Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
02/2008
02/06/2008CN101118940A Built crystal substrate and liquid built crystal growing method
02/06/2008CN101118851A Method of manufacturing semiconductor device
02/06/2008CN101117730A Multi-stage ordered arranged ZSM-5 nano rod bundle and preparation method thereof
02/06/2008CN101117729A Method for treating water solution heavy metallic ion by using trititanic acid sodium whisker
02/06/2008CN101117728A Method for synthesizing sodium titanate whisker
02/06/2008CN101117290A Method for preparing nano strontium titanate by lactic acid adjuvant process
02/06/2008CN100367525C Superconductor method and reactor
02/06/2008CN100367509C High-resisting silicon carbide substrate for semiconductor devices with high breakdown voltage
02/06/2008CN100366802C Coloured diamond
02/05/2008US7326908 Optically-regulated optical emission using colloidal quantum dot nanocrystals
02/05/2008US7326652 Atomic layer deposition using photo-enhanced bond reconfiguration
02/05/2008US7326598 Method of fabricating polycrystalline silicon
02/05/2008US7326477 Optoelectronic devices, light emitting diodes (LEDs) and lasers; specific crystallographic orientation, and the flats are provided to extend along desired plane sets. The flats may advantageously identify orientation of cleavage planes, and direction of cleavage of cleavage planes
02/05/2008US7326434 Precursor solutions and methods of using same
02/05/2008US7326395 Wafer is occupied by N region outside OSF region generated in a ring shape in the radial direction of a single crystal, and Fe concentration of the entire plane in the radial direction including a peripheral part of the wafer is 1x1010 atoms/cm3 or less; produced by the Czochralski method
02/05/2008US7326296 High throughput screening of crystallization of materials
02/05/2008US7326295 Fabrication method for polycrystalline silicon thin film and apparatus using the same
02/05/2008US7326293 Patterned atomic layer epitaxy
02/05/2008US7326292 Quality evaluation method for single crystal ingot
01/2008
01/31/2008WO2008013108A1 Process for producing single-crystal substrate with off angle
01/31/2008WO2008012215A1 Method and device for producing classified high-purity polycrystalline silicon fragments
01/31/2008WO2007059251A9 New diamond uses/applications based on single-crystal cvd diamond produced at rapid growth rate
01/31/2008US20080026234 Epitaxial oxide films via nitride conversion
01/31/2008US20080023710 Method of growing a nitride single crystal on silicon wafer, nitride semiconductor light emitting diode manufactured using the same and the manufacturing method
01/31/2008US20080022921 Group III-Nitride Crystal, Manufacturing Method Thereof, Group III-Nitride Crystal Substrate and Semiconductor Device
01/31/2008DE10304533B4 Bead-Kristall sowie Verfahren zur Herstellung eines Bead-Kristalls und Verwendung Bead-crystal and methods of making and using a bead crystal
01/31/2008DE102005013787B4 Verfahren zur Erzeugung eines Arsen-Dotiermittel für das Ziehen von Siliziumeinzelkristallen Method for generating a arsenic dopant for pulling of silicon single crystals
01/31/2008DE102005013410B4 Vorrichtung und Verfahren zum Kristallisieren von Nichteisenmetallen Apparatus and method for crystallizing non-ferrous metals
01/30/2008EP1882057A2 A high resistivity silicon structure and a process for the preparation thereof
01/30/2008EP1254861B1 Silicon continuous casting method
01/30/2008CN101113532A Laser and non-linear optical bismuth phosphate crystal and preparation and usage thereof
01/30/2008CN101113531A Fluxing medium growing method for fluoroboric acid calcium non-linear optical crystal
01/30/2008CN100365778C Method of fabricating polysilicon thin film and thin film transistor using polysilicon fabricated by the same method
01/30/2008CN100365760C Method for manufacturing semiconductor device, semeconductor device and electronic product
01/30/2008CN100365173C Method of production of silicon carbide single crystal
01/30/2008CN100365172C Yb and Er -codoped gadolinium silicate laser crystal and preparation method therefor
01/30/2008CN100365171C Method for preparing flaky monocrystal lanthanum bismuth titanate powder by molten salt method
01/30/2008CN100365170C SnO2 monodisperse nano monocrystal with square structure and synthesis method thereof
01/29/2008US7323356 Growing a base thin film on a single-crystal substrate; depositing amorphous or polycrystalline LnCuOX thin film to form laminate; and annealing film at 500 degrees C. or more in a vacuum environment; light-emitting diodes, semiconductor leasers, filed-effect transistors, hetero-bipolar transistors
01/29/2008US7323256 Uncut single crystal III-V nitride (optionally doped) having a large area of at least 15 cm2 on a face and a uniformly low dislocation density not exceeding 3x106 dislocations per cm2 of growth surface area on the face; wafers for microelectronic and opto-electronic devices
01/29/2008US7323249 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
01/29/2008US7323051 One hundred millimeter single crystal silicon carbide wafer
01/29/2008US7323049 synthesizing superabrasive particles, wherein crystalline seeds can be arranged in a predetermined pattern; high yield of high quality industrial particles and a narrow distribution of particle sizes
01/29/2008US7323048 Method for producing a single crystal and a single crystal
01/24/2008WO2008011022A1 Method of manufacturing substrates having improved carrier lifetimes
01/24/2008WO2008010583A1 Piezoelectric substance, piezoelectric element, and liquid discharge head and liquid discharge apparatus using piezoelectric element
01/24/2008WO2008010541A1 Method for reducing dislocation in group iii nitride crystal and substrate for epitaxial growth
01/24/2008WO2008009805A1 Method for the growth of indium nitride
01/24/2008US20080019896 Inp Single Crystal Wafer and Method for Producing Inp Single Crystal
01/24/2008US20080017802 Fluorescent Material, a Method of Manufacturing the Fluorescent Material, a Radiation Detector Using the Fluorescent Material, and an X-Ray Ct Scanner
01/24/2008CA2657929A1 Method of manufacturing substrates having improved carrier lifetimes
01/23/2008EP1881094A1 Process for producing group iii element nitride crystal, apparatus for producing group iii element nitride crystal, and group iii element nitride crystal
01/23/2008EP1881093A2 Silicon single crystal wafer for IGBT and method for manufacturing silicon single crystal wafer for IGBT
01/23/2008EP1504368A4 Method for crystallizing human gsk3 and novel crystal structure thereof
01/23/2008EP1404902A4 High surface quality gan wafer and method of fabricating same
01/23/2008EP1268882A4 Axial gradient transport apparatus and process for producing large size, single crystals of silicon carbide
01/23/2008CN101109108A Process for producing cadmium sulfide quantum wire
01/23/2008CN101109107A Production method for controlling yttrium-barium-copper-oxygen superconducting thick film surface internal orientation growth in oxygen ambient
01/23/2008CN101109106A Process for producing aluminum oxide crystal whisker
01/23/2008CN101109105A Graphite boat for improving mercury cadmium telluride rheotaxy membrane surface shape
01/23/2008CN101109102A Method of synthesizing organic-inorganic compound germanium oxide monocrystal nano thread
01/23/2008CN101109100A Process for producing indium oxide nanocrystalline with controlled shape
01/23/2008CN101108783A Organic semicondutor element
01/23/2008CN100363369C Laminated organic-inorganic perofskite with metal defect inorganic frame
01/23/2008CN100363253C Method for developing crystal of aluminium phosphate through cosolvent
01/17/2008WO2008007559A1 Oxide phosphor epitaxial thin film
01/17/2008WO2008007336A2 A method for producing diamond material
01/17/2008US20080014723 Iii-v nitride semiconductor substrate and its production method
01/17/2008US20080011224 Method for producing hexagonal boron nitride single crystal and hexagonal boron nitride single crystal
01/16/2008EP1738199B1 Scintillator material based on rare earth with a reduced nuclear background
01/16/2008CN101106082A Method for the simultaneous double-side grinding of a plurality of semiconductor wafers, and semiconductor wafer having outstanding flatness
01/16/2008CN101104953A Method for preparing TiO2 nano material by direct current deposition method using anode aluminum oxide as template
01/16/2008CN101104952A High doping concentration silicon carbide epitaxial growth method
01/16/2008CN101104951A Method for preparing samarium-barium-copper-oxygen single-orientation superconductive block
01/16/2008CN101104950A Fluxing agent growth method for trigallium phosphate crystal
01/16/2008CN101104949A Zn(1-x)Mn(x)O crystal thin film with cube phase and rock salt ore structure
01/16/2008CN100362147C Process for preparing nano barium titanate and doped solid solution by low temperature solid state reaction
01/16/2008CN100362146C Terbium paramagnetic garnet single crystal and magneto-optical device
01/16/2008CN100362145C Non-linear optics crystal material, process for preparing the same and purposes thereof
01/16/2008CN100362144C Method for preparing borate-based crystal and laser oscillation apparatus
01/16/2008CN100362143C Method of preparing nanocrystalline silicon thin film in high pressure heat filling hydrogen and special apparatus for the same
01/10/2008WO2008005636A1 One hundred millimeter sic crystal grown on off-axis seed
01/10/2008WO2008004657A1 p-TYPE ZINC OXIDE THIN FILM AND METHOD FOR FORMING THE SAME
01/10/2008WO2008004424A1 PROCESS FOR PRODUCING SUBSTRATE OF AlN CRYSTAL, METHOD OF GROWING AlN CRYSTAL, AND SUBSTRATE OF AlN CRYSTAL
01/10/2008WO2007137182A3 Controlling agglomerated point defect and oxygen cluster formation induced by the lateral surface of a silicon single crystal during cz growth
01/10/2008WO2007133358A3 Semiconductor buffer structures
01/10/2008WO2007128522A3 Process for producing a iii-n bulk crystal and a free-standing iii -n substrate, and iii -n bulk crystal and free-standing ih-n substrate
01/10/2008WO2007102799A3 Synthesis of alloyed nanocrystals in aqueous or water-soluble solvents
01/10/2008US20080008642 Process For Producing Aluminum Nitride Crystal And Aluminum Nitride Crystal Obtained Thereby
01/10/2008US20080008438 Self-Coated Single Crystal, And Production Apparatus And Process Therefor
01/10/2008DE10111778B4 Supraleiter-Zwischenprodukt und seine Verwendung Superconductor intermediate and its use
01/09/2008EP1876270A1 METHOD FOR GROWTH OF GaN SINGLE CRYSTAL, METHOD FOR PREPARATION OF GaN SUBSTRATE, PROCESS FOR PRODUCING GaN-BASED ELEMENT, AND GaN-BASED ELEMENT
01/09/2008EP1876269A1 Oxide single crystal and method for production thereof, and single crystal wafer
01/09/2008EP1875512A1 Diamond transistor and method of manufacture thereof
01/09/2008EP1874985A1 Method of and system for forming sic crystals having spatially uniform doping impurities
01/09/2008EP1874983A1 Support for manufacturing a strip based on polycrystalline sillicon
01/09/2008EP1874685A1 Method and apparatus for the continuous production and functionalization of single-waled carbon nanotubes using a high frequency plasma torch
01/09/2008EP1751329B1 Method of sic single crystal growth and sic single crystal
01/09/2008CN100361323C Nitride semiconductor substrate and method of producing same
01/09/2008CN100360721C Method for mfg. ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device