Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2003
12/10/2003CN1461044A Method for preparing p-type zinc oxide film
12/10/2003CN1460728A Velvet zinc oxide transparent conductive film and its preparation method
12/10/2003CN1460662A Method for producing golden ceramic products
12/10/2003CN1460638A Flaky carbon nano tube, preparation method and special equipment
12/10/2003CN1460543A TiO2 nano photocatalytic stainless steel and titanium fibre thread-line and its preparation method
12/10/2003CN1130575C Plastic optical component having reflection prevention film and mechanism for making reflection prevention film thickness uniform
12/10/2003CN1130470C Apparatus and method for depositing semiconductor material
12/10/2003CN1130469C Vacuum coating film equipment for evaporating coating on optical base sheet
12/09/2003US6661027 Semiconductor device and its manufacturing method
12/09/2003US6660931 Silver or silver alloy metal surface with zinc oxide film; chemical resistance, stability; shunt prevention
12/09/2003US6660546 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device
12/09/2003US6660538 Non-contacting deposition control of chalcopyrite thin films
12/09/2003US6660414 Barium strontium titanate material; low dielectric loss or leakage; decreased leakage current; high frequency or microwave applications
12/09/2003US6660365 Soil-resistant coating for glass surfaces
12/09/2003US6660343 Fabrication of conductive/non-conductive nanocomposites by laser evaporation
12/09/2003US6660340 Diamond-like carbon film with enhanced adhesion
12/09/2003US6660339 Process for hydrophobic treatment of water vapor permeable substrates
12/09/2003US6660151 Microstructure elements and process for the production thereof
12/09/2003US6660140 Sputtering apparatus
12/09/2003US6660136 Chalcogenide material over a semiconductor substrate
12/09/2003US6660135 Staged aluminum deposition process for filling vias
12/09/2003US6660134 Feedthrough overlap coil
12/09/2003US6660133 Metal- aluminum-carbon target
12/09/2003US6660125 Sputter PM procedures with polish tool to effectively remove metal defects from target surface nodules (residue)
12/09/2003US6660101 Supplying predetermined quantity of cleaning gas to container, controlling opening degree of automatic pressure regulating valve in vacuum exhaust system to maintain constant pressure, detecting etching end point by change in degree of opening
12/09/2003US6660097 Single-substrate-processing apparatus for semiconductor process
12/09/2003US6660089 Substrate support mechanism and substrate rotation device
12/09/2003US6658895 Carbon nitride coating for optical media discs
12/04/2003WO2003100859A2 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies and corresponding component
12/04/2003WO2003100848A1 Substrate processing device and substrate processing method
12/04/2003WO2003100846A2 Glass material for use at high frequencies
12/04/2003WO2003100819A1 Planetary magnetron
12/04/2003WO2003100128A1 Coating device comprising a conveying device
12/04/2003WO2003100127A1 Method and device for the plasma treatment of workpieces
12/04/2003WO2003100126A1 Method and device for the plasma treatment of work pieces
12/04/2003WO2003100125A1 Method and device for plasma treating workpieces
12/04/2003WO2003100124A1 Method and device for plasma treating workpieces
12/04/2003WO2003100122A2 Method and device for plasma treating workpieces
12/04/2003WO2003100121A2 Multistation coating device and method for plasma coating
12/04/2003WO2003100119A1 Method and device for plasma treatment of work pieces
12/04/2003WO2003100117A1 Method and device for plasma treating workpieces
12/04/2003WO2003100116A1 Method and device for plasma treating workpieces
12/04/2003WO2003100115A1 Method and device for plasma treating workpieces
12/04/2003WO2003100114A1 Replaceable target sidewall insert with texturing
12/04/2003WO2003100113A1 Reactive sputtering method and device
12/04/2003WO2003100112A1 Sputtering target material
12/04/2003WO2003100111A1 Method for producing porous metal by composite physical vapour deposition and the equipment thereof
12/04/2003WO2003100108A1 Process of masking cooling holes of a gas turbine component
12/04/2003WO2003099688A1 Method and device for handling workpieces
12/04/2003WO2003063243A8 Thin films, structures having thin films, and methods of forming thin films
12/04/2003WO2002078043A3 Beam processing apparatus
12/04/2003US20030224620 Method and apparatus for smoothing surfaces on an atomic scale
12/04/2003US20030224218 Group 3 metal oxide and group 5 element
12/04/2003US20030224201 Forming a film composed of an Au-Pd-Fe-In alloy over a primary coating, which is preferably a layer for buffering the potential difference between the base material and the film.
12/04/2003US20030224200 Thermal barrier coating material
12/04/2003US20030224109 Forming uniform patterns by multi-step supporting the substrate in a vacuum deposition process so as to improve the close adhesion of a mask to the substrate
12/04/2003US20030224103 Magnetoresistance effect film and method of forming same
12/04/2003US20030222742 Magnetic field generator for magnetron plasma
12/04/2003US20030222227 Beam stop for use in an ion implantation system
12/04/2003US20030221950 A plasma polymerizing system including at least one chamber is disclosed. After polymerizing a surface of a sheet by generating plasma of reactive gas in the chamber, mixed gas of oxygen and nitrogen is provided into the chamber for
12/04/2003US20030221702 Wet cleaning/passivation process for a passivatable metal part including a contaminant-bearing surface. The process includes the steps of: (a) contacting the contaminant-bearing part with an aqueous acid solution effective for pickling the
12/04/2003US20030221646 Variable valve timing control device
12/04/2003US20030221626 Shaft cooling mechanisms
12/04/2003US20030221620 Vapor deposition device
12/04/2003US20030221618 Apparatus for producing sheeting
12/04/2003US20030221614 Mask and mask frame assembly for evaporation
12/04/2003US20030221613 Mask for evaporation, mask frame assembly including the mask for evaporation, and methods of manufacturing the mask and the mask frame assembly
12/04/2003CA2486590A1 Process of masking cooling holes of a gas turbine component
12/04/2003CA2485185A1 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies
12/04/2003CA2484844A1 Multistation coating device and method for plasma coating
12/04/2003CA2484824A1 Coating device comprising a conveying device
12/04/2003CA2484794A1 Glass material for use at high frequencies
12/03/2003EP1367148A1 Abradable thermal barrier layer and process for producing the same
12/03/2003EP1367145A1 CVD apparatus
12/03/2003EP1366203A1 Refractory metal plates with uniform texture and methods of making the same
12/03/2003EP1366000A2 Photo-induced hydrophilic article and method of making same
12/03/2003CN1460067A Coated article of polymeric basecoat having appearance of stainless steel
12/03/2003CN1460066A Coated article with appearance of stainless steel
12/03/2003CN1460060A Coated article with polymeric basecoat having appearance of stainless steel
12/03/2003CN1459517A Film plating device and film plating method
12/03/2003CN1459516A High vaccum magnetic filtering arc source
12/03/2003CN1459515A Multiion cluster cosputtering settling nano film apparatus
12/03/2003CN1459514A Method of preparing high temperature wear resistant coating
12/03/2003CN1459513A Covering plate in film plating apparatus
12/03/2003CN1129951C Ion source for ion mixer and cathode structure for ion source to generate ion beam
12/03/2003CN1129679C Electric arc ion plating deposition technology of titanium niobium nitride hard film
12/03/2003CN1129678C Electric arc ion planting deposition technolgy of titanium niobium nitride superhard gradient film
12/03/2003CN1129659C Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydraphilic and photocatalytic surface and process for producing said material
12/02/2003US6658172 Optical system with 1×N interleaver and methods of making and using same
12/02/2003US6656792 Nanocrystal flash memory device and manufacturing method therefor
12/02/2003US6656605 Low-sulfur article coated with a platinum-group metal and a ceramic layer, and its preparation
12/02/2003US6656591 Diamond-coated body including interface layer interposed between substrate and diamond coating, and method of manufacturing the same
12/02/2003US6656559 Optical recording medium and optical recording method therefor
12/02/2003US6656535 Bead blasting component to provide surface roughness, dipping component into solution of hydrofluoric acid, hydrochloric acid, and nitric acid, forming aluminum coating by thermal spraying
12/02/2003US6656533 By diffusion coating; turbine blades or vanes
12/02/2003US6656518 Thin film forming method and apparatus
12/02/2003US6656331 Application of antistatic/antireflective coating to a video display screen
12/02/2003US6656330 Coating installation for disk-form workpieces
12/02/2003US6656329 Decorative laminate from resin impregnated paper with alumina particles on surface coated with metal diborides, most preferably titanium and zirconium diborides
12/02/2003US6656283 Channelled chamber surface for a semiconductor substrate processing chamber
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