Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
05/2008
05/22/2008US20080118767 Material for Vapor Sources of Alkali and Alkaline Earth Metals and a Method of its Production
05/22/2008US20080115721 Methods for forming alkali halide ingots into rectangular plates
05/21/2008EP1923491A1 Single crystal material and process for producing the same
05/21/2008EP1922759A2 Nanowires-based transparent conductors
05/21/2008EP1922437A1 Method and apparatus for refining a molten material
05/21/2008EP1809788A4 Method and apparatus for growing a group (iii) metal nitride film and a group (iii) metal nitride film
05/21/2008EP1483782A4 Production method of sic monitor wafer
05/21/2008EP1381718A4 Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques
05/21/2008EP1098016B1 Single-crystal pulling apparatus
05/21/2008DE112006001092T5 Herstellungsverfahren für Siliciumwafer Manufacturing method for silicon wafers
05/21/2008CN101182646A Device and method for growing hemisphere type crystal by heat exchange method
05/21/2008CN100389481C Substrate for nitride semiconductor growth
05/21/2008CN100389233C Beta'-Sialon whisker gas phase reaction preparation method
05/21/2008CN100389230C Process for preparing shape controllable cuprous oxide micro/nano crystal by electrochemical deposition
05/20/2008US7375385 Semiconductor heterostructures having reduced dislocation pile-ups
05/20/2008US7374817 Topological crystal of transition metal chalcogenide and method of forming the same
05/20/2008US7374618 Group III nitride semiconductor substrate
05/20/2008US7374617 Atomic layer deposition methods and chemical vapor deposition methods
05/20/2008US7374616 Acentric lithium borate crystals, method for making, and applications thereof
05/20/2008US7374614 Method for manufacturing single crystal semiconductor
05/20/2008US7374613 Single crystal material having high density dislocations arranged one-dimensionally in straight line form, functional device using said single crystal material, and method for their preparation
05/20/2008US7374612 Method of producing single-polarized lithium tantalate crystal and single-polarized lithium tantalate crystal
05/15/2008WO2008057119A1 Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors
05/15/2008WO2008056761A1 Process for producing single crystal of silicon carbide
05/15/2008WO2008056760A1 Process for producing silicon carbide single crystal
05/15/2008WO2008056758A1 Process for producing silicon carbide single crystal
05/15/2008WO2008056195A1 A multi-chip package
05/15/2008WO2008007336A3 A method for producing diamond material
05/15/2008US20080112856 Method of preparing nanocrystals
05/15/2008DE102007049778A1 Verfahren zum Herstellen eines Halbleitereinkristalls durch das Czochralski-Verfahren sowie Einkristallrohling und Wafer, die unter Verwendung derselben hergestellt werden A method for manufacturing a semiconductor single crystal by the Czochralski method, as well as single crystal ingot and wafers, which are prepared using the same
05/14/2008EP1920080A2 High colour diamond
05/14/2008EP1551768A4 Process for manufacturing a gallium rich gallium nitride film
05/14/2008CN201058893Y Device for growing gallium-doped silicon monocrystal by czochralski method
05/14/2008CN101180710A Group 3-5 nitride semiconductor multilayer substrate, method for manufacturing group 3-5 nitride semiconductor free-standing substrate, and semiconductor element
05/14/2008CN101180420A Method for growth of GaN single crystal, method for preparation of GaN substrate, process for producing GaN-based element, and GaN-based element
05/14/2008CN100388424C Molecular beam epitaxy growth apparatus and method of controlling same
05/14/2008CN100387936C Method for reducing sensitivity of crystals to damage effect of light intensity exposure
05/14/2008CN100387761C InP monocrystal ingot annealing treatment method
05/14/2008CN100387760C Method of producing self-supporting substrates comprising iii-nitrides by means of heteroepitaxy on a sacrificial layer
05/13/2008US7371666 with an emission spanning the visible spectrum; reacting a silicon precursor in the presence of a sheath gas with heat from a radiation beam under conditions effective to produce silicon nanoparticles; acid etching
05/08/2008US20080108162 Light-Emitting Device Structure Using Nitride Bulk Single Crystal Layer
05/08/2008US20080105193 Method and Apparatus for Crystal Growth
05/07/2008EP1918429A1 Aluminum nitride single crystal film, aluminum nitride single crystal laminated substrate and processes for production of both
05/07/2008EP1918428A2 Crystalline metal film
05/07/2008EP1917101A2 Method for manufacture and coating of nanostructured components
05/07/2008EP1335044B1 Zinc oxide semiconductor material
05/07/2008EP1216316B1 Polishing of fluoride crystal optical lenses and preforms using cerium oxide for microlithography
05/07/2008CN101175875A Method and apparatus for producing group III element nitride crystal, and group iii element nitride crystal
05/07/2008CN101175874A Apparatus for manufacturing semiconductor single crystal
05/07/2008CN101175873A Apparatus for manufacturing semiconductor single crystal
05/07/2008CN101175872A Method for producing silicon single crystals and silicon single crystal produced thereby
05/07/2008CN101174756A Calcium niobate laser crystal doped with ytterbium and method for producing the same
05/07/2008CN101174617A Manufacturing method for semiconductor device, semiconductor device, and electronic equipment
05/07/2008CN101174597A GaN single crystal substrate and method for processing surface of GaN single crystal substrate
05/07/2008CN101172665A Method for producing monodisperse Fe*O* nanocrystal assisted with surface active agent
05/07/2008CN100386845C Nitride semiconductor thin film and method for growing the same
05/06/2008US7369758 Molecular beam source for use in accumulation of organic thin-films
05/06/2008US7368308 Methods of fabricating semiconductor heterostructures
05/06/2008US7368015 Apparatus for producing single crystal and quasi-single crystal, and associated method
05/06/2008US7368014 Variable temperature deposition methods
05/06/2008US7368013 Superabrasive particle synthesis with controlled placement of crystalline seeds
05/06/2008US7368012 Methods and apparatuses for a dynamic growing of single-crystal thin-film composed of organic materials
05/02/2008WO2008051585A2 Gallium nitride crystal
05/02/2008WO2008051413A1 Reverse oxidation post-growth process for tailored gain profile in solid-state devices
05/02/2008WO2008050524A1 Apparatus for producing single crystal and method for producing single crystal
05/02/2008WO2008050476A1 Method for manufacturing epitaxial silicon wafer, and epitaxial silicon wafer
05/01/2008US20080102313 Atomic layer chemical vapor deposition of hybrid organic inorganic coatings comprised of such as aluminium benzene oxides; optical properties
05/01/2008US20080099768 Diamond Transistor And Method Of Manufacture Thereof
04/2008
04/30/2008EP1916321A1 Crystal producing apparatus, crystal producing method, substrate producing method, gallium nitride crystal, and gallium nitride substrate
04/30/2008EP1563122A4 Method for forming carbon nanotubes
04/30/2008CN101168852A Mass production method for calcium sulfate whisker
04/30/2008CN101168851A Epitaxial silicon wafer and fabrication method thereof
04/30/2008CN101168850A Silicon single crystal manufacturing method and silicon wafer manufacturing method
04/30/2008CN101168849A Silicon liquid overflow receiving device for polycrystalline silicon ingot casting furnace
04/30/2008CN101168474A Method for manufacturing polycrystalline silicon thin film at low temperature
04/30/2008CN100385701C Domain controlled piezoelectric monocrystal component and its mfg. method
04/30/2008CN100385696C Epitaxial thin films
04/30/2008CN100385619C Mask, method of making the same, and method of making thin film transistor using the same
04/30/2008CN100385326C Silicon crystallizing device
04/30/2008CN100385047C Production of single-crystal nano meter four-phase rod with lead zirconate titanate and perof skite
04/30/2008CN100385046C Method for producing silicon wafer
04/30/2008CN100385045C Process for growing lanthanum chloride crystal by falling method of antivacuum crucible
04/30/2008CN100384716C Target material for metal oxide film, its preparation method, and method for producing metal oxide film
04/29/2008US7364715 As-grown single crystal of alkaline earth metal fluoride
04/29/2008US7364714 3C-SIC nanowhisker and synthesizing method and 3C-SIC nanowhisker
04/29/2008US7364619 Process for obtaining of bulk monocrystalline gallium-containing nitride
04/29/2008US7364617 Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
04/24/2008WO2008047907A1 Sapphire substrate, nitride semiconductor luminescent element using the sapphire substrate, and method for manufacturing the nitride semiconductor luminescent element
04/24/2008WO2008047881A1 Process for producing crystal silicon grain and crystal silicon grain production apparatus
04/24/2008WO2008047637A1 Process for producing nitride semiconductor, crystal growth rate enhancement agent, nitride single crystal, wafer and device
04/24/2008WO2008047627A1 Group iii element nitride substrate, substrate with epitaxial layer, processes for producing these, and process for producing semiconductor element
04/24/2008US20080092803 Patterned atomic layer epitaxy
04/23/2008EP1914795A1 Silicon wafer for semiconductor and manufacturing method thereof
04/23/2008EP1914263A1 Single-crystalline organic carboxylic acid metal complex, process for producing the same, and use thereof
04/23/2008EP1913182A1 Nanoparticles
04/23/2008EP1912894A1 Separation of grown diamond from diamond seeds mosaic
04/23/2008CN101167190A Diamond transistor and method of manufacture thereof
04/23/2008CN101165228A Lithium niobate pn junction and preparation method thereof
04/23/2008CN101165227A Method for synthesizing magnesium borate whisker by using bittern
04/23/2008CN101165226A Thermal field energy-saving synergistic device for polycrystalline silicon ingot casting furnace