Patents for C23F 1 - Etching metallic material by chemical means (16,062)
04/2003
04/02/2003EP1298186A1 Method of removing reactive metal from a metal-coated reactor system
04/01/2003US6541390 Method and composition for selectively etching against cobalt silicide
04/01/2003US6541389 Method of patterning a thin layer by chemical etching
04/01/2003US6540931 By treatment with a mixture of sulfuric acid and hydrogen peroxide, optionally also containing hydrofluoric acid
03/2003
03/27/2003WO2003025971A2 Plasma processing apparatus with coil magnet system
03/27/2003WO2003025677A1 Etching method and composition for forming etching protective layer
03/27/2003WO2003024707A1 Metal-containing web processed with a continuous etch process
03/27/2003US20030060056 Etching solution for signal wire and method of fabricating thin film transistor array panel with the same
03/27/2003US20030060054 Plasma treatment method
03/27/2003US20030056901 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
03/26/2003CN1405797A Method for forming noble metal film pattern
03/25/2003US6537928 Apparatus and method for forming low dielectric constant film
03/25/2003US6537462 Ruthenium and ruthenium dioxide removal method and material
03/25/2003US6537461 Process for treating solid surface and substrate surface
03/25/2003US6537459 Method and apparatus for etching-manufacture of cylindrical elements
03/20/2003WO2002079542A9 Improved adhesion of polymeric materials to metal surfaces
03/20/2003US20030054296 Process for forming etched metal ruler with design handle
03/19/2003CN1403629A Surface treatment apparatus
03/18/2003US6534789 Thin film transistor matrix having TFT with LDD regions
03/18/2003US6533892 Device for etching the backside of wafer
03/12/2003EP1289678A1 Process for improving the adhesion of polymeric materials to metal surfaces
03/12/2003EP1029106A4 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
03/12/2003CN1402309A Proces for polishing indium phosphide single crystal wafer
03/11/2003US6531381 Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device
03/06/2003WO2002046483A3 Silver stain removal from dna detection chips by cyanide etching or sonication
03/06/2003US20030044340 Separation mixture containing slvent and etching impurities
03/06/2003US20030042223 Etch mask
03/06/2003US20030042146 Method of plating and pretreating aluminium workpieces
03/05/2003EP1218566B1 Method for producing a conductor pattern on a dielectric substrate
02/2003
02/27/2003US20030038107 Method and apparatus for removal of unwanted electroplating deposits
02/27/2003US20030037802 Semiconductor treating apparatus and cleaning method of the same
02/26/2003EP1285980A1 Etching process for removing lead from the surface of copper alloy fittings for use with drinking water
02/26/2003EP1285620A1 Ribbon tooth, cutting tool including ribbon teeth, and method of forming a ribbon tooth
02/26/2003EP1285310A1 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer
02/26/2003CN1399788A Method utilizing magnetic assembly during etching thin shadow masks
02/26/2003CN1399317A Etching process and etching liquid
02/26/2003CN1399008A Reaction chamber regulating method
02/20/2003WO2003013879A1 Method of demetallizing a web in an etchant bath and web suitable thereof
02/20/2003WO2002081775A3 On-line removal of copper deposits on steam turbine blades
02/20/2003US20030036274 Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool
02/20/2003US20030036264 Method of etching platinum using a silicon carbide mask
02/20/2003US20030035938 Method of demetallizing a web in an etchant bath and web suitable therefor
02/20/2003US20030035693 Ribbon tooth cutting tool and method
02/20/2003US20030034326 Method for producing liquid discharge head
02/20/2003US20030034324 Method of manufacturing magnetoresistive device, thin film magnetic head and head assembly
02/20/2003CA2374570A1 Ribbon tooth cutting tool and method
02/19/2003CN1398425A Transfer type substrate treating device
02/19/2003CN1397366A Golf club made of multiple materials
02/18/2003US6521328 Copper etching compositions and products derived therefrom
02/18/2003US6521139 Composition for circuit board manufacture
02/18/2003US6521081 Deposition shield for a plasma reactor
02/18/2003US6520840 CMP slurry for planarizing metals
02/13/2003WO2002095800A3 A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
02/13/2003WO2002065528A3 Use of ammonia for etching organic low-k dielectrics
02/13/2003US20030032289 Solution also containing an ester
02/13/2003US20030032287 Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool
02/13/2003US20030029841 Method and apparatus for polishing metal and dielectric substrates
02/13/2003US20030029839 Method of reducing wet etch rate of silicon nitride
02/13/2003US20030029566 Remote exposure of workpieces using a plasma
02/11/2003US6518936 Precision etched radome
02/11/2003US6517999 Method of removing photoresist film
02/11/2003US6517635 For solar cells, liquid crytals
02/06/2003WO2003010809A1 Plasma treating device and substrate mounting table
02/06/2003WO2003010271A1 Surface treatment composition and method for removing si component and reduced metal salt produced on the aluminum dicast material in etching process
02/06/2003WO2002086180A3 A process for converting a metal carbide to diamond by etching in halogens
02/06/2003WO2002079542A3 Improved adhesion of polymeric materials to metal surfaces
02/06/2003WO2002063670A3 Method for removing copper from a wafer edge
02/06/2003US20030027430 Process for etching thin-film layers of a workpiece used to form microelectronic circuits or components
02/06/2003US20030027082 Maintaining surface to be etched below freezing temperature of phase-change masking material; ejecting in liquid form droplets of phase change masking material in a predetermined pattern; etching surface to remove material; removing mask
02/06/2003US20030027059 Method for producing a mask and method for fabricating a semiconductor device
02/06/2003US20030026920 Generating plasma in vacuum; controlling distribution
02/06/2003US20030024898 Method of forming noble metal thin film pattern
02/06/2003US20030024896 Methods of etching silicon-oxide-containing compositions
02/06/2003US20030024644 Method and apparatus for measuring and dispensing a wafer etchant
02/05/2003EP1115906B1 Method for processing the interior of a hollow part
02/05/2003CN1395626A Pickling agent containing urea and method of producing it
02/05/2003CN1395294A Ashing device and method, and method for mfg. semiconductor
02/05/2003CN1394986A Nickel-base submicron information surface layer quick silver-removing liquor
02/04/2003USRE37973 Apparatus for immersing strip in liquid bath comprising trough having submerged panel mounted therein, which has bottom surface spaced from bottom wall of trough defining contact zone and top surface defining return zone, separated by panel
02/04/2003US6514670 Method for designing and manufacturing a micromechanical device
01/2003
01/30/2003US20030022518 Wherein the etching liquid contains silver ions in a given range; prevents silver or silver alloy residues, and gives even and stable etching
01/30/2003US20030022497 Method of chemical mechanical polishing with high throughput and low dishing
01/30/2003US20030019842 Plasma reaction chamber assemblies
01/30/2003US20030019834 using polishing system comprising an abrasive, a polishing pad, an acid, and a carrier
01/30/2003US20030019831 Polysilicon etch useful during the manufacture of a semiconductor device
01/30/2003US20030019761 Immersing brazed nickel-base alloy components joined by nickel alloy brazing composition in electrolyte, applying potential at magnitude wherein nickel base alloy components are electrochemically passive and brazing alloy dissolves
01/29/2003EP0951522B1 Method of removing reactive metal from a metal-coated reactor system
01/29/2003CN1393578A Process for removing residual Al from back of nano aluminium oxide template
01/28/2003US6511609 Replacing a polysilicon, amorphous silicon or tantalum silicide layer in metallization
01/28/2003US6511504 Expandable stents and method for making same
01/23/2003WO2003006711A1 Method of surface treatment for copper workpiece
01/23/2003US20030017419 Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device
01/23/2003US20030015494 Single layer resist lift-off process and apparatus for submicron structures
01/23/2003US20030015288 Sealable surface method and device
01/22/2003EP1277499A2 Multiple material golf club head
01/22/2003CN1392289A Regenerating method for corrosion liquid and corrosion device
01/22/2003CN1392031A Method for producing cutter
01/21/2003US6508948 For performing microfabrication of semiconductor based logic, memory and optoelectronic devices and micromechanical systems
01/21/2003US6508892 Uniform aperture diameter
01/16/2003WO2003005115A1 An etchant for a wire, a method for manufacturing the wire and a method for manufacturing a thin film transistor array panel including the method