Patents for C23F 1 - Etching metallic material by chemical means (16,062)
01/2003
01/16/2003US20030010748 Positive photosensitive compositions
01/15/2003EP1274881A1 Surface treatment method for magnesium alloys and magnesium alloy members thus treated
01/15/2003EP1196788A4 Merged-mask micro-machining process
01/15/2003CN1391264A Photoetching method for nanoparticle pattern based on self organization
01/14/2003US6506314 Adhesion of polymeric materials to metal surfaces
01/14/2003US6506312 Vapor deposition chamber components and methods of making the same
01/14/2003US6506127 Set of woods with face thickness variation based on loft angle
01/09/2003US20030008517 Method of reducing particulates in a plasma etch chamber during a metal etch process
01/09/2003US20030008245 Fine structure and devices employing it
01/09/2003US20030006215 Etchant, method for roughening copper surface and method for producing printed wiring board
01/08/2003EP1273033A1 Inhibition of titanium corrosion
01/08/2003CN1389596A Copper or copper alloy corrodent and corrosion method
01/07/2003US6504152 Probe tip configuration and a method of fabrication thereof
01/07/2003US6503845 Method of etching a tantalum nitride layer in a high density plasma
01/07/2003US6503566 Process for improving the adhesion of polymeric materials to metal surfaces
01/07/2003US6503363 System for reducing wafer contamination using freshly, conditioned alkaline etching solution
01/07/2003CA2079417C Expandable stents and method of making same
01/03/2003WO2003000954A1 Surface treatment agent for copper and copper alloy
01/02/2003US20030004080 Picking agent containing urea and method of producing it
01/02/2003US20030003757 Method of etching tungsten or tungsten nitride in semiconductor structures
01/02/2003US20030000920 Etching method using photoresist etch barrier
01/02/2003EP1270129A2 Selective removal of brazing compound from joined assemblies
12/2002
12/27/2002WO2002103088A1 Method and device for locally removing coatings from parts
12/26/2002US20020197878 Film forming method and film forming apparatus
12/26/2002US20020197761 Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
12/26/2002US20020195423 Method for vapor phase etching of silicon
12/26/2002US20020195417 Wet and dry etching process on <110> silicon and resulting structures
12/26/2002US20020195416 Method of etching a tantalum nitride layer in a high density plasma
12/25/2002CN1386906A Process for removing Ni from waste etching FeCl3 solution containing Ni
12/25/2002CN1097035C Method of post-etching mechanically treated substrate
12/24/2002US6498110 Ruthenium silicide wet etch
12/24/2002US6497994 Photolithographic process for the formation of a one-piece needle
12/19/2002WO2002100778A1 Process for producing ammonium cerium(iv) nitrate
12/19/2002WO2002071918A3 Method for producing undercut surface recesses
12/19/2002US20020192957 Applications of oxide hardmasking in metal dry etch processors
12/19/2002US20020190029 Adding an oxime to an appropriate injection point of an electric generating power plant powered by a steam turbine
12/19/2002US20020190028 Method of improving uniformity of etching of a film on an article
12/19/2002US20020190027 For performing microfabrication of semiconductor based logic, memory and optoelectronic devices and micromechanical systems
12/19/2002US20020189721 Lead-selective surface etching to reduce the release of lead; employed in water distribution systems, in particular lead brass plumbing components for potable water circuits
12/19/2002US20020189632 Method of removing deposits of material formed in laser machining
12/19/2002DE10224935A1 Verfahren zum Ätzen von Öffnungen mit hohem Seitenverhältnis A method for etching high aspect ratio openings
12/18/2002EP1267396A2 Magnetically patterning conductors
12/18/2002CN1385743A Film transistor for LCD and making method
12/18/2002CN1385271A Selectively removing braze composition from conneted assembly
12/18/2002CN1096310C Method and apparatus for sheet products treatment like circuit board
12/17/2002US6495464 Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool
12/17/2002US6495099 Wet processing methods for the manufacture of electronic components
12/17/2002US6495055 Variable time etching system according to the accumulated number of devices being processed and a method for etching in the same manner
12/17/2002US6494960 Method for removing an aluminide coating from a substrate
12/17/2002US6494219 Apparatus with etchant mixing assembly for removal of unwanted electroplating deposits
12/12/2002WO2002099394A1 Methods and systems for monitoring process fluids
12/12/2002WO2002098788A2 Applications of a strain-compensated heavily doped etch stop for silicon structure formation
12/12/2002US20020185225 Substrate processing method and substrate processing apparatus
12/10/2002US6492009 Manufacture and method for obtaining accurately dimensioned features from a metal-containing web processed with a continuous etch process
12/10/2002US6491766 Activated nickel screens and foils
12/10/2002US6491757 Wafer support system
12/10/2002US6491592 Multiple material golf club head
12/05/2002WO2002098194A1 Copper plated circuit layer-carrying copper clad laminated sheet and method of producing printed wiring board using the copper plated circuit layer-carrying copper clad laminated sheet
12/05/2002WO2002097163A1 Method for operating an aluminium pickling bath
12/05/2002WO2002089192A8 Method of wet etching an inorganic antireflection layer
12/05/2002US20020182434 Copper clad laminate with copper-plated circuit layer, and method for manufacturing printed wiring board using the copper clad laminate with copper-plated circuit layer
12/05/2002US20020179570 Method of etching high aspect ratio openings
12/05/2002US20020179563 Application of a strain-compensated heavily doped etch stop for silicon structure formation
12/05/2002US20020179248 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow
12/05/2002DE10216725A1 Producing a metal plate having an opening with an ultra-small cross-section used for a screen of an electron microscope comprises forming a recess in a region of the plate by etching the rear side of the plate
12/05/2002DE10125933A1 Verfahren zum Betrieb eines Aluminium-Beizbades A method of operating an aluminum pickling bath
12/04/2002EP1261752A1 Method and apparatus for repairing lithography masks using a charged particle beam system
12/04/2002CN1383202A Conductor pattern formed by magnetic force
12/04/2002CN1382831A Etching method and etching appts.
11/2002
11/28/2002WO2002095800A2 A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
11/28/2002US20020177320 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid
11/28/2002US20020177310 Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device
11/28/2002US20020175139 Method for forming an electrical insulating layer on bit lines of the flash memory
11/28/2002US20020175083 Process to remove ferric iron impurities from an acidic aqueous solution used in the electro-winning of copper
11/28/2002US20020174951 Surface isolation device
11/27/2002EP1260197A1 Flexible stent
11/26/2002US6486073 Method for stripping a photo resist on an aluminum alloy
11/26/2002US6485511 Expandable stents and method for making same
11/26/2002US6484737 Process of and device for treating small parts with a liquid treatment medium
11/21/2002WO2002092882A1 Method for making a mesh-and-plate surgical implant
11/21/2002US20020173854 Method for making a mesh-and-plate surgical implant
11/21/2002US20020170878 Etching resistance of protein-based photoresist layers
11/21/2002US20020170632 Forming a chromate film on the surface
11/21/2002CA2446960A1 Method for making a mesh-and-plate surgical implant
11/19/2002US6482747 Plasma treatment method and plasma treatment apparatus
11/19/2002US6482746 Computer readable medium for controlling a method of cleaning a process chamber
11/19/2002US6481449 Ultrasonic metal finishing
11/14/2002US20020168863 Exclusion and/or application of the processing fluid by applying while the workpiece and a reactor holding the workpiece are spinning
11/14/2002US20020168825 Method for etching metal layer on a scale of nanometers
11/14/2002US20020168223 Suppressing reduction of copper ions; using solution of ammonium persulfate and 1,4,8,11 tetraazundecane complexing agent
11/14/2002US20020167009 Thin film transistor for liquid crystal display and method of manufacturing the same
11/14/2002US20020166633 Device for etching the backside of wafer
11/13/2002EP1255797A1 Method for roughening copper surfaces for bonding to substrates
11/12/2002US6479390 Method of etching material film formed on semiconductor wafer using surface wave coupled plasma etching apparatus
11/07/2002WO2002089193A1 Method of wet etching a silicon and nitrogen containing material
11/07/2002WO2002089192A1 Method of wet etching an inorganic antireflection layer
11/07/2002US20020164887 Etching method and etching apparatus, method for manufacturing semiconductor device, and semiconductor device
11/07/2002US20020164878 Forming integrated circuits wafers; removal photoresist with light
11/07/2002US20020163290 Color selection electrode, method of producing color selection electrode and cathode ray tube
11/07/2002US20020162990 Composition and process for etching and desmutting aluminum and its alloys