C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/1986
12/30/1986	EP0206822A2 Metal-organic chemical vapour deposition
12/30/1986	EP0206603A1 Method for growing crystals
12/30/1986	EP0206370A1 Process for making a semiconductor device, including the vapour phase deposition of crystalline layers on a substrate
12/30/1986	EP0206145A2 A method of metallising an organic substrate so as to achieve improved adhesion of the metal
12/30/1986	EP0206120A1 Pyrolytic boron nitride crucible and method for producing the same
12/23/1986	US4631199 Oxidizing silane vapor with nitrous oxide and oxygen mixture exposed to radiation
12/23/1986	US4631198 By plasma vapor deposition
12/23/1986	US4630669 Heat exchange apparatus for high temperature LPCVD equipment
12/23/1986	US4630568 Apparatus for coating substrates by plasma polymerization
12/18/1986	WO1986007391A1 An apparatus for coating substrates by plasma discharge
12/17/1986	EP0204907A2 Microwave system and method of making semi-conductor members and improved semi-conductive members made thereby
12/17/1986	EP0204724A1 Method for deposition of gallium arsenide from vapor phase gallium-arsenic complexes.
12/16/1986	US4629661 Wear resistance and toughness improved by having an intermediate hard boride layer
12/16/1986	US4629635 Vapor deposition
12/16/1986	US4628862 Photochemical vapor deposition apparatus
12/10/1986	EP0204565A2 Process for coating the internal surface of a metal tube with a neutron absorber
12/10/1986	EP0204563A2 Process for depositing zinc oxide
12/10/1986	EP0204538A2 Phototreating method and apparatus therefor
12/10/1986	EP0204356A2 Process for the reactive deposition, activated by glow discharge, of an electrical conductor material from a gas phase
12/10/1986	EP0204298A2 Process for producing niobium metal of an ultrahigh purity
12/09/1986	US4628002 Carbon-rich transition zone
12/04/1986	WO1986007156A1 High speed digital frequency counter
12/03/1986	EP0203616A2 Chemical vapor deposition method for the thin film of semiconductor
12/02/1986	US4626449 Method for forming deposition film
12/02/1986	US4626448 Plasma deposition of amorphous metal alloys
12/02/1986	US4626447 Plasma confining apparatus
12/02/1986	US4625678 Apparatus for plasma chemical vapor deposition
12/02/1986	CA1214751A1 Baffle system for glow discharge deposition apparatus
11/1986
11/26/1986	EP0035565B1 Methods and apparatus for generating plasmas
11/26/1986	CN85104135A Multilayer coated cemented carbides
11/25/1986	US4624862 Boron doped semiconductor materials and method for producing same
11/25/1986	CA1214364A1 Method of forming a hard surface layer on a metal component
11/20/1986	WO1986006756A1 Method of making a device comprising a patterned aluminum layer
11/20/1986	WO1986006755A1 Selective chemical vapor deposition method and apparatus
11/20/1986	WO1986006687A1 In-situ cvd chamber cleaner
11/20/1986	WO1986006658A1 Method of producing transparent, haze-free tin oxide coatings
11/20/1986	EP0201696A2 Production of carbon films
11/19/1986	CN86101886A Prodn. of metallic structures on nonconductors
11/18/1986	US4623417 Magnetron plasma reactor
11/18/1986	US4623400 Hard surface coatings for metals in fluidized beds
11/18/1986	US4623369 Multistep liquefaction and gasification
11/18/1986	US4622988 Liquid replenishing apparatus
11/18/1986	CA1214253A1 Upstream cathode assembly
11/12/1986	EP0200991A1 Improved process for adhering an oxide coating on a cobalt-enriched zone, and articles made from said process
11/12/1986	EP0142495B1 Inverted positive vertical flow chemical vapor deposition reactor chamber
11/12/1986	CN86103417A Method of producing transparent, haze-free tin oxide coatings
11/11/1986	US4622081 Formable, temperature-resistant martensitic steel having enhanced resistance to wear
11/05/1986	EP0200332A2 Vertical apparatus for continuous deposition of semiconductor alloys
11/05/1986	EP0200215A1 Raw material supplying device and process for using this device
11/05/1986	EP0200086A2 Plasma chemical vapor deposition SI02-X coated articles and plasma assisted chemical vapor deposition method of applying the coating
11/05/1986	CN85109048A Chemical vapor deposition
11/04/1986	US4620893 Apparatus for the plasma treatment of disk-shaped substrates
10/1986
10/29/1986	EP0199585A2 Apparatus for depositing electrically conductive and/or electrically insulating material on a workpiece
10/29/1986	EP0199527A1 A process for the production of a surface-coated article
10/29/1986	EP0199307A1 Method of coating a molybdenum surface
10/29/1986	EP0198842A1 Reactor apparatus for semiconductor wafer processing.
10/28/1986	US4619866 Method of making a coated cemented carbide body and resulting body
10/28/1986	US4619865 Multilayer coating and method
10/28/1986	US4619844 Controlling flow of vapor from high pressure sublimation chamber into low pressure vapor deposition reactor
10/28/1986	US4619840 Process and apparatus for low pressure chemical vapor deposition of refractory metal
10/28/1986	US4619729 Microwave method of making semiconductor members
10/23/1986	WO1986006105A1 Process for the manufacture of wear resistant binding materials
10/23/1986	WO1986006104A1 METHOD FOR DEPOSITING AT LEAST ONE LAYER OF AN HOMOGENEOUS COMPOUND III-V OR II-VI, PARTICULARLY Ga As, AND SUBSTRATE COATED WITH SUCH A DEPOSITION
10/22/1986	EP0198604A1 Glow discharge deposition apparatus having confined plasma region
10/22/1986	EP0198361A2 Method and apparatus for thin film formation using photo-induced chemical reaction
10/21/1986	US4618541 Using a small ratio of silane to ammonia
10/21/1986	US4618507 Method of making a capacitor winding
10/21/1986	CA1212873A1 Organometallic chemical vapour deposition of films
10/21/1986	CA1212829A1 Susceptor assembly
10/14/1986	US4617087 Method for differential selective deposition of metal for fabricating metal contacts in integrated semiconductor circuits
10/14/1986	US4616597 Apparatus for making a plasma coating
10/14/1986	US4616375 Cleaning device for jet pipes in TiO2 reactor
10/09/1986	WO1986005824A1 Thin layer consisting essentially of ruthenium salt
10/08/1986	EP0196810A2 Process and kit for working metals
10/08/1986	EP0196806A1 Optimized process for forming borophosphosilicate glass
10/08/1986	EP0196388A2 Method of making electrodes
10/08/1986	EP0196346A1 Apparatus for manufacturing surface structures in the nanometer range
10/07/1986	US4615916 Heated, compressed air propelling tin or titanium halide vapors across bottles in side to side direction forming metal oxide
10/07/1986	US4615909 Method of manufacturing semiconductor devices, in which material is deposited from a reaction gas, and apparatus for carrying out such a method
10/07/1986	US4615905 Method of depositing semiconductor films by free radical generation
10/07/1986	US4615904 Maskless growth of patterned films
10/07/1986	US4615781 Mask assembly having mask stress relieving feature
10/07/1986	US4615299 Plasma CVD apparatus for making photoreceptor drum
10/07/1986	US4615298 Method of making non-crystalline semiconductor layer
10/07/1986	US4615294 Barrel reactor and method for photochemical vapor deposition
10/07/1986	CA1212356A1 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
10/01/1986	EP0196201A1 A surface-coated cemented carbide article or part
09/1986
09/30/1986	US4614672 Liquid phase epitaxy (LPE) of silicon carbide
09/30/1986	CA1212169A1 Apparatus for the manufacture of photovoltaic devices
09/24/1986	EP0195292A2 Coatings for ink jet nozzles
09/24/1986	EP0195223A2 Production of metallic structures on a non-conductive substrate
09/20/1986	WO1990010726A1 Use of metallo-organic compounds for vapour deposition of thin films
09/17/1986	EP0194652A1 Coated blade for microtome and method for the preparation thereof
09/17/1986	EP0194373A2 Improvements in or relating to the deposition of a coating on a porous substrate
09/17/1986	CN85102056A Composite hard coating material
09/16/1986	US4612207 Apparatus and process for the fabrication of large area thin film multilayers
09/16/1986	US4612085 Photochemical patterning
09/15/1986	EP0162111A4 Method and apparatus for chemical vapor deposition.
09/12/1986	WO1986005169A1 Rhombohedral polycrystalline boron nitride and process for its production
09/10/1986	EP0193998A1 Method of depositing on a substrate a layer which consists substantially of silicon carbide

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