Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
01/2007
01/24/2007CN1901222A Method and apparatus for epitaxially coating semiconductor wafer, and coated semiconductor wafer
01/24/2007CN1901172A Semiconductor wafer and process for producing a semiconductor wafer
01/24/2007CN1900387A Formulation and preparation of solar energy grade silicon single crystal material
01/24/2007CN1900386A Method for epitaxial growing AlxGa1-xN single crystal film on saphire lining bottom material
01/24/2007CN1900015A Quick preparing method for textured single phase hexagonal ferrite
01/24/2007CN1296970C Nitride semiconductor, semiconductor device and manufacturing method thereof
01/24/2007CN1296969C Method of forming semiconductor device
01/24/2007CN1296529C Single crystal silicon wafer and single crystal silicon production method
01/24/2007CN1296528C Apparatus and method for diamond production
01/24/2007CN1296526C Annealed low defect density single crystal silicon
01/24/2007CN1296525C Process for preparing defect free silicon crystal which allows for variability in process conditions
01/23/2007US7166523 Silicon carbide and method of manufacturing the same
01/23/2007US7166522 Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch
01/23/2007US7166176 Cast single crystal alloy component with improved low angle boundary tolerance
01/23/2007US7166162 Terbium type paramagnetic garnet single crystal and magneto-optical device
01/23/2007US7166161 Anisotropic film manufacturing
01/23/2007CA2331893C Fabrication of gallium nitride semiconductor layers by lateral growth from trench sidewalls
01/18/2007WO2007007587A1 ORIENTATION CONTROLLED Co OXIDE POLYCRYSTAL
01/18/2007WO2007007479A1 Process for producing single crystal
01/18/2007WO2007007456A1 Process for producing single crystal
01/18/2007WO2007006268A1 Method for production of a bead single crystal
01/18/2007WO2006125069A3 A high resistivity silicon structure and a process for the preparation thereof
01/18/2007WO2006097804A3 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy
01/18/2007WO2006031378A3 Progesterone receptor structure
01/18/2007WO2005108635A3 Single crystal shape memory alloy devices and methods
01/18/2007US20070015270 Crystalline PDE4D2 catalytic domain complex, and methods for making and employing same
01/18/2007US20070015269 Crystals of DPP-IV
01/18/2007US20070012943 Group III nitride semiconductor substrate and manufacturing method thereof
01/18/2007DE102005032594A1 Verfahren zur Herstellung eines Bead-Einkristalls A process for preparing a bead single crystal
01/18/2007DE102005030853A1 Verfahren zur Herstellung von dotierten Halbleiter-Einkristallen, und III-V-Halbleiter-Einkristall A process for the production of doped semiconductor single crystals, and III-V semiconductor single crystal
01/17/2007EP1744378A1 Piezoelectric single crystal element and method for fabricating the same
01/17/2007EP1744190A2 A method of processing a substrate made of a ferroelectric single crystalline material
01/17/2007EP1743961A1 Compound semiconductor substrate
01/17/2007EP1743960A1 Self-coated single crystal, and production apparatus and process therefor
01/17/2007EP1743055A1 Method for the growth of semiconductor ribbons
01/17/2007EP1743054A1 Preparation of nanoparticle materials
01/17/2007EP1742870A1 Method and installation for the production of blocks of a semiconductor material
01/17/2007EP1399766B1 Exposure apparatus comprising an optical element made of an isometric crystal
01/17/2007CN2858676Y Electric control device for zone melting silicon single crystal furnace
01/17/2007CN1898778A Method for producing group iii nitride crystal, group iii nitride crystal obtained by such method, and group iii nitride substrate using same
01/17/2007CN1896344A Method for doping oxygen to gallium nitride crystal and oxygen-doped n-type gallium nitride single crystal substrate
01/17/2007CN1896343A Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
01/17/2007CN1896342A Ytterbium-doped lutecium disilicate laser crystal and its preparation
01/17/2007CN1896341A Low-temperature alkaline-solution synthesis of oxygen metal inorganic compound monocrystal nano-material
01/17/2007CN1896340A Homogeneous-thickness silicon-phase epitaxial-layer growth device and method
01/17/2007CN1896339A Process for producing silicon semiconductor wafers with defined defect properties, and silicon semiconductor wafers having these defect properties
01/17/2007CN1896338A Growth of tricesium borate monocrystal cosolvent
01/17/2007CN1896021A 石英玻璃坩埚 Quartz glass crucible
01/17/2007CN1295790C Heavy current medium film and its manufacturing method, heavy-current medium storage, piezoelectric element
01/17/2007CN1295527C Diamond-structure photo crystal with hollow-medium ball and preparing method thereof
01/17/2007CN1295386C Method for growing gadolinium orthosilicate monocrystal
01/17/2007CN1295384C Process for collimated beam shaped nano zinc oxide crystal whisker
01/16/2007US7164187 Semiconductor and semiconductor substrate, method of manufacturing the same, and semiconductor device
01/16/2007US7163874 Ferroelectric thin film manufacturing method, ferroelectric element manufacturing method, surface acoustic wave element, frequency filter, oscillator, electronic circuit, and electronic apparatus
01/11/2007WO2007005816A2 Low-temperature catalyzed formation of segmented nanowire of dielectric material
01/11/2007WO2007004730A1 Highly pure hexagonal boron nitride single crystal powder capable of emitting far-ultraviolet light at high brightness level, and method for production thereof
01/11/2007WO2007004495A1 Process for producing crystal with supercrtical solvent, crystal growth apparatus, crystal, and device
01/11/2007WO2006041660A3 100 mm silicon carbide wafer with low micropipe density
01/11/2007WO2005122267A8 Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy
01/11/2007US20070007242 Method and system for producing crystalline thin films with a uniform crystalline orientation
01/11/2007US20070006797 Lithium tantalate substrate and method for producing same
01/11/2007DE102005031692A1 New high ohmic silicon carbide single crystals, useful as substrates in semiconductor components, have controlled, low content of sulfur as electrically active multiple donor component
01/10/2007EP1741809A1 Electrostatic charge controlling process for piezoelectric oxide single crystal and apparatus for electrostatic charge controlling process
01/10/2007EP1741808A1 InP SINGLE CRYSTAL WAFER AND InP SINGLE CRYSTAL MANUFACTURING METHOD
01/10/2007EP1741807A1 Apparatus for production of crystal of group iii element nitride and process for producing crystal of group iii element nitride
01/10/2007EP1740742A1 Manufacture of cadmium mercury telluride
01/10/2007EP1740735A1 Heat treatment method for monocrystalline or directionally solidified structural components
01/10/2007EP1740331A2 Method and arrangement for crystal growth from fused metals or fused solutions
01/10/2007EP1606103A4 Rapid generation of nanoparticles from bulk solids at room temperature
01/10/2007CN1894771A Non-polarity (Al, B, Inc, Ga) N Quantum pit
01/10/2007CN1894611A Method for producing photon crystal and controllable defect therein
01/10/2007CN1894446A Large area, uniformly low dislocation density GaN substrate and process for making the same
01/10/2007CN1894445A Process to produce a CU(IN,GA)SE2 single crystal powder and monograin membrane solarcell comprising this powder
01/10/2007CN1894093A Vicinal gallium nitride substrate for high quality homoepitaxy
01/10/2007CN1891867A Process and equipment for continuously producing tetrapod-like zinc oxide whisker
01/10/2007CN1891866A Growth of colorless silicon carbide crystal
01/10/2007CN1294629C Silicon semiconductor crystal wafers and manufacturing method for multiple semiconductor crystal wafers
01/10/2007CN1294297C Process for preparing silicon carbide crystal whisker
01/09/2007US7161173 P-type group II-VI semiconductor compounds
01/09/2007US7161148 Tip structures, devices on their basis, and methods for their preparation
01/09/2007US7161029 Prepared by mixing a lysine-based solution with sulfuric acid at -10 to 35 degrees C., and allowing crystals to form that are characterized by having peaks at diffraction angles 2 theta of 16.6 degrees and 17.0 degrees as measured by powder X-ray diffraction
01/09/2007US7160763 Polycrystalline TFT uniformity through microstructure mis-alignment
01/09/2007US7160617 Boron doped diamond
01/09/2007US7160613 Stabilized semiconductor nanocrystals
01/09/2007US7160388 Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride
01/09/2007US7160387 High purity silica crucible by electrolytic refining, and its production method and pulling method
01/09/2007US7160381 Forming basic calcium phosphate whiskers or fine crystals on the surface of Ca4(PO4)20 particles by treating with a whisker-inducing solution and heating up to 1000 degrees C. to form a fast-setting, bioresorbable calcium phosphate cement
01/09/2007CA2148290C Hot corrosion resistant single crystal nickel-based superalloys
01/04/2007WO2007001184A1 Method for producing directionally solidified silicon ingots
01/04/2007WO2007001031A1 Process for producing fine diamond and fine diamond
01/04/2007WO2007000864A1 Quartz glass crucible for pulling up of silicon single crystal and process for producing the quartz glass crucible
01/04/2007WO2007000271A1 Reinforced micromechanical part
01/04/2007WO2006124152A3 Method for using a static electric field to induce crystallization and to control crystal form
01/04/2007US20070004106 Technique for perfecting the active regions of wide bandgap semiconductor nitride devices
01/04/2007US20070001175 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer
01/04/2007US20070000429 Method for producing single crystal and single crystal
01/04/2007DE20122681U1 Device for growing large volume single crystals has heating element arranged on side walls of melt crucible to prevent lateral radial heat flow
01/04/2007DE102005030851A1 Device for heat-treating III-V semiconductor wafers comprises a wafer carrier with dimensions such that a cover is formed close to the wafer surface
01/04/2007DE102005029162A1 Solar cell with a whisker structure of monocrystalline silicon wherein the whiskers are oriented randomly
01/04/2007CA2840566A1 Lithium manganese compounds and methods of making the same