Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/1986
09/10/1986EP0193674A1 Method of amorphizing a solid material by injection of exotic atoms with electron beams
09/03/1986EP0193419A1 Method and apparatus for low pressure chemical vapor deposition
09/03/1986EP0193324A2 Extra-low iron loss grain oriented silicon steel sheets
09/03/1986EP0193192A2 Pyrolytic boron nitride article and method for producing the same
09/02/1986US4609771 Tandem junction solar cell devices incorporating improved microcrystalline p-doped semiconductor alloy material
09/02/1986US4609562 Detection and closing of cracks
09/02/1986US4608943 Cathode assembly with localized profiling capabilities
08/1986
08/28/1986WO1986004929A1 Process for producing unidirectional silicon steel plate with extraordinarily low iron loss
08/27/1986EP0192143A2 Permeable polymer membrane for desiccation of gas
08/27/1986CN85100378A Plasma chemical vapor-phase coating process and equipment-using commercially pure feed gas
08/26/1986US4608276 Manufacturing optical fibre
08/26/1986US4608271 Method for the manufacture of metal silicide layers by means of reduced pressure gas phase deposition
08/26/1986US4608117 Maskless growth of patterned films
08/26/1986US4608063 Exhaust system for chemical vapor deposition apparatus
08/26/1986US4607591 For chemical vapor deposition
08/26/1986CA1210526A1 Device having semi-insulating indium phosphides based compositions
08/26/1986CA1210243A1 Raw material supply device
08/20/1986EP0191143A1 Photochemical process for substrate surface preparation
08/20/1986EP0191054A1 Methods of and apparatus for vapor delivery control in optical preform manufacture.
08/19/1986US4606941 Agitation along vibrating incline
08/19/1986US4606932 Method for depositing a micron-size metallic film on a transparent substrate utilizing a laser
08/14/1986WO1986004658A1 Hard material seal members having a low friction coefficient
08/14/1986WO1986004617A1 System and method for depositing plural thin film layers on a substrate
08/14/1986WO1986004548A1 Process of manufacturing seal members having a low friction coefficient
08/13/1986EP0190748A1 Gas reaction apparatus and multi-wall pipe type burner therefor
08/12/1986US4605565 Vacuum deposition of metal oxide using radiofrequency signal to form ionized plasma of metal and oxygen
08/12/1986US4605479 Cleaning under vacuum with hydrofluoric acid and water vapor, then metallization
08/12/1986CA1209330A1 Inverted positive vertical flow chemical vapor deposition chamber
08/06/1986EP0189636A1 Fluorinated p-doped microcrystalline semiconductor alloys and method of preparation
08/06/1986CN85108824A Boron doped semiconductor materials and method for producing same
08/05/1986US4604304 Controlled oxidation of several thin layers
08/05/1986US4604118 Method for synthesizing MgO--Al2 O3 --SiO2 glasses and ceramics
08/05/1986CA1209091A1 Photo and heat assisted chemical vapour deposition
07/1986
07/30/1986EP0156857A4 Method and apparatus for coating a substrate.
07/29/1986US4603082 Diamond-like film
07/29/1986US4603056 Molybdenum nitride, silicon nitride layers
07/23/1986EP0188369A2 Refractory coated article
07/23/1986EP0188208A2 Plasma reactor chamber
07/23/1986EP0188057A1 Erosion resistant coatings
07/23/1986EP0187826A1 Fabrication of devices with a silicon oxide region.
07/22/1986US4601260 Vertical semiconductor processor
07/22/1986CA1207985A1 Method and apparatus for producing high purity silicon
07/16/1986EP0187402A1 Method of manufacturing preferentially oriented (111)-tungsten
07/16/1986EP0187189A2 Glass-surface microcarrier for anchorage-dependent cell cultivation
07/16/1986CN85108047A Fluorinated p-doped microcrystalline semiconductor alloys and method of preparation
07/15/1986US4600801 Fluorinated, p-doped microcrystalline silicon semiconductor alloy material
07/15/1986US4600654 Phenyltin tr&chloride, vapor depostion
07/15/1986US4600390 Apparatus and method for applying a silicon oxide-containing adhesion-promoting layer on metallic dental prostheses
07/15/1986US4599971 Vapor deposition film forming apparatus
07/09/1986EP0186910A1 Process for preparation of ceramic film
07/09/1986CN85109272A Improved process of chemical vapour deposition using coating with organic compound of tin mixed with organic compound of fluorine
07/08/1986US4599462 Low temperature vapor codeposition
07/08/1986US4599281 Wearing part
07/08/1986US4599135 Thin film deposition
07/02/1986EP0186481A2 Improved chemical vapor deposition method of producing fluorine-doped tin oxide coatings
07/02/1986EP0186443A2 Silicon nitride films for integrated circuits
07/02/1986EP0186266A1 Erosion-resistant coating system
07/01/1986US4598024 Dispersion toughened ceramic composites and method for making same
07/01/1986US4597989 Method of depositing silicon films with reduced structural defects
07/01/1986US4597986 Method for photochemical vapor deposition
07/01/1986US4597985 Low temperature deposition of silicon oxides for device fabrication
07/01/1986US4597983 Method for producing a directed aerosol stream
07/01/1986US4597639 Dielectric air-interface plasma optical power limiter
07/01/1986US4597170 Method of making an electrode
06/1986
06/24/1986US4596208 CVD reaction chamber
06/18/1986EP0184917A1 Plasma reactor vessel and process
06/18/1986EP0184757A2 Frictional member and method of surface treating to obtain the same
06/17/1986US4595634 Multilayer coated glass sheet in which sublayer contains at least a part of its thickness wherein the refractive index falls as distance from glass underlayer increases
06/17/1986US4595608 Method for selective deposition of tungsten on silicon
06/17/1986US4595601 Exposing workpiece to gaseous mixture of halogen gas and raw material gas containing element bondable with element of non-insulating material to form insulating compound, irradiating, forming layer of insulating compound
06/17/1986CA1206244A1 Process gas introduction and channeling system
06/17/1986CA1205962A1 Multiple coated cutting tool
06/11/1986EP0184352A1 Method of surface treatment
06/11/1986EP0184279A2 Method and apparatus for processing a work piece
06/10/1986US4594264 Method for forming gallium arsenide from thin solid films of gallium-arsenic complexes
06/10/1986US4593644 Continuous in-line deposition system
06/10/1986CN85109258A Method of manufacturing tungsten perferentially orientated in the <111> direction
06/05/1986WO1986003228A1 Method for deposition of gallium arsenide from vapor phase gallium-arsenic complexes
06/04/1986EP0183407A2 Cleaning device for reactor pipes
06/04/1986EP0183254A2 Plasma CVD apparatus and method for forming a diamond-like carbon film
06/04/1986EP0182889A1 Method for producing diamond-like carbon layers.
06/03/1986US4593168 Method and apparatus for the heat-treatment of a plate-like member
06/03/1986US4592933 High efficiency homogeneous chemical vapor deposition
06/03/1986US4592926 Processing apparatus and method
06/03/1986US4592790 Heating, rapidly chilling, grinding, annealing depleted uranium particles under argon;vapor deposition of silver, copper or lead uniform coating
06/03/1986US4592307 Vapor phase deposition apparatus
06/03/1986US4592306 Apparatus for the deposition of multi-layer coatings
06/03/1986CA1205363A1 System including improved cathode for continuous deposition of amorphous material
05/1986
05/27/1986US4591464 Prevents backflow of liquid
05/21/1986EP0181706A1 Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition
05/21/1986EP0181624A1 Coating of semiconductor wafers and apparatus therefor
05/20/1986US4590096 Using organotin compound and organic fluorine dopant-controlling humidity of carrier gas stream
05/20/1986US4590091 Photochemical process for substrate surface preparation
05/20/1986US4589729 Apparatus comprising an articulated arm radiation guide
05/14/1986EP0181113A2 Improved boron doped semiconductor materials and method for producing
05/14/1986EP0180936A2 Process for making a bundle of superconducting fibres
05/13/1986US4588675 Vapor deposition of metal film onto substrate, impregnation with polymerizable material, and polymerization
05/13/1986US4588610 Ammonia or hydrazine, monosilane or polysilane, ultraviolet light
05/07/1986EP0180397A2 Method and apparatus for the production of polycrystalline silicon
05/06/1986US4587458 Controlling current density