Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/1998
11/17/1998US5837331 Vapor deposition in vacuum enclosure by ionizing the precursor, forming gaseous plasma having ion impinging energy, modulating in predetermined manner
11/17/1998US5837316 Ultra fine particle gas deposition apparatus
11/17/1998US5837275 Anti-microbial materials
11/17/1998US5837108 Heat treating glass substrate sputter-coated with a silicon nitride undercoating, nonoxidized/nonnitrided nickel or nickel alloy intermediate coating and silicon nitride overcoating
11/17/1998US5837059 Automatic positive pressure seal access door
11/17/1998US5837057 Film forming apparatus with particle prevention plate
11/17/1998US5836506 Sputter target/backing plate assembly and method of making same
11/12/1998WO1998050916A1 Device and method for manufacturing an optical recording medium
11/12/1998WO1998050598A1 Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor
11/12/1998WO1998050597A1 Porous medium and method of preparing same
11/12/1998WO1998033199A3 Ion accelerator for use in ion implanter
11/12/1998WO1998032893A3 Wafer support system
11/12/1998CA2288987A1 Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor
11/11/1998EP0877421A2 Sputter deposition and annealing of copper alloy metallization M
11/11/1998EP0877411A1 Magnetron source with magnet assembly
11/11/1998EP0877410A1 Deposition chamber and method for depositing low dielectric constant films
11/11/1998EP0877246A2 In situ monitoring of contaminants in semiconductor processing chambers
11/11/1998EP0787219B1 Laser method for plating vias
11/11/1998EP0782744B1 Apparatus and method for sputtering carbon
11/11/1998CN1198479A Technology for plating titanium alloy on bicycle surface
11/10/1998US5834803 Oriented ferroelectric thin film element and process for preparing the same
11/10/1998US5834372 Pretreatment of semiconductor substrate
11/10/1998US5834070 Method of producing protective coatings with chemical composition and structure gradient across the thickness
11/10/1998US5834068 Heating a wafer than cooling with a high thermal conductive gas, adjusting flow rate to stabilize the temperature and reduce surface temperature variations
11/10/1998US5834059 Semiconductors
11/10/1998US5833823 Sputter source with a target arrangement and a holding device
11/10/1998US5833815 Magnetron cathodes are free to move
11/10/1998US5833770 High frequency soft magnetic alloy and plane magnetic element, antenna and wave absorber comprising the same
11/10/1998US5833752 Manifold system
11/10/1998US5833425 Semiconductor device manufacturing apparatus employing vacuum system
11/05/1998WO1998049371A1 Apparatus for producing titanium crystal and titanium
11/05/1998WO1998049370A1 Method for producing titanium crystal and titanium
11/05/1998WO1998049365A1 Skeletal columnar coatings
11/05/1998WO1998049357A1 Titanium crystal and titanium
11/05/1998WO1998048862A1 Calcium-phosphate coated implant element
11/05/1998CA2288150A1 Calcium-phosphate coated implant element
11/05/1998CA2282364A1 Skeletal columnar coatings
11/04/1998EP0875924A2 Improved tantalum-containing barrier layers for copper
11/04/1998EP0875918A1 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter
11/04/1998EP0875603A1 Coated article
11/04/1998EP0875602A1 Article having a coating
11/04/1998EP0875601A1 Coated article
11/04/1998EP0875600A1 Coated article
11/04/1998EP0875599A1 Coated article
11/04/1998EP0875598A1 Article having a decorative and protective multi-layer coating
11/04/1998EP0875597A1 Article having a decorative and protective multi-layer coating
11/04/1998EP0875596A1 Article having a decorative and protective coating
11/04/1998EP0875595A1 Process-gas supply apparatus
11/04/1998EP0875594A1 Method for improving the osteointegration of osseous fixing implants
11/04/1998EP0875146A1 Anti-microbial materials
11/04/1998EP0874697A1 Permeable solar control film
11/04/1998CN1198191A Method of making sputter target/backing plate assembly
11/04/1998CN1198109A Vacuum flash evaporated polymer composites
11/04/1998CN1198072A Plasma immersion implantation with pulsed anode
11/04/1998CN1197848A Vacuum film growth apparatus
11/04/1998CN1197847A Isometric nanometer boron nitride film and its preparation
11/04/1998CN1040556C Low-active surface strong radiation source target making tech.
11/03/1998US5831851 Apparatus and method for controlling high throughput sputtering
11/03/1998US5830579 Strip based on coated aluminum, which is resistant to corrosion and is deformable
11/03/1998US5830531 Vacuum process, hard coating, superimposed friction reducing layer
11/03/1998US5830376 Topographical selective patterns
11/03/1998US5830336 Sputtering of lithium
11/03/1998US5830332 Sputter deposition of hydrogenated amorphous carbon film and applications thereof
11/03/1998US5830331 Apparatus and method for sputtering carbon
11/03/1998US5830330 Method and apparatus for low pressure sputtering
11/03/1998US5830327 Rotating magnet sputter sources having a broad erosion pattern, relatively small source to substrate distance to extend target life, and good deposition thickness uniformity.
11/03/1998US5830272 System for and method of providing a controlled deposition on wafers
10/1998
10/29/1998WO1998048444A1 Method and apparatus for ionized sputtering of materials
10/29/1998WO1998048168A2 In situ getter pump system and method
10/29/1998WO1998048073A1 Plasma processing system utilizing combined anode/ion source
10/29/1998WO1998048072A1 Multilayered coated cutting tool
10/29/1998WO1998047702A1 Photovoltaic device and its method of preparation
10/29/1998WO1998047613A1 Systems and methods for the combinatorial synthesis of novel materials
10/29/1998DE19745966C1 Low ohmic resistive layer of copper@-nickel@ alloy
10/29/1998CA2233205A1 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter
10/28/1998EP0874065A1 Improved magnet design for a sputtering chamber
10/28/1998EP0874064A1 Method for surface treatment of steel tools
10/28/1998EP0873575A1 Device for producing oxidic thin films
10/28/1998EP0873431A1 Apparatus for affixing a rotating cylindrical magnetron target to a spindle
10/28/1998EP0873430A1 Sputtering device and liquid-cooled target assembly therefor
10/27/1998US5828493 Base of unanodized aluminum; thick, nonporous oxide layer; opaque layer of vacuum deposited aluminum; quarter wavelength thick layers of low refractive index and of high refractive index vacuum deposited material; durability
10/27/1998US5827802 Method of depositing monomolecular layers
10/27/1998US5827774 Ion implantation method using tilted ion beam
10/27/1998US5827580 Cathodic arc deposition while controlling partial pressure of oxygen and density of the metal flux
10/27/1998US5827414 Single piece slotted ferromagnetic sputtering target and sputtering apparatus
10/27/1998US5827409 Method and apparatus for forming thin film for liquid crystal display
10/27/1998US5827408 Method and apparatus for improving the conformality of sputter deposited films
10/27/1998US5827371 Unibody crucible and effusion source employing such a crucible
10/27/1998US5826773 Rope material transfer structure
10/22/1998WO1998047178A2 Method and apparatus for thin film aluminum planarization
10/22/1998WO1998046807A1 Method and device for pvd coating
10/22/1998DE19738234C1 Apparatus for producing sputtered coatings consisting of hard substances
10/22/1998DE19716236A1 Plasma burner for metal cutting or welding
10/22/1998DE19715647A1 Control of reactive precipitation of coatings onto substrates with elongate magnetron
10/21/1998EP0872880A2 Method for forming a platinum group metal layer for a capacitor
10/21/1998EP0872579A1 Process for preparing polycrystalline thin film, process for preparing oxide superconductor, and apparatus therefor
10/21/1998EP0872573A1 Vacuum processing apparatus for depositing thin layers
10/21/1998EP0872572A1 Sputtering target and a method for the manufacture thereof
10/21/1998EP0872571A1 Method for making a sputtering target based on Zinc sulphide and sputtering target
10/21/1998EP0872570A1 Synthetic resin moldings and process for producing the same
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