| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/25/2004 | EP1390552A1 Nickel-titanium sputter target alloy |
| 02/25/2004 | EP1390314A1 Heat treatable coated articles with anti-migration barrier layer between dielectric and solar control layers, and methods of making same |
| 02/25/2004 | EP1390157A1 Method and apparatus for temperature controlled vapor deposition on a substrate |
| 02/25/2004 | EP1284757B1 System comprising a carrier substrate and a ti/p or. ai/p coating |
| 02/25/2004 | CN1478292A Mobile plating system and method |
| 02/25/2004 | CN1478214A Improving stability of ion beam generated alignment layers by surface modification |
| 02/25/2004 | CN1478154A Method for cold process deposition of antiglare layer |
| 02/25/2004 | CN1477676A Method for making display equipment |
| 02/25/2004 | CN1477230A Hign temp-resistant article and its mfg. method |
| 02/25/2004 | CN1477228A Central multiple arc source type ion plating method |
| 02/25/2004 | CN1477227A Equipment for preparing multi-layer metal coated composite film and its production process |
| 02/25/2004 | CN1476948A Multicomponent composite coated cutting tool and its preparation method |
| 02/25/2004 | CN1139671C Method of depositing electrocatalyst and electrodes formed by such method |
| 02/24/2004 | US6697194 Antireflection coating for ultraviolet light at large angles of incidence |
| 02/24/2004 | US6696171 Method of ion implantation using oxygen and a metallic surface layer formed therefrom |
| 02/24/2004 | US6696107 Passivation; displacing particles; high density magnetic recording media; data storage |
| 02/24/2004 | US6696096 Apparatus for and method of vacuum vapor deposition and organic electroluminescent device |
| 02/24/2004 | US6695954 If a film consisting of only the sputtered material is to be formed on a substrate, then the gas within the chamber is nonreactive, on the other hand, a nitride or oxide film formed by chemical reaction of target and reactive gas |
| 02/24/2004 | US6694792 Substrate treatment process |
| 02/24/2004 | CA2162998C Metallized film and decorative articles made therewith |
| 02/19/2004 | WO2004015748A1 Method and device for alternating deposition of two materials by cathodic sputtering |
| 02/19/2004 | WO2004015496A2 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams |
| 02/19/2004 | WO2004015169A2 Method for coating the surface of metallic material, device for carrying out said method |
| 02/19/2004 | WO2004015163A2 Method for the production of a ceramic fiber with a metal coating |
| 02/19/2004 | WO2004015162A1 METHOD FOR PREPARING ALUMNA COATING FILM HAVING α-TYPE CRYSTAL STRUCTURE AS PRIMARY STRUCTURE |
| 02/19/2004 | WO2004015161A1 Method and array for processing carrier materials by means of heavy ion radiation and subsequent etching |
| 02/19/2004 | WO2003087426A3 Coating installation |
| 02/19/2004 | WO2003048406A3 Coating method and coating |
| 02/19/2004 | WO2003041138A3 Sintered polycrystalline gallium nitride |
| 02/19/2004 | WO2003030224A3 Barrier formation using novel sputter-deposition method |
| 02/19/2004 | WO2002076631A3 Composite layer and method for producing said composite layer |
| 02/19/2004 | US20040033702 Deposition of thin films by laser ablation |
| 02/19/2004 | US20040033701 Lanthanide doped tiox dielectric films |
| 02/19/2004 | US20040033681 Lanthanide doped TiOx dielectric films by plasma oxidation |
| 02/19/2004 | US20040033679 Patterning of nanostructures |
| 02/19/2004 | US20040033424 Forming semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, and photonic devices |
| 02/19/2004 | US20040033369 Flexible electrically conductive film |
| 02/19/2004 | US20040031680 One or more shields for use in a sputter reactor |
| 02/19/2004 | US20040031546 High-purity ferromagnetic sputter targets and methods of manufacture |
| 02/19/2004 | US20040031442 Evaporation method, evaporation device and method of fabricating light emitting device |
| 02/19/2004 | DE10235818A1 Production of a ceramic fiber having a metal coating-reinforcing fiber comprises transferring the metal coating on the ceramic fiber into a polygonal outer mold to form a composite of reinforcing fibers |
| 02/19/2004 | DE10234861A1 Process and device for alternate deposition of two different materials by cathodic atomization for electronic multilayers and micromechanics uses two part target and alternate excitation |
| 02/19/2004 | CA2495457A1 Method for coating the surface of metallic material, device for carrying out said method |
| 02/18/2004 | EP0853345B1 METHOD FOR FORMING CdTe FILM |
| 02/18/2004 | CN1476737A Patterning method and device, film forming method and device and electro-optic device and its mfg. method |
| 02/18/2004 | CN1476533A Method for quantifying texture homogeneity of polycrystalline material |
| 02/18/2004 | CN1476420A Silicon monoxide sintered product and method for production thereof |
| 02/18/2004 | CN1476279A Method, system and apparatus for mfg. organic electroluminescence device and its display apparatus |
| 02/18/2004 | CN1476278A Shadow mask and plane display apparatus made of said shadow mask and its manufacturing method |
| 02/18/2004 | CN1476041A Shady cover used for manufacturing plane display device |
| 02/18/2004 | CN1475767A Heat exchanger surface treatment device capable of proceeding continuous treatment |
| 02/18/2004 | CN1475597A Carbon film coved part and its mfg. method |
| 02/18/2004 | CN1475596A Alloy material for use as reflection film of reflection type plane display and sputtering target material |
| 02/18/2004 | CN1139105C Laser annealing method for semiconductor layer |
| 02/18/2004 | CN1138979C Plasma probe diagnosing device for glow discharge surface treatment |
| 02/18/2004 | CN1138871C Aluminium or aluminium alloy sputtering target |
| 02/18/2004 | CN1138870C Sb-doped strontium titanate film and its preparing process |
| 02/18/2004 | CN1138863C Steel sheet for heat shrink band and method for producing the same |
| 02/17/2004 | US6693747 Optical element having antireflection film |
| 02/17/2004 | US6693030 Reactive preclean prior to metallization for sub-quarter micron application |
| 02/17/2004 | US6692850 Controlled stress optical coatings for membranes |
| 02/17/2004 | US6692843 Multilayer |
| 02/17/2004 | US6692833 By chemical vapor deposition on a non-conductive substrate using as precursor a metal halide and/or organometallic compound and a reducing agent; allows another metal conducting layer to be deposited by electrolysis |
| 02/17/2004 | US6692809 Optical recording medium |
| 02/17/2004 | US6692624 Vacuum coating apparatus |
| 02/17/2004 | US6692623 Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method |
| 02/17/2004 | US6692622 Plasma processing apparatus with an electrically conductive wall |
| 02/17/2004 | US6692619 High-saturation magnetization; magnetron co-sputtering of two or more kinds of materials; uniform thickness; magnetic recording media |
| 02/17/2004 | US6692618 Magnetron sputter source with multipart target |
| 02/17/2004 | US6692617 Sustained self-sputtering reactor having an increased density plasma |
| 02/17/2004 | US6692576 Wafer support system |
| 02/17/2004 | US6692568 Sputtering a group iii metal in a nitrogen or ammonia environment and depositing it on a growth surface |
| 02/12/2004 | WO2004013375A1 Installation for the vacuum treatment of substrates |
| 02/12/2004 | WO2004013374A2 Device and method for coating substrates |
| 02/12/2004 | WO2004013373A2 Apparatus and method to control bias during sputtering |
| 02/12/2004 | WO2004013372A1 Sputtering target, sintered body, conductive film formed by using them, organic el device, and substrate used for the organic el device |
| 02/12/2004 | WO2004013371A2 Method and apparatus for plasma implantation without deposition of a layer of byproduct |
| 02/12/2004 | WO2003086958A3 Method for producing a product having a structured surface |
| 02/12/2004 | WO2003046245A3 Process for making angstrom scale and high aspect functional platelets |
| 02/12/2004 | US20040029039 Optical light emitting diodes; generation of heat by vaporization; electroluminescence display |
| 02/12/2004 | US20040028957 Process control; vaporization of various sulfide compounds |
| 02/12/2004 | US20040028954 Substrate overcoated with smooth oxide composite |
| 02/12/2004 | US20040028938 Method of making a protective coating forming a thermal barrier with a bonding underlayer on a superalloy substrate, and a part obtained thereby |
| 02/12/2004 | US20040028912 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| 02/12/2004 | US20040028838 Using microwave frequency; barium strontium titanate as buffer during annealing |
| 02/12/2004 | US20040028813 Method for producing a continuous coating at the surface of a component |
| 02/12/2004 | US20040028811 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film |
| 02/12/2004 | US20040027700 Method of forming optical thin film |
| 02/12/2004 | US20040027048 Magnesium barium thioaluminate and related phosphor materials |
| 02/12/2004 | US20040026419 Plastic overcoated with metal; vacuum, vapor deposition |
| 02/12/2004 | US20040026412 Method and device for plasma treatment of moving metal substrates |
| 02/12/2004 | US20040026368 Monitoring substrate processing by detecting reflectively diffracted light |
| 02/12/2004 | US20040026360 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument |
| 02/12/2004 | US20040026242 Such as attachment of octadecyl thiol to titanium |
| 02/12/2004 | US20040026240 Sputtering apparatus and sputter film deposition method |
| 02/12/2004 | US20040026236 Nanolayered coated cutting tool and method for making the same |
| 02/12/2004 | US20040026235 System and apparatus for control of sputter deposition process |
| 02/12/2004 | US20040026234 Method and device for continuous cold plasma deposition of metal coatings |
| 02/12/2004 | US20040025986 Controlled-grain-precious metal sputter targets |
| 02/12/2004 | DE10235057A1 Vapor deposition of acicular x-ray phosphor layer, used e.g. as phosphor or storage phosphor in medicine or non-destructive testing of materials involves simultaneous vaporization of divalent europium oxyhalide and alkali halide |