Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
09/2004
09/15/2004EP1457823A2 Photosensitive element for use as flexographic printing plate
09/15/2004EP1457817A1 Granulated solid processing agent for silver halide photographic material and producing method of the same
09/15/2004EP1332405A4 Single part color photographic developer concentrate
09/14/2004US6791593 Image formation on heat-developable light-sensitive material and image forming apparatus
09/14/2004US6790600 Method of color photographic processing for color photographic papers
09/14/2004US6790585 Method for developing a high contrast photographic material containing a polyhydrazide nucleating agent
09/14/2004US6790569 Variations in photosensitivity
09/10/2004WO2004077154A2 Lithographic printing with polarized light
09/09/2004US20040175661 Granular solid photographic processing agent and production method thereof
09/09/2004US20040175657 Dual-solder flip-chip solder bump
09/09/2004US20040175635 Alternating phase shift mask design with optimized phase shapes
09/09/2004US20040175630 overlying an absorber stack that overlies a reflective substrate; the multilayer antireflective coating has layers of nitrogen, oxygen and nitrogen combined with the predetermined metal of the upper layer of the absorber stack; making semiconductors at lower wavelengths
09/09/2004US20040175629 Stack overcoating semiconductor substrate; ruthenium or chromium layer; patterning using optical radiation
09/08/2004EP1455226A1 Granular solid photographic processing agent and production method thereof
09/08/2004EP1455225A1 Thermally developable emulsions and materials containing heterocyclic disulfide compounds
09/08/2004EP1454189A1 Method for processing a color reversal photographic film
09/08/2004EP1454188A1 Method for preparing a new composite material with improved efficiency and said new composite material
09/08/2004CN1527131A 摄影作品 Photography
09/02/2004US20040171506 A composition for photographic bleaching contains a peracid bleaching agent such as a peroxide, persulfate, or periodate, and a cyclicaminomethanediphosphonic acid or a salt thereof as a stabilizing compound. This bleaching composition can also
09/01/2004EP1452910A1 Photographic peracid bleaching compositon, processing kit, and method of use
09/01/2004CN1525245A Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device
09/01/2004CN1525244A Photographic peracid bleaching composition, processing kit, and method of use
08/2004
08/31/2004US6783924 Colour photographic silver halide material
08/26/2004WO2004072735A1 Mask correcting method
08/26/2004WO2004072734A2 Transmission mask with differential attenuation to improve iso-dense proximity
08/26/2004US20040166419 Resolution and process window improvement using lift-off
08/26/2004US20040166418 Adjusting line width deviations
08/26/2004US20040165281 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
08/26/2004US20040165279 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus
08/26/2004DE4124569B4 Filmbearbeitungsvorrichtung Film processor
08/25/2004EP1449030A1 Solutions for a photographic reversal bath and processing method for a photographic color reversal film
08/25/2004CN1523639A Photomask, pattern formation method using photomask and mask data creation method
08/24/2004US6780571 Upside down bake plate to make vertical and negative photoresist profile
08/24/2004US6780548 Decreased diffraction
08/19/2004US20040161713 Processing stability and which has realized a replenishment reduction with respect to processing solutions
08/19/2004US20040161680 Photographic article
08/19/2004US20040161678 For forming a fine pattern in fabrication of semiconductor integrated circuit devices
08/19/2004US20040161677 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device
08/19/2004US20040161675 Phase shifting lithographic process
08/19/2004US20040161674 Graytone mask and method thereof
08/18/2004EP1447965A2 Photographic article with both positive and negative copies of an image
08/18/2004EP1447711A2 Photomask, pattern formation method using photomask and mask data creation method
08/17/2004US6777345 Patterning methods for fabricating semiconductor devices
08/17/2004US6777174 Photosensitive material including a substrate and photographic layers containing a yellow color-developing blue light-sensitive silver halide emulsion layer, a magenta color-developing green light-sensitive silver halide emulsion layer,
08/17/2004US6777147 Method for evaluating the effects of multiple exposure processes in lithography
08/17/2004US6777146 Adjusting line width deviations
08/12/2004WO2004068239A1 Image forming method
08/12/2004US20040157176 Forming the silver halide grains by mixing a silver salt and a halide salt in a dispersing medium; subjecting the silver formed silver halide grains to selenium sensitization
08/12/2004US20040157175 Silver halide color photographic light-sensitive material, and image-forming method
08/12/2004US20040157172 Method of color photographic processing for color photographic papers
08/12/2004US20040157155 Polymers, resist compositions and patterning process
08/12/2004US20040157135 For the proximity effects in the imaging of patterns in a photolithography
08/11/2004EP1445650A1 Method of color photographic processing for color photographic papers
08/11/2004CN1520532A Digital film processing solutions and method of digital film processing
08/11/2004CN1519955A Thin film transistor array panel, its mfg. method and mask for such panel
08/11/2004CN1519645A Silver-halide emulsion, its prepn. method, and silver-halide photograph material
08/10/2004US6773871 Method of machining glass
08/10/2004US6773865 Applying a self-assembled monolayer having metal ligand sites to a substrate; binding a metal deposit to ligand sites of metal ligating self- assembled monolayer; applying a resist to metal deposit
08/10/2004US6773174 Photofinishing processing system and a processing solution supply cartridge for the processing system
08/05/2004WO2004066358A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
08/05/2004WO2004066028A2 Method for process optimization and control by comparison between 2 or more measured scatterometry signals
08/05/2004WO2004065287A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
08/05/2004US20040151988 EUV mask blank defect mitigation
08/04/2004EP1442336A1 Process for preparing p-phenylenediamine color developers in a concentrated free-base form
08/04/2004CN1517796A 曝光装置 Exposure device
08/04/2004CN1517790A Emulsion and material cntaining triazine-thioketone compound for heat development material
08/04/2004CN1517789A Silver halides color photographic sensitive material and color image forming method
08/04/2004CN1517788A Silver halide emulsions and silver halide photographic material
08/03/2004US6770429 Single part color photographic developer concentrate
08/03/2004US6770402 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same
08/03/2004CA2125087C Antistatic stabilizer and final wash additive for photo developing
07/2004
07/29/2004US20040147129 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate
07/29/2004US20040146819 Photothermographic material
07/29/2004US20040146816 Silver halide emulsion and silver halide photographic material
07/29/2004US20040146814 low amounts of water absorption (excellent hardening properties) before entering the drying section of the processing cycle and without black dots or lines due to pressure sensitization, without loss in speed or sensitivity
07/29/2004US20040146813 Thermally developable imaging materials with reduced mottle providing improved image uniformity
07/29/2004US20040146811 filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained
07/29/2004US20040146789 based on discovery that the flatness of the mask substrate was degraded after chucked depending on the surface shape of the mask substrate, and found that such degraded flatness was a major cause to lower the product yield
07/29/2004US20040146560 Oriented nanostructures and methods of preparing
07/27/2004US6768538 Photolithography system to increase overlay accuracy
07/27/2004US6767693 Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices
07/27/2004US6767692 Forming photoresist-free and antireflective coating-free peripheral upper surface on substrate bounded by smooth and accurate sidewall on photoresist layer by photolithographic termination of outer perimeter of photoresist layer
07/27/2004US6767681 Preventing reproduction of prints, motion picture films or negatives, by marking, then analyzing during development
07/22/2004US20040142287 silver halide having a high silver iodide content; binder contains polymer latex; reducing agent is a bisphenol, e.g., 2,2'-isobutylidenebis(4,6-dimethylphenol); high sensitivity, low fogging, and excellent image stability
07/22/2004US20040142286 Use of partially fluotinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
07/22/2004US20040142281 layer of hydrogen silsesquioxane on top of carbon layer; electrons passing through the resist layer conducted away through the carbon layer to prevent buildup of electrons which repel electrons from the e-beam resulting in a less focused e-beam
07/22/2004US20040142256 Alternate side lithographic substrate imaging
07/22/2004US20040142252 Method of machining glass
07/22/2004US20040142249 making integrated circuits using absorbent transmission masks that can be repaired
07/22/2004US20040140453 Heating a cesium halide with a Europium compound containing one or more halides, cooling mixture, and recovering the CsX:Eu phosphor
07/22/2004DE10361273A1 Vorrichtung und Verfahren zum Verbessern der Resistlinienrauhheit bei der Bearbeitung von Halbleiterscheiben Apparatus and method for improving the resist line roughness in the machining of semiconductor wafers
07/22/2004DE10356663A1 Übertragung von Strukturen bei der Herstellung von Bauelementen Transfer of structures in the manufacture of components
07/21/2004EP1439415A1 Industrial radiographic silver halide material suitable for rapid processing applications
07/21/2004EP1439414A1 Thermally developable emulsions and materials containing triazinethione compounds
07/21/2004CN1514301A 改进的光引发剂 Improved photoinitiators
07/21/2004CN1158243C N-bis- or N-tris-[(1,2-dicarboxy-ethoxy)-ethyl]-amine derivatives and preparation and use of the same
07/20/2004US6764819 Method for chemiluminescent detection
07/20/2004US6764814 Photographic developing composition and use thereof in the development of a photographic element
07/15/2004WO2004040371A3 Novel copolymer and photoresist compositions thereof
07/15/2004US20040137384 Exposure substrate in vacuum; vibrating absorption supports ; gas springs; metal beellows; accuracy
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