Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2004
03/04/2004US20040043258 Perpendicular magnetic recording medium and magnetic storage apparatus using the same
03/04/2004US20040043245 Method to control silver concentration in a resistance variable memory element
03/04/2004US20040043226 Heat treatable low-E coated articles and methods of making same by sputtering Ag in oxygen inclusive atmosphere
03/04/2004US20040043208 Porous material and production process thereof
03/04/2004US20040043150 Vapor deposition process and apparatus therefor
03/04/2004US20040042770 Heating crucible for organic thin film forming apparatus
03/04/2004US20040040837 Overcoating substrate with glass; high speed computers
03/04/2004US20040040836 Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film
03/04/2004US20040040835 Process control; pulsed direct current; controlling pressure
03/04/2004US20040040506 High throughput deposition apparatus
03/04/2004US20040040504 Manufacturing apparatus
03/04/2004US20040040414 Sputtering target; radiation transparent; electroconductivity; indium, tungsten oxide
03/04/2004DE4341173B4 Vorrichtung und Verfahren zur Abscheidung unterschiedlicher Materialien auf einem Substrat Apparatus and method for deposition of different materials on a substrate
03/04/2004DE20320232U1 Device for reducing unintentional deposition of materials on sealed viewing glass of an evacuated processing chamber used in high vacuum vaporizing plants comprises a circular pane with a slit arranged parallel to the viewing glass
03/04/2004DE10239486A1 Production of a substrate for producing light conducting light glass rods used in illumination systems, involves preparing a substrate molded blank and coating a surface which corresponds to a first substrate outer surface
03/04/2004DE10239163A1 Vorrichtung und Verfahren zur Ausbildung von Gradientenschichten auf Substraten in einer Vakuumkammer Apparatus and method for forming gradient layers on substrates in a vacuum chamber
03/04/2004DE10239014A1 Vacuum deposition installation for the multiple coating of substrates comprises a lock, a gas feeding system, a transport unit and electrically operated magnetrons each having a target surface covered by a moving screen
03/04/2004DE10234614B3 Verfahren zur Bearbeitung von Trägermaterial durch Schwerionenbestrahlung und nachfolgenden Ätzprozess A method for processing substrate by heavy ion irradiation and subsequent etching process
03/04/2004DE10056541B4 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions
03/03/2004EP1394869A2 Method of forming protection film for covering electronic component and electronic device having protection film
03/03/2004EP1394290A2 Process for the production of precision tubes
03/03/2004EP1394287A2 Glass coating reactor cleaning with a reactive gas
03/03/2004EP1394286A1 Pretreatment of an organic layer for ALD thereof
03/03/2004EP1394284A1 Sputtering target for forming phase change optical disc protective film and optical recording medium having phase change optical disc protective film formed using that target
03/03/2004EP1394281A1 UNIDIRECTIONAL SILICON STEEL SHEET OF ULTRA−LOW IRON LOSS AND METHOD FOR PRODUCTION THEREOF
03/03/2004EP1394164A1 Precursor containing a nitrogen compound bound to HfCl4 for hafnium oxide layer and method for forming hafnium oxide film using the precursor
03/03/2004EP1394123A1 Mechanism to mold glass lenses using an implanted precision glass molding tool
03/03/2004EP1393601A1 Method and system for improving the effectiveness of medical devices by adhering drugs to the surface thereof
03/03/2004EP1393340A2 Apparatus
03/03/2004EP1392884A1 Recessed sputter target
03/03/2004EP1392883A1 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies
03/03/2004EP1392882A1 Method and device for treating a substrate
03/03/2004EP1392881A1 Single source sputtering of thioaluminate phosphor films
03/03/2004EP1392879A1 Electric arc evaporator
03/03/2004EP1392200A2 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology
03/03/2004EP1166324B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma
03/03/2004EP1140721B1 Methods and apparatus for producing silver based low emissivity coatings without the use of metal primer layers
03/03/2004EP1034316B1 High purity cobalt sputter target and process of manufacturing the same
03/03/2004CN1480011A Multi-face forming mask device for vacuum deposition
03/03/2004CN1479802A Alluminium alloy thin film, wiring circuit having the thin film and target material depositing the thin film
03/03/2004CN1479321A 氧化物烧结体 Oxide sintered body
03/03/2004CN1478919A Manufacturing method of polycrystal film and manufacturing method of oxide superconductor
03/03/2004CN1478918A Heating crucible and deposite device using the heating crucible
03/03/2004CN1140367C Process for preparing nm-material by dual-glow discharge of hollow cathodes
03/02/2004US6699739 Thin film forming device, method of forming a thin, and self-light-emitting device
03/02/2004US6699375 Method of extending process kit consumable recycling life
03/02/2004US6699374 Low temperature cathodic magnetron sputtering
03/02/2004US6699372 Method of coil preparation for ionized metal plasma process and method of manufacturing integrated circuits
03/02/2004US6699336 Useful in secondary lithium batteries
03/02/2004US6698647 Aluminum-comprising target/backing plate structures
02/2004
02/26/2004WO2004017388A2 Lithographic template and method of formation
02/26/2004WO2004017356A2 Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes
02/26/2004WO2004017352A2 Method for vapor-depositing a substrate with a needle-shaped x-ray fluorescent material, and x-ray fluorescent material
02/26/2004WO2004017140A1 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank
02/26/2004WO2004016825A1 Hafnium silicide target and method for preparation thereof
02/26/2004WO2004016824A1 Electroconductive oxide sintered compact, sputtering target comprising the sintered compact and methods for producing them
02/26/2004WO2004016823A1 Silicon substrate or silicon sputtering target and method for preparation thereof
02/26/2004WO2004016822A2 Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer and use thereof in ophthalmic optics
02/26/2004WO2004016820A2 Thin film deposition apparatus
02/26/2004WO2004016560A2 Flexible electrically conductive film
02/26/2004WO2004016417A2 Plasma treated metallized film
02/26/2004WO2003044836A3 High temperature superconducting composite conductors
02/26/2004WO2003003417A3 High throughput hybrid deposition system and method using the same
02/26/2004WO2002082530A3 In-situ thickness measurement for use in semiconductor processing
02/26/2004WO2002072260A3 Metal bis-triflimide compounds, their synthesis and their uses
02/26/2004WO2002043103A8 Extraction and deceleration of low energy beam with low beam divergence
02/26/2004US20040039155 Heating polyethylene resin at a heating temperature higher than a melting point of the resin material in a reduced pressure atmosphere; excellent controllability
02/26/2004US20040038505 Ion implantation method, SOI wafer manufacturing method and ion implantation system
02/26/2004US20040038504 Ion implantation method and method for manufacturing SOI wafer
02/26/2004US20040038084 Piston pin having a low friction coating which is a vapor deposited coating of a 4A to 6A group metal compound, selected from carbide, nitride, oxynitride, carbonitride, sulfide and mixutures
02/26/2004US20040038045 Cleaning the surface, heating, exposing to oxygen, ozone, steam, hydrogen, ammonia, nitrous oxide, nitric oxide, and nitrogen to form a an adherent film on the surface and etching
02/26/2004US20040038033 Dlc layer system and method for producing said layer system
02/26/2004US20040037987 Method of making a solid compacted pellet of organic material for vacuum deposition of oled displays
02/26/2004US20040037970 Method for forming gas cluster and method for forming thin film
02/26/2004US20040037956 Vapor deposition a silane coupling agent on electronics, under control pressure in vacuum chamber; preventing non-uniform coatings
02/26/2004US20040036168 Hydrogen gettering system
02/26/2004US20040035698 Friction fit target assembly for high power sputtering operation
02/26/2004US20040035697 Cathodic sputtering metal backing plate
02/26/2004US20040035692 Sputtering process comprising impressing DC magnetic field of first magnetic polarity parallel to central axis, injecting sputter working gas into chamber, electrically biasing target to excite working gas into plasma for sputtering, RF biasing
02/26/2004US20040035530 Sheet-fed treating device
02/26/2004US20040035366 Heating crucible and deposition apparatus using the same
02/26/2004US20040035363 Device and a method for the formation of gradient layers on substrates in a vacuum chamber
02/26/2004US20040035360 Manufacturing apparatus
02/26/2004DE19613745B4 Verfahren zur Herstellung anamorphotischer mikrooptischer Arrays und damit ausgestattete Faserlinse Process for the preparation of anamorphic micro-optical arrays and thus equipped fiber lens
02/26/2004DE10326136A1 Entladungsplasma-Bearbeitungsanlage mit magnetischer neutraler Linie Discharge plasma processing system with magnetic neutral line
02/26/2004DE10247002B3 Multi-chambered continuous coating apparatus has several separate processing chambers with adjoining walls and easily replaceable circumferential seals between wall and support faces of sealing insert
02/26/2004DE10240605A1 Coating thermoplastic foam mouldings with metallic layers, comprises controlling the thermal capacity of the particles or droplets that are used for coating
02/26/2004DE10236456A1 Retaining device for use in the manufacture of optical data disks, while they are subjected processing in a vacuum, comprises a fluid filled chamber that expands under the vacuum to ensure the disk is firmly retained
02/26/2004CA2495244A1 Plasma treated metallized film
02/25/2004EP1391783A2 Method and apparatus for making a shadow mask array
02/25/2004EP1391534A1 Method for manufacturing endo-osseous implants or medical prosthesis by ionic implantation technique
02/25/2004EP1391533A1 Method for protecting articles, and related compositions
02/25/2004EP1391532A1 Organic material for vacuum deposition
02/25/2004EP1391531A2 Thermal barrier coating with nitride particles
02/25/2004EP1391429A1 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film
02/25/2004EP1390964A1 Dipole ion source
02/25/2004EP1390560A2 Process for making platelets
02/25/2004EP1390559A1 Method for producing a layer with a predefined layer thickness profile
02/25/2004EP1390558A1 Penning discharge plasma source
02/25/2004EP1390557A1 System and method for making thin-film structures using a stepped profile mask