Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2004
02/12/2004DE10235051A1 Vapor deposition of acicular x-ray phosphor layer, used e.g. as phosphor or storage phosphor in medicine or non-destructive testing of materials involves simultaneous vaporization of trivalent europium oxyhalide and alkali halide
02/12/2004DE10234862A1 Process for magnetron sputtering for depositing thin layers for coating glass, plastic films, metals, electrical components and other substrates comprises initially impinging a magnetron source and/or partial target with a magnetic field
02/12/2004DE10234859A1 Einrichtung und Verfahren zum Beschichten von Substraten Apparatus and method for coating substrates
02/12/2004DE10234856A1 Coating device for depositing layers of alloys, mixtures or reaction products of different materials by magnetron sputtering has a target made from concentrically arranged partial targets each made from the material to be deposited
02/12/2004DE10234855A1 Device for adjusting layer thickness distribution during vacuum deposition on moving substrates comprises adjustable opening delimited by partial screens, and vaporizing region running across moving direction
02/12/2004DE10233567A1 Device for generating pulsed plasma in vacuum chamber with solid state target has at least one debris stop that rotates about axis between optical element or substrate and plasma in vacuum chamber
02/12/2004DE10207078B4 Kolbenring mit einer PVD-Beschichtung Piston ring with a PVD coating
02/11/2004EP1388885A2 Cathodic arc shielding
02/11/2004EP1388592A1 Process and apparatus for isolating a surface area of a workpiece
02/11/2004EP1388566A1 Metallized polyester composition
02/11/2004EP1388159A1 Magnetic mirror plasma source
02/11/2004EP1387897A1 Electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo
02/11/2004CN1474881A Substrate with photocatalytic coating
02/11/2004CN1474752A Polymer anti-reflective coatings deposited by plasma enhanced chemical vapor deposition
02/11/2004CN1138020C Evaporation coating process with cathode arc for depositing diamond-like carbon film
02/11/2004CN1138011C Aluminium alloy thin film and target and method for forming thin film using same
02/10/2004US6690094 High aspect ratio metallization structures
02/10/2004US6689685 Process for forming a diffusion barrier material nitride film
02/10/2004US6689515 Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank
02/10/2004US6689487 Thermal barrier coating
02/10/2004US6689486 Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
02/10/2004US6689477 Sintered products contain indium oxide, tin oxide and zinc oxide; formed into films through sputtering; displays
02/10/2004US6689456 Magnetic recording medium, a manufacturing method thereof, and a magnetic recording unit using thereof
02/10/2004US6689444 Reflection layer or semi-transparent reflection layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media
02/10/2004US6689255 Variations in thickness; rotation; positioning mask
02/10/2004US6689254 Replaceable sputtering target with annular projecting rim having forward facing front edge forming vacuum tight seal with sputtering chamber, rearward facing rear edge having fluid sealing surface surrounding cooling fluid cavity
02/10/2004US6689253 Facing target assembly and sputter deposition apparatus
02/10/2004US6689221 Cooling gas delivery system for a rotatable semiconductor substrate support assembly
02/10/2004US6689199 Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating
02/10/2004US6688817 Drill for drilling, a method for making a drill for drilling, and a cutting tool
02/10/2004US6688254 Vapor deposition temperature control apparatus and method
02/05/2004WO2004012229A2 Reduced volume, high conductance process chamber
02/05/2004WO2004012220A2 Methods and apparatus for monitoring plasma parameters in plasma doping systems
02/05/2004WO2004011693A1 Atomic deposition layer methods
02/05/2004WO2004011691A1 Copper sputtering targets and methods of forming copper sputtering targets
02/05/2004WO2004011690A1 Sputtering target
02/05/2004WO2004011688A2 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings
02/05/2004WO2003087233A3 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
02/05/2004WO2003083160A3 Evaluation of chamber components having textured coatings chamber components
02/05/2004US20040023811 Depositing polycrystalline thin film on a polycrystalline substrate. The temperature of the polycrystalline substrate is set within a range from 150 degrees C. to 250 degrees C., the ion beam energy of the ion beam is adjusted within a
02/05/2004US20040023445 Electronic circuit
02/05/2004US20040023432 Semiconductor polysilicon component and method of manufacture thereof
02/05/2004US20040023125 Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask
02/05/2004US20040023106 Apparatus and method for fracture absorption layer
02/05/2004US20040023080 First layer comprises 50-100 wt. % alumina and 50-0 wt. % silica; second layer comprises 50-100 wt. % silica and 50-0 wt. % alumina; provides the coating stack with a higher emissivity
02/05/2004US20040023048 Enhanced bonding layers on native oxide surfaces
02/05/2004US20040023047 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
02/05/2004US20040023038 Limits the transmission of oxygen-containing gases to materials over which it is deposited when subjected to conditioning comprising one or more of heating, bending, and tempering.
02/05/2004US20040023020 Thermal barrier coating utilizing a dispersion strengthened metallic bond coat
02/05/2004US20040022947 Method for creating microstructure patterns by contact transfer technique
02/05/2004US20040022942 Vapour deposition
02/05/2004US20040022664 High heat resistance and a low electrical resistance
02/05/2004US20040022662 Method for protecting articles, and related compositions
02/05/2004US20040021410 Method and apparatus for making a shadow mask array
02/05/2004US20040020770 Auxiliary electromagnets in a magnetron sputter reactor
02/05/2004US20040020769 High purity sputter targets with target end-of-life indication and method of manufacture
02/05/2004US20040020768 Asymmetric rotating sidewall magnet ring for magnetron sputtering
02/05/2004US20040020761 Sputter coating apparatus including ion beam source(s), and corresponding method
02/05/2004US20040020760 Pulsed highly ionized magnetron sputtering
02/05/2004US20040020759 Sputtering cathode adapter assembly and method
02/05/2004US20040020435 Multi-face forming mask device for vacuum deposition
02/05/2004DE10233137A1 Substrate coating unit, comprises a distributor for gaseous material, which sends out a coating material, and an electron beam generator
02/05/2004DE10232731A1 Be- und Entladevorrichtung für eine Beschichtungseinrichtung Loading and unloading of a coating device
02/05/2004DE10232179A1 PVD-Verfahren und PVD-Vorrichtung PVD method and PVD device
02/05/2004DE10231203A1 Targetträgeranordnung Target support assembly
02/05/2004DE10058767B4 Verfahren zum beschleunigten Erzeugen eines vorbestimmten Prozeßgasdruckes in einer Prozeßkammer A method of accelerated forming a predetermined process gas pressure in a process chamber
02/04/2004EP1387602A1 A method of forming an electrically conductive coating on support sheets for printed circuit cards
02/04/2004EP1386979A2 Method of producing polycrystalline thin film and method of producing an oxide superconducting element
02/04/2004EP1386198A2 Ion-beam deposition process for manufacturing binary photomask blanks
02/04/2004EP1386019A1 Apparatus and method for epitaxial sputter deposition of multi-compound magnetic epilayers with high deposition rate
02/04/2004EP1385900A1 Barrier coated plastic containers
02/04/2004EP1029105B1 PVD Al2O3 COATED CUTTING TOOL
02/04/2004CN2602034Y Continuous deposition and sputter machine
02/04/2004CN1473355A Electrode for P-type Sic
02/04/2004CN1473329A Sputtering target and production method therefor and optical recording medium formed with phase-change type optical disk protection film
02/04/2004CN1472774A Micro-powder remover
02/04/2004CN1472598A Masks for vaporation, frame assembly therewith and manufacture of both
02/04/2004CN1472360A Ion implanted composite coating film apparatus
02/04/2004CN1472359A Heating temperature controller and method for preparing method
02/04/2004CN1472135A Carbon nanometer for fuel battery, its preparing method and fuel battery therewith
02/04/2004CN1472008A Mixed metallic oxide catalyst with physical weather salation load
02/04/2004CN1137466C Exchange bonding film, magneto-resistant effect element, magnet head and magnet memory
02/04/2004CN1137284C Process for modifying inner surface of tubular workpiece
02/03/2004US6687015 Method and device for measuring the thickness of a layer
02/03/2004US6686599 Ion production device for ion beam irradiation apparatus
02/03/2004US6686290 Method of forming a fine pattern
02/03/2004US6686236 Methods of preventing reduction of IrOx during PZT formation by metalorganic chemical vapor deposition or other processing
02/03/2004US6686215 Method of producing an electroluminescence display device
02/03/2004US6686205 Parallel synthesis and analysis
02/03/2004US6686053 AL alloy member having excellent corrosion resistance
02/03/2004US6686050 Heat treatable low-E coated articles and methods of making same
02/03/2004US6685805 Method of manufacturing substrate having transparent conductive film, substrate having transparent conductive film manufactured using the method, and touch panel using the substrate
02/03/2004US6685804 Depositing thin film of active material capable of alloying with lithium on current collector of metal incapable of such alloying, by supplying material from gas phase, forming mixed layer at interface via diffusion of current collector material
02/03/2004CA2226335C Cutting tool
01/2004
01/29/2004WO2004010508A1 Nonvolatile semiconductor storage device and manufacturing method
01/29/2004WO2004010494A2 Method for transferring an electrically active thin layer
01/29/2004WO2004010475A2 Method of reducing internal stress in materials
01/29/2004WO2004010455A2 Ion beam source with coated electrode
01/29/2004WO2004010229A1 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension
01/29/2004WO2004009866A2 Monolithic sputtering target assembly