Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2004
03/18/2004US20040050108 Mechanism to mold glass lenses using an implanted precision glass molding tool
03/18/2004DE10242421A1 Coating for substrates used in the automobile industry comprises niobium nitride or niobium metal nitride
03/18/2004DE10240160A1 Corrosion-protected component used as a connecting element, such as a rivet, bolt or screw, comprises a base body made from a steel or light metal and a corrosion-inhibiting surface layer made from aluminum, alloy or compound
03/18/2004CA2670068A1 Metallic material for electronic components, method of working and process for producing thereof
03/18/2004CA2669987A1 Metallic material for electronic components, method of working and process for producing thereof
03/18/2004CA2488724A1 Vapor deposited catalysts and their use in fuel cells
03/17/2004EP1398819A2 Matching box, vacuum apparatus using the same, and vacuum processing method
03/17/2004EP1397534A2 A method of growing a semiconductor layer
03/17/2004EP1397527A1 Grain oriented electric sheet of metal with an electrically insulating coating
03/17/2004EP1397526A2 Modified diamond-like carbon (dlc) layer structure
03/17/2004EP1397525A1 Device for vacuum metallising large surfaces by plasma activation
03/17/2004EP1397260A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
03/17/2004EP1397244A1 Transparent conductive stratiform coating of indium tin oxide
03/17/2004EP1238120B1 Device and method for coating objects at a high temperature
03/17/2004EP1084283B1 Vacuum strip coating installation
03/17/2004CN1483300A Production method and device for organic el element
03/17/2004CN1482653A Precursor containing a nitrogen compound bound to hfcl4 for hafnium oxide layer and method for forming hafnium oxide film using the precursor
03/17/2004CN1482274A Aluminum nitride monocrystal film and method of preparing the same
03/17/2004CN1481971A Pvd coated cutting tool
03/17/2004CN1142561C Corrosion-resisting permanent magnet and method for producing same
03/17/2004CN1142317C Process for preparing gas-sensitive allochroic WO3 film by vacuum evaporation
03/17/2004CN1142316C Nb-doped barium titanate film material and its preparing process
03/16/2004US6707610 Applying grey metal damage retardation layer to flexible substrate, applying optical coating of titanium nitride on side of metal layer opposite substrate, attaching to rigid substrate for solar control
03/16/2004US6707097 Method for forming refractory metal-silicon-nitrogen capacitors and structures formed
03/16/2004US6706448 Method and apparatus for lithiating alloys
03/16/2004US6706412 Barrier film for limiting transmission of oxygen and moisture therethrough
03/16/2004US6706407 Glass coated with heat reflecting colored film and process for its production
03/16/2004US6706327 Method of making cemented carbide body
03/16/2004US6706323 Vapor phase coating of airfoil flowpath surfaces and platform upper surfaces of several airfoils simultaneously while masking dovetail sections
03/16/2004US6706226 Compacting moisture-sensitive organic materials in making an organic light-emitting device
03/16/2004US6706156 Method of making an improved MR sensor
03/16/2004US6706155 Sputtering apparatus and film manufacturing method
03/12/2004CA2512478A1 Compound film, and method for fabrication the same
03/12/2004CA2419099A1 Compound film, and method for fabricating the same
03/11/2004WO2004020687A1 High throughput deposition apparatus
03/11/2004WO2004020686A2 A hybrid beam deposition system and methods for fabricating zno films, p-type zno films, and zno-based ii-vi compound semiconductor devices
03/11/2004WO2004020683A2 Silver selenide film stoichiometry and morphology control in sputter deposition
03/11/2004WO2003079432A3 Automatically adjusting serial connections of thick and thin layers and method for the production thereof
03/11/2004US20040049308 Assembly for processing substrates
03/11/2004US20040048466 Method and apparatus for forming high surface area material films and membranes
03/11/2004US20040048461 Methods and apparatus for forming barrier layers in high aspect ratio vias
03/11/2004US20040048449 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
03/11/2004US20040048092 Preparing a structure including columnar members and an area surrounding each of columnar members; removing columnar members from structure to form a porous body; filling porous body with a functional material
03/11/2004US20040048077 For containing high frequency electromagnetic radiation within a personal computer, cellular telephone, or other electronic instrument; lightweight, efficiency
03/11/2004US20040048075 Surface plasmon-excitable granular thin film of noble metal
03/11/2004US20040048074 Glass coated with heat reflecting colored film and process for its production
03/11/2004US20040048037 Method of fabricating electronic devices
03/11/2004US20040048000 Device and method for organic vapor jet deposition
03/11/2004US20040047989 Process for producing metal oxide, target comprising the metal oxide for forming thin metal oxide film, process for producing the same, and process for producing thin metal oxide film
03/11/2004US20040046969 System and method for monitoring thin film deposition on optical substrates
03/11/2004US20040046130 Apparatus and method for synthesizing films and coatings by focused particle beam deposition
03/11/2004US20040045812 Magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil
03/11/2004US20040045811 A metal vapor deposition reactor includes a primary reactor chamber having a primary chamber enclosure comprising a ceiling chamber having a primary chamber enclosure comprising a ceiling and side wall. A wafer support pedestal within the
03/11/2004US20040045810 Forming a thin film from negatively charged sputtered ions. More specifically, a sputter deposition apparatus for forming a thin film on a substrate includes at least one sputter target comprised of a material for the thin film, an ion gun
03/11/2004US20040045809 Sputtering target and method for making composite soft magnetic films with a sintered target
03/11/2004US20040045807 Process for preparing nanostructured materials of controlled surface chemistry
03/11/2004US20040045507 Apparatus for plasma doping
03/11/2004US20040045341 Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device
03/11/2004US20040045320 Method for transporting glass panels through a coating installation and device for transporting said glass panels
03/11/2004DE4126216B4 Vorrichtung für Dünnschichtverfahren zur Behandlung großflächiger Substrate Apparatus for thin-film processes for the treatment of large area substrates
03/11/2004DE10341513A1 Technique, for controlling flow of reactive gas in plasma vacuum deposition process, involves using optical spectroscopy to measure the particle stream intensities in the coating material and the reactive gas
03/11/2004DE10240221A1 Verfahren zum Herstellen dünner Präzisionsrohre A method for producing thin precision tubes
03/11/2004DE10224990B3 Verfahren zur Abscheidung transparenter leitfähiger Schichten A process for the deposition of transparent conductive layers
03/10/2004EP1396470A2 Fabrication of microstructures with vacuum-sealed cavity
03/10/2004EP1395876A2 Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
03/10/2004EP1395689A1 Pt-co based sputtering targets
03/10/2004EP1395688A1 Ion beam sputter deposition process
03/10/2004CN2606115Y Crucible vaporizer for organic electroluminascent film coater
03/10/2004CN1481582A Processing method and processing appts
03/10/2004CN1481449A Injector and method for prolonged introduction of reagents into plasma
03/10/2004CN1480999A Sputter system capable of detecting position of semiconductor chip automatically
03/10/2004CN1480984A Mfg. equipment
03/10/2004CN1480744A Plastic optical device having antireflecting membrane and mechanism enabling evenness of such membrane
03/10/2004CN1480557A Magnetism controlled wobbly sputter machine in sweep type
03/10/2004CN1480555A Pre-sputter method for raising rate of utilization of sputter target
03/10/2004CN1480554A Alloy target material for conduction film and its preparation method
03/10/2004CN1480342A Laser thermal transfer donor contg separated adulterant coating
03/10/2004CN1141734C Preparation of solar energy photovoltaic material-carbon film
03/10/2004CN1141416C Indium source reagent compsns.
03/10/2004CN1141415C Synthesis of carbon-base film
03/10/2004CN1141187C Method and appts. for zone lubrication of magnetic media
03/10/2004CN1141178C Titanium dioxide photocatalysis air-cleaning film and its preparation method
03/09/2004US6704913 In situ wafer heat for reduced backside contamination
03/09/2004US6703300 Method for making multilayer electronic devices
03/09/2004US6703179 Transfer of organic material from a donor to form a layer in an OLED device
03/09/2004US6703130 Substrate coated with transparent conductive film and manufacturing method thereof
03/09/2004US6702934 Pulsed arc molecular beam deposition apparatus and methodology
03/09/2004US6702931 Forming thick, uniform oxide layer; evaporation of single phase target in oxygen atmosphere
03/09/2004US6702930 Method and means for enhancing utilization of sputtering targets
03/04/2004WO2004018166A1 A cutting member having a superlattice coating
03/04/2004WO2004001495A3 Display cell, in particular liquid crystal, or photovoltaic cell comprising means for connection to an electronic control circuit
03/04/2004WO2003100121A3 Multistation coating device and method for plasma coating
03/04/2004WO2003088445A3 Apparatus and method for arc detection
03/04/2004WO2003051787A3 Method for the production of locally functional photocatalytic areas and objects obtained therewith
03/04/2004WO2002023582A9 Faraday system for ion implanters
03/04/2004US20040043628 Method of forming an oxide film
03/04/2004US20040043553 Elimination of dendrite formation during metal/chalcogenide glass deposition
03/04/2004US20040043525 Method of forming protection film for covering electronic component and electronic device having protection film
03/04/2004US20040043260 Substrate with photocatalytic coating
03/04/2004US20040043259 Optical multilayer film and optical semiconductor device including the same