Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/1987
07/08/1987EP0228295A2 Method for producing an electronic device having a multi-layer structure
07/08/1987EP0227692A1 Thin layer consisting essentially of ruthenium salt.
07/08/1987CN86106620A Microwave enhanced cvd system under magnetic field
07/07/1987US4678679 Continuous deposition of activated process gases
07/07/1987US4678678 Radiation of metal film with high energy ions
07/07/1987US4678536 Method of photochemical surface treatment
07/07/1987US4677738 Thin film silicon alloy
07/01/1987EP0227388A2 Electrophotographic photosensitive member process and apparatus for the preparation thereof
07/01/1987EP0226898A2 Composite powder, composite bodies and process for their production
07/01/1987EP0226651A1 Apparatus for chemical vapor deposition of a coating on an optical fiber
06/1987
06/30/1987US4676814 Method for the continuous building of a hollow cylindrical soot body having no internal support
06/30/1987US4676195 Capacitance coupled type, electrode structure
06/30/1987CA1223487A1 Oxide bond for aluminum oxide coated cutting tools
06/25/1987DE3633986A1 Alumina-based surface layer for hard sintered objects and a process for producing it
06/24/1987EP0226130A2 Method of producing silicon diffusion coatings on metal articles
06/24/1987EP0111501B1 Process for forming sulfide layers
06/23/1987US4675206 Process for the production of a surface-coated article
06/23/1987US4675089 Low temperature deposition method for high quality aluminum oxide films
06/23/1987US4674434 Apparatus for forming deposited film
06/18/1987WO1987003741A1 Selective deposition process
06/17/1987CN86107009A Class coating method and resulting article
06/16/1987US4673589 Photoconducting amorphous carbon
06/16/1987US4673588 Device for coating a substrate by means of plasma-CVD or cathode sputtering
06/16/1987US4673587 High strength
06/16/1987US4672915 Gas supply device, particularly for manufacturing semiconductor elements
06/16/1987EP0225342A1 Method of producing transparent, haze-free tin oxide coatings.
06/16/1987CA1222912A1 Chemical vapor deposition of titanium nitride and like films
06/10/1987EP0225224A2 After oxide metal alloy process
06/10/1987EP0224563A1 High speed digital frequency counter
06/10/1987EP0224495A1 Process for the manufacture of wear resistant binding materials
06/10/1987CN86107141A Method for forming deposited film
06/09/1987US4672170 Apparatus for thermochemical treatments of metals by ionic bombardment
06/09/1987US4671850 Enhanced mechanical strength
06/09/1987CA1222660A1 Method for producing an aerosol stream and its use
06/03/1987EP0224360A2 Semiconductor device manufacturing method
06/03/1987EP0223787A1 Selective chemical vapor deposition method and apparatus.
06/02/1987US4670762 Plasma decomposition, photolysis
06/02/1987US4670172 Process and kit for working metals
05/1987
05/27/1987EP0223629A1 Method and apparatus for the chemical vapour deposition of uniform thin films on many flat substrates
05/27/1987EP0223585A2 A hard sintered compact for a tool
05/27/1987EP0223083A1 Process for the production of a high-temperature protective coating
05/27/1987EP0222960A1 Method and apparatus for the on-line coating of silica based fibers with boron-nitride
05/27/1987CN86107084A Method for forming a deposited film
05/26/1987US4668538 Processes for depositing metal compound coatings
05/26/1987US4668530 Titanium silicide
05/26/1987US4668528 Laser initiated
05/26/1987US4668527 Gold into silicon substrates
05/26/1987US4668365 Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
05/20/1987EP0222400A2 Process for protecting polished silicon surfaces
05/20/1987EP0222241A1 Deposition of titanium aluminides
05/20/1987EP0221906A1 $i(IN-SITU) CVD CHAMBER CLEANER
05/20/1987CN86107683A Method and system for mfg. semiconductor devices
05/19/1987US4667076 Method and apparatus for microwave heat-treatment of a semiconductor water
05/19/1987US4666734 Apparatus and process for mass production of film by vacuum deposition
05/19/1987CA1221827A1 External isolation module
05/13/1987EP0221812A2 Apparatus and method for producing thin films with the aid of a plasma
05/13/1987EP0221515A2 Composite stiff lightweight structure and method for making same
05/13/1987EP0221492A2 Article coated with a wear-resistant film of a precious metal
05/13/1987EP0221429A2 Chemical vapour deposition reactor
05/13/1987EP0221184A1 Mask repairing apparatus
05/13/1987EP0221156A1 Method of making a device comprising a patterned aluminum layer.
05/12/1987US4664951 Method provided for corrective lateral displacement of a longitudinally moving web held in a planar configuration
05/12/1987US4664944 Deposition method for producing silicon carbide high-temperature semiconductors
05/12/1987US4664939 Vertical semiconductor processor
05/12/1987US4664938 Method for deposition of silicon
05/12/1987US4664937 Method of depositing semiconductor films by free radical generation
05/12/1987US4664890 Glow-discharge decomposition apparatus
05/12/1987US4664747 Surface processing apparatus utilizing local thermal equilibrium plasma and method of using same
05/12/1987US4664743 Growth of semi-conductors and apparatus for use therein
05/12/1987US4664057 Photoprocessing apparatus including conical reflector
05/06/1987EP0220685A2 Apparatus and method for registration of shadow masked thin-film patterns
05/06/1987EP0220552A2 Vacuum deposition system and method
05/05/1987US4663183 Glow discharge method of applying a carbon coating onto a substrate
05/05/1987US4663009 System and method for depositing plural thin film layers on a substrate
04/1987
04/29/1987EP0219873A2 Mask for patterning electrode structures in thin film EL devices
04/29/1987EP0219872A2 Mask assembly having mask stress relieving feature
04/29/1987EP0219826A2 Vacuum processing system
04/28/1987US4661409 Using alternating electromagnetic field to activate hydrocarbon plasma; silicone adhesion
04/28/1987US4661407 Glass-surface microcarrier for anchorage-dependent cell cultivation
04/28/1987US4661381 Controlling oxidation
04/28/1987US4661140 Gas reaction apparatus and multi-wall pipe type burner therefor
04/22/1987EP0218623A1 METHOD FOR DEPOSITING AT LEAST ONE LAYER OF AN HOMOGENEOUS COMPOUND III-V OR II-VI, PARTICULARLY Ga As, AND SUBSTRATE COATED WITH SUCH A DEPOSITION
04/21/1987US4659591 Method of coating tungsten preferentially orientated in the <111> direction on a substrate
04/21/1987CA1220768A1 Bubbler cylinder and dip tube device
04/21/1987CA1220678A1 Method of making infrared reflecting coating
04/14/1987US4657777 Vapor phase decomposition of a silicon halide with silane compound
04/14/1987US4657616 In-situ CVD chamber cleaner
04/09/1987WO1987002073A1 Surface treating method and apparatus
04/09/1987WO1987001970A1 Continuous vapor deposition method for producing a coated glass article
04/08/1987EP0216932A1 Rhombohedral polycrystalline boron nitride and process for its production
04/08/1987EP0216810A1 A process for manufacturing seal disk members having a low friction coefficient.
04/07/1987US4655893 Cubic boron nitride preparation utilizing a boron and nitrogen bearing gas
04/07/1987US4655852 Conversion to martensite; forming iron, aluminum alloy layer
04/07/1987CA1220007A1 Coated glazing material
04/01/1987EP0216157A2 A method of depositing metal contact regions on a silicon substrate
04/01/1987EP0215968A1 Device for the production of amorphous silicon solar cells, method for operating this device and cathode for use in this device
03/1987
03/31/1987US4654509 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus
03/31/1987US4654269 Spun glass layer
03/31/1987US4654232 Method for the formation of a titanium or zirconium compound coating
03/31/1987US4654228 Thermophoresis deposition, control pore size