Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2004
06/01/2004US6743481 Process for production of ultrathin protective overcoats
06/01/2004US6743476 Method for producing indium tin oxide film
06/01/2004US6743475 Process for producing aluminum oxide films at low temperatures
06/01/2004US6743343 Target and process for its production, and method of forming a film having a high refractive index
06/01/2004US6743342 Sputtering target with a partially enclosed vault
06/01/2004US6743341 Apparatus for applying thin layers to a substrate
06/01/2004US6743340 Posiitoning in vacuum; magnetron sputtering ferromagnetic material on wafer
06/01/2004US6743296 Apparatus and method for self-centering a wafer in a sputter chamber
06/01/2004US6743082 Blasting apparatus
05/2004
05/27/2004WO2004044583A1 Surfaces with gradients in surface topography
05/27/2004WO2004044263A1 Device for carrying out a surface treatment of substrates under vacuum
05/27/2004WO2004044262A1 Fabrication of magnesium diboride superconductor thin films and electronic devices by ion implantation
05/27/2004WO2004044261A2 High deposition rate sputtering
05/27/2004WO2004044260A1 Sputtering target and powder for production thereof
05/27/2004WO2004044259A1 Ta SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF
05/27/2004WO2004043871A1 System of layers for transparent substrates and coated substrate
05/27/2004WO2004043691A1 Extremely strain tolerant thermal protection coating and related method and apparatus thereof
05/27/2004WO2004043690A1 Multilayer sheet and packaging material for food, medicine, and tool for food, medicen, and tool
05/27/2004WO2004043631A1 Die cast sputter targets
05/27/2004WO2004029321A3 Composite bodies having an abrasion-reducing surface and method for the production thereof
05/27/2004WO2004024979B1 Sensor system and methods used to detect material wear and surface deterioration
05/27/2004WO2004024972A3 Systems and methods for a target and backing plate assembly
05/27/2004WO2004009299B1 Loading and unloading device for a coating unit
05/27/2004WO2003088340A3 Method for the production of structured layers on substrates
05/27/2004US20040101781 Reflecting layer, optical recording medium and sputtering target for forming reflecting layer
05/27/2004US20040101761 Solid electrolyte and battery employing the same
05/27/2004US20040101708 Coated article
05/27/2004US20040101694 Coated article with silicon nitride inclusive layer adjacent glass
05/27/2004US20040099899 High K dielectric material and method of making a high K dielectric material
05/27/2004US20040099525 Using work function reducing agents; sputtering onto surface; ionizing mixture containing oxygen; generation electrons
05/27/2004US20040099524 Magnetron sputtering
05/27/2004US20040099378 Gas injection apparatus for semiconductor processing system
05/27/2004US20040099285 Method of cleaning a coated process chamber component
05/27/2004US20040099282 Monitoring and decomposition of deposits in enclosures used for chemical vapor deposition of semiconductors, using gas generators, radiation measuring instruments and analysis apparatus
05/27/2004DE19935181C5 Verfahren zum Schutz eines vakuumtechnisch bearbeiteten Substrates und Verwendung des Verfahrens A method of protecting a vacuum-processed substrate and using the method
05/27/2004DE10353540A1 Process for the plasma-supported coating of a tubular component comprises inserting a source containing coating material into the component, evacuating the inner chamber of the component, and producing a high frequency magnetic field
05/27/2004DE10351748A1 Entspiegeltes Brillenglas und Verfahren zu dessen Herstellung Anti-reflective lens and method for its manufacture
05/27/2004DE10349087A1 Half-tone-type phase shift mask blank manufacturing method involves sputtering reactive gas onto substrate, to form half-tone film with desired optical characteristic, irrespective of change of gas flow amount
05/27/2004DE10305159A1 Punching line for punching processes comprises a punching line cut having a cutting tip and cutting sides
05/27/2004DE10253824A1 Metallizing of composite surfaces involves covering substrate of thermoplastic with high proportion of wood fiber filling, using metallic layer
05/27/2004DE10253319B3 Verfahren zum Herstellen eines Sputtertargets aus einer Si-Basislegierung, sowie die Verwendung des Sputtertargets A method of manufacturing a sputtering target from a Si-base alloy, and the use of sputter targets
05/27/2004DE10252543A1 Beschichtung für ein Kunststoffsubstrat Coating on a plastic substrate
05/27/2004CA2504919A1 System of layers for transparent substrates and coated substrate
05/26/2004EP1422705A1 Method of forming film on optical disk
05/26/2004EP1422316A1 Method for cleaning reaction container and film deposition system
05/26/2004EP1422314A1 Dispositive and process to clean process chambers and vacuum lines
05/26/2004EP1422313A1 Apparatus and method for vacuum vapor deposition of a coating material with continuated material replenishment
05/26/2004EP1422312A1 SPUTTERING TARGET, TRANSPARENT CONDUCTIVE FILM, AND THEIR MANUFACTURING METHOD
05/26/2004EP1422311A2 Hard film and hard film coated tool
05/26/2004EP1421613A1 Method and apparatus for fabricating mercuric iodide polycrystalline films for digital radiography
05/26/2004EP1421593A1 Methods and apparatus for depositing magnetic films
05/26/2004EP1190209B1 Method and device for measuring the thickness of a layer
05/26/2004EP1180262B1 Method for producing a hybrid disk, and hybrid disk
05/26/2004EP0986461A4 Method of forming a silicon layer on a surface
05/26/2004CN1500285A Consecutive deposition system
05/26/2004CN1500284A Hybrid scanning system and methods for ion implantation
05/26/2004CN1499648A Zinc oxide film and photoelectric element using it, and forming method of zinc oxide film
05/26/2004CN1499156A Method for forming light absorption membrane possessing mirroring option for solar powered vacuum heat collection bube
05/26/2004CN1498875A Oxide sintered body and sputtering target, and prepn. process of transparent conductive oxide film used as electrode
05/26/2004CN1151528C Cathode-ray tube and its producing method
05/26/2004CN1151515C Method for preparing oriented high-temp. superconducting film layer on non-texture basis
05/26/2004CN1151514C Method for raising critical current density of laser method prepared high-temp. superconducting strip material
05/26/2004CN1151315C Article having coating
05/26/2004CN1151314C Method for preparing film by means of cold-cathode sputtering process and its equipment
05/26/2004CN1151313C Ion plating apparatus that prevents wasteful consumption of evaporation material
05/26/2004CN1151312C Surface metallized high molecular film, and its prepn. method
05/26/2004CN1150980C Process for preparing photocatalyitc TiO2 film used to clean water and air
05/25/2004US6740624 Spraying method to form a thick coating and products obtained
05/25/2004US6740585 Barrier formation using novel sputter deposition method with PVD, CVD, or ALD
05/25/2004US6740532 Method of manufacturing a ferroelectric thin film
05/25/2004US6740428 Slide member
05/25/2004US6740420 Substrate having a modified native oxide layer for improved electrical conductivity
05/25/2004US6740416 Functional thin film formed uniformly on aerogel surface; layers can be infrared reflective film, optical wavequide, electroconductive, fluorescent; intermediate layer is copper phthalocyanine for electroconductive functional layer
05/25/2004US6740398 Magnetic films including iridium, manganese and nitrogen
05/25/2004US6740393 DLC coating system and process and apparatus for making coating system
05/25/2004US6740378 Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
05/25/2004US6740290 Converting impurity divalent copper ions in aqueous solution of cobalt chloride to monovalent copper ions using hydrochloric acid, separating monovalent copper ions using ion exchange resins
05/25/2004US6740212 Rectangular magnetron sputtering cathode with high target utilization
05/25/2004US6740210 Sputtering method for forming film and apparatus therefor
05/25/2004US6740209 Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media
05/25/2004US6740208 Photo mask blank and method of manufacturing the same
05/25/2004US6740207 Plasma discharge is at least conjointly supplied by means of high frequency (hf) energy, wherein the hf supply of the plasma discharge is briefly deactivated.
05/25/2004US6739196 Cleanliness evaluation in sputter targets using phase
05/21/2004WO2004042774A1 Methods and apparatus for generating high-density plasma
05/21/2004WO2004042111A2 Lock arrangement for a substrate coating installation
05/21/2004WO2004042110A1 Method of forming film on substrate
05/21/2004WO2004042108A2 Transparent conductive film for flat panel displays
05/21/2004WO2004042107A2 Coating for a plastic substrate
05/21/2004WO2004042104A2 Thin films and methods for forming thin films utilizing ecae-targets
05/21/2004WO2004041985A2 Device and method for the evaporative deposition of a high-temperature superconductor in a vacuum with continuous material introduction
05/21/2004WO2004041415A1 Semiconductor manufacturing facility and process systems utilizing exhaust recirculation
05/21/2004WO2004031418A3 Method for manufacturing products by means of deformation at increased temperatures
05/20/2004US20040098094 Implantable graft and methods of making same
05/20/2004US20040097063 Single wafer processing method and system for processing semiconductor
05/20/2004US20040096694 Multilayer; vacuum evaporation; process control; electrolytic cells
05/20/2004US20040096650 Synthetic resin molded material and method for its production
05/20/2004US20040096587 Epitaxial oxide films via nitride conversion
05/20/2004US20040096583 Method for vacuum treatment of workpieces and vacuum treatment installation
05/20/2004US20040096580 Film forming method and film forming device
05/20/2004US20040095537 Liquid crystal panel and method for manufacturing same