Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
02/2006
02/09/2006WO2006013735A1 Composite copper foil and method for production thereof
02/09/2006US20060029723 repairing a coated high pressure turbine blade, which has been exposed to engine operation, to restore coated airfoil contour dimensions of the blade, and improve upon the prior bond coat
02/09/2006US20060027460 Metal interconnect features with a doping gradient
02/09/2006DE10309401B4 Vorrichtung und Verfahren zu Beschichtung von Gegenständen An apparatus and process for coating objects
02/09/2006DE102004033332A1 Einspannvorrichtung für Druckzylinder Jig for printing cylinders
02/08/2006EP1624092A1 Chromium plated exhaust pipe
02/08/2006CN1732291A Lead free bump and method of forming the same
02/08/2006CN1240881C Method for electroplating strip of foam
02/07/2006US6996425 Cellular phone housing
02/07/2006US6995457 Wiring structure and manufacturing method therefor, semiconductor device including wiring structure and wiring board
02/07/2006US6994919 Core sheet overcoated with aluminum alloy
02/02/2006WO2006012112A2 Electrochemical plating cell with an auxiliary electrode in an isolated anolyte compartment
02/02/2006WO2006011922A2 Pulse reverse electrolysis of acidic copper electroplating solutions
02/01/2006EP1620222A1 Method of connecting module layers suitable for the production of microstructure components and a microstructure component
02/01/2006CN1729315A Method for producing galvanically deposited antennae for RFID labels using an adhesive that is selectively applied
02/01/2006CN1729312A Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit
02/01/2006CN1728347A Apparatus and method for plating semiconductor wafers
02/01/2006CN1239753C Nickel base alloy composite conductor roll and manufacturing method
02/01/2006CN1239751C Ternary tin zinc alloy, electroplating solutions and galvanic method for producing ternary tin zinc alloy coatings
01/2006
01/31/2006US6992016 Chemical processing method, and method of manufacturing semiconductor device
01/31/2006US6991717 Web processing method and apparatus
01/31/2006US6991711 Cup type plating apparatus
01/31/2006US6991710 Apparatus for manually and automatically processing microelectronic workpieces
01/26/2006WO2005095678A3 Electroplating system and method
01/26/2006WO2005018311A3 Fishhook
01/26/2006DE102004032659A1 Vorrichtung und Verfahren zum chemischen oder elektrolytischen Behandeln von Behandlungsgut sowie die Verwendung der Vorrichtung Apparatus and method for chemical or electrolytic treatment of material to be treated and to the use of the device
01/25/2006EP1619275A2 Apparatus and method for plating semiconductor wafers
01/25/2006EP1112125B1 Metallization structures for microelectronic applications and process for forming the structures
01/25/2006CN1725932A Conductive base material with resistance layer and circuit board material with resistance layer
01/25/2006CN1724252A Pure copper-coated copper foil and method of producing the same, and TAB tape and method of producing the same
01/25/2006CN1238891C Novel chip interconnect and packaging deposition methods and structures
01/25/2006CN1238769C Mask forming and removing method, and semiconductor device, electric circuit, display module, color filter and emissive device manufactured by the same method
01/25/2006CN1238571C Electroplating cup with adjustable spacing between cathode, anode and uniform stream plate in wafer level package
01/24/2006US6989328 Method of manufacturing semiconductor device having damascene interconnection
01/24/2006US6989199 Copper foil for printed-wiring board and copper-clad laminate using copper foil for printed-wiring board
01/24/2006US6989084 Semiconductor wafer plating cell assembly
01/24/2006US6988932 Apparatus of sealing wafer backside for full-face processing
01/24/2006US6988327 Methods and systems for processing a substrate using a dynamic liquid meniscus
01/19/2006US20060012044 Plating method
01/19/2006US20060011487 Submicron and nano size particle encapsulation by electrochemical process and apparatus
01/19/2006US20060011485 Multi step electrodeposition process for reducing defects and minimizing film thickness
01/19/2006DE102004030726A1 Process to etch manufacture printed circuit board by regulation of electrolytic cell voltage transverse to the direction of travel
01/19/2006DE10148045B4 Reparaturverfahren für strukturierte und/oder glatte Stahloberflächen auf Endlosbändern oder Pressblechen Repair method for structured and / or smooth steel surfaces of endless belts or press plates
01/18/2006EP1027722B1 Plating system for semiconductor materials
01/18/2006CN2752276Y Nickeling device for radiator
01/18/2006CN2751972Y Polishing product for processing base material
01/18/2006CN1722374A Substrate proximity processing structures and methods for using and making the same
01/18/2006CN1722372A Proximity head heating method and apparatus
01/12/2006WO2006004298A1 Method for manufacturing black surface-treated copper foil for emi shield
01/12/2006WO2006002969A2 Device and method for chemically and electrolytically treating work pieces
01/12/2006WO2005059206A3 Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces
01/12/2006WO2005040459A3 Electroplating compositions and methods for electroplating
01/12/2006US20060006071 Reducing defects; adjust bioas voltage, current; overcoating substrate with metal seed layer
01/12/2006US20060006060 Method and apparatus for processing a substrate with minimal edge exclusion
01/12/2006US20060005902 Method for production of thin metal-containing layers having low electrical resistance
01/12/2006DE10347145B4 Verfahren zur Herstellung einer Verschleißschutzschicht A method for producing a wear-resistant layer
01/11/2006CN1720355A Metal plating structure and method for production thereof
01/11/2006CN1720354A Methods for forming interconnect structures by co-plating of noble metals and structures formed thereby
01/11/2006CN1720350A Peel strength enhancement of copper laminates
01/11/2006CN1718868A Electrolytic film plating device
01/10/2006US6984302 Placing the substrate surface within an enclosure, introducing liquid material into enclosure, and directing the liquid angularly toward substrate surface flowing rotationally upon contact; semiconductors
01/10/2006US6984301 Methods of forming capacitor constructions
01/05/2006WO2006001594A1 Method for manufacturing black surface- treated copper foil for emi shield and copper foil the same and the composite material using it
01/05/2006WO2005076680A3 Method and device for electrolytically increasing the thickness of an electrically conductive pattern on a dielectric substrate, as well as a dielectrict substrate
01/05/2006US20060001132 Palladium-spot leadframes for high adhesion semiconductor devices and method of fabrication
01/05/2006US20060000708 Noble metal contacts for plating applications
01/05/2006US20060000704 Solution treatment apparatus and solution treatment method
01/04/2006EP1612855A2 Method and apparatus for plating semiconductor wafers
01/04/2006EP1226365A4 Sliding bearing having multilayer lead-free overplate and method of manufacture
01/04/2006CN1717153A Method and device for electrolytically increasing the thickness of an electrically conductive pattern on a dielectric substrate, as well as a dielectric substrate
01/04/2006CN1715457A Surface coarsening method and surface coarsening liquid for copper foil
01/04/2006CN1234919C Electroplating apparatus
01/04/2006CN1234917C Continuous nickel plating apparatus for fine metal wire
01/04/2006CN1234916C Method and device for electrolytic treatment of electrically insulating film materials and use of said method
01/04/2006CN1234915C Copper foil coated with stable layer, coating method and laminate piece including insulation substrate and copper foil
01/03/2006US6982863 Component formation via plating technology
01/03/2006US6982011 Method for producing improved cold-rolled strip that is capable of being deep-drawn or ironed, and cold-rolled strip, preferably used for producing cylindrical containers and, in particular, battery containers
01/03/2006CA2320278C Plating apparatus and method
01/03/2006CA2191339C Method and device for continuous uniform electrolytic metallising or etching
12/2005
12/29/2005WO2005123990A1 Device and method for electrolytically treating flat work pieces
12/29/2005WO2005123989A1 Plating apparatus
12/29/2005WO2005123988A1 Method of barrier layer surface treatment to enable direct copper plating on barrier metal
12/29/2005WO2004094702A8 Multi-chemistry plating system
12/29/2005US20050287388 Metal based resistance heating element and method for preparation therefor
12/29/2005US20050284768 Method for coloring socket
12/29/2005US20050284767 electroplating; movable electrodes; as anode moves over wafer, electric current is applied through meniscus between anode and wafer
12/29/2005US20050284766 Pulse reverse electrolysis of acidic copper electroplating solutions
12/29/2005US20050284755 Substrate support element for an electrochemical plating cell
12/29/2005US20050284754 Electric field reducing thrust plate
12/29/2005US20050284751 Electrochemical plating cell with a counter electrode in an isolated anolyte compartment
12/29/2005DE112004000245T5 Verbund-Kupferfolie, Verfahren zu deren Herstellung und Hochfrequenz-Übertragungsschaltung unter Verwendung einer Verbundkupferfolie Composite copper foil, to processes for their preparation and high-frequency transmission circuit using a composite copper foil
12/29/2005CA2568579A1 Plating apparatus
12/28/2005EP1610375A2 Contact carriers for populating substrates with spring contacts
12/28/2005EP1610132A2 Fabricating interconnects using sacrificial substrates
12/28/2005CN1714412A Method for increasing the copper to superconductor ratio in a superconductor wire
12/28/2005CN1714177A Plating uniformity control by contact ring shaping
12/28/2005CN1233880C Cathode chuck of electroplating tester
12/27/2005US6979645 Method of producing a semiconductor device having copper wiring
12/27/2005US6979515 Surface-treated steel plate for battery case and battery case
12/27/2005US6979393 Method for plating copper conductors and devices formed
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