Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2004
01/21/2004CN1470078A ZNO substrate for solar cells, solar cells with the same substrate and manufacturing process of the solar cells
01/21/2004CN1469423A Gas phase deposition equipment
01/21/2004CN1468972A Evaporating and coating apparatus for making organic electroluminescent display
01/21/2004CN1135405C High reflection mirror
01/20/2004US6680246 Process for forming a nitride film
01/20/2004US6680242 Method of forming crystalline semiconductor thin film on base substrate, lamination formed with crystalline semiconductor thin film and color filter
01/20/2004US6680133 A film of a nickel/phosphorus/group 1b, 2a, 3, 4, 5b ,7a or 8 having a melting point of 600-2000 degrees c. which determines the crystal orientation of an overlying film subjected to surface-texturing; smoothness; error rate
01/20/2004US6680130 Group 3 metal oxide and group 5 element
01/20/2004US6679981 Inductive plasma loop enhancing magnetron sputtering
01/20/2004US6679978 Method of making self-cleaning substrates
01/20/2004US6679977 Method of producing flat panels
01/20/2004US6679976 System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals
01/15/2004WO2004006228A2 Reflective or semi-reflective metal alloy coatings
01/15/2004WO2004005593A2 Metal nano-objects, formed on semiconductor surfaces, and method for making said nano-objects
01/15/2004WO2004005576A1 Plant for vacuum coating of objects treated in batches
01/15/2004WO2004005574A2 Rotary target and method for onsite mechanical assembly of rotary target
01/15/2004WO2004005203A1 Oh and h resistant silicon material
01/15/2004WO2004005186A1 sp3 BOND BORON NITRIDE EMITTING LIGHT IN ULTRAVIOLET REGION, ITS PRODUCING METHOD, AND FUNCTIONAL MATERIAL USING SAME
01/15/2004WO2003065766A3 Heating in a vacuum atmosphere in the presence of a plasma
01/15/2004US20040009297 Forming zone of non-adherence on substrate portion which is to be uncoated, prior to application of coating system; zone of non-adherence is adjacent the interface, so that coating system will not adhere to zone of non-adherence
01/15/2004US20040009296 Coating with calcium-containing compound before heat treating builds continuous uniform and adherent layer on surface of alloy, so that aluminum depletion of alloy is reduced under cyclic thermal stress; high temperature corrosion resistance
01/15/2004US20040009087 Hot-pressing suitable materials to form a target blank where a surface has a topography that is an inverse of an expected wear profile; improved lifetime
01/15/2004US20040007702 Controlled vapor deposition of materials onto substrate; sequentially repeating vapor depositions of a quantity of each one of at least two materials onto substrate until an operator determined amount of each has been deposited
01/15/2004US20040007455 Arc-coating process with rotating cathodes
01/15/2004US20040007184 Surface treating process, surface treating apparatus, vapor-depositing material, and rare earth metal-based permanent magnet with surface treated
01/15/2004US20040007183 Apparatus and method for the formation of thin films
01/15/2004DE29724778U1 Reflective coating especially for vehicle wheel or body part - consists of reflective layer sputtered on smooth=surfaced levelling layer provided on base surface, for simple, inexpensive mirrored=coating
01/15/2004DE19858913B4 Schutzschicht Protective layer
01/15/2004DE10230395A1 Leitfähiges Bauteil für elektrochemische Zellen sowie Verfahren zur Herstellung eines solchen Bauteils Conductive component for electrochemical cells and methods for producing such a component
01/15/2004DE10227637A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces
01/15/2004DE10043748B4 Zylinderförmiges Sputtertarget, Verfahren zu seiner Herstellung und Verwendung Cylindrical sputtering target, process for its preparation and use
01/15/2004DE10032005B4 Waferhalterad mit einer Andrückvorrichtung in einer Waferbeschichtungsanlage Waferhalterad with a pressing device in a wafer coating plant
01/15/2004CA2491514A1 Metal nano-objects, formed on semiconductor surfaces, and method for making said nano-objects
01/14/2004EP1380858A1 Method for manufacturing an anti-reflective coating on a substrate for the production of a polarizer
01/14/2004EP1380857A1 Antireflection film and antireflection layer-affixed plastic substrate
01/14/2004EP1380855A2 Apparatus and process for fluorination treatment of substrates
01/14/2004EP1380670A1 Zns-sio2 sputtering target and optical recording medium having zns-sio2 protective film for phase change type optical disk formed by using said target
01/14/2004EP1380668A1 Manganese alloy sputtering target and method for producing the same
01/14/2004EP1380667A1 Carbon film-coated article and method of producing the same
01/14/2004EP1380665A1 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom
01/14/2004EP1380050A2 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring
01/14/2004EP1222196B1 Deposition of films using organosilsesquioxane-precursors
01/14/2004EP1141443B1 A method of metallizing the surface of a solid polymer substrate and the product obtained
01/14/2004CN1468145A Combinatorial systems and methods for coating with organic materials
01/14/2004CN1467802A Laser anneal equipment and laser film forming method
01/14/2004CN1467540A Composite vapour deposition material and composite deposition film made therefrom
01/14/2004CN1467311A Method of manufacturing inorganic nanotube
01/14/2004CN1134819C Method and equipment for ion implantation
01/14/2004CN1134555C Apparatus for manufacturing diamond film having large area and manufacturing method thereof
01/13/2004US6677594 Scanning wheel for ion implantation process chamber
01/13/2004US6677063 Hydrophilic and/or rutile and anatase titanium oxide are obtained by sputter depositing titanium metal oxide on a film of zirconium oxide in the cubic phase.
01/13/2004US6676994 Heating a material to a sufficient temperature in a furnace placed inside a vacuum system, flowing an inert gas carrier over through the heated material and entraining the vapors of the material in the material and entraining the vapors
01/13/2004US6676990 Minimizing variability; increasing output; lowering cost
01/13/2004US6676814 Substrate coated with an MgO layer
01/13/2004US6676811 Multistage evacuation and irradiation with pulsed laser
01/13/2004US6676810 Method of coating insulative substrates
01/13/2004US6676741 Methods for producing enhanced interference pigments
01/13/2004US6676728 Sputtering target, method of making same, and high-melting metal powder material
01/13/2004US6676704 Prosthetic joint component having at least one sintered polycrystalline diamond compact articulation surface and substrate surface topographical features in said polycrystalline diamond compact
01/08/2004WO2004003252A1 Multi-component substances and processes for preparation thereof
01/08/2004WO2004002887A1 Barium cadmium tantalum-based compound having high dielectric properties and method of making the same
01/08/2004WO2003070998A8 Method and apparatus for ion beam coating
01/08/2004WO2003003411B1 Selfhealing flexible photonic composites for light sources
01/08/2004WO2002048423A3 Method for coating substrates and mask holder
01/08/2004US20040005981 Rotary metal- cutting tools such as drill bits, countersinks, milling cutters, screw taps, reamers, etc. The coating according to the invention consists essentially of nitrides of Cr, Ti and Al with a unusually high share of Cr atoms, namely
01/08/2004US20040005502 In particular for use as a bipolar plate in a fuel cell. The conductive component consists of a metal part provided with a doped diamond coating and/or with a doped diamond-like carbon coating. This coating enables the component to be produced at
01/08/2004US20040005432 Silver-based alloy composition for use as a reflective or semi- reflective coatings or layer(s) for use in optical data storage media, low emissivity glass, transparent conductive displays, and electro-chromic mirrors, or other reflective or
01/08/2004US20040005416 Coating on a plastic substrate for the production of a polarizer includes the steps of (a) placing the plastic substrate and a target in a vacuum chamber in such a manner that the substrate and the target are spaced apart from each
01/08/2004US20040005409 Improve vapor phase diffusion coating of articles. The apparatus provides a barrier to segregate the portion of the article requiring coating from the portion of the article not requiring coating. The fixture is reusable, being unaffected
01/08/2004US20040004684 Light diffusing film having electromagnetic wave blocking property
01/08/2004US20040004431 Organic EL panel and manufacturing method thereof
01/08/2004US20040003992 Coating apparatus for disk-shaped workpieces
01/08/2004US20040003896 Controller for plasma processing apparatus performing good etching process
01/08/2004US20040003775 Shadow mask for fabricating flat display
01/08/2004US20040003771 Deposition methods and apparatus
01/08/2004DE10227048A1 Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt A device for coating substrates by means of physical vapor deposition over the hollow cathode effect
01/08/2004DE10224991A1 Verfahren und Einrichtung zur Reduzierung der Zündspannung von Plasmen Method and apparatus for reducing the ignition voltage of plasmas
01/08/2004DE10212923A1 Verfahren zum Beschichten eines Substrates und Vorrichtung zur Durchführung des Verfahrens A method for coating a substrate and apparatus for carrying out the method
01/07/2004EP1378933A2 Shadow mask for fabricating a flat display
01/07/2004EP1378587A1 High-temperature articles and method for making
01/07/2004EP1378304A2 Wear resistant coating with enhanced toughness
01/07/2004CN1466634A Method of making nickel-coated copper substrate and thin film composite containing same
01/07/2004CN1465739A Vacuum electric arc automatic arc-striking method and apparatus
01/07/2004CN1465738A Method for treating tin soldering wettability by using cathode electric arc ion plating technology
01/07/2004CN1133818C Compressor for refrigerator
01/07/2004CN1133756C Multi-layer componded superhard C3N4/MN film and its synthesizing equipment and process
01/07/2004CN1133753C Method for producing sputtered aluminium alloy target material by using gas jet powder
01/06/2004US6674587 Antiglare optical device
01/06/2004US6673724 Pulsed-mode RF bias for side-wall coverage improvement
01/06/2004US6673718 Methods for forming aluminum metal wirings
01/06/2004US6673716 Control of the deposition temperature to reduce the via and contact resistance of Ti and TiN deposited using ionized PVD techniques
01/06/2004US6673430 Fr metal machining
01/06/2004US6673400 Hydrogen gettering system
01/06/2004US6673393 Oxide coated cutting tool
01/06/2004US6673255 By which a predetermined number of flat workpieces may be parallel processed, whereby the number of operating cycles for such treatment is minimalized so as to reach optimal short throughput times with optimal low handling
01/06/2004US6673221 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly
01/06/2004US6673220 System and method for fabricating silicon targets
01/06/2004US6673127 Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
01/06/2004US6672922 Forming smooth thick film dielectric using warm isostatic pressing and firing
01/02/2004EP1376212A1 Display cell, in particular comprising liquid crystals, or photovoltaic cell comprising connection means to a driver circuit