Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2013
06/26/2013CN103180935A Compound gan substrate and method for producing same, and group iii nitride semiconductor device and method for producing same
06/26/2013CN103173745A Temperature control method for chemical vapor deposition apparatus
06/26/2013CN103173744A Tray and reaction chamber including same
06/26/2013CN103173743A Wafer carrier with hub
06/26/2013CN103173742A Spraying head and vapor deposition reaction cavity
06/26/2013CN103173741A Film deposition system
06/26/2013CN103173740A MOCVD (metal-organic chemical vapor deposition) tail gas driven rotary system
06/26/2013CN103173739A substrate processing apparatus, program, storage medium and conditioning necessity determining method
06/26/2013CN103173738A Preparation method for GaN nanostructure with adjustable Ga vacancy
06/26/2013CN103173737A Silicon carbide chemical vapor-phase epitaxy stage device
06/26/2013CN103173671A Cemented carbide body and applications thereof
06/26/2013CN103171187A Sandwich type transparent conductive film and preparation method thereof
06/26/2013CN103170478A Method and system for supplying a cleaning gas into a process chamber
06/26/2013CN102433542B Preparation method of carbon/aluminium composite material
06/26/2013CN102264944B CVD device
06/26/2013CN102157425B Ring assembly for substrate processing chamber
06/26/2013CN102115879B Substrate processing apparatus
06/26/2013CN102046839B Method for making oriented tantalum pentoxide films
06/25/2013US8471049 Precursors for depositing group 4 metal-containing films
06/25/2013US8470408 Carbon nanotube synthesis for nanopore devices
06/25/2013US8470403 Organic thin film deposition device, organic EL element manufacturing device, and organic thin film deposition method
06/25/2013US8470402 Method of depositing a metal-containing dielectric film
06/25/2013US8470401 Use of group V metal containing precursors for a process of depositing a metal containing film
06/25/2013US8470400 Graphene synthesis by chemical vapor deposition
06/25/2013US8470140 Method for the production of an ultra barrier layer system
06/25/2013US8470127 Cam-locked showerhead electrode and assembly
06/25/2013US8470126 Wiggling control for pseudo-hardmask
06/25/2013US8470094 Apparatus for continuous coating
06/25/2013US8468969 Dimensionally stable durable thermal spray masking system
06/20/2013WO2013090001A1 Combinatorial rf bias method for pvd
06/20/2013WO2013089815A1 Electroless plating of silver onto graphite
06/20/2013WO2013088998A1 Film forming device and manufacturing method for glass with film
06/20/2013WO2013088706A1 Surface treatment apparatus, surface treatment method, substrate supporting mechanism, and recording medium
06/20/2013WO2013088680A1 Film forming device
06/20/2013WO2013088624A1 Processing device and shield
06/20/2013WO2013088623A1 Processing device and shield
06/20/2013WO2013088603A1 Power introduction device and vacuum processing device using power introduction device
06/20/2013WO2013088213A1 Deposition system having a reaction chamber configured for in situ metrology and related method
06/20/2013WO2013087848A1 Coated cutting tool and method of manufacturing the same
06/20/2013WO2013087797A1 Large area optical quality synthetic polycrystalline diamond window
06/20/2013WO2013087706A1 Synthetic diamond coated compound semiconductor substrates
06/20/2013WO2013087704A1 Substrates for semiconductor devices
06/20/2013WO2013087703A1 Method of dressing an abrasive wheel using a polycrystalline cvd synthetic diamond dresser and method of fabricating the same
06/20/2013WO2013087702A2 Large area optical quality synthetic polycrystalline diamond window
06/20/2013WO2013021149A3 Methods for forming an organic layer on a substrate
06/20/2013US20130157469 Semiconductor Processing System with Source for Decoupled Ion and Radical Control
06/20/2013US20130157170 Method for depositing catalyst in fuel cell, fuel cell manufactured by the same and operation apparatus for the same
06/20/2013US20130157062 Laminate and process for producing laminate
06/20/2013US20130156974 Method for manufacturing a porous synthetic diamond material
06/20/2013US20130156950 Film-forming apparatus and film-forming method
06/20/2013US20130156949 Methods of fabricating porous media and inorganic selective membrane
06/20/2013US20130156940 Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzle
06/20/2013US20130156937 System and Method for Aligning Sputter Sources
06/20/2013US20130153536 Combinatorial processing using a remote plasma source
06/20/2013US20130153204 Ram bop shear blade process to enhance the toughness
06/20/2013US20130153149 Substrate Processing Tool with Tunable Fluid Flow
06/20/2013US20130152858 Apparatus for performing a plasma chemical vapour deposition process
06/20/2013US20130152857 Substrate Processing Fluid Delivery System and Method
06/20/2013DE112011102310T5 Gleitlager Plain bearings
06/20/2013DE102012222673A1 Gerät zur Abscheidung organischer Schichten, Verfahren zum Fertigen von Geräten mit organischer lichtemittierender Anzeige unter Verwendung desselben und Gerät mit organischer lichtemittierender Anzeige Apparatus for deposition of organic layers, methods of fabricating devices with organic light-emitting display using the same, and organic light-emitting display device with
06/20/2013DE102011088525A1 Anordnung zum Beschichten eines Substrats An arrangement for coating a substrate
06/20/2013DE102011056538A1 Method for removing unwanted residues of process chamber of chemical vapor deposition reactor, involves forming non-volatile intermediate, so that surface coverage degree of residue is increased/decreased at respective phases of cycle
06/20/2013DE102010043949B4 Vorrichtung und Verfahren zum Beschichten von Oberflächen Apparatus and method for coating surfaces
06/19/2013EP2604720A1 Coated cutting tool and method of manufacturing the same
06/19/2013EP2604427A1 Laminate, and laminate production method
06/19/2013EP2603618A1 Sliding ring with improved run-in properties
06/19/2013CN203007419U Monitoring device and vapor deposition device
06/19/2013CN203007418U Control system of chemical vapor deposition equipment
06/19/2013CN203007417U Plasma enhanced chemical vapor deposition plate electrode device and deposition device
06/19/2013CN203007416U Microwave antenna
06/19/2013CN203007415U Constant temperature system for heating platforms
06/19/2013CN203007414U Chemical vapor deposition device and tray thereof
06/19/2013CN203007413U Graphite frame grab for silicon chip coating
06/19/2013CN203007412U Movable joint air conductive tool for chemical vapor deposition furnace
06/19/2013CN203007411U Shower head and chemical vapor deposition equipment
06/19/2013CN203007410U Air inflating structure of chemical vapor deposition furnace
06/19/2013CN203007409U Metal plate cooling device of gas-importing nozzle of thin film deposition equipment
06/19/2013CN203007408U Reaction chamber
06/19/2013CN203007407U Chemical vapor deposition equipment
06/19/2013CN203007406U Heating device and chemical vapor deposition equipment
06/19/2013CN203007405U Metal organic chemical vapor deposition equipment
06/19/2013CN203007404U Chemical vapor deposition equipment
06/19/2013CN203007403U Reaction chamber
06/19/2013CN203007402U Special device used for preparing wafer upper cladding
06/19/2013CN203007401U Horizontal type thin film deposition cooling plate device
06/19/2013CN203002359U Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method
06/19/2013CN103168115A Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
06/19/2013CN103167717A Antenna unit for inductively coupled plasma and inductively coupled plasma processing device
06/19/2013CN103165744A Manufacturing method of crystalline silicon solar energy battery piece
06/19/2013CN103165730A Solar battery passivating and manufacturing method
06/19/2013CN103165410A Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus
06/19/2013CN103160826A Preparation method of continuous carbon fiber surface pyrolytic carbon/nickel composite coating
06/19/2013CN103160814A Reaction chamber and air flow control method
06/19/2013CN103160813A Reaction chamber and plasma processing equipment applying the same
06/19/2013CN103160812A Lower electrode assembly and chemical vapor deposition equipment comprising the same
06/19/2013CN103160811A Organometallic chemical vapor deposition machine
06/19/2013CN103160810A Tray used for induction heating, and plasma processing device
06/19/2013CN103160809A Gas dispersion device used in a growth process of wafer polycrystalline silicon film and growth process
06/19/2013CN103160808A An apparatus for performing a plasma chemical vapour deposition process
06/19/2013CN103160807A Atomic layer deposition method for improving hydrophilicity of polytetrafluoroethylene film
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