Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2004
01/02/2004EP1375704A1 Diamond substrate having piezoelectric thin film, and method for manufacturing it
01/02/2004EP1375703A1 Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing the metallic very thin film or the metallic very thin film laminate
01/02/2004EP1375701A1 Thermal barrier coating material
01/02/2004EP1375698A1 Sputter device
01/02/2004EP1375697A1 Laminated film and method of forming film
01/02/2004EP1375693A1 Grain oriented electromagnetic steel sheet exhibiting extremely small watt loss and method for producing the same
01/02/2004EP1375445A1 Process for manufacturing a glazing having a multilayered coating
01/02/2004EP1375431A2 Method of manufacturing inorganic nanotube
01/02/2004EP1374992A1 Supported mixed metal oxide catalyst obtained by physical or chemical vapour deposition
01/02/2004EP1374286A2 Diffuser and rapid cycle chamber
01/02/2004EP1373604A1 Tank for epitaxy installation and installation comprising one such tank
01/02/2004EP1373594A1 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly
01/02/2004EP1373388A1 Release films
01/02/2004EP1373278A1 Metalloamide and aminosilane precursors for cvd formation of dielectric thin films
01/02/2004EP1372897A2 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
01/02/2004EP1372871A1 Coating for a handle
01/02/2004EP1131473B1 Process for making metal flakes
01/01/2004US20040001965 High-temperature articles and method for making
01/01/2004US20040001959 Phosphate coating; cell proliferation; adhesion to bone tissue
01/01/2004US20040001916 Cesium dispensers and process for the use thereof
01/01/2004US20040000651 Ion source having replaceable and sputterable solid source material
01/01/2004US20040000477 Apparatus and method for obtaining symmetrical junctions between a read sensor and hard bias layers
01/01/2004US20040000379 Evaporation container and evaporation source
12/2003
12/31/2003WO2004001831A1 Magnetron plasma processing apparatus
12/31/2003WO2004001817A1 Transfer chamber for vacuum processing system
12/31/2003WO2004001804A2 Device for generation of reactive ions
12/31/2003WO2004001738A1 Method of delivering substrate to film forming device for disk-like substrate, mechanism for delivering substrate used for the method, substrate holder, and method of manufacturing disk-like recording medium using the method
12/31/2003WO2004001737A1 Method for delivery of substrate to film forming device for disk-like substrate, substrate delivery mechanism and substrate holder used for the method, and method of manufacturing disk-like recording medium using the method
12/31/2003WO2004001495A2 Display cell, in particular liquid crystal, or photovoltaic cell comprising means for connection to an electronic control circuit
12/31/2003WO2004001094A1 Sputter target monitoring system
12/31/2003WO2004001093A1 Silver alloy sputtering target and process for producing the same
12/31/2003WO2004001092A1 AlRu SPATTERING TARGET AND METHOD FOR PREPARATION THEREOF
12/31/2003WO2004000987A1 Method of cleaning chamber of vacuum evaporation apparatus for production of organic el element
12/31/2003WO2004000494A1 Coated cutting tool member
12/31/2003WO2004000460A1 Method and apparatus for manufacturing a catalyst
12/31/2003WO2003088347A3 Method for connecting substrates and composite element
12/31/2003WO2003026796A3 A nano-supported sponge catalyst for nanotube growth
12/31/2003WO2002093648A3 Semiconductor device interconnect
12/31/2003CN1464991A Substrate with ito coating film and manufacture thereof
12/31/2003CN1464917A Method and device for forming film
12/31/2003CN1464916A Process for production of ultrathin protective overcoats
12/31/2003CN1464914A Unidirectional silicon steel sheet of ultra low iron loss and method for production thereof
12/31/2003CN1464862A Ceramic and method for preparation thereof, and dielectric capacitor, semiconductor and element
12/31/2003CN1464861A Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
12/31/2003CN1464074A A solid electrolyte crystal material and process for preparing crystal film
12/31/2003CN1132961C Process for preparing mask for organic vacuum coating
12/30/2003US6671109 ND filter having composite PVD film of metal and its oxide
12/30/2003US6670624 Ion implanter in-situ mass spectrometer
12/30/2003US6670055 Magnetic recording medium and manufacturing method therefor
12/30/2003US6669989 Method for producing by evaporation a functionally graded coating with an outer ceramic layer on a metal substrate
12/30/2003US6669987 Depressurization of mechanical cells containing optical recording media, using pumps, then coating the disks
12/30/2003US6669830 Sputtering target, transparent conductive oxide, and process for producing the sputtering target
12/30/2003US6669829 Shutter disk and blade alignment sensor
12/30/2003US6669824 Uniform thin films
12/30/2003US6669823 Process for preparing nanostructured materials of controlled surface chemistry
12/30/2003US6669795 Methods of fabricating high transition temperature SMA, and SMA materials made by the methods
12/30/2003US6669782 Method and apparatus to control the formation of layers useful in integrated circuits
12/30/2003US6668618 Systems and methods of monitoring thin film deposition
12/25/2003WO2003106731A1 Material evaporation chamber with differential vacuum pumping
12/25/2003US20030236163 Providing a catalyst support; vapor depositing layers comprising molybdenum, vanadium and tellurium and layer comprising at least one other element; calcining
12/25/2003US20030235720 Depositing coating material comprising zirconium oxide over substrate; depositing coating material comprising titanium oxide; wherein one of coating materials is deposited by pyrolytic deposition
12/25/2003US20030235695 Glass substrates, including glass sheet and continuous float glass ribbon
12/25/2003US20030235694 Method for the excitation of a plasma and a use of the method
12/25/2003US20030235659 Electron generator for generating electrons by heating a tungsten filament, traveling at a high speed from high voltage power source to the foil support at low voltage, entering into processing zone; electrochemical mechining
12/25/2003US20030234371 Device for generating reactive ions
12/25/2003US20030234176 Vapor deposition of films using electric arcs having graphite electrodes
12/25/2003US20030234175 Pre-sputtering method for improving utilization rate of sputter target
12/25/2003US20030233980 Systems for making barrier coated plastic containers
12/24/2003WO2003107428A1 Semiconductor device and method for fabricating the same
12/24/2003WO2003107385A2 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method
12/24/2003WO2003106733A1 Target and method of diffusion bonding target to backing plate
12/24/2003WO2003106732A1 Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating
12/24/2003WO2003106730A1 Thin film-forming apparatus
12/24/2003WO2003106729A2 Method of making automotive trim with chromium inclusive coating thereon, and corresponding automotive trim product
12/24/2003WO2003106363A2 Method for production of a glazed piece provided with a multi-layer coating
12/24/2003WO2003106016A1 Process for preparing nanostructured materials of controlled surface chemistry
12/24/2003WO2003071577A3 Channel spark source for generating a stable, focussed electron beam
12/24/2003WO2003062491A3 Refractrory metal and alloy refining by laser forming and melting
12/24/2003CN2594278Y Continuous magnetic controlled sputtering apparatus for producing high reflective mirror
12/24/2003CN2594277Y Magnetic filtered metal vapor vacuum arc plasma depositing source
12/24/2003CN1463450A Mfg. method of double-sided metallization film and metallization film capacitor using same
12/24/2003CN1463367A Antireflection film and antireflection layer-affixed plastic substrate
12/24/2003CN1463300A Sputtering target for forming phase change type optical disk protective film and optical recording medium with phase change type optical disk protective film formed thereon by using target
12/24/2003CN1463225A Coated article with polymeric basecoat
12/24/2003CN1462817A Metal plasma procedure in multistage ionization
12/24/2003CN1132227C Ion beam neutralizing method and appts.
12/24/2003CN1132219C Cathode arc source and graphite target
12/24/2003CN1132218C Ion filling appts. ion source appts. and method for positioning ion source appts.
12/23/2003USRE38358 Cold cathode ion beam deposition apparatus with segregated gas flow
12/23/2003US6668207 Optical films for extreme ultraviolet lithography
12/23/2003US6667839 Holding device for an optical element made of a crystalline material
12/23/2003US6667493 Thin-film magnetic element capable of effectively orienting magnetization direction of magnetic layer and manufacturing method thereof
12/23/2003US6667215 Method of making transistors
12/23/2003US6667121 Heat treatable coated article with anti-migration barrier between dielectric and solar control layer portion, and methods of making same
12/23/2003US6667075 Method for imparting hydrophilicity to substrate
12/23/2003US6666982 Protection of dielectric window in inductively coupled plasma generation
12/23/2003US6666958 Sputtering or vapor depostion of silicon carbide targets, while adjusting electricity and/or concentration of oxygen or nitrogen, to form coatings or thin films having variable thickness; optical filters
12/23/2003US6666957 Magnetron sputtering system and photomask blank production method based on the same
12/23/2003US6666901 Thermal shock resistant quasicrystalline alloy target
12/23/2003US6666811 Coating microsphere with radioactive, diffusion barrier, and protective layers; solid, multilayered seamless elements are implanted; heating tumors