Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2004
01/29/2004WO2004009865A1 FABRICATION OF B/C/N/O/Si DOPED SPUTTERING TARGETS
01/29/2004WO2004009864A1 Pellet feeder
01/29/2004WO2004009299A2 Loading and unloading device for a coating unit
01/29/2004WO2003097892A3 System and apparatus for control of sputter deposition process
01/29/2004WO2003069016A3 In-line deposition processes for circuit fabrication
01/29/2004WO2003063226A3 Oxide layer on a gaas-based semiconductor structure and method of forming the same
01/29/2004WO2003020998A3 Integrated circuit device and fabrication using metal-doped chalcogenide materials
01/29/2004US20040018796 Method of manufacturing display device
01/29/2004US20040018416 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same
01/29/2004US20040018393 Coated tool
01/29/2004US20040018334 Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
01/29/2004US20040018303 Temperature control by a radiation reflectors that can be moved within the chamber to increase and decrease the amount of reflective heat; depositing a ceramic coatings on gas turbine engine for heat resistance
01/29/2004US20040018110 Filling microstructure alloy powders in containers, then isostatic pressing and machining
01/29/2004US20040016965 Field-effect transistor and method of producing the same
01/29/2004US20040016952 Method of forming ferroelectric film, ferroelectric memory, method of manufacturing the same, semiconductor device, and method of manufacturing the same
01/29/2004US20040016929 Electrode for p-type sic
01/29/2004US20040016907 Method of using predoped materials for making an organic light-emitting device
01/29/2004US20040016641 Pulsed carbon plasma apparatus
01/29/2004US20040016640 Ion beam source with coated electrode(s)
01/29/2004US20040016635 Durability
01/29/2004US20040016443 Effectively eliminates particles in the vacuum container unit without degrading the rate of operation of the processing device
01/29/2004US20040016402 Methods and apparatus for monitoring plasma parameters in plasma doping systems
01/29/2004US20040016400 Source for thermal physical vapor deposition of organic electroluminescent layers
01/29/2004US20040016394 Atomic layer deposition methods
01/29/2004DE10318825A1 Testsystem für ferroelektrische Materialien und Edelmetallelektroden bei Halbleiterkondensatoren Test system for ferroelectric materials and precious metal electrodes in semiconductor capacitors
01/28/2004EP1384796A2 Organic film formation apparatus
01/28/2004EP1384395A1 Production of nanocrystal beams
01/28/2004EP1384257A2 Ionized pvd with sequential deposition and etching
01/28/2004EP1383939A1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
01/28/2004EP1383937A1 Device for inserting a flexible strip material into a chamber
01/28/2004EP1383936A2 Sputter targets comprising ti and zr
01/28/2004EP1135219B1 Method for producing adhesive surface coatings
01/28/2004EP1114201B1 Device and method for the vacuum plasma processing of objects
01/28/2004EP1015655B1 Skeletal columnar coatings
01/28/2004CN1471496A Method of making coated articles and coated articles made thereby
01/28/2004CN1471341A Mask frame assembly of thin layer vacuum evaporation for organic electroluminescent device
01/28/2004CN1471138A High dielectric coefficient gate dielectric material hafnium aluminate fil mand preparing method thereof
01/28/2004CN1471137A High dielectric coefficient gate dielectric material hafnium nitrogen aluminate film and preparing method thereof
01/28/2004CN1470700A Needle driving mechanism of sewing machine
01/28/2004CN1470671A SiC/TiN superhard nano multi-layer film and manufacturing process thereof
01/28/2004CN1470350A Coating tool
01/28/2004CN1136333C Equipment and process for low-temperature osmosis of metal
01/28/2004CN1136332C Equipment and method for preparing film by pulse aided filter and arc deposition
01/28/2004CN1136331C Pulse glow discharge plasma surface metallurgical technology
01/27/2004US6684172 Sensor to predict void free films using various grating structures and characterize fill performance
01/27/2004US6683425 Null-field magnetron apparatus with essentially flat target
01/27/2004US6683012 Method for epitaxially growing crystalline insulation layer on crystalline silicon substrate while simultaneously growing silicon oxide, nitride, or oxynitride
01/27/2004US6682860 Quartz substrates having translucent thin films comprising silicon oxynitrides and transition metal mixtures having improved etch selectivity for use in lithography
01/27/2004US6682834 Magnetic storage medium having a high recording density
01/27/2004US6682833 Recorders comprising nonmagnetic foundation, polycrystalline undercoatings and magnetic alloy of cobalt and chromium for use in disk drives having high coercive forces and high recording density
01/27/2004US6682828 Steel sheet provided with a coating comprising a main layer of zinc-chromium alloy the predominant phase of which has a delta and/or zeta structure
01/27/2004US6682827 Nickel aluminide coating and coating systems formed therewith
01/27/2004US6682807 Depositing a first carbon layer on disk, first carbon layer comprising predominantly sp3 carbon; and depositing second carbon layer on disk, second carbon layer
01/27/2004US6682782 Organic compound having an acetylene group, vacuum deposition polymerization thereof, deposited polymerized thin film, and electroluminescence device containing same
01/27/2004US6682772 High temperature deposition of Pt/TiOx for bottom electrodes
01/27/2004US6682637 Magnetron sputter source
01/27/2004US6682636 Physical vapor deposition targets and methods of formation
01/27/2004US6682635 Cathodic sputtering chamber for applying material to the surface of a semiconductor wafer located therein
01/27/2004US6682634 Apparatus for sputter deposition
01/27/2004US6682600 Reusable mass-sensor in manufacture of organic light-emitting devices
01/27/2004US6682343 Substrate processing apparatus
01/27/2004US6682288 Substrate processing pallet and related substrate processing method and machine
01/27/2004US6682270 Method of loading a sputter pallet
01/22/2004WO2004008517A1 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
01/22/2004WO2004008479A2 Vacuum sputtering cathode
01/22/2004WO2004008478A2 Cathode for vacuum sputtering treatment machine
01/22/2004WO2004008450A1 Protective overcoatings
01/22/2004WO2004007791A1 Target support assembly
01/22/2004WO2004007790A1 Low-friction material
01/22/2004WO2004007191A1 Transparent laminated film having barrier property and method for production thereof
01/22/2004WO2003096080A3 Silver alloy thin film reflector and transparent electrical conductor
01/22/2004WO2003090272A3 Methods for the formation of thin film layers using short-time thermal processes
01/22/2004US20040014314 Evaporative deposition with enhanced film uniformity and stoichiometry
01/22/2004US20040014077 Delivering a first component of a first material and a first component of a second material to first and second region on a substrate, delivering a second component of second material to first and second region, simultaneously reacting component
01/22/2004US20040013899 Thin film having indium oxide as its major component and containing tungsten oxide and/or molybdenum oxide; excellent surface smoothness and low specific resistance
01/22/2004US20040013820 Method for making films utilizing a pulsed laser for ion injection and deposition
01/22/2004US20040013798 Comprises luminophores/phosphors; vapor phase deposition
01/22/2004US20040012742 Liquid crystal display device and method for fabricating the same
01/22/2004US20040012120 Compacting moisture-sensitive organic materials in making an organic light-emitting device
01/22/2004US20040011641 For forming a high density thin film; efficiency
01/22/2004US20040011640 Using electric field for partially ionizing process gas; accelerating ionized gas toward target region, ejecting target constituents and partially depositing ejected target constituents on substrate region; generating magnetic field
01/22/2004US20040011442 Method for reducing the oxygen and oxide content in cobalt to produce cobalt sputtering targets
01/22/2004US20040011440 Grain structure is about 99 percent recrystallized; sputter target's face has a grain orientation ratio of about 10 percent each of (111), (200), (220) and (311); grain size of less than about 10 mu m for improving sputter target arcing
01/22/2004US20040011385 Glass-coating reactor cleaning with a reactive gas
01/21/2004EP1383181A2 Compacting moisture-sensitive organic materials in making an organic light-emitting device
01/21/2004EP1382714A2 Apparatus for removing particles
01/21/2004EP1382713A2 Source for thermal physical vapour deposition of organic electroluminescent layers
01/21/2004EP1382712A1 Plant for vacuum coating of objects in batches
01/21/2004EP1382711A1 Arc evaporator with a powerful magnetic guide for targets having a large surface area
01/21/2004EP1382710A1 Ultrafine-grain-copper-base sputter targets
01/21/2004EP1382709A1 Coated tool
01/21/2004EP1382708A2 Surface recovery of contaminated deposition tools
01/21/2004EP1382583A2 Glass substrates coated with a stack of thin layers having reflective properties for infrared and/or solar radiation
01/21/2004EP1382082A2 Strain-relieved tunable dielectric thin films
01/21/2004EP1381918A2 Ion-beam deposition process for manufacturing multilayered attenuated phase shift photomask blanks
01/21/2004EP1381708A1 Target and method of optimizing target profile
01/21/2004EP1381707A1 Method for producing a coating on a machining tool and a machining tool
01/21/2004EP1381706A1 Method and device for production of endless plastic hollow profiles
01/21/2004EP1381703A2 A method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target
01/21/2004EP0692138B1 Reactive dc sputtering system