Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2004
04/07/2004EP1404763A1 Method for the production of plane-parallel platelets by using organic separating agents
04/07/2004EP1404722A1 Continuous processing apparatus by plasma polymerization with vertical chamber
04/07/2004EP1404460A1 Masking article for use in vehicle manufacturing
04/07/2004EP1046183B1 Ion implantation device arranged to select neutral ions from the ion beam and methode
04/07/2004CN2609940Y Magnetic field rotation outside cylindrical target
04/07/2004CN1488009A Diamond coatings on reactor wall and method of manufacturing thereof
04/07/2004CN1487777A Method for forming protection film coating electronic elements and electronic instrument with protection film
04/07/2004CN1487636A Nd2 YVO4 light waveguide film device on Sio2 Substrate and its prepn
04/07/2004CN1487551A Prepn of carbon supported film
04/07/2004CN1487117A Method and product of sputtering and depositing bioactive gradient hydroxyapatite/Ti layer on Ti alloy surface
04/07/2004CN1487116A Vapour-deposition source for organic electroluminescent film vapour-deposition
04/07/2004CN1487115A PLD process of preparing Ni-C film material with positive giant magnetoresistive effect at room temperature
04/07/2004CN1487114A Coating template calibrating device and method for sputtering nano multilayer film
04/07/2004CN1144907C Sliding device of sewing machine
04/07/2004CN1144888C Aluminium-titanium alloy with high specular reflectivity, reflecting layer containing the same alloy and micrors and parts comprising the same layer
04/06/2004US6717178 Semiconductor devices fabricated using sputtered silicon targets
04/06/2004US6716795 Useful where an electronically active layer is deposited on the buffer layer
04/06/2004US6716660 Method for fabricating a wiring line assembly for a thin film transistor array panel substrate
04/06/2004US6716656 Self-aligned hybrid deposition
04/06/2004US6716545 High temperature superconducting composite conductors
04/06/2004US6716542 Sputtering target for production of a magnetic recording medium
04/06/2004US6716540 Multilayer film formed body
04/06/2004US6716483 Methods for cutting articles containing at least a substantial amount of wood
04/06/2004US6716323 Coating glass
04/06/2004US6716322 Method and apparatus for controlling film profiles on topographic features
04/06/2004US6716321 Protective coatings; process control; concurrent applying coating with various physical properties
04/06/2004CA2355685C Soil-resistant coating for glass surfaces
04/02/2004CA2444153A1 Scratch resistant metal films and metallized surfaces and methods of fabricating them
04/01/2004WO2004028214A1 Fabrication system and manufacturing method of light emitting device
04/01/2004WO2004027898A2 Anode compositions having an elastomeric binder and an adhesion promoter
04/01/2004WO2004027684A2 Photolithography mask repair
04/01/2004WO2004027465A1 Reducing the susceptibility of titanium nitride optical layers to crack
04/01/2004WO2004027109A1 Tantalum sputtering target and method for preparation thereof
04/01/2004WO2004027108A2 Process of controllable synthesis of carbon films with composite structures
04/01/2004WO2004027107A1 Masking mechanism for film-forming device
04/01/2004WO2004027105A1 Method, equipment, and material for creating a surface on a metal
04/01/2004WO2004026787A1 Method for producing layers and layer systems and coated substrate
04/01/2004WO2004026786A1 Protective layer, method and arrangement for the production of protective layers
04/01/2004WO2004026785A1 Coated object
04/01/2004WO2004026782A1 Layer system comprising a titanium-aluminium-oxide layer
04/01/2004WO2004026471A1 Photocatalyst material and process for producing the same
04/01/2004WO2004016820A3 Thin film deposition apparatus
04/01/2004WO2004011688A3 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings
04/01/2004WO2004008478A3 Cathode for vacuum sputtering treatment machine
04/01/2004WO2004005574A3 Rotary target and method for onsite mechanical assembly of rotary target
04/01/2004WO2003105543A3 Method and device for reduction of the ignition voltage of plasmas
04/01/2004WO2003104517A3 Method and device for incorporating a compound in the pores of a porous material and uses thereof
04/01/2004WO2003069015A3 Aperture masks for circuit fabrication
04/01/2004WO2003046255A8 Field emission device and method of fabricating same
04/01/2004US20040063883 Process for producing an organic polymer film whereby when using it as an interlayer insulating film in a semiconductor device, the film exhibits higher adhesiveness at its interface where other semiconductor materials are in contact with the
04/01/2004US20040063320 A collimator as a flux reducer may be used to filter out charged particles and reduce damage; amorphous, intermetallic layers
04/01/2004US20040063226 Growth of multi-component alloy films with controlled graded chemical composition on sub-nanometer scale
04/01/2004US20040063059 Dental braces and methods for coating
04/01/2004US20040062864 Method for vapor phase aluminiding of a gas turbine blade partially masked with a masking enclosure
04/01/2004US20040062862 Substrate holder; controlling temperature; uniform distribution of vapors
04/01/2004US20040062856 Depositing layers in OLED devices using viscous flow
04/01/2004US20040062675 Fabrication of ductile intermetallic sputtering targets
04/01/2004US20040060817 Cluster tool with a hollow cathode array
04/01/2004US20040060813 High-power pulsed magnetron sputtering
04/01/2004US20040060812 Method for modulating stress in films deposited using a physical vapor deposition (PVD) process
04/01/2004US20040060592 Semiconductor device and its manufacturing method
04/01/2004US20040060513 Processing method and processing apparatus
04/01/2004DE4417224B4 Akustische Oberflächenwellenvorrichtung und Verfahren zu ihrer Herstellung A surface acoustic wave device and methods for their preparation
04/01/2004DE20220798U1 Coating device for coating a large substrate or a number of smaller substrates is arranged within a vacuum chamber and has a moving unit to which a vaporizer is fixed
04/01/2004DE10336228A1 Dünner Legierungsfilm auf Ag-Basis und Sputtertarget zum Bilden des Films Alloy thin film, and Ag-based sputtering target for forming the film
04/01/2004DE10306784A1 Verbindungsfilm und Verfahren zur Herstellung desselben Compound film and method for manufacturing the same
04/01/2004DE10243406A1 Plasmaquelle Plasma source
04/01/2004CA2498901A1 Anode compositions having an elastomeric binder and an adhesion promoter
03/2004
03/31/2004EP1403911A2 Thin film device and its fabrication method
03/31/2004EP1403399A2 Titanium article having improved corrosion resistance
03/31/2004EP1403395A1 Method for vapor phase aluminiding of a gas turbine blade partially masked with a masking enclosure
03/31/2004EP1403388A1 Process for making products by high temperature deformation
03/31/2004EP1402951A1 Conductive catalyst particle and its manufacturing method, gas-diffusing catalyst electrode, and electrochemical device
03/31/2004EP1402082A1 Apparatus for vacuum vaporization
03/31/2004EP1402081A1 Ring-type sputtering target
03/31/2004EP0757615B1 Process of coating a layer of amorphous diamond on blades
03/31/2004CN2608517Y Zinc aluminium vacuum evaporation film-plating machine
03/31/2004CN1486502A 离子源 Ion source
03/31/2004CN1486122A Organic solid compaction column members for organic light-emitting diode displays and method for production thereof
03/31/2004CN1485459A Process for preparing nanometer metallic particles dispersion oxide optical thin film
03/31/2004CN1144198C Device and method for mfg. optical recording medium
03/31/2004CN1144085C Touch screen base material with transparent electroconductive film
03/30/2004US6714401 Concentration of oxygen in the vicinity of the interface between the resin thin film and the metal thin film is higher than a concentration of oxygen in a middle portion of the resin thin film in its thickness direction
03/30/2004US6713391 Physical vapor deposition targets
03/30/2004US6713216 Thin alkali metal film member and method of producing the same
03/30/2004US6713199 Plurality of separate layers, each having a thickness of less than 500 angstrom , and based on hafnium dioxide (hfo2), zirconium dioxide (zro2) and alumina (al2o3). in practice, the hafnium dioxide, zirconium dioxide and alumina layers form
03/30/2004US6713121 Cathode ray tube and method for manufacturing thereof
03/30/2004US6712943 Methods for angle limiting deposition mask
03/30/2004US6712928 Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device
03/30/2004US6712915 Formation and applications of AlCuFe quasicrystalline thin films
03/30/2004US6712907 Magnetically coupled linear servo-drive mechanism
03/26/2004CA2442642A1 Process for manufacturing an aluminum nitride ain substrate
03/25/2004WO2004026000A1 Thin film phosphor for electroluminescent displays
03/25/2004WO2004025999A1 Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays
03/25/2004WO2004025696A2 Active matrix backplane for controlling controlled elements and method of manufacture thereof
03/25/2004WO2004025219A1 System and method for monitoring thin film deposition on optical substrates
03/25/2004WO2004024979A1 Sensor system and methods used to detect material wear and surface deterioration
03/25/2004WO2004024978A1 Non-planar sputter targets having crystallographic orientations promoting uniform deposition
03/25/2004WO2004024977A1 Iron silicide sputtering target and method for production thereof
03/25/2004WO2004024976A1 Component protected against corrosion and method for the production thereof and device for carrying out said method