Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
03/2008
03/26/2008CN101148779A Preparation method for potassium titanate crystal whisker
03/26/2008CN101148778A Hydroxyapatite crystal whisker with high length-diameter ratio and preparation method thereof
03/26/2008CN101148777A Method and device for growing gallium-mixing silicon monocrystal by czochralski method
03/26/2008CN101148776A Epitaxy growth method for gallium antimonide on gallium arsenide substrate
03/26/2008CN100377306C Non-polar single crystalline A-plane nitride semiconductor wafer and preparation method thereof
03/26/2008CN100376727C Method of manufacturing group-III nitride crystal
03/26/2008CN100376726C Silicon carbide crystal whisker generation furnace and method for producing silicon carbide crystal whisker
03/26/2008CN100376725C CaB4 compound crystal and preparation method thereof
03/26/2008CN100376724C Method for flux growth of Na3La9B8027
03/26/2008CN100376317C High temperature high pressure capsule for processing material in supercritical fluid
03/25/2008US7348718 Discharge electrode implemented by a wide bandgap semiconductor and a discharge lamp using the same
03/25/2008US7348670 Nanostructure, electronic device and method of manufacturing the same
03/25/2008US7348200 Method of growing non-polar a-plane gallium nitride
03/25/2008US7348076 sapphire single crystal is in the form of a sheet having a length>width>>thickness, the width not being less than 15 centimeters and the thickness being not less than about 0.5 centimeters
03/25/2008US7347956 Ytterbium (Yb) mixed oxide having a base crystal consisting of garnet single crystal or a borate single crystal; forms an optically active charge transfer state (CTS) together with a neighboring negative ion; achieve a high-accuracy scintillation detector for enhanced resolution tomography scan
03/25/2008CA2406347C Gan substrate, method of growing gan and method of producing gan substrate
03/20/2008WO2008032752A1 Substrate production equipment
03/20/2008WO2008031229A1 Process and apparatus for purifying low-grade silicon material
03/20/2008WO2007143743A3 High volume delivery system for gallium trichloride
03/20/2008US20080069953 three gas inlet zones disposed vertically one above the other, located between the ceiling and the heated floor; vapor deposition of semiconductor crystalline layers; reduce the horizontal extent of the inlet zone
03/20/2008US20080067493 Diamond Electron Emission Cathode,Electron Emission Source,Electron Microscope,And Electron Beam Exposure Device
03/19/2008EP1900859A1 Composite comprising array of acicular crystal, process for producing the same, photoelectric conversion element, luminescent element, and capacitor
03/19/2008EP1900858A1 Epitaxial wafer and method of producing same
03/19/2008EP1900857A1 Method of manufacturing single crystalline gallium nitride thick film
03/19/2008EP1900856A2 Silicon carbide manufacturing device and method of maufacturing silicon carbide
03/19/2008EP1899261A2 Semiconducting nanoparticles with surface modification
03/19/2008EP1565484B1 Mesoporous glass as nucleant for macromolecule crystallisation
03/19/2008EP1337698A4 Single crystals of lead magnesium niobate-lead titanate
03/19/2008EP1328014B1 Semiconductor base material and method of manufacturing the material
03/19/2008CN101146936A Magnesium oxide single crystal and method for producing same
03/19/2008CN101146743A Process for the production of si by reduction of siclj with liquid zn
03/19/2008CN101145516A Silicon base nitride single crystal thin film epitaxial structure and growth method
03/19/2008CN101144188A Orthogonal structure BC3N crystal and preparation method thereof
03/19/2008CN101144187A Y and Zn double doping lead tungstate crystal and preparation method thereof
03/19/2008CN101144186A Method for synthesizing potassium hexatitanate crystal whisker
03/19/2008CN101144185A Method for growing near-stoichiometric ratio lithium niobate crystal
03/19/2008CN101144184A Crystalline metal film
03/19/2008CN101144183A Method for preparing gold micron crystal with surface enhanced Raman active branched surface
03/19/2008CN101144182A Method of growing gallium nitride crystal
03/19/2008CN101143357A Nanocrystalline film and its low temperature preparing method
03/19/2008CN100375795C Magnesium borate whisker hydrothermal synthesis preparation method
03/18/2008US7344753 Noncatalytically forming a nanowire on a substrate from an organometallic vapor without any type of reducing agent; use of Copper (ethylacetoacetate)trialkyl phosphite as copper precursor for example; integrated circuits
03/18/2008US7344595 Method and apparatus for purification of crystal material and for making crystals therefrom and use of crystals obtained thereby
03/18/2008US7344594 Melter assembly and method for charging a crystal forming apparatus with molten source material
03/13/2008WO2008029827A1 PROCESS FOR PRODUCING AlN CRYSTAL
03/13/2008WO2008029736A1 Method for separating surface layer or growth layer of diamond
03/13/2008WO2008029589A1 Method and equipment for producing group-iii nitride
03/13/2008WO2008029579A1 Silicon single-crystal wafer and process for producing the same
03/13/2008WO2008028522A1 A method of synthesizing semiconductor nanostructures and nanostructures synthesized by the method
03/13/2008WO2007081492A9 High growth rate methods of producing high-quality diamonds
03/13/2008US20080060381 Ferroelectric film, method of manufacturing the same, ferroelectric memory and piezoelectric device
03/13/2008DE102006041513A1 Hochtemperatur-Schichtsupraleiteraufbau und Verfahren zu seiner Herstellung High-temperature layer superconductor structure and process for its preparation
03/13/2008CA2662594A1 Method and apparatus for producing a group iii nitride
03/12/2008EP1897978A1 Manufacturing method of group III nitride substrate, group III nitride substrate, group III nitride substrate with epitaxial layer, group III nitride device, manufacturing method of group III nidtride substrate with epitaxial layer, and manufacturing method of group III nitride device
03/12/2008EP1897977A1 Method of growing silicon single crystal
03/12/2008EP1897976A2 Method for producing silicon single crystal and method for producing silicon wafer
03/12/2008EP1897965A1 A process for eliminating precipitates from a semiconductor II-VI material by annealing.
03/12/2008EP1897853A1 Process for producing conductive mayenite compound
03/12/2008EP1897123A2 A cold-walled vessel process for compounding, homogenizing and consolidating semiconductor compounds
03/12/2008EP1896636A2 Nanorod arrays formed by ion beam implantation
03/12/2008EP1778890B1 Method for production of reactors for the decomposition of gases
03/12/2008EP1684973A4 Vicinal gallium nitride substrate for high quality homoepitaxy
03/12/2008EP1614166A4 Fluidic nanotubes and devices
03/12/2008EP1583858A4 Sacrificial template method of fabricating a nanotube
03/12/2008CN101142235A Estrogen receptor structure
03/12/2008CN101139734A Method for preparing calcium carbonate crystal whisker
03/12/2008CN101139733A Monocrystalline semiconductor wafer comprising defect-reduced regions and method for producing it
03/12/2008CN100375233C Fabrication method for polycrystalline silicon thin film and display device fabricated using the same
03/12/2008CN100374628C Method and device for prodn. of silicon single crystal, silicon single crystal, and silicon semiconductor wafers with determined defect distributions
03/12/2008CN100374627C Method for producing high purity silica crucible by electrolytic refining, mfg. method of crucible and pulling method
03/12/2008CN100374626C Method and device for growing sapphire crystal by laser
03/12/2008CN100374369C Method of treating carbon nano tube using electric arc discharging
03/11/2008US7341929 Method to fabricate patterned strain-relaxed SiGe epitaxial with threading dislocation density control
03/11/2008US7341787 doping silicon or germanium with group III compounds for p-type doping and to group V compounds for n-type doping, coating with an epitaxial layer and optionally having structures formed by electronic components; substrates having low electrical resistance
03/11/2008US7341628 Method to reduce crystal defects particularly in group III-nitride layers and substrates
03/11/2008CA2444561C Biofunctional hydroxyapatite coatings and microspheres for in-situ drug encapsulation
03/06/2008WO2008028051A1 High-index uv opitcal materials for immersion lithography
03/06/2008WO2008026931A1 Method and equipment for manufacturing multi-crystalline solar grade silicon from metallurgical silicon
03/06/2008US20080057324 Epitaxial wafer and method of producing same
03/06/2008US20080057323 Epitaxial silicon wafer and fabrication method thereof
03/06/2008US20080057197 Chemical vapor deposition reactor having multiple inlets
03/06/2008US20080056984 Hexagonal Wurtzite Type Single Crystal, Process For Producing The Same, And Hexagonal Wurtzite Type Single Crystal Substrate
03/06/2008US20080054412 Reduction of carrot defects in silicon carbide epitaxy
03/06/2008DE112006001204T5 Verfahren und Vorrichtung zum Erzeugen von Siliciumkarbidkristallen Method and apparatus for producing silicon carbide crystals
03/05/2008EP1895579A1 Diamond semiconductor element and method for manufacturing same
03/05/2008EP1895573A1 Silicon carbide single-crystal wafer and process for producing the same
03/05/2008EP1895031A1 Process for producing silicon carbide single crystal
03/05/2008EP1895030A2 Method and assembly for manufacturing a pipe
03/05/2008EP1895029A1 Apparatus for producing semiconductor single crystal
03/05/2008EP1895028A1 Apparatus for producing semiconductor single crystal
03/05/2008EP1895027A1 Method of growing silicon single crystal and process for producing silicon wafer
03/05/2008EP1895026A1 Method of growing silicon single crystal and silicon single crystal grown by the method
03/05/2008EP1895025A2 Semiconductor crystal, and method and apparatus of production
03/05/2008EP1894647A1 Method of producing monocrystalline seeds simultaneously when casting monocrystalline parts
03/05/2008EP1894256A1 Grown photonic crystals in semiconductor light emitting devices
03/05/2008EP1485955A4 Semiconductor-nanocrystal/conjugated polymer thin films
03/05/2008CN201031265Y Two regions gas-phase transport synthesizing container
03/05/2008CN201031264Y Growth device of multiple compound semi-conductor single-crystal
03/05/2008CN101137774A Container for easily oxidizable or hygroscopic substance, and method for heating and pressuring treatment of easily oxidizable or hygroscopic substance
03/05/2008CN101135060A Re3+,Cr5+:LnVO4 automodulation laser crystal and preparation method and application thereof