Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2004
05/06/2004WO2004038842A2 FUEL CELL HAVING TiAlNO DEPOSITED AS A PROTECTIVE LAYER ON METALLIC SURFACES
05/06/2004WO2004038702A1 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus
05/06/2004WO2004038065A1 Stabilized aluminum laminate having aluminum and stabilizing layer laminated thereon
05/06/2004WO2004038062A2 Method of forming a sputtering target assembly and assembly made therefrom
05/06/2004WO2004038061A1 Substrate having multilayer film and method for manufacturing the same
05/06/2004WO2004038059A2 Target designs and related methods for enhanced cooling and reduced deflection and deformation
05/06/2004WO2004017356A3 Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes
05/06/2004WO2002031215A9 Method of forming indium tin oxide film
05/06/2004US20040088052 Used for a prosthesis; diamon-like-coatings/ion implantation
05/06/2004US20040086723 Coated article with silicon oxynitride adjacent glass
05/06/2004US20040086717 Providing a flexible plastic substrate; depositing a multilayered conductive metallic film comprising two layers of alloy selected from indium cerium oxide and indium tin oxide surrounding a layer of an alloy of silver, palladium, copper
05/06/2004US20040086662 Stability of ion beam generated alignment layers by surface modification
05/06/2004US20040086639 Patterned thin-film deposition using collimating heated mask asembly
05/06/2004US20040086630 Positioning a substrate in spaced relation to a port of a microeffusion cell; transporting substrate across port; effusing an emissive material from the port; adhering the emissive material effused from the port to form emissive strip
05/06/2004US20040086629 Selective deposition of emissive layer in electroluminescent displays
05/06/2004US20040086628 Selective deposition of emissive layer in electroluminescent displays
05/06/2004US20040085023 Methods and apparatus for generating high-density plasma
05/06/2004US20040084709 Capacitor having a cylindrical (or concave) structure to overcome a difficulty in etching a lower electrode as the height of a 3-dimensionally stacked capacitor increases
05/06/2004US20040084422 Plasma source
05/06/2004US20040084305 Sputtering system and manufacturing method of thin film
05/06/2004US20040084299 High throughput dual ion beam deposition apparatus
05/06/2004US20040084298 Sputtering magnetic, grain-confining, and nonmagnetic materials; annealing in controlled vacuum; quenching; transformation from soft to hard magnetic granular films; coercive force, high saturation magnetization
05/06/2004US20040083976 Modified deposition ring to eliminate backside and wafer edge coating
05/06/2004US20040083969 Film forming apparatus, substrate for forming oxide thin film, and production method thereof
05/06/2004US20040083968 Apparatus for performing at least one process on a substrate
05/06/2004US20040083955 Vacuum chamber load lock structure and article transport mechanism
05/06/2004US20040083696 Ion implantation and wet bench systems utilizing exhaust gas recirculation
05/06/2004EP1416541A2 Transparent oxide electrode film and manufacturing method thereof, transparent electroconductive base Material, solar cell and photo detection element
05/06/2004EP1416064A2 Method of coating micro-electromechanical devices
05/06/2004EP1415014A1 Method for making diamond-coated composite materials
05/06/2004EP1415013A1 Rapid cycle chamber having a top vent with nitrogen purge
05/06/2004EP1415012A1 Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
05/06/2004EP1415011A1 A method for reactive sputtering deposition
05/06/2004EP1414586A2 Composite layer and method for producing said composite layer
05/06/2004EP1414568A2 Metal bistriflimide compounds, their synthesis and their uses
05/06/2004EP1307604B1 Method for producing a tool which can be used to create surface structures in the sub-micrometer range
05/06/2004EP1290239B1 Bearing with amorphous boron carbide coating
05/06/2004EP1144131B1 Plasma enhanced chemical deposition of conjugated polymer
05/06/2004DE10248962A1 Production of a high temperature superconductor layer on a substrate for use in high energy applications comprises depositing a superconducting layer with a low growth rate
05/06/2004CA2448410A1 Anti-relfection spectacle lens and its production method
05/05/2004CN1494603A Arc evaporator with powerful magnetic guide for targets having large surface area
05/05/2004CN1494602A Assembly of physical vapor deposition target and method for producing same
05/05/2004CN1494601A Physical vapor deposition target/backing plate assemblies, and methods of forming same
05/05/2004CN1494600A Method for forming resin film and method for mfg. electronic parts
05/05/2004CN1494388A Ornament having white coating film and mfg. method thereof
05/05/2004CN1494359A Photomask and its mfg. method, electroluminescent apparatus and mfg. method thereof, and electronic machine
05/05/2004CN1493539A Preparation method of photo catalytic activation self cleaning product
05/05/2004CN1493372A Manufacturing method of medical high voltage static treatment membrane
05/05/2004CN1148563C Method and apparatus for in-situ monitoring of plasma etch and deposition processes using pulsed broadband light source
05/05/2004CN1148465C Method for preparing composite conductive material
05/04/2004US6731849 Coating for optical fibers
05/04/2004US6731386 Measurement technique for ultra-thin oxides
05/04/2004US6730885 Batch type heat treatment system, method for controlling same, and heat treatment method
05/04/2004US6730605 Redistribution of copper deposited films
05/04/2004US6730547 Integrated circuit device and fabrication using metal-doped chalcogenide materials
05/04/2004US6730445 Attenuated embedded phase shift photomask blanks
05/04/2004US6730415 Comprises film comprising phosphorous, platinum and/or palladium glassy alloy; corrosion resistance; durability
05/04/2004US6730413 Thermal barrier coating
05/04/2004US6730365 Method of thin film deposition under reactive conditions with RF or pulsed DC plasma at the substrate holder
05/04/2004US6730351 Porous metallic vapor deposited film with crystalline grown up in a dendrite structure, in a vacuum vapor deposition.
05/04/2004US6730198 Container-shaped physical vapor deposition targets
05/04/2004US6730197 Oblique deposition apparatus
05/04/2004US6730196 Auxiliary electromagnets in a magnetron sputter reactor
05/04/2004US6730194 Lock chamber, a sputtering source with an active surface, a transport chamber with one connection opening to the lock chamber and the sputtering source
05/04/2004US6730174 Unitary removable shield assembly
05/04/2004US6729927 Method and apparatus for making a shadow mask array
04/2004
04/29/2004WO2004036651A1 Semiconductor ferroelectric storage device and its manufacturing method
04/29/2004WO2004036616A1 Method for the production of a substrate with a magnetron sputter coating and unit for the same
04/29/2004WO2004035855A2 Method of producing a high density pattern of isolated clusters
04/29/2004WO2004035854A2 Method and apparatus for processing substrates
04/29/2004WO2004035307A1 Film multilayer body and flexible circuit board
04/29/2004WO2004001804A3 Device for generation of reactive ions
04/29/2004WO2003095698A3 Device and method for the electron beam attenuation of reactively formed layers on substrates
04/29/2004US20040082200 Method for forming a silicon nitride layer
04/29/2004US20040082099 Elimination of dendrite formation during metal/chalcogenide glass deposition
04/29/2004US20040081880 Method for fabricating membrane-electrode assembly and fuel cell adopting the membrane-electrode assembly
04/29/2004US20040081836 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein
04/29/2004US20040081833 Process for depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate, and substrate thus coated
04/29/2004US20040081824 Oxide coated cutting tool
04/29/2004US20040081767 Ceramic masking material and application method for protecting turbine airfoil component surfaces during vapor phase aluminiding
04/29/2004US20040081763 By which a technically usable metal coating can be produced in accordance with thin-layer technology at high production speed
04/29/2004US20040081750 Storage phosphor screen and preparation method
04/29/2004US20040080830 Niobium oxide and silicon dioxide thin film filter for dense wavelength division multiplexing
04/29/2004US20040079635 Sputtering target material
04/29/2004US20040079634 Method of forming a sputtering target assembly and assembly made therefrom
04/29/2004US20040079281 Scanned focus deposition system
04/28/2004EP1413651A1 Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target
04/28/2004EP1413647A2 Wear resistant coating
04/28/2004EP1413644A2 Thin-film deposition device
04/28/2004EP1413643A2 Multiple axis tumbler coating apparatus
04/28/2004EP1412964A1 Sputtering magnetron arrangements with adjustable magnetic field strength
04/28/2004EP1412550A2 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device
04/28/2004EP1370371A4 Vacuum deposition of cationic polymer systems
04/28/2004EP1165856B1 Method of making a multilayer article by arc plasma deposition
04/28/2004EP1038306B1 Method and device for improving surfaces
04/28/2004CN1492978A Piston ring and method for producing the same
04/28/2004CN1492942A Tantalum and niobium billets and methods of producing the same
04/28/2004CN1492941A Sputtering target, and production method therefor
04/28/2004CN1492940A Laminated film and method of forming film
04/28/2004CN1492071A Method and device for producing low reflectivity film