone diazide compound, alkali soluble resin binder, polyphenol compound to control dissolution rate in developer
10/10/1995US5456995 Radiation-sensitive positive resist composition
10/10/1995US5456798 Methods and apparatus for processing curved surface
10/10/1995US5456174 Apparatus for manufacturing screen printing plates
10/10/1995US5456134 For converting a rotary movement into a translatory movement
10/05/1995WO1995022448A3 Preparation of embossing shims
10/05/1995DE19512245A1 Illuminating device resolution measuring photomask for semiconductor process
10/05/1995DE19512148A1 Semiconductor component field oxide layer formation method
10/05/1995DE19511533A1 Fine measuring appts. for properties in semiconductor mfr
10/05/1995DE19511119A1 Light to photoresist layer directing method for thin film mask mfr.
10/05/1995CA2146200A1 Stiff actuator active vibration isolation system
10/04/1995EP0675521A2 High pressure mercury lamp
10/04/1995EP0675412A1 Photosensitive resin composition
10/04/1995EP0675411A1 Photosensitive resin composition and photosensitive film using the same
10/04/1995EP0675410A1 Resist composition for deep ultraviolet light
10/04/1995EP0675409A1 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern
10/04/1995EP0674778A1 Process and device for generating dosage patterns for the production of structured surfaces
10/04/1995EP0674777A1 Composition for removing adhesives from polymeric film and process for using same
10/04/1995EP0517923B1 Method of forming minute resist pattern
10/04/1995CN2209343Y Simple vertical and horizontal projecting, photographing and reproducing machine
10/03/1995US5455850 X-ray lithography using holographic images
10/03/1995US5455651 Apparatus for developing a printing plate
10/03/1995US5455632 Television signal processing circuit for simultaneously displaying a sub-picture in a main-picture
10/03/1995US5455416 Preexposure device for printing forms to be imagewise exposed
10/03/1995US5455349 Vinylbenzyl thymine monomers
10/03/1995US5455145 Method of manufacturing double layer resist pattern and double layer resist structure
10/03/1995US5455144 Reduction projection exposure of pattern onto positive photosensitive resist film, then transferring second pattern onto negative resist film, for improving resolution of fine patterns
10/03/1995US5455143 Aminoketone sensitizers for aqueous soluble photopolymer compositions
10/03/1995US5454906 Method of providing sacrificial spacer for micro-mechanical devices
09/1995
09/28/1995DE19511191A1 Photoresist wavy form deposition method for semiconductor lithography
09/28/1995DE19510449A1 Rotation error detection reticule for correcting photolithographic mask orientation
09/27/1995EP0674342A1 Pattern and method for evaluating focal point
09/27/1995EP0674231A1 Stripping compositions containing crown others
09/27/1995EP0674230A1 Apparatus and method for making a lithographic offset plate by the silver salt diffusion transfer process
09/27/1995EP0674229A1 Polymeric composition and method for surface detackification
09/27/1995EP0674228A1 Lithographic method
09/27/1995EP0674227A1 Imaging element and method for making a printing plate according to the silver salt diffusion transfer process
09/27/1995EP0674226A1 An imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process
09/27/1995EP0674225A1 Photosensitive resin composition and photosensitive film
09/27/1995EP0674224A1 Photosensitive composition and image formation using the same
09/27/1995EP0674200A1 Scanning near-field optic/atomic force microscope
09/27/1995EP0673888A1 Synthetic silica glass formed article for optical use and method for preparing the same
09/27/1995EP0673785A1 Black metal thermally imageable transparency elements
09/27/1995EP0648232A4 High purity thiol-ene composition.
09/27/1995CN2208714Y Table type continuous photo printing machine
09/27/1995CN1109215A Overlay measurement mark and method of measuring an overlay error between multi patterns in a semiconductor device using the measurement mark
09/26/1995US5453876 Microlens array
09/26/1995US5453816 Protective mask for pellicle
09/26/1995US5453814 Illumination source and method for microlithography
09/26/1995US5453413 Phototransformation of fullerenes
09/26/1995US5453404 Method for making an interconnection structure for integrated circuits
09/26/1995US5453345 Imaging medium
09/26/1995US5453341 Radiation-sensitive polymers and positive-working recording materials
09/26/1995US5453340 Photosensitive composition for volume hologram recording
09/26/1995US5453157 Low temperature anisotropic ashing of resist for semiconductor fabrication
09/26/1995US5452905 Spinning plate for substrates
09/26/1995US5452521 Workpiece alignment structure and method
09/21/1995DE19509173A1 Masse aus einem Epoxygruppen enthaltenden Cycloolefinharz Mass of an epoxy group-containing cyclo-olefin
09/20/1995EP0672955A1 Process for electrodeposition of resist formulations which contain metal salts of b-diketones
09/20/1995EP0672954A2 Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a traizine and use thereof in lithographic printing plates
09/20/1995EP0672953A2 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium
09/20/1995EP0672952A1 Positive photoresist composition
09/20/1995EP0672951A2 Lead-frame forming material
09/20/1995EP0672950A1 Waterless lithographic plate
09/20/1995EP0672944A1 Light-sensitive composition for black matrix, substrate for color filter, and liquid crystal display
09/20/1995EP0672269A1 Binary vapor adhesion promoters and methods of using the same
09/20/1995EP0671960A1 Liquid applicator with metering insert.
09/20/1995EP0245431B1 Photoimaging processes and compositions
09/20/1995CN1108767A Apparatus for managing liquid for removing glue used in photoetch
09/19/1995US5452090 Microlithography system
09/19/1995US5452054 Variable annular illuminator for photolithographic projection imager
09/19/1995US5452053 Wafer stepper
09/19/1995US5452052 Apparatus for exposing chemically amplified resist
09/19/1995US5452041 Apparatus for processing photographic sheet material
09/19/1995US5452039 Method and apparatus for calculating the area of moving sheet material useful in photographic development
09/19/1995US5451774 High density, three-dimensional, intercoupled optical sensor circuit
09/19/1995US5451489 Multilayer element wafers with photoresist layers treated with light
09/19/1995US5451488 Reticle having sub-patterns and a method of exposure using the same
09/19/1995US5451484 Positive resist composition
09/19/1995US5451480 Artical fabrication utilizing lithographic processes
09/19/1995US5451479 Method of forming a pattern of a multilayer type semiconductor device
09/19/1995US5451343 Fluorone and pyronin y derivatives
09/19/1995US5451295 Process for removing film from a substrate
09/19/1995US5451293 Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma
09/14/1995WO1995024736A1 High vertical aspect ratio thin film structures
09/14/1995WO1995024674A1 Stable, ionomeric photoresist emulsion and process of preparation and use thereof
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